High stability measurement in the sub-half micron region based on new ESD technology

Gespeichert in:

Autor*in:	Kitamura, T. [verfasserIn]

Format:	Artikel

Erschienen:	1995

Umfang:	4

Übergeordnetes Werk:	Enthalten in: Microelectronic engineering - Amsterdam [u.a.] : Elsevier, 1983, 27(1995), 1-4, Seite 535-538
Übergeordnetes Werk:	volume:27 ; year:1995 ; number:1-4 ; pages:535-538 ; extent:4

Katalog-ID:	OLC1750248360

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