Competitive and synergistic effects between excimer VUV radiation and O radicals on the etching mechanisms of polyethylene and fluoropolymer surfaces treated by an atmospheric He–O2 post-discharge

Gespeichert in:

Autor*in:	Dufour, T [verfasserIn] Hubert, J Vandencasteele, N Viville, P Lazzaroni, R Reniers, F

Format:	Artikel

Erschienen:	2013

Umfang:	1

Übergeordnetes Werk:	Enthalten in: Journal of physics. D, Applied physics - Bristol : IOP Publ., 1970, 46(2013), 31 vom: 1. Aug., Seite 315203-315203
Übergeordnetes Werk:	volume:46 ; year:2013 ; number:31 ; day:1 ; month:08 ; pages:315203-315203 ; extent:1

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title_sort	competitive and synergistic effects between excimer vuv radiation and o radicals on the etching mechanisms of polyethylene and fluoropolymer surfaces treated by an atmospheric he–o2 post-discharge
title_auth	Competitive and synergistic effects between excimer VUV radiation and O radicals on the etching mechanisms of polyethylene and fluoropolymer surfaces treated by an atmospheric He–O2 post-discharge
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title_short	Competitive and synergistic effects between excimer VUV radiation and O radicals on the etching mechanisms of polyethylene and fluoropolymer surfaces treated by an atmospheric He–O2 post-discharge
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Competitive and synergistic effects between excimer VUV radiation and O radicals on the etching mechanisms of polyethylene and fluoropolymer surfaces treated by an atmospheric He–O2 post-discharge

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