Modeling and Simulation of a Chemical Vapor Deposition - Volume 2011, Article ID 641920, 25 pages

Gespeichert in:

Autor*in:	Geiser, J [verfasserIn] Arab, M

Format:	Artikel

Erschienen:	2011

Übergeordnetes Werk:	Enthalten in: Journal of applied mathematics - New York, NY : Hindawi Publ. Corp., 2001, 2(2011)
Übergeordnetes Werk:	volume:2 ; year:2011

Katalog-ID:	OLC1895463076

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