Resistive Switching Characteristics of Flexible TiO₂ Thin Film Fabricated by Deep Ultraviolet Photochemical Solution Method

A novel ultraviolet photochemical method was used to prepare TiO2 resistive-switching films. Amorphous TiO2 films were formed on flexible indium-tin oxide (ITO) coated polyethylene terephthalate (PET) substrates by deep ultraviolet irradiation at 150 °C. A Pt/TiO2/ITO/PET device was then fabricated...
Ausführliche Beschreibung

Gespeichert in:
Autor*in:

Chen, Yuanqing [verfasserIn]

Li, Lingwei

Yin, Xiaoru

Yerramilli, Aditya

Shen, Yuxia

Song, Yang

Bian, Weibai

Li, Na

Zhao, Zhao

Qu, Wenwen

Theodore, N. David

Alford, T. L

Format:

Artikel

Sprache:

Englisch

Schlagwörter:

Titanium oxide

Switching circuits

Resistance

Performance evaluation

Radiation effects

Switches

Temperature

resistive switching

deep ultraviolet irradiation

Films

Übergeordnetes Werk:

Enthalten in: IEEE electron device letters - New York, NY : IEEE, 1980, PP, 99, Seite 1-1

Übergeordnetes Werk:

volume:PP ; number:99 ; pages:1-1

Links:

Volltext
Link aufrufen

DOI / URN:

10.1109/LED.2017.2756444

Katalog-ID:

OLC1997634368

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