Resistive Switching Characteristics of Flexible TiO₂ Thin Film Fabricated by Deep Ultraviolet Photochemical Solution Method
A novel ultraviolet photochemical method was used to prepare TiO2 resistive-switching films. Amorphous TiO2 films were formed on flexible indium-tin oxide (ITO) coated polyethylene terephthalate (PET) substrates by deep ultraviolet irradiation at 150 °C. A Pt/TiO2/ITO/PET device was then fabricated...
Ausführliche Beschreibung
Autor*in: |
Chen, Yuanqing [verfasserIn] |
---|
Format: |
Artikel |
---|---|
Sprache: |
Englisch |
Schlagwörter: |
---|
Übergeordnetes Werk: |
Enthalten in: IEEE electron device letters - New York, NY : IEEE, 1980, PP, 99, Seite 1-1 |
---|---|
Übergeordnetes Werk: |
volume:PP ; number:99 ; pages:1-1 |
Links: |
---|
DOI / URN: |
10.1109/LED.2017.2756444 |
---|
Katalog-ID: |
OLC1997634368 |
---|
LEADER | 01000caa a2200265 4500 | ||
---|---|---|---|
001 | OLC1997634368 | ||
003 | DE-627 | ||
005 | 20230715074636.0 | ||
007 | tu | ||
008 | 171125nuuuuuuuuxx ||||| 00| ||eng c | ||
024 | 7 | |a 10.1109/LED.2017.2756444 |2 doi | |
028 | 5 | 2 | |a PQ20171228 |
035 | |a (DE-627)OLC1997634368 | ||
035 | |a (DE-599)GBVOLC1997634368 | ||
035 | |a (PRQ)i655-d47904bc05ad2f44c2624f4097805f8717a26fd9b29f13624ddc44f524a80a050 | ||
035 | |a (KEY)0101063800000000000009900001resistiveswitchingcharacteristicsofflexibletiothin | ||
040 | |a DE-627 |b ger |c DE-627 |e rakwb | ||
041 | |a eng | ||
082 | 0 | 4 | |a 620 |q DE-600 |
100 | 1 | |a Chen, Yuanqing |e verfasserin |4 aut | |
245 | 1 | 0 | |a Resistive Switching Characteristics of Flexible TiO₂ Thin Film Fabricated by Deep Ultraviolet Photochemical Solution Method |
336 | |a Text |b txt |2 rdacontent | ||
337 | |a ohne Hilfsmittel zu benutzen |b n |2 rdamedia | ||
338 | |a Band |b nc |2 rdacarrier | ||
520 | |a A novel ultraviolet photochemical method was used to prepare TiO2 resistive-switching films. Amorphous TiO2 films were formed on flexible indium-tin oxide (ITO) coated polyethylene terephthalate (PET) substrates by deep ultraviolet irradiation at 150 °C. A Pt/TiO2/ITO/PET device was then fabricated to investigate bipolar resistive switching of the films for potential application in non-volatile memories. The ratio of on-state to off-state currents was measured, and a good value of 1000 was obtained. The retention and switch-cycling characteristics of the device were investigated for different bending radii. The resistive switching behavior of the flexible device remained stable after 600 cycles of electrical switching, and 1000 cycles of bending. These findings indicate that these devices have good flexibility, retention characteristics, switch-cycle repeatability and bend-cycle repeatability. | ||
650 | 4 | |a Titanium oxide | |
650 | 4 | |a Switching circuits | |
650 | 4 | |a Resistance | |
650 | 4 | |a Performance evaluation | |
650 | 4 | |a Radiation effects | |
650 | 4 | |a Switches | |
650 | 4 | |a Temperature | |
650 | 4 | |a resistive switching | |
650 | 4 | |a deep ultraviolet irradiation | |
650 | 4 | |a Films | |
700 | 1 | |a Li, Lingwei |4 oth | |
700 | 1 | |a Yin, Xiaoru |4 oth | |
700 | 1 | |a Yerramilli, Aditya |4 oth | |
700 | 1 | |a Shen, Yuxia |4 oth | |
700 | 1 | |a Song, Yang |4 oth | |
700 | 1 | |a Bian, Weibai |4 oth | |
700 | 1 | |a Li, Na |4 oth | |
700 | 1 | |a Zhao, Zhao |4 oth | |
700 | 1 | |a Qu, Wenwen |4 oth | |
700 | 1 | |a Theodore, N. David |4 oth | |
700 | 1 | |a Alford, T. L |4 oth | |
773 | 0 | 8 | |i Enthalten in |t IEEE electron device letters |d New York, NY : IEEE, 1980 |g PP, 99, Seite 1-1 |w (DE-627)129618993 |w (DE-600)245158-X |w (DE-576)015122115 |x 0193-8576 |7 nnns |
773 | 1 | 8 | |g volume:PP |g number:99 |g pages:1-1 |
856 | 4 | 1 | |u http://dx.doi.org/10.1109/LED.2017.2756444 |3 Volltext |
856 | 4 | 2 | |u http://ieeexplore.ieee.org/document/8049388 |
912 | |a GBV_USEFLAG_A | ||
912 | |a SYSFLAG_A | ||
912 | |a GBV_OLC | ||
912 | |a SSG-OLC-TEC | ||
912 | |a GBV_ILN_2004 | ||
951 | |a AR | ||
952 | |d PP |e 99 |h 1-1 |
author_variant |
y c yc |
---|---|
matchkey_str |
article:01938576:uuuuuuuu::eitvsicighrceitcofeiltohnimarctdyeplrvoe |
allfields |
10.1109/LED.2017.2756444 doi PQ20171228 (DE-627)OLC1997634368 (DE-599)GBVOLC1997634368 (PRQ)i655-d47904bc05ad2f44c2624f4097805f8717a26fd9b29f13624ddc44f524a80a050 (KEY)0101063800000000000009900001resistiveswitchingcharacteristicsofflexibletiothin DE-627 ger DE-627 rakwb eng 620 DE-600 Chen, Yuanqing verfasserin aut Resistive Switching Characteristics of Flexible TiO₂ Thin Film Fabricated by Deep Ultraviolet Photochemical Solution Method Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier A novel ultraviolet photochemical method was used to prepare TiO2 resistive-switching films. Amorphous TiO2 films were formed on flexible indium-tin oxide (ITO) coated polyethylene terephthalate (PET) substrates by deep ultraviolet irradiation at 150 °C. A Pt/TiO2/ITO/PET device was then fabricated to investigate bipolar resistive switching of the films for potential application in non-volatile memories. The ratio of on-state to off-state currents was measured, and a good value of 1000 was obtained. The retention and switch-cycling characteristics of the device were investigated for different bending radii. The resistive switching behavior of the flexible device remained stable after 600 cycles of electrical switching, and 1000 cycles of bending. These findings indicate that these devices have good flexibility, retention characteristics, switch-cycle repeatability and bend-cycle repeatability. Titanium oxide Switching circuits Resistance Performance evaluation Radiation effects Switches Temperature resistive switching deep ultraviolet irradiation Films Li, Lingwei oth Yin, Xiaoru oth Yerramilli, Aditya oth Shen, Yuxia oth Song, Yang oth Bian, Weibai oth Li, Na oth Zhao, Zhao oth Qu, Wenwen oth Theodore, N. David oth Alford, T. L oth Enthalten in IEEE electron device letters New York, NY : IEEE, 1980 PP, 99, Seite 1-1 (DE-627)129618993 (DE-600)245158-X (DE-576)015122115 0193-8576 nnns volume:PP number:99 pages:1-1 http://dx.doi.org/10.1109/LED.2017.2756444 Volltext http://ieeexplore.ieee.org/document/8049388 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_2004 AR PP 99 1-1 |
spelling |
10.1109/LED.2017.2756444 doi PQ20171228 (DE-627)OLC1997634368 (DE-599)GBVOLC1997634368 (PRQ)i655-d47904bc05ad2f44c2624f4097805f8717a26fd9b29f13624ddc44f524a80a050 (KEY)0101063800000000000009900001resistiveswitchingcharacteristicsofflexibletiothin DE-627 ger DE-627 rakwb eng 620 DE-600 Chen, Yuanqing verfasserin aut Resistive Switching Characteristics of Flexible TiO₂ Thin Film Fabricated by Deep Ultraviolet Photochemical Solution Method Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier A novel ultraviolet photochemical method was used to prepare TiO2 resistive-switching films. Amorphous TiO2 films were formed on flexible indium-tin oxide (ITO) coated polyethylene terephthalate (PET) substrates by deep ultraviolet irradiation at 150 °C. A Pt/TiO2/ITO/PET device was then fabricated to investigate bipolar resistive switching of the films for potential application in non-volatile memories. The ratio of on-state to off-state currents was measured, and a good value of 1000 was obtained. The retention and switch-cycling characteristics of the device were investigated for different bending radii. The resistive switching behavior of the flexible device remained stable after 600 cycles of electrical switching, and 1000 cycles of bending. These findings indicate that these devices have good flexibility, retention characteristics, switch-cycle repeatability and bend-cycle repeatability. Titanium oxide Switching circuits Resistance Performance evaluation Radiation effects Switches Temperature resistive switching deep ultraviolet irradiation Films Li, Lingwei oth Yin, Xiaoru oth Yerramilli, Aditya oth Shen, Yuxia oth Song, Yang oth Bian, Weibai oth Li, Na oth Zhao, Zhao oth Qu, Wenwen oth Theodore, N. David oth Alford, T. L oth Enthalten in IEEE electron device letters New York, NY : IEEE, 1980 PP, 99, Seite 1-1 (DE-627)129618993 (DE-600)245158-X (DE-576)015122115 0193-8576 nnns volume:PP number:99 pages:1-1 http://dx.doi.org/10.1109/LED.2017.2756444 Volltext http://ieeexplore.ieee.org/document/8049388 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_2004 AR PP 99 1-1 |
allfields_unstemmed |
10.1109/LED.2017.2756444 doi PQ20171228 (DE-627)OLC1997634368 (DE-599)GBVOLC1997634368 (PRQ)i655-d47904bc05ad2f44c2624f4097805f8717a26fd9b29f13624ddc44f524a80a050 (KEY)0101063800000000000009900001resistiveswitchingcharacteristicsofflexibletiothin DE-627 ger DE-627 rakwb eng 620 DE-600 Chen, Yuanqing verfasserin aut Resistive Switching Characteristics of Flexible TiO₂ Thin Film Fabricated by Deep Ultraviolet Photochemical Solution Method Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier A novel ultraviolet photochemical method was used to prepare TiO2 resistive-switching films. Amorphous TiO2 films were formed on flexible indium-tin oxide (ITO) coated polyethylene terephthalate (PET) substrates by deep ultraviolet irradiation at 150 °C. A Pt/TiO2/ITO/PET device was then fabricated to investigate bipolar resistive switching of the films for potential application in non-volatile memories. The ratio of on-state to off-state currents was measured, and a good value of 1000 was obtained. The retention and switch-cycling characteristics of the device were investigated for different bending radii. The resistive switching behavior of the flexible device remained stable after 600 cycles of electrical switching, and 1000 cycles of bending. These findings indicate that these devices have good flexibility, retention characteristics, switch-cycle repeatability and bend-cycle repeatability. Titanium oxide Switching circuits Resistance Performance evaluation Radiation effects Switches Temperature resistive switching deep ultraviolet irradiation Films Li, Lingwei oth Yin, Xiaoru oth Yerramilli, Aditya oth Shen, Yuxia oth Song, Yang oth Bian, Weibai oth Li, Na oth Zhao, Zhao oth Qu, Wenwen oth Theodore, N. David oth Alford, T. L oth Enthalten in IEEE electron device letters New York, NY : IEEE, 1980 PP, 99, Seite 1-1 (DE-627)129618993 (DE-600)245158-X (DE-576)015122115 0193-8576 nnns volume:PP number:99 pages:1-1 http://dx.doi.org/10.1109/LED.2017.2756444 Volltext http://ieeexplore.ieee.org/document/8049388 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_2004 AR PP 99 1-1 |
allfieldsGer |
10.1109/LED.2017.2756444 doi PQ20171228 (DE-627)OLC1997634368 (DE-599)GBVOLC1997634368 (PRQ)i655-d47904bc05ad2f44c2624f4097805f8717a26fd9b29f13624ddc44f524a80a050 (KEY)0101063800000000000009900001resistiveswitchingcharacteristicsofflexibletiothin DE-627 ger DE-627 rakwb eng 620 DE-600 Chen, Yuanqing verfasserin aut Resistive Switching Characteristics of Flexible TiO₂ Thin Film Fabricated by Deep Ultraviolet Photochemical Solution Method Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier A novel ultraviolet photochemical method was used to prepare TiO2 resistive-switching films. Amorphous TiO2 films were formed on flexible indium-tin oxide (ITO) coated polyethylene terephthalate (PET) substrates by deep ultraviolet irradiation at 150 °C. A Pt/TiO2/ITO/PET device was then fabricated to investigate bipolar resistive switching of the films for potential application in non-volatile memories. The ratio of on-state to off-state currents was measured, and a good value of 1000 was obtained. The retention and switch-cycling characteristics of the device were investigated for different bending radii. The resistive switching behavior of the flexible device remained stable after 600 cycles of electrical switching, and 1000 cycles of bending. These findings indicate that these devices have good flexibility, retention characteristics, switch-cycle repeatability and bend-cycle repeatability. Titanium oxide Switching circuits Resistance Performance evaluation Radiation effects Switches Temperature resistive switching deep ultraviolet irradiation Films Li, Lingwei oth Yin, Xiaoru oth Yerramilli, Aditya oth Shen, Yuxia oth Song, Yang oth Bian, Weibai oth Li, Na oth Zhao, Zhao oth Qu, Wenwen oth Theodore, N. David oth Alford, T. L oth Enthalten in IEEE electron device letters New York, NY : IEEE, 1980 PP, 99, Seite 1-1 (DE-627)129618993 (DE-600)245158-X (DE-576)015122115 0193-8576 nnns volume:PP number:99 pages:1-1 http://dx.doi.org/10.1109/LED.2017.2756444 Volltext http://ieeexplore.ieee.org/document/8049388 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_2004 AR PP 99 1-1 |
allfieldsSound |
10.1109/LED.2017.2756444 doi PQ20171228 (DE-627)OLC1997634368 (DE-599)GBVOLC1997634368 (PRQ)i655-d47904bc05ad2f44c2624f4097805f8717a26fd9b29f13624ddc44f524a80a050 (KEY)0101063800000000000009900001resistiveswitchingcharacteristicsofflexibletiothin DE-627 ger DE-627 rakwb eng 620 DE-600 Chen, Yuanqing verfasserin aut Resistive Switching Characteristics of Flexible TiO₂ Thin Film Fabricated by Deep Ultraviolet Photochemical Solution Method Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier A novel ultraviolet photochemical method was used to prepare TiO2 resistive-switching films. Amorphous TiO2 films were formed on flexible indium-tin oxide (ITO) coated polyethylene terephthalate (PET) substrates by deep ultraviolet irradiation at 150 °C. A Pt/TiO2/ITO/PET device was then fabricated to investigate bipolar resistive switching of the films for potential application in non-volatile memories. The ratio of on-state to off-state currents was measured, and a good value of 1000 was obtained. The retention and switch-cycling characteristics of the device were investigated for different bending radii. The resistive switching behavior of the flexible device remained stable after 600 cycles of electrical switching, and 1000 cycles of bending. These findings indicate that these devices have good flexibility, retention characteristics, switch-cycle repeatability and bend-cycle repeatability. Titanium oxide Switching circuits Resistance Performance evaluation Radiation effects Switches Temperature resistive switching deep ultraviolet irradiation Films Li, Lingwei oth Yin, Xiaoru oth Yerramilli, Aditya oth Shen, Yuxia oth Song, Yang oth Bian, Weibai oth Li, Na oth Zhao, Zhao oth Qu, Wenwen oth Theodore, N. David oth Alford, T. L oth Enthalten in IEEE electron device letters New York, NY : IEEE, 1980 PP, 99, Seite 1-1 (DE-627)129618993 (DE-600)245158-X (DE-576)015122115 0193-8576 nnns volume:PP number:99 pages:1-1 http://dx.doi.org/10.1109/LED.2017.2756444 Volltext http://ieeexplore.ieee.org/document/8049388 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_2004 AR PP 99 1-1 |
language |
English |
source |
Enthalten in IEEE electron device letters PP, 99, Seite 1-1 volume:PP number:99 pages:1-1 |
sourceStr |
Enthalten in IEEE electron device letters PP, 99, Seite 1-1 volume:PP number:99 pages:1-1 |
format_phy_str_mv |
Article |
institution |
findex.gbv.de |
topic_facet |
Titanium oxide Switching circuits Resistance Performance evaluation Radiation effects Switches Temperature resistive switching deep ultraviolet irradiation Films |
dewey-raw |
620 |
isfreeaccess_bool |
false |
container_title |
IEEE electron device letters |
authorswithroles_txt_mv |
Chen, Yuanqing @@aut@@ Li, Lingwei @@oth@@ Yin, Xiaoru @@oth@@ Yerramilli, Aditya @@oth@@ Shen, Yuxia @@oth@@ Song, Yang @@oth@@ Bian, Weibai @@oth@@ Li, Na @@oth@@ Zhao, Zhao @@oth@@ Qu, Wenwen @@oth@@ Theodore, N. David @@oth@@ Alford, T. L @@oth@@ |
publishDateDaySort_date |
2024-01-01T00:00:00Z |
hierarchy_top_id |
129618993 |
dewey-sort |
3620 |
id |
OLC1997634368 |
language_de |
englisch |
fullrecord |
<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000caa a2200265 4500</leader><controlfield tag="001">OLC1997634368</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20230715074636.0</controlfield><controlfield tag="007">tu</controlfield><controlfield tag="008">171125nuuuuuuuuxx ||||| 00| ||eng c</controlfield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1109/LED.2017.2756444</subfield><subfield code="2">doi</subfield></datafield><datafield tag="028" ind1="5" ind2="2"><subfield code="a">PQ20171228</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)OLC1997634368</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)GBVOLC1997634368</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(PRQ)i655-d47904bc05ad2f44c2624f4097805f8717a26fd9b29f13624ddc44f524a80a050</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(KEY)0101063800000000000009900001resistiveswitchingcharacteristicsofflexibletiothin</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1=" " ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">620</subfield><subfield code="q">DE-600</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Chen, Yuanqing</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Resistive Switching Characteristics of Flexible TiO₂ Thin Film Fabricated by Deep Ultraviolet Photochemical Solution Method</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">Text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">ohne Hilfsmittel zu benutzen</subfield><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">Band</subfield><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">A novel ultraviolet photochemical method was used to prepare TiO2 resistive-switching films. Amorphous TiO2 films were formed on flexible indium-tin oxide (ITO) coated polyethylene terephthalate (PET) substrates by deep ultraviolet irradiation at 150 °C. A Pt/TiO2/ITO/PET device was then fabricated to investigate bipolar resistive switching of the films for potential application in non-volatile memories. The ratio of on-state to off-state currents was measured, and a good value of 1000 was obtained. The retention and switch-cycling characteristics of the device were investigated for different bending radii. The resistive switching behavior of the flexible device remained stable after 600 cycles of electrical switching, and 1000 cycles of bending. These findings indicate that these devices have good flexibility, retention characteristics, switch-cycle repeatability and bend-cycle repeatability.</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Titanium oxide</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Switching circuits</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Resistance</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Performance evaluation</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Radiation effects</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Switches</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Temperature</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">resistive switching</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">deep ultraviolet irradiation</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Films</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Li, Lingwei</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Yin, Xiaoru</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Yerramilli, Aditya</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Shen, Yuxia</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Song, Yang</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Bian, Weibai</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Li, Na</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Zhao, Zhao</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Qu, Wenwen</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Theodore, N. David</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Alford, T. L</subfield><subfield code="4">oth</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">Enthalten in</subfield><subfield code="t">IEEE electron device letters</subfield><subfield code="d">New York, NY : IEEE, 1980</subfield><subfield code="g">PP, 99, Seite 1-1</subfield><subfield code="w">(DE-627)129618993</subfield><subfield code="w">(DE-600)245158-X</subfield><subfield code="w">(DE-576)015122115</subfield><subfield code="x">0193-8576</subfield><subfield code="7">nnns</subfield></datafield><datafield tag="773" ind1="1" ind2="8"><subfield code="g">volume:PP</subfield><subfield code="g">number:99</subfield><subfield code="g">pages:1-1</subfield></datafield><datafield tag="856" ind1="4" ind2="1"><subfield code="u">http://dx.doi.org/10.1109/LED.2017.2756444</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="856" ind1="4" ind2="2"><subfield code="u">http://ieeexplore.ieee.org/document/8049388</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_USEFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SYSFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_OLC</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-TEC</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2004</subfield></datafield><datafield tag="951" ind1=" " ind2=" "><subfield code="a">AR</subfield></datafield><datafield tag="952" ind1=" " ind2=" "><subfield code="d">PP</subfield><subfield code="e">99</subfield><subfield code="h">1-1</subfield></datafield></record></collection>
|
author |
Chen, Yuanqing |
spellingShingle |
Chen, Yuanqing ddc 620 misc Titanium oxide misc Switching circuits misc Resistance misc Performance evaluation misc Radiation effects misc Switches misc Temperature misc resistive switching misc deep ultraviolet irradiation misc Films Resistive Switching Characteristics of Flexible TiO₂ Thin Film Fabricated by Deep Ultraviolet Photochemical Solution Method |
authorStr |
Chen, Yuanqing |
ppnlink_with_tag_str_mv |
@@773@@(DE-627)129618993 |
format |
Article |
dewey-ones |
620 - Engineering & allied operations |
delete_txt_mv |
keep |
author_role |
aut |
collection |
OLC |
remote_str |
false |
illustrated |
Not Illustrated |
issn |
0193-8576 |
topic_title |
620 DE-600 Resistive Switching Characteristics of Flexible TiO₂ Thin Film Fabricated by Deep Ultraviolet Photochemical Solution Method Titanium oxide Switching circuits Resistance Performance evaluation Radiation effects Switches Temperature resistive switching deep ultraviolet irradiation Films |
topic |
ddc 620 misc Titanium oxide misc Switching circuits misc Resistance misc Performance evaluation misc Radiation effects misc Switches misc Temperature misc resistive switching misc deep ultraviolet irradiation misc Films |
topic_unstemmed |
ddc 620 misc Titanium oxide misc Switching circuits misc Resistance misc Performance evaluation misc Radiation effects misc Switches misc Temperature misc resistive switching misc deep ultraviolet irradiation misc Films |
topic_browse |
ddc 620 misc Titanium oxide misc Switching circuits misc Resistance misc Performance evaluation misc Radiation effects misc Switches misc Temperature misc resistive switching misc deep ultraviolet irradiation misc Films |
format_facet |
Aufsätze Gedruckte Aufsätze |
format_main_str_mv |
Text Zeitschrift/Artikel |
carriertype_str_mv |
nc |
author2_variant |
l l ll x y xy a y ay y s ys y s ys w b wb n l nl z z zz w q wq n d t nd ndt t l a tl tla |
hierarchy_parent_title |
IEEE electron device letters |
hierarchy_parent_id |
129618993 |
dewey-tens |
620 - Engineering |
hierarchy_top_title |
IEEE electron device letters |
isfreeaccess_txt |
false |
familylinks_str_mv |
(DE-627)129618993 (DE-600)245158-X (DE-576)015122115 |
title |
Resistive Switching Characteristics of Flexible TiO₂ Thin Film Fabricated by Deep Ultraviolet Photochemical Solution Method |
ctrlnum |
(DE-627)OLC1997634368 (DE-599)GBVOLC1997634368 (PRQ)i655-d47904bc05ad2f44c2624f4097805f8717a26fd9b29f13624ddc44f524a80a050 (KEY)0101063800000000000009900001resistiveswitchingcharacteristicsofflexibletiothin |
title_full |
Resistive Switching Characteristics of Flexible TiO₂ Thin Film Fabricated by Deep Ultraviolet Photochemical Solution Method |
author_sort |
Chen, Yuanqing |
journal |
IEEE electron device letters |
journalStr |
IEEE electron device letters |
lang_code |
eng |
isOA_bool |
false |
dewey-hundreds |
600 - Technology |
recordtype |
marc |
contenttype_str_mv |
txt |
container_start_page |
1 |
author_browse |
Chen, Yuanqing |
container_volume |
PP |
class |
620 DE-600 |
format_se |
Aufsätze |
author-letter |
Chen, Yuanqing |
doi_str_mv |
10.1109/LED.2017.2756444 |
dewey-full |
620 |
title_sort |
resistive switching characteristics of flexible tio₂ thin film fabricated by deep ultraviolet photochemical solution method |
title_auth |
Resistive Switching Characteristics of Flexible TiO₂ Thin Film Fabricated by Deep Ultraviolet Photochemical Solution Method |
abstract |
A novel ultraviolet photochemical method was used to prepare TiO2 resistive-switching films. Amorphous TiO2 films were formed on flexible indium-tin oxide (ITO) coated polyethylene terephthalate (PET) substrates by deep ultraviolet irradiation at 150 °C. A Pt/TiO2/ITO/PET device was then fabricated to investigate bipolar resistive switching of the films for potential application in non-volatile memories. The ratio of on-state to off-state currents was measured, and a good value of 1000 was obtained. The retention and switch-cycling characteristics of the device were investigated for different bending radii. The resistive switching behavior of the flexible device remained stable after 600 cycles of electrical switching, and 1000 cycles of bending. These findings indicate that these devices have good flexibility, retention characteristics, switch-cycle repeatability and bend-cycle repeatability. |
abstractGer |
A novel ultraviolet photochemical method was used to prepare TiO2 resistive-switching films. Amorphous TiO2 films were formed on flexible indium-tin oxide (ITO) coated polyethylene terephthalate (PET) substrates by deep ultraviolet irradiation at 150 °C. A Pt/TiO2/ITO/PET device was then fabricated to investigate bipolar resistive switching of the films for potential application in non-volatile memories. The ratio of on-state to off-state currents was measured, and a good value of 1000 was obtained. The retention and switch-cycling characteristics of the device were investigated for different bending radii. The resistive switching behavior of the flexible device remained stable after 600 cycles of electrical switching, and 1000 cycles of bending. These findings indicate that these devices have good flexibility, retention characteristics, switch-cycle repeatability and bend-cycle repeatability. |
abstract_unstemmed |
A novel ultraviolet photochemical method was used to prepare TiO2 resistive-switching films. Amorphous TiO2 films were formed on flexible indium-tin oxide (ITO) coated polyethylene terephthalate (PET) substrates by deep ultraviolet irradiation at 150 °C. A Pt/TiO2/ITO/PET device was then fabricated to investigate bipolar resistive switching of the films for potential application in non-volatile memories. The ratio of on-state to off-state currents was measured, and a good value of 1000 was obtained. The retention and switch-cycling characteristics of the device were investigated for different bending radii. The resistive switching behavior of the flexible device remained stable after 600 cycles of electrical switching, and 1000 cycles of bending. These findings indicate that these devices have good flexibility, retention characteristics, switch-cycle repeatability and bend-cycle repeatability. |
collection_details |
GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_2004 |
container_issue |
99 |
title_short |
Resistive Switching Characteristics of Flexible TiO₂ Thin Film Fabricated by Deep Ultraviolet Photochemical Solution Method |
url |
http://dx.doi.org/10.1109/LED.2017.2756444 http://ieeexplore.ieee.org/document/8049388 |
remote_bool |
false |
author2 |
Li, Lingwei Yin, Xiaoru Yerramilli, Aditya Shen, Yuxia Song, Yang Bian, Weibai Li, Na Zhao, Zhao Qu, Wenwen Theodore, N. David Alford, T. L |
author2Str |
Li, Lingwei Yin, Xiaoru Yerramilli, Aditya Shen, Yuxia Song, Yang Bian, Weibai Li, Na Zhao, Zhao Qu, Wenwen Theodore, N. David Alford, T. L |
ppnlink |
129618993 |
mediatype_str_mv |
n |
isOA_txt |
false |
hochschulschrift_bool |
false |
author2_role |
oth oth oth oth oth oth oth oth oth oth oth |
doi_str |
10.1109/LED.2017.2756444 |
up_date |
2024-07-04T03:20:10.173Z |
_version_ |
1803617000677703680 |
fullrecord_marcxml |
<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000caa a2200265 4500</leader><controlfield tag="001">OLC1997634368</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20230715074636.0</controlfield><controlfield tag="007">tu</controlfield><controlfield tag="008">171125nuuuuuuuuxx ||||| 00| ||eng c</controlfield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1109/LED.2017.2756444</subfield><subfield code="2">doi</subfield></datafield><datafield tag="028" ind1="5" ind2="2"><subfield code="a">PQ20171228</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)OLC1997634368</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)GBVOLC1997634368</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(PRQ)i655-d47904bc05ad2f44c2624f4097805f8717a26fd9b29f13624ddc44f524a80a050</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(KEY)0101063800000000000009900001resistiveswitchingcharacteristicsofflexibletiothin</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1=" " ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">620</subfield><subfield code="q">DE-600</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Chen, Yuanqing</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Resistive Switching Characteristics of Flexible TiO₂ Thin Film Fabricated by Deep Ultraviolet Photochemical Solution Method</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">Text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">ohne Hilfsmittel zu benutzen</subfield><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">Band</subfield><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">A novel ultraviolet photochemical method was used to prepare TiO2 resistive-switching films. Amorphous TiO2 films were formed on flexible indium-tin oxide (ITO) coated polyethylene terephthalate (PET) substrates by deep ultraviolet irradiation at 150 °C. A Pt/TiO2/ITO/PET device was then fabricated to investigate bipolar resistive switching of the films for potential application in non-volatile memories. The ratio of on-state to off-state currents was measured, and a good value of 1000 was obtained. The retention and switch-cycling characteristics of the device were investigated for different bending radii. The resistive switching behavior of the flexible device remained stable after 600 cycles of electrical switching, and 1000 cycles of bending. These findings indicate that these devices have good flexibility, retention characteristics, switch-cycle repeatability and bend-cycle repeatability.</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Titanium oxide</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Switching circuits</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Resistance</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Performance evaluation</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Radiation effects</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Switches</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Temperature</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">resistive switching</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">deep ultraviolet irradiation</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Films</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Li, Lingwei</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Yin, Xiaoru</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Yerramilli, Aditya</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Shen, Yuxia</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Song, Yang</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Bian, Weibai</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Li, Na</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Zhao, Zhao</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Qu, Wenwen</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Theodore, N. David</subfield><subfield code="4">oth</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Alford, T. L</subfield><subfield code="4">oth</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">Enthalten in</subfield><subfield code="t">IEEE electron device letters</subfield><subfield code="d">New York, NY : IEEE, 1980</subfield><subfield code="g">PP, 99, Seite 1-1</subfield><subfield code="w">(DE-627)129618993</subfield><subfield code="w">(DE-600)245158-X</subfield><subfield code="w">(DE-576)015122115</subfield><subfield code="x">0193-8576</subfield><subfield code="7">nnns</subfield></datafield><datafield tag="773" ind1="1" ind2="8"><subfield code="g">volume:PP</subfield><subfield code="g">number:99</subfield><subfield code="g">pages:1-1</subfield></datafield><datafield tag="856" ind1="4" ind2="1"><subfield code="u">http://dx.doi.org/10.1109/LED.2017.2756444</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="856" ind1="4" ind2="2"><subfield code="u">http://ieeexplore.ieee.org/document/8049388</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_USEFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SYSFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_OLC</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-TEC</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2004</subfield></datafield><datafield tag="951" ind1=" " ind2=" "><subfield code="a">AR</subfield></datafield><datafield tag="952" ind1=" " ind2=" "><subfield code="d">PP</subfield><subfield code="e">99</subfield><subfield code="h">1-1</subfield></datafield></record></collection>
|
score |
7.401597 |