Comparative study of annealing and oxidation effects in a-SiC:H and a-SiC thin films deposited by radio-frequency magnetron sputtering

Gespeichert in:

Autor*in:	Vasin, A.V. [verfasserIn] Muto, Sh. Ishikawa, Yu. Rusavsky, A.V. Kimura, T. Lysenko, V.S. Nazarov, A.N.

Format:	Artikel

Erschienen:	2011

Umfang:	7

Übergeordnetes Werk:	Enthalten in: Thin solid films - Amsterdam [u.a.] Elsevier, 1967, 519(2011), 7 vom: 31. Jan., Seite 2218-2225
Übergeordnetes Werk:	volume:519 ; year:2011 ; number:7 ; day:31 ; month:01 ; pages:2218-2225 ; extent:7

Katalog-ID:	OLC1857072545

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allfieldsSound	sw110125_1 (DE-627)OLC1857072545 (DE-599)GBVOLC1857072545 DE-627 ger DE-627 rakwb 050 530 530 AVZ Vasin, A.V. verfasserin aut Comparative study of annealing and oxidation effects in a-SiC:H and a-SiC thin films deposited by radio-frequency magnetron sputtering 2011 7 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Muto, Sh. oth Ishikawa, Yu. oth Rusavsky, A.V. oth Kimura, T. oth Lysenko, V.S. oth Nazarov, A.N. oth Enthalten in Thin solid films Amsterdam [u.a.] Elsevier, 1967 519(2011), 7 vom: 31. Jan., Seite 2218-2225 (DE-627)129522287 (DE-600)212814-7 (DE-576)014938588 0040-6090 nnns volume:519 year:2011 number:7 day:31 month:01 pages:2218-2225 extent:7 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY SSG-OLC-CHE SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_21 GBV_ILN_65 GBV_ILN_70 GBV_ILN_2006 GBV_ILN_2020 GBV_ILN_2279 GBV_ILN_4700 AR 519 2011 7 31 1 2218-2225 7
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Comparative study of annealing and oxidation effects in a-SiC:H and a-SiC thin films deposited by radio-frequency magnetron sputtering

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