Measurement of valence-band offset at native oxide/Ba[Si.sub.2] interfaces by hard x-ray photoelectron spectroscopy

Gespeichert in:

Autor*in:	Takabe, Ryota [verfasserIn] Weijie Du Ito, Keita Takeuchi, Hiroki Toko, Kaoru Ueda, Shigenori Kimura, Akio Suemasu, Takashi

Format:	Artikel
Sprache:	Englisch

Erschienen:	2016

Schlagwörter:	Barium compounds X-ray spectroscopy Electric properties Usage

Übergeordnetes Werk:	Enthalten in: Journal of applied physics - Melville, NY : AIP, 1937, 119(2016), 2
Übergeordnetes Werk:	volume:119 ; year:2016 ; number:2

Katalog-ID:	OLC1973855402

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title	Measurement of valence-band offset at native oxide/Ba[Si.sub.2] interfaces by hard x-ray photoelectron spectroscopy
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title_sort	measurement of valence-band offset at native oxide/ba[si.sub.2] interfaces by hard x-ray photoelectron spectroscopy
title_auth	Measurement of valence-band offset at native oxide/Ba[Si.sub.2] interfaces by hard x-ray photoelectron spectroscopy
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