Low Pressure Chemical Vapor Deposition of Silicon Dioxide Films by Thermal Decomposition of Tetra-alkoxysilanes

Gespeichert in:

Autor*in:	Kim, E.J. [verfasserIn] Gill, W.N.

Format:	Artikel

Erschienen:	1995

Systematik:	VA 4000

Übergeordnetes Werk:	Enthalten in: Journal of the Electrochemical Society - Pennington, NJ : Electrochemical Society, 1948, 142(1995), 2, Seite 676
Übergeordnetes Werk:	volume:142 ; year:1995 ; number:2 ; pages:676

Katalog-ID:	OLC174599422X

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author-letter	Kim, E.J.
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title_sort	low pressure chemical vapor deposition of silicon dioxide films by thermal decomposition of tetra-alkoxysilanes
title_auth	Low Pressure Chemical Vapor Deposition of Silicon Dioxide Films by Thermal Decomposition of Tetra-alkoxysilanes
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title_short	Low Pressure Chemical Vapor Deposition of Silicon Dioxide Films by Thermal Decomposition of Tetra-alkoxysilanes
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up_date	2024-07-03T23:40:51.269Z
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