Sequential sputtered Co-HfO2 granular films

Gespeichert in:

Autor*in:	Chadha, M [verfasserIn] Ng, V

Format:	Artikel
Sprache:	Englisch

Erschienen:	2017

Übergeordnetes Werk:	Enthalten in: Journal of magnetism and magnetic materials - Amsterdam : NH, Elsevier, 1975, 426(2017), Seite 302-309
Übergeordnetes Werk:	volume:426 ; year:2017 ; pages:302-309

Links:	Volltext

DOI / URN:	10.1016/j.jmmm.2016.11.094

Katalog-ID:	OLC1990165222

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