Characteristic Enhancement of Solution-Processed In-Ga-Zn Oxide Thin-Film Transistors by Laser Annealing
Autor*in: |
Yang, Y-H [verfasserIn] |
---|
Format: |
Artikel |
---|
Erschienen: |
2010 |
---|
Umfang: |
3 |
---|
Übergeordnetes Werk: |
Enthalten in: IEEE electron device letters - New York, NY : IEEE, 1980, 31(2010), 9, Seite 969-972 |
---|---|
Übergeordnetes Werk: |
volume:31 ; year:2010 ; number:9 ; pages:969-972 ; extent:3 |
Katalog-ID: |
OLC1848546866 |
---|
LEADER | 01000caa a22002652 4500 | ||
---|---|---|---|
001 | OLC1848546866 | ||
003 | DE-627 | ||
005 | 20230711220936.0 | ||
007 | tu | ||
008 | 100909s2010 xx ||||| 00| ||und c | ||
028 | 5 | 2 | |a sw100908_1 |
035 | |a (DE-627)OLC1848546866 | ||
035 | |a (DE-599)GBVOLC1848546866 | ||
040 | |a DE-627 |b ger |c DE-627 |e rakwb | ||
082 | 0 | 4 | |a 620 |
100 | 1 | |a Yang, Y-H |e verfasserin |4 aut | |
245 | 1 | 0 | |a Characteristic Enhancement of Solution-Processed In-Ga-Zn Oxide Thin-Film Transistors by Laser Annealing |
264 | 1 | |c 2010 | |
300 | |a 3 | ||
336 | |a Text |b txt |2 rdacontent | ||
337 | |a ohne Hilfsmittel zu benutzen |b n |2 rdamedia | ||
338 | |a Band |b nc |2 rdacarrier | ||
700 | 1 | |a Yang, S S |4 oth | |
700 | 1 | |a Chou, K-S |4 oth | |
773 | 0 | 8 | |i Enthalten in |t IEEE electron device letters |d New York, NY : IEEE, 1980 |g 31(2010), 9, Seite 969-972 |w (DE-627)129618993 |w (DE-600)245158-X |w (DE-576)015122115 |x 0193-8576 |7 nnns |
773 | 1 | 8 | |g volume:31 |g year:2010 |g number:9 |g pages:969-972 |g extent:3 |
912 | |a GBV_USEFLAG_A | ||
912 | |a SYSFLAG_A | ||
912 | |a GBV_OLC | ||
912 | |a SSG-OLC-TEC | ||
912 | |a GBV_ILN_22 | ||
912 | |a GBV_ILN_70 | ||
912 | |a GBV_ILN_170 | ||
912 | |a GBV_ILN_2014 | ||
912 | |a GBV_ILN_2020 | ||
912 | |a GBV_ILN_2061 | ||
912 | |a GBV_ILN_4266 | ||
912 | |a GBV_ILN_4313 | ||
912 | |a GBV_ILN_4314 | ||
951 | |a AR | ||
952 | |d 31 |j 2010 |e 9 |h 969-972 |g 3 |
author_variant |
y h y yhy |
---|---|
matchkey_str |
article:01938576:2010----::hrceitcnacmnosltopoesdnanxdtiflta |
hierarchy_sort_str |
2010 |
publishDate |
2010 |
allfields |
sw100908_1 (DE-627)OLC1848546866 (DE-599)GBVOLC1848546866 DE-627 ger DE-627 rakwb 620 Yang, Y-H verfasserin aut Characteristic Enhancement of Solution-Processed In-Ga-Zn Oxide Thin-Film Transistors by Laser Annealing 2010 3 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Yang, S S oth Chou, K-S oth Enthalten in IEEE electron device letters New York, NY : IEEE, 1980 31(2010), 9, Seite 969-972 (DE-627)129618993 (DE-600)245158-X (DE-576)015122115 0193-8576 nnns volume:31 year:2010 number:9 pages:969-972 extent:3 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_22 GBV_ILN_70 GBV_ILN_170 GBV_ILN_2014 GBV_ILN_2020 GBV_ILN_2061 GBV_ILN_4266 GBV_ILN_4313 GBV_ILN_4314 AR 31 2010 9 969-972 3 |
spelling |
sw100908_1 (DE-627)OLC1848546866 (DE-599)GBVOLC1848546866 DE-627 ger DE-627 rakwb 620 Yang, Y-H verfasserin aut Characteristic Enhancement of Solution-Processed In-Ga-Zn Oxide Thin-Film Transistors by Laser Annealing 2010 3 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Yang, S S oth Chou, K-S oth Enthalten in IEEE electron device letters New York, NY : IEEE, 1980 31(2010), 9, Seite 969-972 (DE-627)129618993 (DE-600)245158-X (DE-576)015122115 0193-8576 nnns volume:31 year:2010 number:9 pages:969-972 extent:3 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_22 GBV_ILN_70 GBV_ILN_170 GBV_ILN_2014 GBV_ILN_2020 GBV_ILN_2061 GBV_ILN_4266 GBV_ILN_4313 GBV_ILN_4314 AR 31 2010 9 969-972 3 |
allfields_unstemmed |
sw100908_1 (DE-627)OLC1848546866 (DE-599)GBVOLC1848546866 DE-627 ger DE-627 rakwb 620 Yang, Y-H verfasserin aut Characteristic Enhancement of Solution-Processed In-Ga-Zn Oxide Thin-Film Transistors by Laser Annealing 2010 3 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Yang, S S oth Chou, K-S oth Enthalten in IEEE electron device letters New York, NY : IEEE, 1980 31(2010), 9, Seite 969-972 (DE-627)129618993 (DE-600)245158-X (DE-576)015122115 0193-8576 nnns volume:31 year:2010 number:9 pages:969-972 extent:3 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_22 GBV_ILN_70 GBV_ILN_170 GBV_ILN_2014 GBV_ILN_2020 GBV_ILN_2061 GBV_ILN_4266 GBV_ILN_4313 GBV_ILN_4314 AR 31 2010 9 969-972 3 |
allfieldsGer |
sw100908_1 (DE-627)OLC1848546866 (DE-599)GBVOLC1848546866 DE-627 ger DE-627 rakwb 620 Yang, Y-H verfasserin aut Characteristic Enhancement of Solution-Processed In-Ga-Zn Oxide Thin-Film Transistors by Laser Annealing 2010 3 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Yang, S S oth Chou, K-S oth Enthalten in IEEE electron device letters New York, NY : IEEE, 1980 31(2010), 9, Seite 969-972 (DE-627)129618993 (DE-600)245158-X (DE-576)015122115 0193-8576 nnns volume:31 year:2010 number:9 pages:969-972 extent:3 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_22 GBV_ILN_70 GBV_ILN_170 GBV_ILN_2014 GBV_ILN_2020 GBV_ILN_2061 GBV_ILN_4266 GBV_ILN_4313 GBV_ILN_4314 AR 31 2010 9 969-972 3 |
allfieldsSound |
sw100908_1 (DE-627)OLC1848546866 (DE-599)GBVOLC1848546866 DE-627 ger DE-627 rakwb 620 Yang, Y-H verfasserin aut Characteristic Enhancement of Solution-Processed In-Ga-Zn Oxide Thin-Film Transistors by Laser Annealing 2010 3 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Yang, S S oth Chou, K-S oth Enthalten in IEEE electron device letters New York, NY : IEEE, 1980 31(2010), 9, Seite 969-972 (DE-627)129618993 (DE-600)245158-X (DE-576)015122115 0193-8576 nnns volume:31 year:2010 number:9 pages:969-972 extent:3 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_22 GBV_ILN_70 GBV_ILN_170 GBV_ILN_2014 GBV_ILN_2020 GBV_ILN_2061 GBV_ILN_4266 GBV_ILN_4313 GBV_ILN_4314 AR 31 2010 9 969-972 3 |
source |
Enthalten in IEEE electron device letters 31(2010), 9, Seite 969-972 volume:31 year:2010 number:9 pages:969-972 extent:3 |
sourceStr |
Enthalten in IEEE electron device letters 31(2010), 9, Seite 969-972 volume:31 year:2010 number:9 pages:969-972 extent:3 |
format_phy_str_mv |
Article |
institution |
findex.gbv.de |
dewey-raw |
620 |
isfreeaccess_bool |
false |
container_title |
IEEE electron device letters |
authorswithroles_txt_mv |
Yang, Y-H @@aut@@ Yang, S S @@oth@@ Chou, K-S @@oth@@ |
publishDateDaySort_date |
2010-01-01T00:00:00Z |
hierarchy_top_id |
129618993 |
dewey-sort |
3620 |
id |
OLC1848546866 |
fullrecord |
<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000caa a22002652 4500</leader><controlfield tag="001">OLC1848546866</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20230711220936.0</controlfield><controlfield tag="007">tu</controlfield><controlfield tag="008">100909s2010 xx ||||| 00| ||und c</controlfield><datafield tag="028" ind1="5" ind2="2"><subfield code="a">sw100908_1</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)OLC1848546866</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)GBVOLC1848546866</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">620</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Yang, Y-H</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Characteristic Enhancement of Solution-Processed In-Ga-Zn Oxide Thin-Film Transistors by Laser Annealing</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">2010</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">3</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">Text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">ohne Hilfsmittel zu benutzen</subfield><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">Band</subfield><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Yang, S S</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Chou, K-S</subfield><subfield code="4">oth</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">Enthalten in</subfield><subfield code="t">IEEE electron device letters</subfield><subfield code="d">New York, NY : IEEE, 1980</subfield><subfield code="g">31(2010), 9, Seite 969-972</subfield><subfield code="w">(DE-627)129618993</subfield><subfield code="w">(DE-600)245158-X</subfield><subfield code="w">(DE-576)015122115</subfield><subfield code="x">0193-8576</subfield><subfield code="7">nnns</subfield></datafield><datafield tag="773" ind1="1" ind2="8"><subfield code="g">volume:31</subfield><subfield code="g">year:2010</subfield><subfield code="g">number:9</subfield><subfield code="g">pages:969-972</subfield><subfield code="g">extent:3</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_USEFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SYSFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_OLC</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-TEC</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_22</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_70</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_170</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2014</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2020</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2061</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4266</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4313</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4314</subfield></datafield><datafield tag="951" ind1=" " ind2=" "><subfield code="a">AR</subfield></datafield><datafield tag="952" ind1=" " ind2=" "><subfield code="d">31</subfield><subfield code="j">2010</subfield><subfield code="e">9</subfield><subfield code="h">969-972</subfield><subfield code="g">3</subfield></datafield></record></collection>
|
author |
Yang, Y-H |
spellingShingle |
Yang, Y-H ddc 620 Characteristic Enhancement of Solution-Processed In-Ga-Zn Oxide Thin-Film Transistors by Laser Annealing |
authorStr |
Yang, Y-H |
ppnlink_with_tag_str_mv |
@@773@@(DE-627)129618993 |
format |
Article |
dewey-ones |
620 - Engineering & allied operations |
delete_txt_mv |
keep |
author_role |
aut |
collection |
OLC |
remote_str |
false |
illustrated |
Not Illustrated |
issn |
0193-8576 |
topic_title |
620 Characteristic Enhancement of Solution-Processed In-Ga-Zn Oxide Thin-Film Transistors by Laser Annealing |
topic |
ddc 620 |
topic_unstemmed |
ddc 620 |
topic_browse |
ddc 620 |
format_facet |
Aufsätze Gedruckte Aufsätze |
format_main_str_mv |
Text Zeitschrift/Artikel |
carriertype_str_mv |
nc |
author2_variant |
s s y ss ssy k s c ksc |
hierarchy_parent_title |
IEEE electron device letters |
hierarchy_parent_id |
129618993 |
dewey-tens |
620 - Engineering |
hierarchy_top_title |
IEEE electron device letters |
isfreeaccess_txt |
false |
familylinks_str_mv |
(DE-627)129618993 (DE-600)245158-X (DE-576)015122115 |
title |
Characteristic Enhancement of Solution-Processed In-Ga-Zn Oxide Thin-Film Transistors by Laser Annealing |
ctrlnum |
(DE-627)OLC1848546866 (DE-599)GBVOLC1848546866 |
title_full |
Characteristic Enhancement of Solution-Processed In-Ga-Zn Oxide Thin-Film Transistors by Laser Annealing |
author_sort |
Yang, Y-H |
journal |
IEEE electron device letters |
journalStr |
IEEE electron device letters |
isOA_bool |
false |
dewey-hundreds |
600 - Technology |
recordtype |
marc |
publishDateSort |
2010 |
contenttype_str_mv |
txt |
container_start_page |
969 |
author_browse |
Yang, Y-H |
container_volume |
31 |
physical |
3 |
class |
620 |
format_se |
Aufsätze |
author-letter |
Yang, Y-H |
dewey-full |
620 |
title_sort |
characteristic enhancement of solution-processed in-ga-zn oxide thin-film transistors by laser annealing |
title_auth |
Characteristic Enhancement of Solution-Processed In-Ga-Zn Oxide Thin-Film Transistors by Laser Annealing |
collection_details |
GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_22 GBV_ILN_70 GBV_ILN_170 GBV_ILN_2014 GBV_ILN_2020 GBV_ILN_2061 GBV_ILN_4266 GBV_ILN_4313 GBV_ILN_4314 |
container_issue |
9 |
title_short |
Characteristic Enhancement of Solution-Processed In-Ga-Zn Oxide Thin-Film Transistors by Laser Annealing |
remote_bool |
false |
author2 |
Yang, S S Chou, K-S |
author2Str |
Yang, S S Chou, K-S |
ppnlink |
129618993 |
mediatype_str_mv |
n |
isOA_txt |
false |
hochschulschrift_bool |
false |
author2_role |
oth oth |
up_date |
2024-07-03T14:48:32.544Z |
_version_ |
1803569712375791616 |
fullrecord_marcxml |
<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000caa a22002652 4500</leader><controlfield tag="001">OLC1848546866</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20230711220936.0</controlfield><controlfield tag="007">tu</controlfield><controlfield tag="008">100909s2010 xx ||||| 00| ||und c</controlfield><datafield tag="028" ind1="5" ind2="2"><subfield code="a">sw100908_1</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)OLC1848546866</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)GBVOLC1848546866</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">620</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Yang, Y-H</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Characteristic Enhancement of Solution-Processed In-Ga-Zn Oxide Thin-Film Transistors by Laser Annealing</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">2010</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">3</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">Text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">ohne Hilfsmittel zu benutzen</subfield><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">Band</subfield><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Yang, S S</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Chou, K-S</subfield><subfield code="4">oth</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">Enthalten in</subfield><subfield code="t">IEEE electron device letters</subfield><subfield code="d">New York, NY : IEEE, 1980</subfield><subfield code="g">31(2010), 9, Seite 969-972</subfield><subfield code="w">(DE-627)129618993</subfield><subfield code="w">(DE-600)245158-X</subfield><subfield code="w">(DE-576)015122115</subfield><subfield code="x">0193-8576</subfield><subfield code="7">nnns</subfield></datafield><datafield tag="773" ind1="1" ind2="8"><subfield code="g">volume:31</subfield><subfield code="g">year:2010</subfield><subfield code="g">number:9</subfield><subfield code="g">pages:969-972</subfield><subfield code="g">extent:3</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_USEFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SYSFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_OLC</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-TEC</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_22</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_70</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_170</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2014</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2020</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2061</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4266</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4313</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4314</subfield></datafield><datafield tag="951" ind1=" " ind2=" "><subfield code="a">AR</subfield></datafield><datafield tag="952" ind1=" " ind2=" "><subfield code="d">31</subfield><subfield code="j">2010</subfield><subfield code="e">9</subfield><subfield code="h">969-972</subfield><subfield code="g">3</subfield></datafield></record></collection>
|
score |
7.4025803 |