Free-standing subwavelength grid infrared cut filter of 90mm diameter for LPP EUV light source
A subwavelength grid infrared (IR) cut filter as large as 90mm in diameter was fabricated and tested on a 6inch Si wafer for a laser-produced plasma (LPP) extreme ultraviolet (EUV) light source used in the next generation lithography tools. The IR cut filter is a grid type, which has higher thermal...
Ausführliche Beschreibung
Gespeichert in:
| Autor*in: |
Suzuki, Yukio [verfasserIn] |
|---|
| Format: |
Artikel |
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| Sprache: |
Englisch |
| Erschienen: |
2014 |
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| Rechteinformationen: |
Nutzungsrecht: © COPYRIGHT 2015 Elsevier B.V. |
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| Schlagwörter: |
|---|
| Übergeordnetes Werk: |
Enthalten in: Sensors and actuators |
|---|---|
| Übergeordnetes Werk: |
volume:231 ; year:2014 ; pages:59 |
| Links: |
|---|
| DOI / URN: |
10.1016/j.sna.2014.07.006 |
|---|
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OLC1958620173 |
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| 520 | |a A subwavelength grid infrared (IR) cut filter as large as 90mm in diameter was fabricated and tested on a 6inch Si wafer for a laser-produced plasma (LPP) extreme ultraviolet (EUV) light source used in the next generation lithography tools. The IR cut filter is a grid type, which has higher thermal stability compared with a conventional multilayer metal membrane filter. The grid is a free-standing Molybdenum coated Si honeycomb structure with a thickness of 5[mu]m, a wire width of only 0.35[mu]m and a pitch of 4.5[mu]m. Such a large-size free-standing microstructure was successfully fabricated by carefully balancing film stress at each process step. The fabricated IR cut filter demonstrated 99.7% rejection for 10.6[mu]m IR light. The IR cut filter was finally installed in a LPP EUV light source. | ||
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10.1016/j.sna.2014.07.006 doi PQ20160617 (DE-627)OLC1958620173 (DE-599)GBVOLC1958620173 (PRQ)c650-6474e99364c2bc3a54b315a1196204410864ff7871b2565ed711191b54e0d81d0 (KEY)0190458220140000231000000059freestandingsubwavelengthgridinfraredcutfilterof90 DE-627 ger DE-627 rakwb eng 530 620 DNB Suzuki, Yukio verfasserin aut Free-standing subwavelength grid infrared cut filter of 90mm diameter for LPP EUV light source 2014 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier A subwavelength grid infrared (IR) cut filter as large as 90mm in diameter was fabricated and tested on a 6inch Si wafer for a laser-produced plasma (LPP) extreme ultraviolet (EUV) light source used in the next generation lithography tools. The IR cut filter is a grid type, which has higher thermal stability compared with a conventional multilayer metal membrane filter. The grid is a free-standing Molybdenum coated Si honeycomb structure with a thickness of 5[mu]m, a wire width of only 0.35[mu]m and a pitch of 4.5[mu]m. Such a large-size free-standing microstructure was successfully fabricated by carefully balancing film stress at each process step. The fabricated IR cut filter demonstrated 99.7% rejection for 10.6[mu]m IR light. The IR cut filter was finally installed in a LPP EUV light source. Nutzungsrecht: © COPYRIGHT 2015 Elsevier B.V. Laser-plasma interactions Electric filters Totsu, Kentaro oth Moriyama, Masaaki oth Esashi, Masayoshi oth Tanaka, Shuji oth Enthalten in Sensors and actuators <Lausanne> / A Amsterdam [u.a.] : Elsevier, 1990 231(2014), Seite 59 (DE-627)130852945 (DE-600)1026063-8 (DE-576)023100265 0924-4247 nnns volume:231 year:2014 pages:59 http://dx.doi.org/10.1016/j.sna.2014.07.006 Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY GBV_ILN_21 GBV_ILN_70 GBV_ILN_2020 GBV_ILN_2045 AR 231 2014 59 |
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Free-standing subwavelength grid infrared cut filter of 90mm diameter for LPP EUV light source |
| abstract |
A subwavelength grid infrared (IR) cut filter as large as 90mm in diameter was fabricated and tested on a 6inch Si wafer for a laser-produced plasma (LPP) extreme ultraviolet (EUV) light source used in the next generation lithography tools. The IR cut filter is a grid type, which has higher thermal stability compared with a conventional multilayer metal membrane filter. The grid is a free-standing Molybdenum coated Si honeycomb structure with a thickness of 5[mu]m, a wire width of only 0.35[mu]m and a pitch of 4.5[mu]m. Such a large-size free-standing microstructure was successfully fabricated by carefully balancing film stress at each process step. The fabricated IR cut filter demonstrated 99.7% rejection for 10.6[mu]m IR light. The IR cut filter was finally installed in a LPP EUV light source. |
| abstractGer |
A subwavelength grid infrared (IR) cut filter as large as 90mm in diameter was fabricated and tested on a 6inch Si wafer for a laser-produced plasma (LPP) extreme ultraviolet (EUV) light source used in the next generation lithography tools. The IR cut filter is a grid type, which has higher thermal stability compared with a conventional multilayer metal membrane filter. The grid is a free-standing Molybdenum coated Si honeycomb structure with a thickness of 5[mu]m, a wire width of only 0.35[mu]m and a pitch of 4.5[mu]m. Such a large-size free-standing microstructure was successfully fabricated by carefully balancing film stress at each process step. The fabricated IR cut filter demonstrated 99.7% rejection for 10.6[mu]m IR light. The IR cut filter was finally installed in a LPP EUV light source. |
| abstract_unstemmed |
A subwavelength grid infrared (IR) cut filter as large as 90mm in diameter was fabricated and tested on a 6inch Si wafer for a laser-produced plasma (LPP) extreme ultraviolet (EUV) light source used in the next generation lithography tools. The IR cut filter is a grid type, which has higher thermal stability compared with a conventional multilayer metal membrane filter. The grid is a free-standing Molybdenum coated Si honeycomb structure with a thickness of 5[mu]m, a wire width of only 0.35[mu]m and a pitch of 4.5[mu]m. Such a large-size free-standing microstructure was successfully fabricated by carefully balancing film stress at each process step. The fabricated IR cut filter demonstrated 99.7% rejection for 10.6[mu]m IR light. The IR cut filter was finally installed in a LPP EUV light source. |
| collection_details |
GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY GBV_ILN_21 GBV_ILN_70 GBV_ILN_2020 GBV_ILN_2045 |
| title_short |
Free-standing subwavelength grid infrared cut filter of 90mm diameter for LPP EUV light source |
| url |
http://dx.doi.org/10.1016/j.sna.2014.07.006 |
| remote_bool |
false |
| author2 |
Totsu, Kentaro Moriyama, Masaaki Esashi, Masayoshi Tanaka, Shuji |
| author2Str |
Totsu, Kentaro Moriyama, Masaaki Esashi, Masayoshi Tanaka, Shuji |
| ppnlink |
130852945 |
| mediatype_str_mv |
n |
| isOA_txt |
false |
| hochschulschrift_bool |
false |
| author2_role |
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| doi_str |
10.1016/j.sna.2014.07.006 |
| up_date |
2024-07-03T13:54:15.747Z |
| _version_ |
1803566297380814848 |
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7.401576 |