Control of Ion Energy for Low-Damage Plasma Processing in RF Discharge

Gespeichert in:

Autor*in:	Sato, Naoyuki [verfasserIn] Kobayashi, Hideki Tanabe, Toshio Ikehata, Takashi Mase, Hiroshi

Format:	Artikel

Erschienen:	1995

Systematik:	UA 4210.

Umfang:	5

Übergeordnetes Werk:	Enthalten in: Japanese journal of applied physics. Part 1, Regular papers, brief communications & review papers - Tokyo : Ōyō Butsuri Gakkai, 1982, 34(1995), 4, B, Seite 2158-2162
Übergeordnetes Werk:	volume:34 ; year:1995 ; number:4 ; supplement:B ; pages:2158-2162 ; extent:5

Katalog-ID:	OLC1760796271

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Control of Ion Energy for Low-Damage Plasma Processing in RF Discharge

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