Growth and properties of vertically well-aligned GaN nanowires by thermal chemical vapor deposition process
Autor*in: |
Kang, S.M. [verfasserIn] |
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Format: |
Artikel |
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Erschienen: |
2011 |
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Umfang: |
3 |
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Übergeordnetes Werk: |
Enthalten in: Materials letters - New York, NY [u.a.] : Elsevier, 1982, 65(2011), 4 vom: 28. Feb., Seite 763-766 |
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Übergeordnetes Werk: |
volume:65 ; year:2011 ; number:4 ; day:28 ; month:02 ; pages:763-766 ; extent:3 |
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sw110201_1 (DE-627)OLC185746625X (DE-599)GBVOLC185746625X DE-627 ger DE-627 rakwb 530 600 670 Kang, S.M. verfasserin aut Growth and properties of vertically well-aligned GaN nanowires by thermal chemical vapor deposition process 2011 3 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Kang, B.K. oth Yoon, D.H. oth Enthalten in Materials letters New York, NY [u.a.] : Elsevier, 1982 65(2011), 4 vom: 28. Feb., Seite 763-766 (DE-627)130443611 (DE-600)710033-4 (DE-576)015976998 0167-577X nnns volume:65 year:2011 number:4 day:28 month:02 pages:763-766 extent:3 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY GBV_ILN_20 GBV_ILN_70 AR 65 2011 4 28 2 763-766 3 |
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