Pattern transfer fidelity in capillary force lithography with poly(ferrocenylsilane) plasma etch resists
Autor*in: |
Korczagin, Igor [verfasserIn] |
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Format: |
Artikel |
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Erschienen: |
2008 |
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Umfang: |
6 |
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Übergeordnetes Werk: |
Enthalten in: European polymer journal - Oxford : Elsevier, 1965, 44(2008), 8, Seite 2523-2528 |
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Übergeordnetes Werk: |
volume:44 ; year:2008 ; number:8 ; pages:2523-2528 ; extent:6 |
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OLC1798984563 |
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sw080819 (DE-627)OLC1798984563 (DE-599)GBVOLC1798984563 DE-627 ger DE-627 rakwb 670 35.80 bkl Korczagin, Igor verfasserin aut Pattern transfer fidelity in capillary force lithography with poly(ferrocenylsilane) plasma etch resists 2008 6 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Xu, Hong oth Hempenius, Mark A. oth Julius Vancso, G. oth Enthalten in European polymer journal Oxford : Elsevier, 1965 44(2008), 8, Seite 2523-2528 (DE-627)129594008 (DE-600)240481-3 (DE-576)015086860 0014-3057 nnns volume:44 year:2008 number:8 pages:2523-2528 extent:6 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-CHE SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_70 GBV_ILN_2006 GBV_ILN_2411 GBV_ILN_4012 GBV_ILN_4323 35.80 AVZ AR 44 2008 8 2523-2528 6 |
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sw080819 (DE-627)OLC1798984563 (DE-599)GBVOLC1798984563 DE-627 ger DE-627 rakwb 670 35.80 bkl Korczagin, Igor verfasserin aut Pattern transfer fidelity in capillary force lithography with poly(ferrocenylsilane) plasma etch resists 2008 6 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Xu, Hong oth Hempenius, Mark A. oth Julius Vancso, G. oth Enthalten in European polymer journal Oxford : Elsevier, 1965 44(2008), 8, Seite 2523-2528 (DE-627)129594008 (DE-600)240481-3 (DE-576)015086860 0014-3057 nnns volume:44 year:2008 number:8 pages:2523-2528 extent:6 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-CHE SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_70 GBV_ILN_2006 GBV_ILN_2411 GBV_ILN_4012 GBV_ILN_4323 35.80 AVZ AR 44 2008 8 2523-2528 6 |
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sw080819 (DE-627)OLC1798984563 (DE-599)GBVOLC1798984563 DE-627 ger DE-627 rakwb 670 35.80 bkl Korczagin, Igor verfasserin aut Pattern transfer fidelity in capillary force lithography with poly(ferrocenylsilane) plasma etch resists 2008 6 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Xu, Hong oth Hempenius, Mark A. oth Julius Vancso, G. oth Enthalten in European polymer journal Oxford : Elsevier, 1965 44(2008), 8, Seite 2523-2528 (DE-627)129594008 (DE-600)240481-3 (DE-576)015086860 0014-3057 nnns volume:44 year:2008 number:8 pages:2523-2528 extent:6 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-CHE SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_70 GBV_ILN_2006 GBV_ILN_2411 GBV_ILN_4012 GBV_ILN_4323 35.80 AVZ AR 44 2008 8 2523-2528 6 |
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sw080819 (DE-627)OLC1798984563 (DE-599)GBVOLC1798984563 DE-627 ger DE-627 rakwb 670 35.80 bkl Korczagin, Igor verfasserin aut Pattern transfer fidelity in capillary force lithography with poly(ferrocenylsilane) plasma etch resists 2008 6 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Xu, Hong oth Hempenius, Mark A. oth Julius Vancso, G. oth Enthalten in European polymer journal Oxford : Elsevier, 1965 44(2008), 8, Seite 2523-2528 (DE-627)129594008 (DE-600)240481-3 (DE-576)015086860 0014-3057 nnns volume:44 year:2008 number:8 pages:2523-2528 extent:6 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-CHE SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_70 GBV_ILN_2006 GBV_ILN_2411 GBV_ILN_4012 GBV_ILN_4323 35.80 AVZ AR 44 2008 8 2523-2528 6 |
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