Hydrogen and deuterium incorporation and transport in hafnium-based dielectric films on silicon

Gespeichert in:

Autor*in:	Pezzi, R.P. [verfasserIn] Miotti, L. Bastos, K.P. Soares, G.V. Driemeier, C. Baumvol, I.J.R. Punchaipetch, P. Pant, G. Gnade, B.E.

Format:	Artikel

Erschienen:	2004

Umfang:	3

Übergeordnetes Werk:	Enthalten in: Applied physics letters - Melville, NY : AIP, 1962, 85(2004), 16, Seite 3540-3542
Übergeordnetes Werk:	volume:85 ; year:2004 ; number:16 ; pages:3540-3542 ; extent:3

Katalog-ID:	OLC1730743005

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Hydrogen and deuterium incorporation and transport in hafnium-based dielectric films on silicon

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