Low-Loss Microcoaxial Rat-Race Hybrid for Si-Based Microwave Integrated Circuits
This letter presents a microcoaxial rat-race hybrid for Si-based Ku-Band microwave applications. The device fabrication is conducted using a low-thermal-budget multilayer Cu Damescene process, which is fully compatible with CMOS back-end-of-line (BEOL) technology. The reported on-chip rat-race hybri...
Ausführliche Beschreibung
Autor*in: |
Tian, Yang [verfasserIn] |
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Format: |
Artikel |
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Sprache: |
Englisch |
Erschienen: |
2016 |
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Schlagwörter: |
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Übergeordnetes Werk: |
Enthalten in: IEEE microwave and wireless components letters - New York, NY : Inst., 1991, 26(2016), 3, Seite 162-164 |
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Übergeordnetes Werk: |
volume:26 ; year:2016 ; number:3 ; pages:162-164 |
Links: |
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DOI / URN: |
10.1109/LMWC.2016.2524657 |
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Katalog-ID: |
OLC1974265420 |
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520 | |a This letter presents a microcoaxial rat-race hybrid for Si-based Ku-Band microwave applications. The device fabrication is conducted using a low-thermal-budget multilayer Cu Damescene process, which is fully compatible with CMOS back-end-of-line (BEOL) technology. The reported on-chip rat-race hybrid shows a best transmission loss (0.32 dB for sum ports and 0.25 dB for difference ports) of the reported on-chip rat-race hybrids. The demonstrated rat-race hybrid has isolation better than 20 dB and signal reflection of all ports less than <inline-formula> <tex-math notation="LaTeX">-</tex-math></inline-formula>12 dB in the operation band, which is corresponding to a fractional bandwidth (FBW) of about 34% and 29% in the symmetrical and differential modes, respectively. As the lines of the hybrid are folded to closely routed meander structures, more than 75% of size reduction is achieved. With these advanced features, the microcoaxial rat-race can be used for the high performance Si-based microwave applications. | ||
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10.1109/LMWC.2016.2524657 doi PQ20160430 (DE-627)OLC1974265420 (DE-599)GBVOLC1974265420 (PRQ)i537-fe2b2d26f84c3fb736b1692c656bf4f62eae64e99f07f3cdbc2dd2381d3e367b0 (KEY)0392640020160000026000300162lowlossmicrocoaxialratracehybridforsibasedmicrowav DE-627 ger DE-627 rakwb eng 620 DNB 53.82 bkl Tian, Yang verfasserin aut Low-Loss Microcoaxial Rat-Race Hybrid for Si-Based Microwave Integrated Circuits 2016 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier This letter presents a microcoaxial rat-race hybrid for Si-based Ku-Band microwave applications. The device fabrication is conducted using a low-thermal-budget multilayer Cu Damescene process, which is fully compatible with CMOS back-end-of-line (BEOL) technology. The reported on-chip rat-race hybrid shows a best transmission loss (0.32 dB for sum ports and 0.25 dB for difference ports) of the reported on-chip rat-race hybrids. The demonstrated rat-race hybrid has isolation better than 20 dB and signal reflection of all ports less than <inline-formula> <tex-math notation="LaTeX">-</tex-math></inline-formula>12 dB in the operation band, which is corresponding to a fractional bandwidth (FBW) of about 34% and 29% in the symmetrical and differential modes, respectively. As the lines of the hybrid are folded to closely routed meander structures, more than 75% of size reduction is achieved. With these advanced features, the microcoaxial rat-race can be used for the high performance Si-based microwave applications. Microwave circuits Silicon Propagation losses Microwave integrated circuits transmission loss CMOS integrated circuits phase response Isolation rat-race hybrid S-parameters Resists System-on-chip return loss Wang, Hong oth Liu, Zhihong oth Meng, Qianqian oth Lee, Kokyan oth Enthalten in IEEE microwave and wireless components letters New York, NY : Inst., 1991 26(2016), 3, Seite 162-164 (DE-627)130939455 (DE-600)1059336-6 (DE-576)025091948 1051-8207 nnns volume:26 year:2016 number:3 pages:162-164 http://dx.doi.org/10.1109/LMWC.2016.2524657 Volltext http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=7419232 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_11 GBV_ILN_70 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2016 53.82 AVZ AR 26 2016 3 162-164 |
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10.1109/LMWC.2016.2524657 doi PQ20160430 (DE-627)OLC1974265420 (DE-599)GBVOLC1974265420 (PRQ)i537-fe2b2d26f84c3fb736b1692c656bf4f62eae64e99f07f3cdbc2dd2381d3e367b0 (KEY)0392640020160000026000300162lowlossmicrocoaxialratracehybridforsibasedmicrowav DE-627 ger DE-627 rakwb eng 620 DNB 53.82 bkl Tian, Yang verfasserin aut Low-Loss Microcoaxial Rat-Race Hybrid for Si-Based Microwave Integrated Circuits 2016 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier This letter presents a microcoaxial rat-race hybrid for Si-based Ku-Band microwave applications. The device fabrication is conducted using a low-thermal-budget multilayer Cu Damescene process, which is fully compatible with CMOS back-end-of-line (BEOL) technology. The reported on-chip rat-race hybrid shows a best transmission loss (0.32 dB for sum ports and 0.25 dB for difference ports) of the reported on-chip rat-race hybrids. The demonstrated rat-race hybrid has isolation better than 20 dB and signal reflection of all ports less than <inline-formula> <tex-math notation="LaTeX">-</tex-math></inline-formula>12 dB in the operation band, which is corresponding to a fractional bandwidth (FBW) of about 34% and 29% in the symmetrical and differential modes, respectively. As the lines of the hybrid are folded to closely routed meander structures, more than 75% of size reduction is achieved. With these advanced features, the microcoaxial rat-race can be used for the high performance Si-based microwave applications. Microwave circuits Silicon Propagation losses Microwave integrated circuits transmission loss CMOS integrated circuits phase response Isolation rat-race hybrid S-parameters Resists System-on-chip return loss Wang, Hong oth Liu, Zhihong oth Meng, Qianqian oth Lee, Kokyan oth Enthalten in IEEE microwave and wireless components letters New York, NY : Inst., 1991 26(2016), 3, Seite 162-164 (DE-627)130939455 (DE-600)1059336-6 (DE-576)025091948 1051-8207 nnns volume:26 year:2016 number:3 pages:162-164 http://dx.doi.org/10.1109/LMWC.2016.2524657 Volltext http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=7419232 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_11 GBV_ILN_70 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2016 53.82 AVZ AR 26 2016 3 162-164 |
allfields_unstemmed |
10.1109/LMWC.2016.2524657 doi PQ20160430 (DE-627)OLC1974265420 (DE-599)GBVOLC1974265420 (PRQ)i537-fe2b2d26f84c3fb736b1692c656bf4f62eae64e99f07f3cdbc2dd2381d3e367b0 (KEY)0392640020160000026000300162lowlossmicrocoaxialratracehybridforsibasedmicrowav DE-627 ger DE-627 rakwb eng 620 DNB 53.82 bkl Tian, Yang verfasserin aut Low-Loss Microcoaxial Rat-Race Hybrid for Si-Based Microwave Integrated Circuits 2016 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier This letter presents a microcoaxial rat-race hybrid for Si-based Ku-Band microwave applications. The device fabrication is conducted using a low-thermal-budget multilayer Cu Damescene process, which is fully compatible with CMOS back-end-of-line (BEOL) technology. The reported on-chip rat-race hybrid shows a best transmission loss (0.32 dB for sum ports and 0.25 dB for difference ports) of the reported on-chip rat-race hybrids. The demonstrated rat-race hybrid has isolation better than 20 dB and signal reflection of all ports less than <inline-formula> <tex-math notation="LaTeX">-</tex-math></inline-formula>12 dB in the operation band, which is corresponding to a fractional bandwidth (FBW) of about 34% and 29% in the symmetrical and differential modes, respectively. As the lines of the hybrid are folded to closely routed meander structures, more than 75% of size reduction is achieved. With these advanced features, the microcoaxial rat-race can be used for the high performance Si-based microwave applications. Microwave circuits Silicon Propagation losses Microwave integrated circuits transmission loss CMOS integrated circuits phase response Isolation rat-race hybrid S-parameters Resists System-on-chip return loss Wang, Hong oth Liu, Zhihong oth Meng, Qianqian oth Lee, Kokyan oth Enthalten in IEEE microwave and wireless components letters New York, NY : Inst., 1991 26(2016), 3, Seite 162-164 (DE-627)130939455 (DE-600)1059336-6 (DE-576)025091948 1051-8207 nnns volume:26 year:2016 number:3 pages:162-164 http://dx.doi.org/10.1109/LMWC.2016.2524657 Volltext http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=7419232 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_11 GBV_ILN_70 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2016 53.82 AVZ AR 26 2016 3 162-164 |
allfieldsGer |
10.1109/LMWC.2016.2524657 doi PQ20160430 (DE-627)OLC1974265420 (DE-599)GBVOLC1974265420 (PRQ)i537-fe2b2d26f84c3fb736b1692c656bf4f62eae64e99f07f3cdbc2dd2381d3e367b0 (KEY)0392640020160000026000300162lowlossmicrocoaxialratracehybridforsibasedmicrowav DE-627 ger DE-627 rakwb eng 620 DNB 53.82 bkl Tian, Yang verfasserin aut Low-Loss Microcoaxial Rat-Race Hybrid for Si-Based Microwave Integrated Circuits 2016 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier This letter presents a microcoaxial rat-race hybrid for Si-based Ku-Band microwave applications. The device fabrication is conducted using a low-thermal-budget multilayer Cu Damescene process, which is fully compatible with CMOS back-end-of-line (BEOL) technology. The reported on-chip rat-race hybrid shows a best transmission loss (0.32 dB for sum ports and 0.25 dB for difference ports) of the reported on-chip rat-race hybrids. The demonstrated rat-race hybrid has isolation better than 20 dB and signal reflection of all ports less than <inline-formula> <tex-math notation="LaTeX">-</tex-math></inline-formula>12 dB in the operation band, which is corresponding to a fractional bandwidth (FBW) of about 34% and 29% in the symmetrical and differential modes, respectively. As the lines of the hybrid are folded to closely routed meander structures, more than 75% of size reduction is achieved. With these advanced features, the microcoaxial rat-race can be used for the high performance Si-based microwave applications. Microwave circuits Silicon Propagation losses Microwave integrated circuits transmission loss CMOS integrated circuits phase response Isolation rat-race hybrid S-parameters Resists System-on-chip return loss Wang, Hong oth Liu, Zhihong oth Meng, Qianqian oth Lee, Kokyan oth Enthalten in IEEE microwave and wireless components letters New York, NY : Inst., 1991 26(2016), 3, Seite 162-164 (DE-627)130939455 (DE-600)1059336-6 (DE-576)025091948 1051-8207 nnns volume:26 year:2016 number:3 pages:162-164 http://dx.doi.org/10.1109/LMWC.2016.2524657 Volltext http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=7419232 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_11 GBV_ILN_70 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2016 53.82 AVZ AR 26 2016 3 162-164 |
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10.1109/LMWC.2016.2524657 doi PQ20160430 (DE-627)OLC1974265420 (DE-599)GBVOLC1974265420 (PRQ)i537-fe2b2d26f84c3fb736b1692c656bf4f62eae64e99f07f3cdbc2dd2381d3e367b0 (KEY)0392640020160000026000300162lowlossmicrocoaxialratracehybridforsibasedmicrowav DE-627 ger DE-627 rakwb eng 620 DNB 53.82 bkl Tian, Yang verfasserin aut Low-Loss Microcoaxial Rat-Race Hybrid for Si-Based Microwave Integrated Circuits 2016 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier This letter presents a microcoaxial rat-race hybrid for Si-based Ku-Band microwave applications. The device fabrication is conducted using a low-thermal-budget multilayer Cu Damescene process, which is fully compatible with CMOS back-end-of-line (BEOL) technology. The reported on-chip rat-race hybrid shows a best transmission loss (0.32 dB for sum ports and 0.25 dB for difference ports) of the reported on-chip rat-race hybrids. The demonstrated rat-race hybrid has isolation better than 20 dB and signal reflection of all ports less than <inline-formula> <tex-math notation="LaTeX">-</tex-math></inline-formula>12 dB in the operation band, which is corresponding to a fractional bandwidth (FBW) of about 34% and 29% in the symmetrical and differential modes, respectively. As the lines of the hybrid are folded to closely routed meander structures, more than 75% of size reduction is achieved. With these advanced features, the microcoaxial rat-race can be used for the high performance Si-based microwave applications. Microwave circuits Silicon Propagation losses Microwave integrated circuits transmission loss CMOS integrated circuits phase response Isolation rat-race hybrid S-parameters Resists System-on-chip return loss Wang, Hong oth Liu, Zhihong oth Meng, Qianqian oth Lee, Kokyan oth Enthalten in IEEE microwave and wireless components letters New York, NY : Inst., 1991 26(2016), 3, Seite 162-164 (DE-627)130939455 (DE-600)1059336-6 (DE-576)025091948 1051-8207 nnns volume:26 year:2016 number:3 pages:162-164 http://dx.doi.org/10.1109/LMWC.2016.2524657 Volltext http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=7419232 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_11 GBV_ILN_70 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2016 53.82 AVZ AR 26 2016 3 162-164 |
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Tian, Yang |
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Tian, Yang ddc 620 bkl 53.82 misc Microwave circuits misc Silicon misc Propagation losses misc Microwave integrated circuits misc transmission loss misc CMOS integrated circuits misc phase response misc Isolation misc rat-race hybrid misc S-parameters misc Resists misc System-on-chip misc return loss Low-Loss Microcoaxial Rat-Race Hybrid for Si-Based Microwave Integrated Circuits |
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620 DNB 53.82 bkl Low-Loss Microcoaxial Rat-Race Hybrid for Si-Based Microwave Integrated Circuits Microwave circuits Silicon Propagation losses Microwave integrated circuits transmission loss CMOS integrated circuits phase response Isolation rat-race hybrid S-parameters Resists System-on-chip return loss |
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ddc 620 bkl 53.82 misc Microwave circuits misc Silicon misc Propagation losses misc Microwave integrated circuits misc transmission loss misc CMOS integrated circuits misc phase response misc Isolation misc rat-race hybrid misc S-parameters misc Resists misc System-on-chip misc return loss |
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ddc 620 bkl 53.82 misc Microwave circuits misc Silicon misc Propagation losses misc Microwave integrated circuits misc transmission loss misc CMOS integrated circuits misc phase response misc Isolation misc rat-race hybrid misc S-parameters misc Resists misc System-on-chip misc return loss |
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ddc 620 bkl 53.82 misc Microwave circuits misc Silicon misc Propagation losses misc Microwave integrated circuits misc transmission loss misc CMOS integrated circuits misc phase response misc Isolation misc rat-race hybrid misc S-parameters misc Resists misc System-on-chip misc return loss |
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Low-Loss Microcoaxial Rat-Race Hybrid for Si-Based Microwave Integrated Circuits |
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Low-Loss Microcoaxial Rat-Race Hybrid for Si-Based Microwave Integrated Circuits |
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10.1109/LMWC.2016.2524657 |
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low-loss microcoaxial rat-race hybrid for si-based microwave integrated circuits |
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Low-Loss Microcoaxial Rat-Race Hybrid for Si-Based Microwave Integrated Circuits |
abstract |
This letter presents a microcoaxial rat-race hybrid for Si-based Ku-Band microwave applications. The device fabrication is conducted using a low-thermal-budget multilayer Cu Damescene process, which is fully compatible with CMOS back-end-of-line (BEOL) technology. The reported on-chip rat-race hybrid shows a best transmission loss (0.32 dB for sum ports and 0.25 dB for difference ports) of the reported on-chip rat-race hybrids. The demonstrated rat-race hybrid has isolation better than 20 dB and signal reflection of all ports less than <inline-formula> <tex-math notation="LaTeX">-</tex-math></inline-formula>12 dB in the operation band, which is corresponding to a fractional bandwidth (FBW) of about 34% and 29% in the symmetrical and differential modes, respectively. As the lines of the hybrid are folded to closely routed meander structures, more than 75% of size reduction is achieved. With these advanced features, the microcoaxial rat-race can be used for the high performance Si-based microwave applications. |
abstractGer |
This letter presents a microcoaxial rat-race hybrid for Si-based Ku-Band microwave applications. The device fabrication is conducted using a low-thermal-budget multilayer Cu Damescene process, which is fully compatible with CMOS back-end-of-line (BEOL) technology. The reported on-chip rat-race hybrid shows a best transmission loss (0.32 dB for sum ports and 0.25 dB for difference ports) of the reported on-chip rat-race hybrids. The demonstrated rat-race hybrid has isolation better than 20 dB and signal reflection of all ports less than <inline-formula> <tex-math notation="LaTeX">-</tex-math></inline-formula>12 dB in the operation band, which is corresponding to a fractional bandwidth (FBW) of about 34% and 29% in the symmetrical and differential modes, respectively. As the lines of the hybrid are folded to closely routed meander structures, more than 75% of size reduction is achieved. With these advanced features, the microcoaxial rat-race can be used for the high performance Si-based microwave applications. |
abstract_unstemmed |
This letter presents a microcoaxial rat-race hybrid for Si-based Ku-Band microwave applications. The device fabrication is conducted using a low-thermal-budget multilayer Cu Damescene process, which is fully compatible with CMOS back-end-of-line (BEOL) technology. The reported on-chip rat-race hybrid shows a best transmission loss (0.32 dB for sum ports and 0.25 dB for difference ports) of the reported on-chip rat-race hybrids. The demonstrated rat-race hybrid has isolation better than 20 dB and signal reflection of all ports less than <inline-formula> <tex-math notation="LaTeX">-</tex-math></inline-formula>12 dB in the operation band, which is corresponding to a fractional bandwidth (FBW) of about 34% and 29% in the symmetrical and differential modes, respectively. As the lines of the hybrid are folded to closely routed meander structures, more than 75% of size reduction is achieved. With these advanced features, the microcoaxial rat-race can be used for the high performance Si-based microwave applications. |
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title_short |
Low-Loss Microcoaxial Rat-Race Hybrid for Si-Based Microwave Integrated Circuits |
url |
http://dx.doi.org/10.1109/LMWC.2016.2524657 http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=7419232 |
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Wang, Hong Liu, Zhihong Meng, Qianqian Lee, Kokyan |
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