High aspect ratio fine pattern transfer using a novel mold by nanoimprint lithography 06FC15

Gespeichert in:

Autor*in:	Sakamoto, J [verfasserIn] Fujikawa, N Nishikura, N Kawata, H Yasuda, M Hirai, Y

Format:	Artikel

Erschienen:	2011

Systematik:	UA 4922

Übergeordnetes Werk:	Enthalten in: Journal of vacuum science and technology / B - New York, NY : Inst., 1983, 29(2011), 6
Übergeordnetes Werk:	volume:29 ; year:2011 ; number:6

Katalog-ID:	OLC1887463070

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