Analysis of local segregation of impurities at a silicon melt–crystal interface during crystal growth in transverse magnetic field-applied Czochralski method

Gespeichert in:

Autor*in:	Kakimoto, Koichi [verfasserIn] Liu, Lijun

Format:	Artikel

Erschienen:	2009

Umfang:	4

Übergeordnetes Werk:	Enthalten in: Journal of crystal growth - Amsterdam [u.a.] : Elsevier, 1967, 311(2009), 8, Seite 2313-2316
Übergeordnetes Werk:	volume:311 ; year:2009 ; number:8 ; pages:2313-2316 ; extent:4

Katalog-ID:	OLC1816820636

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