Transient modeling of chemical vapor infiltration of methane using multi-step reaction and deposition models

Gespeichert in:

Autor*in:	Li, Aijun [verfasserIn] Deutschmann, Olaf

Format:	Artikel

Erschienen:	2007

Umfang:	7

Übergeordnetes Werk:	Enthalten in: Chemical engineering science - Amsterdam : Elsevier, 1951, 62(2007), 18, Seite 4976-4982
Übergeordnetes Werk:	volume:62 ; year:2007 ; number:18 ; pages:4976-4982 ; extent:7

Katalog-ID:	OLC1776513223

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