Demonstration and Fabrication Tolerance Study of Temperature-Insensitive Silicon-Photonic MZI Tunable by a Metal Heater
We present a temperature-insensitive tunable silicon-photonic Mach-Zehnder interferometer (MZI) filter fabricated by deep ultraviolet lithography. The wavelength shift of the MZI filter depending on temperature is reduced down to −4 pm/°C at ∼1480 nm using a design with waveguide narrowing and widen...
Ausführliche Beschreibung
Gespeichert in:
| Autor*in: |
Lee, Jong-Moo [verfasserIn] |
|---|
| Format: |
Artikel |
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| Sprache: |
Englisch |
| Erschienen: |
2017 |
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| Schlagwörter: |
wavelength division multiplexing |
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| Übergeordnetes Werk: |
Enthalten in: Journal of lightwave technology - New York, NY : IEEE, 1983, 35(2017), 22, Seite 4903-4909 |
|---|---|
| Übergeordnetes Werk: |
volume:35 ; year:2017 ; number:22 ; pages:4903-4909 |
| Links: |
|---|
| DOI / URN: |
10.1109/JLT.2017.2763244 |
|---|
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OLC1999276531 |
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| 520 | |a We present a temperature-insensitive tunable silicon-photonic Mach-Zehnder interferometer (MZI) filter fabricated by deep ultraviolet lithography. The wavelength shift of the MZI filter depending on temperature is reduced down to −4 pm/°C at ∼1480 nm using a design with waveguide narrowing and widening, and the MZI filter is tunable with a thermal heater at an efficiency of 24 mW/free spectral range (FSR). The FSR of the MZI is about 5.8 nm, which corresponds to a channel spacing of 2.9 nm for a two-channel MZI. We discuss the fabrication tolerance of the fabricated MZI according to experimental and simulation results and show design parameters for a fabrication-tolerant temperature-insensitive MZI with a 20-nm channel spacing for coarse wavelength-division multiplexing application. | ||
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| 650 | 4 | |a wavelength division multiplexing | |
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| 650 | 4 | |a Temperature measurement | |
| 650 | 4 | |a optical components | |
| 650 | 4 | |a Heating systems | |
| 650 | 4 | |a optical planar waveguides | |
| 650 | 4 | |a optical planar waveguide components | |
| 650 | 4 | |a Optical device fabrication | |
| 650 | 4 | |a Integrated optoelectronics | |
| 700 | 1 | |a Kim, Min-Su |4 oth | |
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| 700 | 1 | |a Testa, Francesco |4 oth | |
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10.1109/JLT.2017.2763244 doi PQ20171228 (DE-627)OLC1999276531 (DE-599)GBVOLC1999276531 (PRQ)i942-c1d5f3edf006c9c0df312b923be690fc4cb3aa19317120eb5dce2ad6e0ed0a1e0 (KEY)0124889820170000035002204903demonstrationandfabricationtolerancestudyoftempera DE-627 ger DE-627 rakwb eng 530 600 620 DE-600 Lee, Jong-Moo verfasserin aut Demonstration and Fabrication Tolerance Study of Temperature-Insensitive Silicon-Photonic MZI Tunable by a Metal Heater 2017 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier We present a temperature-insensitive tunable silicon-photonic Mach-Zehnder interferometer (MZI) filter fabricated by deep ultraviolet lithography. The wavelength shift of the MZI filter depending on temperature is reduced down to −4 pm/°C at ∼1480 nm using a design with waveguide narrowing and widening, and the MZI filter is tunable with a thermal heater at an efficiency of 24 mW/free spectral range (FSR). The FSR of the MZI is about 5.8 nm, which corresponds to a channel spacing of 2.9 nm for a two-channel MZI. We discuss the fabrication tolerance of the fabricated MZI according to experimental and simulation results and show design parameters for a fabrication-tolerant temperature-insensitive MZI with a 20-nm channel spacing for coarse wavelength-division multiplexing application. Optical waveguides wavelength division multiplexing Indexes Silicon Temperature measurement optical components Heating systems optical planar waveguides optical planar waveguide components Optical device fabrication Integrated optoelectronics Kim, Min-Su oth Ahn, Joon Tae oth Adelmini, Laetitia oth Fowler, Daivid oth Kopp, Christophe oth Oton, Claudio J oth Testa, Francesco oth Enthalten in Journal of lightwave technology New York, NY : IEEE, 1983 35(2017), 22, Seite 4903-4909 (DE-627)129620882 (DE-600)246121-3 (DE-576)015127214 0733-8724 nnns volume:35 year:2017 number:22 pages:4903-4909 http://dx.doi.org/10.1109/JLT.2017.2763244 Volltext http://ieeexplore.ieee.org/document/8068186 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY GBV_ILN_70 GBV_ILN_185 AR 35 2017 22 4903-4909 |
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10.1109/JLT.2017.2763244 doi PQ20171228 (DE-627)OLC1999276531 (DE-599)GBVOLC1999276531 (PRQ)i942-c1d5f3edf006c9c0df312b923be690fc4cb3aa19317120eb5dce2ad6e0ed0a1e0 (KEY)0124889820170000035002204903demonstrationandfabricationtolerancestudyoftempera DE-627 ger DE-627 rakwb eng 530 600 620 DE-600 Lee, Jong-Moo verfasserin aut Demonstration and Fabrication Tolerance Study of Temperature-Insensitive Silicon-Photonic MZI Tunable by a Metal Heater 2017 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier We present a temperature-insensitive tunable silicon-photonic Mach-Zehnder interferometer (MZI) filter fabricated by deep ultraviolet lithography. The wavelength shift of the MZI filter depending on temperature is reduced down to −4 pm/°C at ∼1480 nm using a design with waveguide narrowing and widening, and the MZI filter is tunable with a thermal heater at an efficiency of 24 mW/free spectral range (FSR). The FSR of the MZI is about 5.8 nm, which corresponds to a channel spacing of 2.9 nm for a two-channel MZI. We discuss the fabrication tolerance of the fabricated MZI according to experimental and simulation results and show design parameters for a fabrication-tolerant temperature-insensitive MZI with a 20-nm channel spacing for coarse wavelength-division multiplexing application. Optical waveguides wavelength division multiplexing Indexes Silicon Temperature measurement optical components Heating systems optical planar waveguides optical planar waveguide components Optical device fabrication Integrated optoelectronics Kim, Min-Su oth Ahn, Joon Tae oth Adelmini, Laetitia oth Fowler, Daivid oth Kopp, Christophe oth Oton, Claudio J oth Testa, Francesco oth Enthalten in Journal of lightwave technology New York, NY : IEEE, 1983 35(2017), 22, Seite 4903-4909 (DE-627)129620882 (DE-600)246121-3 (DE-576)015127214 0733-8724 nnns volume:35 year:2017 number:22 pages:4903-4909 http://dx.doi.org/10.1109/JLT.2017.2763244 Volltext http://ieeexplore.ieee.org/document/8068186 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY GBV_ILN_70 GBV_ILN_185 AR 35 2017 22 4903-4909 |
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10.1109/JLT.2017.2763244 doi PQ20171228 (DE-627)OLC1999276531 (DE-599)GBVOLC1999276531 (PRQ)i942-c1d5f3edf006c9c0df312b923be690fc4cb3aa19317120eb5dce2ad6e0ed0a1e0 (KEY)0124889820170000035002204903demonstrationandfabricationtolerancestudyoftempera DE-627 ger DE-627 rakwb eng 530 600 620 DE-600 Lee, Jong-Moo verfasserin aut Demonstration and Fabrication Tolerance Study of Temperature-Insensitive Silicon-Photonic MZI Tunable by a Metal Heater 2017 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier We present a temperature-insensitive tunable silicon-photonic Mach-Zehnder interferometer (MZI) filter fabricated by deep ultraviolet lithography. The wavelength shift of the MZI filter depending on temperature is reduced down to −4 pm/°C at ∼1480 nm using a design with waveguide narrowing and widening, and the MZI filter is tunable with a thermal heater at an efficiency of 24 mW/free spectral range (FSR). The FSR of the MZI is about 5.8 nm, which corresponds to a channel spacing of 2.9 nm for a two-channel MZI. We discuss the fabrication tolerance of the fabricated MZI according to experimental and simulation results and show design parameters for a fabrication-tolerant temperature-insensitive MZI with a 20-nm channel spacing for coarse wavelength-division multiplexing application. Optical waveguides wavelength division multiplexing Indexes Silicon Temperature measurement optical components Heating systems optical planar waveguides optical planar waveguide components Optical device fabrication Integrated optoelectronics Kim, Min-Su oth Ahn, Joon Tae oth Adelmini, Laetitia oth Fowler, Daivid oth Kopp, Christophe oth Oton, Claudio J oth Testa, Francesco oth Enthalten in Journal of lightwave technology New York, NY : IEEE, 1983 35(2017), 22, Seite 4903-4909 (DE-627)129620882 (DE-600)246121-3 (DE-576)015127214 0733-8724 nnns volume:35 year:2017 number:22 pages:4903-4909 http://dx.doi.org/10.1109/JLT.2017.2763244 Volltext http://ieeexplore.ieee.org/document/8068186 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY GBV_ILN_70 GBV_ILN_185 AR 35 2017 22 4903-4909 |
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10.1109/JLT.2017.2763244 doi PQ20171228 (DE-627)OLC1999276531 (DE-599)GBVOLC1999276531 (PRQ)i942-c1d5f3edf006c9c0df312b923be690fc4cb3aa19317120eb5dce2ad6e0ed0a1e0 (KEY)0124889820170000035002204903demonstrationandfabricationtolerancestudyoftempera DE-627 ger DE-627 rakwb eng 530 600 620 DE-600 Lee, Jong-Moo verfasserin aut Demonstration and Fabrication Tolerance Study of Temperature-Insensitive Silicon-Photonic MZI Tunable by a Metal Heater 2017 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier We present a temperature-insensitive tunable silicon-photonic Mach-Zehnder interferometer (MZI) filter fabricated by deep ultraviolet lithography. The wavelength shift of the MZI filter depending on temperature is reduced down to −4 pm/°C at ∼1480 nm using a design with waveguide narrowing and widening, and the MZI filter is tunable with a thermal heater at an efficiency of 24 mW/free spectral range (FSR). The FSR of the MZI is about 5.8 nm, which corresponds to a channel spacing of 2.9 nm for a two-channel MZI. We discuss the fabrication tolerance of the fabricated MZI according to experimental and simulation results and show design parameters for a fabrication-tolerant temperature-insensitive MZI with a 20-nm channel spacing for coarse wavelength-division multiplexing application. Optical waveguides wavelength division multiplexing Indexes Silicon Temperature measurement optical components Heating systems optical planar waveguides optical planar waveguide components Optical device fabrication Integrated optoelectronics Kim, Min-Su oth Ahn, Joon Tae oth Adelmini, Laetitia oth Fowler, Daivid oth Kopp, Christophe oth Oton, Claudio J oth Testa, Francesco oth Enthalten in Journal of lightwave technology New York, NY : IEEE, 1983 35(2017), 22, Seite 4903-4909 (DE-627)129620882 (DE-600)246121-3 (DE-576)015127214 0733-8724 nnns volume:35 year:2017 number:22 pages:4903-4909 http://dx.doi.org/10.1109/JLT.2017.2763244 Volltext http://ieeexplore.ieee.org/document/8068186 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY GBV_ILN_70 GBV_ILN_185 AR 35 2017 22 4903-4909 |
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10.1109/JLT.2017.2763244 doi PQ20171228 (DE-627)OLC1999276531 (DE-599)GBVOLC1999276531 (PRQ)i942-c1d5f3edf006c9c0df312b923be690fc4cb3aa19317120eb5dce2ad6e0ed0a1e0 (KEY)0124889820170000035002204903demonstrationandfabricationtolerancestudyoftempera DE-627 ger DE-627 rakwb eng 530 600 620 DE-600 Lee, Jong-Moo verfasserin aut Demonstration and Fabrication Tolerance Study of Temperature-Insensitive Silicon-Photonic MZI Tunable by a Metal Heater 2017 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier We present a temperature-insensitive tunable silicon-photonic Mach-Zehnder interferometer (MZI) filter fabricated by deep ultraviolet lithography. The wavelength shift of the MZI filter depending on temperature is reduced down to −4 pm/°C at ∼1480 nm using a design with waveguide narrowing and widening, and the MZI filter is tunable with a thermal heater at an efficiency of 24 mW/free spectral range (FSR). The FSR of the MZI is about 5.8 nm, which corresponds to a channel spacing of 2.9 nm for a two-channel MZI. We discuss the fabrication tolerance of the fabricated MZI according to experimental and simulation results and show design parameters for a fabrication-tolerant temperature-insensitive MZI with a 20-nm channel spacing for coarse wavelength-division multiplexing application. Optical waveguides wavelength division multiplexing Indexes Silicon Temperature measurement optical components Heating systems optical planar waveguides optical planar waveguide components Optical device fabrication Integrated optoelectronics Kim, Min-Su oth Ahn, Joon Tae oth Adelmini, Laetitia oth Fowler, Daivid oth Kopp, Christophe oth Oton, Claudio J oth Testa, Francesco oth Enthalten in Journal of lightwave technology New York, NY : IEEE, 1983 35(2017), 22, Seite 4903-4909 (DE-627)129620882 (DE-600)246121-3 (DE-576)015127214 0733-8724 nnns volume:35 year:2017 number:22 pages:4903-4909 http://dx.doi.org/10.1109/JLT.2017.2763244 Volltext http://ieeexplore.ieee.org/document/8068186 GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY GBV_ILN_70 GBV_ILN_185 AR 35 2017 22 4903-4909 |
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530 600 620 DE-600 Demonstration and Fabrication Tolerance Study of Temperature-Insensitive Silicon-Photonic MZI Tunable by a Metal Heater Optical waveguides wavelength division multiplexing Indexes Silicon Temperature measurement optical components Heating systems optical planar waveguides optical planar waveguide components Optical device fabrication Integrated optoelectronics |
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Demonstration and Fabrication Tolerance Study of Temperature-Insensitive Silicon-Photonic MZI Tunable by a Metal Heater |
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Demonstration and Fabrication Tolerance Study of Temperature-Insensitive Silicon-Photonic MZI Tunable by a Metal Heater |
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Lee, Jong-Moo |
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demonstration and fabrication tolerance study of temperature-insensitive silicon-photonic mzi tunable by a metal heater |
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Demonstration and Fabrication Tolerance Study of Temperature-Insensitive Silicon-Photonic MZI Tunable by a Metal Heater |
| abstract |
We present a temperature-insensitive tunable silicon-photonic Mach-Zehnder interferometer (MZI) filter fabricated by deep ultraviolet lithography. The wavelength shift of the MZI filter depending on temperature is reduced down to −4 pm/°C at ∼1480 nm using a design with waveguide narrowing and widening, and the MZI filter is tunable with a thermal heater at an efficiency of 24 mW/free spectral range (FSR). The FSR of the MZI is about 5.8 nm, which corresponds to a channel spacing of 2.9 nm for a two-channel MZI. We discuss the fabrication tolerance of the fabricated MZI according to experimental and simulation results and show design parameters for a fabrication-tolerant temperature-insensitive MZI with a 20-nm channel spacing for coarse wavelength-division multiplexing application. |
| abstractGer |
We present a temperature-insensitive tunable silicon-photonic Mach-Zehnder interferometer (MZI) filter fabricated by deep ultraviolet lithography. The wavelength shift of the MZI filter depending on temperature is reduced down to −4 pm/°C at ∼1480 nm using a design with waveguide narrowing and widening, and the MZI filter is tunable with a thermal heater at an efficiency of 24 mW/free spectral range (FSR). The FSR of the MZI is about 5.8 nm, which corresponds to a channel spacing of 2.9 nm for a two-channel MZI. We discuss the fabrication tolerance of the fabricated MZI according to experimental and simulation results and show design parameters for a fabrication-tolerant temperature-insensitive MZI with a 20-nm channel spacing for coarse wavelength-division multiplexing application. |
| abstract_unstemmed |
We present a temperature-insensitive tunable silicon-photonic Mach-Zehnder interferometer (MZI) filter fabricated by deep ultraviolet lithography. The wavelength shift of the MZI filter depending on temperature is reduced down to −4 pm/°C at ∼1480 nm using a design with waveguide narrowing and widening, and the MZI filter is tunable with a thermal heater at an efficiency of 24 mW/free spectral range (FSR). The FSR of the MZI is about 5.8 nm, which corresponds to a channel spacing of 2.9 nm for a two-channel MZI. We discuss the fabrication tolerance of the fabricated MZI according to experimental and simulation results and show design parameters for a fabrication-tolerant temperature-insensitive MZI with a 20-nm channel spacing for coarse wavelength-division multiplexing application. |
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| title_short |
Demonstration and Fabrication Tolerance Study of Temperature-Insensitive Silicon-Photonic MZI Tunable by a Metal Heater |
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http://dx.doi.org/10.1109/JLT.2017.2763244 http://ieeexplore.ieee.org/document/8068186 |
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Kim, Min-Su Ahn, Joon Tae Adelmini, Laetitia Fowler, Daivid Kopp, Christophe Oton, Claudio J Testa, Francesco |
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Kim, Min-Su Ahn, Joon Tae Adelmini, Laetitia Fowler, Daivid Kopp, Christophe Oton, Claudio J Testa, Francesco |
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