A fabrication method of high-Q quartz crystal resonator using double-layered etching mask for DRIE

Gespeichert in:

Autor*in:	Abe, Takashi [verfasserIn] Itasaka, Yousuke

Format:	Artikel

Erschienen:	2012

Umfang:	4

Übergeordnetes Werk:	Enthalten in: Sensors and actuators / A - Amsterdam [u.a.] : Elsevier, 1990, 188(2012) vom: Dez., Seite 503-506
Übergeordnetes Werk:	volume:188 ; year:2012 ; month:12 ; pages:503-506 ; extent:4

Katalog-ID:	OLC1907540830

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spelling	sw121125_1 (DE-627)OLC1907540830 (DE-599)GBVOLC1907540830 DE-627 ger DE-627 rakwb 530 620 Abe, Takashi verfasserin aut A fabrication method of high-Q quartz crystal resonator using double-layered etching mask for DRIE 2012 4 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier Itasaka, Yousuke oth Enthalten in Sensors and actuators <Lausanne> / A Amsterdam [u.a.] : Elsevier, 1990 188(2012) vom: Dez., Seite 503-506 (DE-627)130852945 (DE-600)1026063-8 (DE-576)023100265 0924-4247 nnns volume:188 year:2012 month:12 pages:503-506 extent:4 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY GBV_ILN_21 GBV_ILN_70 GBV_ILN_170 GBV_ILN_2006 GBV_ILN_2020 GBV_ILN_2045 GBV_ILN_4700 AR 188 2012 12 503-506 4
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