NOTE: Fast prototyping using a dry film photoresist: microfabrication of soft-lithography masters for microfluidic structures

Gespeichert in:

Autor*in:	Stephan, K. [verfasserIn] Pittet, P. Renaud, L. Kleimann, P. Morin, P. Ouaini, N. Ferrigno, R.

Format:	Artikel

Erschienen:	2007

Übergeordnetes Werk:	Enthalten in: Journal of micromechanics and microengineering - Bristol : IOP Publ., 1991, 17(2007), 10, Seite N69
Übergeordnetes Werk:	volume:17 ; year:2007 ; number:10 ; pages:N69

Katalog-ID:	OLC1779272332

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spelling	sw070928 (DE-627)OLC1779272332 (DE-599)GBVOLC1779272332 DE-627 ger DE-627 rakwb 530 Stephan, K. verfasserin aut NOTE: Fast prototyping using a dry film photoresist: microfabrication of soft-lithography masters for microfluidic structures 2007 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Pittet, P. oth Renaud, L. oth Kleimann, P. oth Morin, P. oth Ouaini, N. oth Ferrigno, R. oth Enthalten in Journal of micromechanics and microengineering Bristol : IOP Publ., 1991 17(2007), 10, Seite N69 (DE-627)130968692 (DE-600)1069644-1 (DE-576)025188429 0960-1317 nnns volume:17 year:2007 number:10 pages:N69 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY GBV_ILN_21 GBV_ILN_32 GBV_ILN_40 GBV_ILN_60 GBV_ILN_70 GBV_ILN_150 GBV_ILN_170 GBV_ILN_2006 GBV_ILN_2020 AR 17 2007 10 N69
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allfieldsGer	sw070928 (DE-627)OLC1779272332 (DE-599)GBVOLC1779272332 DE-627 ger DE-627 rakwb 530 Stephan, K. verfasserin aut NOTE: Fast prototyping using a dry film photoresist: microfabrication of soft-lithography masters for microfluidic structures 2007 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Pittet, P. oth Renaud, L. oth Kleimann, P. oth Morin, P. oth Ouaini, N. oth Ferrigno, R. oth Enthalten in Journal of micromechanics and microengineering Bristol : IOP Publ., 1991 17(2007), 10, Seite N69 (DE-627)130968692 (DE-600)1069644-1 (DE-576)025188429 0960-1317 nnns volume:17 year:2007 number:10 pages:N69 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY GBV_ILN_21 GBV_ILN_32 GBV_ILN_40 GBV_ILN_60 GBV_ILN_70 GBV_ILN_150 GBV_ILN_170 GBV_ILN_2006 GBV_ILN_2020 AR 17 2007 10 N69
allfieldsSound	sw070928 (DE-627)OLC1779272332 (DE-599)GBVOLC1779272332 DE-627 ger DE-627 rakwb 530 Stephan, K. verfasserin aut NOTE: Fast prototyping using a dry film photoresist: microfabrication of soft-lithography masters for microfluidic structures 2007 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Pittet, P. oth Renaud, L. oth Kleimann, P. oth Morin, P. oth Ouaini, N. oth Ferrigno, R. oth Enthalten in Journal of micromechanics and microengineering Bristol : IOP Publ., 1991 17(2007), 10, Seite N69 (DE-627)130968692 (DE-600)1069644-1 (DE-576)025188429 0960-1317 nnns volume:17 year:2007 number:10 pages:N69 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY GBV_ILN_21 GBV_ILN_32 GBV_ILN_40 GBV_ILN_60 GBV_ILN_70 GBV_ILN_150 GBV_ILN_170 GBV_ILN_2006 GBV_ILN_2020 AR 17 2007 10 N69
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