Advanced Process Control - Neural Network-Based Real-Time Malfunction Diagnosis of Reactive Ion Etching Using In Situ Metrology Data

Gespeichert in:

Autor*in:	Hong, S.J. [verfasserIn] May, G.S.

Format:	Artikel

Erschienen:	2004

Umfang:	14

Übergeordnetes Werk:	Enthalten in: IEEE transactions on semiconductor manufacturing - New York, NY : IEEE, 1988, 17(2004), 3, Seite 408-421
Übergeordnetes Werk:	volume:17 ; year:2004 ; number:3 ; pages:408-421 ; extent:14

Katalog-ID:	OLC1727362802

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