Room-temperature deposition of flexible transparent conductive Ga-doped ZnO thin films by magnetron sputtering on polymer substrates
Abstract Flexible Ga doped ZnO transparent conductive films were prepared on polymer substrates at room temperature by RF magnetron sputtering. The effect of the Ar flow rate is more important than that of r.f. power and sputtering pressure. The dependence of the structural, electrical, optical and...
Ausführliche Beschreibung
Autor*in: |
Gong, Li [verfasserIn] |
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Format: |
Artikel |
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Sprache: |
Englisch |
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2017 |
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Anmerkung: |
© Springer Science+Business Media New York 2017 |
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Übergeordnetes Werk: |
Enthalten in: Journal of materials science / Materials in electronics - Springer US, 1990, 28(2017), 8 vom: 06. Jan., Seite 6093-6098 |
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Übergeordnetes Werk: |
volume:28 ; year:2017 ; number:8 ; day:06 ; month:01 ; pages:6093-6098 |
Links: |
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DOI / URN: |
10.1007/s10854-016-6286-3 |
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Katalog-ID: |
OLC2026320705 |
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LEADER | 01000caa a22002652 4500 | ||
---|---|---|---|
001 | OLC2026320705 | ||
003 | DE-627 | ||
005 | 20230518115741.0 | ||
007 | tu | ||
008 | 200820s2017 xx ||||| 00| ||eng c | ||
024 | 7 | |a 10.1007/s10854-016-6286-3 |2 doi | |
035 | |a (DE-627)OLC2026320705 | ||
035 | |a (DE-He213)s10854-016-6286-3-p | ||
040 | |a DE-627 |b ger |c DE-627 |e rakwb | ||
041 | |a eng | ||
082 | 0 | 4 | |a 600 |a 670 |a 620 |q VZ |
100 | 1 | |a Gong, Li |e verfasserin |4 aut | |
245 | 1 | 0 | |a Room-temperature deposition of flexible transparent conductive Ga-doped ZnO thin films by magnetron sputtering on polymer substrates |
264 | 1 | |c 2017 | |
336 | |a Text |b txt |2 rdacontent | ||
337 | |a ohne Hilfsmittel zu benutzen |b n |2 rdamedia | ||
338 | |a Band |b nc |2 rdacarrier | ||
500 | |a © Springer Science+Business Media New York 2017 | ||
520 | |a Abstract Flexible Ga doped ZnO transparent conductive films were prepared on polymer substrates at room temperature by RF magnetron sputtering. The effect of the Ar flow rate is more important than that of r.f. power and sputtering pressure. The dependence of the structural, electrical, optical and adhesive properties of flexible Ga doped ZnO transparent conductive thin films on the Ar flow rate was investigated for the first time. When the Ar flow rate is 40 sccm, the residual stress is changed from compressive stress to tensile stress, indicating the crystallinity of the film is best. And the lowest square resistance of 7.9 Ω/sq. is obtained at the Ar flow rate of 40 sccm. Regardless of the Ar flow rate, the optical transmittance in the visible light of all the films is about 90%. The best adhesive behavior is obtained at the Ar flow rate of 40 sccm. | ||
650 | 4 | |a Residual Stress | |
650 | 4 | |a Transparent Conductive Film | |
650 | 4 | |a Chemical Spray Pyrolysis | |
650 | 4 | |a Transparent Conductive Oxide Material | |
650 | 4 | |a Transparent Conductive Oxide Thin Film | |
700 | 1 | |a Liu, Yun-Zhen |4 aut | |
700 | 1 | |a Liu, Fang-Yang |4 aut | |
700 | 1 | |a Jiang, Liang-Xing |4 aut | |
773 | 0 | 8 | |i Enthalten in |t Journal of materials science / Materials in electronics |d Springer US, 1990 |g 28(2017), 8 vom: 06. Jan., Seite 6093-6098 |w (DE-627)130863289 |w (DE-600)1030929-9 |w (DE-576)023106719 |x 0957-4522 |7 nnns |
773 | 1 | 8 | |g volume:28 |g year:2017 |g number:8 |g day:06 |g month:01 |g pages:6093-6098 |
856 | 4 | 1 | |u https://doi.org/10.1007/s10854-016-6286-3 |z lizenzpflichtig |3 Volltext |
912 | |a GBV_USEFLAG_A | ||
912 | |a SYSFLAG_A | ||
912 | |a GBV_OLC | ||
912 | |a SSG-OLC-TEC | ||
912 | |a SSG-OLC-PHY | ||
912 | |a SSG-OLC-PHA | ||
912 | |a SSG-OLC-DE-84 | ||
912 | |a GBV_ILN_30 | ||
912 | |a GBV_ILN_70 | ||
912 | |a GBV_ILN_2004 | ||
912 | |a GBV_ILN_2015 | ||
912 | |a GBV_ILN_4046 | ||
912 | |a GBV_ILN_4323 | ||
951 | |a AR | ||
952 | |d 28 |j 2017 |e 8 |b 06 |c 01 |h 6093-6098 |
author_variant |
l g lg y z l yzl f y l fyl l x j lxj |
---|---|
matchkey_str |
article:09574522:2017----::omeprtrdpstoofeiltasaetodcieaoezohnimbmger |
hierarchy_sort_str |
2017 |
publishDate |
2017 |
allfields |
10.1007/s10854-016-6286-3 doi (DE-627)OLC2026320705 (DE-He213)s10854-016-6286-3-p DE-627 ger DE-627 rakwb eng 600 670 620 VZ Gong, Li verfasserin aut Room-temperature deposition of flexible transparent conductive Ga-doped ZnO thin films by magnetron sputtering on polymer substrates 2017 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © Springer Science+Business Media New York 2017 Abstract Flexible Ga doped ZnO transparent conductive films were prepared on polymer substrates at room temperature by RF magnetron sputtering. The effect of the Ar flow rate is more important than that of r.f. power and sputtering pressure. The dependence of the structural, electrical, optical and adhesive properties of flexible Ga doped ZnO transparent conductive thin films on the Ar flow rate was investigated for the first time. When the Ar flow rate is 40 sccm, the residual stress is changed from compressive stress to tensile stress, indicating the crystallinity of the film is best. And the lowest square resistance of 7.9 Ω/sq. is obtained at the Ar flow rate of 40 sccm. Regardless of the Ar flow rate, the optical transmittance in the visible light of all the films is about 90%. The best adhesive behavior is obtained at the Ar flow rate of 40 sccm. Residual Stress Transparent Conductive Film Chemical Spray Pyrolysis Transparent Conductive Oxide Material Transparent Conductive Oxide Thin Film Liu, Yun-Zhen aut Liu, Fang-Yang aut Jiang, Liang-Xing aut Enthalten in Journal of materials science / Materials in electronics Springer US, 1990 28(2017), 8 vom: 06. Jan., Seite 6093-6098 (DE-627)130863289 (DE-600)1030929-9 (DE-576)023106719 0957-4522 nnns volume:28 year:2017 number:8 day:06 month:01 pages:6093-6098 https://doi.org/10.1007/s10854-016-6286-3 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_30 GBV_ILN_70 GBV_ILN_2004 GBV_ILN_2015 GBV_ILN_4046 GBV_ILN_4323 AR 28 2017 8 06 01 6093-6098 |
spelling |
10.1007/s10854-016-6286-3 doi (DE-627)OLC2026320705 (DE-He213)s10854-016-6286-3-p DE-627 ger DE-627 rakwb eng 600 670 620 VZ Gong, Li verfasserin aut Room-temperature deposition of flexible transparent conductive Ga-doped ZnO thin films by magnetron sputtering on polymer substrates 2017 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © Springer Science+Business Media New York 2017 Abstract Flexible Ga doped ZnO transparent conductive films were prepared on polymer substrates at room temperature by RF magnetron sputtering. The effect of the Ar flow rate is more important than that of r.f. power and sputtering pressure. The dependence of the structural, electrical, optical and adhesive properties of flexible Ga doped ZnO transparent conductive thin films on the Ar flow rate was investigated for the first time. When the Ar flow rate is 40 sccm, the residual stress is changed from compressive stress to tensile stress, indicating the crystallinity of the film is best. And the lowest square resistance of 7.9 Ω/sq. is obtained at the Ar flow rate of 40 sccm. Regardless of the Ar flow rate, the optical transmittance in the visible light of all the films is about 90%. The best adhesive behavior is obtained at the Ar flow rate of 40 sccm. Residual Stress Transparent Conductive Film Chemical Spray Pyrolysis Transparent Conductive Oxide Material Transparent Conductive Oxide Thin Film Liu, Yun-Zhen aut Liu, Fang-Yang aut Jiang, Liang-Xing aut Enthalten in Journal of materials science / Materials in electronics Springer US, 1990 28(2017), 8 vom: 06. Jan., Seite 6093-6098 (DE-627)130863289 (DE-600)1030929-9 (DE-576)023106719 0957-4522 nnns volume:28 year:2017 number:8 day:06 month:01 pages:6093-6098 https://doi.org/10.1007/s10854-016-6286-3 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_30 GBV_ILN_70 GBV_ILN_2004 GBV_ILN_2015 GBV_ILN_4046 GBV_ILN_4323 AR 28 2017 8 06 01 6093-6098 |
allfields_unstemmed |
10.1007/s10854-016-6286-3 doi (DE-627)OLC2026320705 (DE-He213)s10854-016-6286-3-p DE-627 ger DE-627 rakwb eng 600 670 620 VZ Gong, Li verfasserin aut Room-temperature deposition of flexible transparent conductive Ga-doped ZnO thin films by magnetron sputtering on polymer substrates 2017 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © Springer Science+Business Media New York 2017 Abstract Flexible Ga doped ZnO transparent conductive films were prepared on polymer substrates at room temperature by RF magnetron sputtering. The effect of the Ar flow rate is more important than that of r.f. power and sputtering pressure. The dependence of the structural, electrical, optical and adhesive properties of flexible Ga doped ZnO transparent conductive thin films on the Ar flow rate was investigated for the first time. When the Ar flow rate is 40 sccm, the residual stress is changed from compressive stress to tensile stress, indicating the crystallinity of the film is best. And the lowest square resistance of 7.9 Ω/sq. is obtained at the Ar flow rate of 40 sccm. Regardless of the Ar flow rate, the optical transmittance in the visible light of all the films is about 90%. The best adhesive behavior is obtained at the Ar flow rate of 40 sccm. Residual Stress Transparent Conductive Film Chemical Spray Pyrolysis Transparent Conductive Oxide Material Transparent Conductive Oxide Thin Film Liu, Yun-Zhen aut Liu, Fang-Yang aut Jiang, Liang-Xing aut Enthalten in Journal of materials science / Materials in electronics Springer US, 1990 28(2017), 8 vom: 06. Jan., Seite 6093-6098 (DE-627)130863289 (DE-600)1030929-9 (DE-576)023106719 0957-4522 nnns volume:28 year:2017 number:8 day:06 month:01 pages:6093-6098 https://doi.org/10.1007/s10854-016-6286-3 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_30 GBV_ILN_70 GBV_ILN_2004 GBV_ILN_2015 GBV_ILN_4046 GBV_ILN_4323 AR 28 2017 8 06 01 6093-6098 |
allfieldsGer |
10.1007/s10854-016-6286-3 doi (DE-627)OLC2026320705 (DE-He213)s10854-016-6286-3-p DE-627 ger DE-627 rakwb eng 600 670 620 VZ Gong, Li verfasserin aut Room-temperature deposition of flexible transparent conductive Ga-doped ZnO thin films by magnetron sputtering on polymer substrates 2017 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © Springer Science+Business Media New York 2017 Abstract Flexible Ga doped ZnO transparent conductive films were prepared on polymer substrates at room temperature by RF magnetron sputtering. The effect of the Ar flow rate is more important than that of r.f. power and sputtering pressure. The dependence of the structural, electrical, optical and adhesive properties of flexible Ga doped ZnO transparent conductive thin films on the Ar flow rate was investigated for the first time. When the Ar flow rate is 40 sccm, the residual stress is changed from compressive stress to tensile stress, indicating the crystallinity of the film is best. And the lowest square resistance of 7.9 Ω/sq. is obtained at the Ar flow rate of 40 sccm. Regardless of the Ar flow rate, the optical transmittance in the visible light of all the films is about 90%. The best adhesive behavior is obtained at the Ar flow rate of 40 sccm. Residual Stress Transparent Conductive Film Chemical Spray Pyrolysis Transparent Conductive Oxide Material Transparent Conductive Oxide Thin Film Liu, Yun-Zhen aut Liu, Fang-Yang aut Jiang, Liang-Xing aut Enthalten in Journal of materials science / Materials in electronics Springer US, 1990 28(2017), 8 vom: 06. Jan., Seite 6093-6098 (DE-627)130863289 (DE-600)1030929-9 (DE-576)023106719 0957-4522 nnns volume:28 year:2017 number:8 day:06 month:01 pages:6093-6098 https://doi.org/10.1007/s10854-016-6286-3 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_30 GBV_ILN_70 GBV_ILN_2004 GBV_ILN_2015 GBV_ILN_4046 GBV_ILN_4323 AR 28 2017 8 06 01 6093-6098 |
allfieldsSound |
10.1007/s10854-016-6286-3 doi (DE-627)OLC2026320705 (DE-He213)s10854-016-6286-3-p DE-627 ger DE-627 rakwb eng 600 670 620 VZ Gong, Li verfasserin aut Room-temperature deposition of flexible transparent conductive Ga-doped ZnO thin films by magnetron sputtering on polymer substrates 2017 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © Springer Science+Business Media New York 2017 Abstract Flexible Ga doped ZnO transparent conductive films were prepared on polymer substrates at room temperature by RF magnetron sputtering. The effect of the Ar flow rate is more important than that of r.f. power and sputtering pressure. The dependence of the structural, electrical, optical and adhesive properties of flexible Ga doped ZnO transparent conductive thin films on the Ar flow rate was investigated for the first time. When the Ar flow rate is 40 sccm, the residual stress is changed from compressive stress to tensile stress, indicating the crystallinity of the film is best. And the lowest square resistance of 7.9 Ω/sq. is obtained at the Ar flow rate of 40 sccm. Regardless of the Ar flow rate, the optical transmittance in the visible light of all the films is about 90%. The best adhesive behavior is obtained at the Ar flow rate of 40 sccm. Residual Stress Transparent Conductive Film Chemical Spray Pyrolysis Transparent Conductive Oxide Material Transparent Conductive Oxide Thin Film Liu, Yun-Zhen aut Liu, Fang-Yang aut Jiang, Liang-Xing aut Enthalten in Journal of materials science / Materials in electronics Springer US, 1990 28(2017), 8 vom: 06. Jan., Seite 6093-6098 (DE-627)130863289 (DE-600)1030929-9 (DE-576)023106719 0957-4522 nnns volume:28 year:2017 number:8 day:06 month:01 pages:6093-6098 https://doi.org/10.1007/s10854-016-6286-3 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_30 GBV_ILN_70 GBV_ILN_2004 GBV_ILN_2015 GBV_ILN_4046 GBV_ILN_4323 AR 28 2017 8 06 01 6093-6098 |
language |
English |
source |
Enthalten in Journal of materials science / Materials in electronics 28(2017), 8 vom: 06. Jan., Seite 6093-6098 volume:28 year:2017 number:8 day:06 month:01 pages:6093-6098 |
sourceStr |
Enthalten in Journal of materials science / Materials in electronics 28(2017), 8 vom: 06. Jan., Seite 6093-6098 volume:28 year:2017 number:8 day:06 month:01 pages:6093-6098 |
format_phy_str_mv |
Article |
institution |
findex.gbv.de |
topic_facet |
Residual Stress Transparent Conductive Film Chemical Spray Pyrolysis Transparent Conductive Oxide Material Transparent Conductive Oxide Thin Film |
dewey-raw |
600 |
isfreeaccess_bool |
false |
container_title |
Journal of materials science / Materials in electronics |
authorswithroles_txt_mv |
Gong, Li @@aut@@ Liu, Yun-Zhen @@aut@@ Liu, Fang-Yang @@aut@@ Jiang, Liang-Xing @@aut@@ |
publishDateDaySort_date |
2017-01-06T00:00:00Z |
hierarchy_top_id |
130863289 |
dewey-sort |
3600 |
id |
OLC2026320705 |
language_de |
englisch |
fullrecord |
<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000caa a22002652 4500</leader><controlfield tag="001">OLC2026320705</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20230518115741.0</controlfield><controlfield tag="007">tu</controlfield><controlfield tag="008">200820s2017 xx ||||| 00| ||eng c</controlfield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1007/s10854-016-6286-3</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)OLC2026320705</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-He213)s10854-016-6286-3-p</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1=" " ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">600</subfield><subfield code="a">670</subfield><subfield code="a">620</subfield><subfield code="q">VZ</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Gong, Li</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Room-temperature deposition of flexible transparent conductive Ga-doped ZnO thin films by magnetron sputtering on polymer substrates</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">2017</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">Text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">ohne Hilfsmittel zu benutzen</subfield><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">Band</subfield><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">© Springer Science+Business Media New York 2017</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Abstract Flexible Ga doped ZnO transparent conductive films were prepared on polymer substrates at room temperature by RF magnetron sputtering. The effect of the Ar flow rate is more important than that of r.f. power and sputtering pressure. The dependence of the structural, electrical, optical and adhesive properties of flexible Ga doped ZnO transparent conductive thin films on the Ar flow rate was investigated for the first time. When the Ar flow rate is 40 sccm, the residual stress is changed from compressive stress to tensile stress, indicating the crystallinity of the film is best. And the lowest square resistance of 7.9 Ω/sq. is obtained at the Ar flow rate of 40 sccm. Regardless of the Ar flow rate, the optical transmittance in the visible light of all the films is about 90%. The best adhesive behavior is obtained at the Ar flow rate of 40 sccm.</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Residual Stress</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Transparent Conductive Film</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Chemical Spray Pyrolysis</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Transparent Conductive Oxide Material</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Transparent Conductive Oxide Thin Film</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Liu, Yun-Zhen</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Liu, Fang-Yang</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Jiang, Liang-Xing</subfield><subfield code="4">aut</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">Enthalten in</subfield><subfield code="t">Journal of materials science / Materials in electronics</subfield><subfield code="d">Springer US, 1990</subfield><subfield code="g">28(2017), 8 vom: 06. Jan., Seite 6093-6098</subfield><subfield code="w">(DE-627)130863289</subfield><subfield code="w">(DE-600)1030929-9</subfield><subfield code="w">(DE-576)023106719</subfield><subfield code="x">0957-4522</subfield><subfield code="7">nnns</subfield></datafield><datafield tag="773" ind1="1" ind2="8"><subfield code="g">volume:28</subfield><subfield code="g">year:2017</subfield><subfield code="g">number:8</subfield><subfield code="g">day:06</subfield><subfield code="g">month:01</subfield><subfield code="g">pages:6093-6098</subfield></datafield><datafield tag="856" ind1="4" ind2="1"><subfield code="u">https://doi.org/10.1007/s10854-016-6286-3</subfield><subfield code="z">lizenzpflichtig</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_USEFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SYSFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_OLC</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-TEC</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-PHY</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-PHA</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-DE-84</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_30</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_70</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2004</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2015</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4046</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4323</subfield></datafield><datafield tag="951" ind1=" " ind2=" "><subfield code="a">AR</subfield></datafield><datafield tag="952" ind1=" " ind2=" "><subfield code="d">28</subfield><subfield code="j">2017</subfield><subfield code="e">8</subfield><subfield code="b">06</subfield><subfield code="c">01</subfield><subfield code="h">6093-6098</subfield></datafield></record></collection>
|
author |
Gong, Li |
spellingShingle |
Gong, Li ddc 600 misc Residual Stress misc Transparent Conductive Film misc Chemical Spray Pyrolysis misc Transparent Conductive Oxide Material misc Transparent Conductive Oxide Thin Film Room-temperature deposition of flexible transparent conductive Ga-doped ZnO thin films by magnetron sputtering on polymer substrates |
authorStr |
Gong, Li |
ppnlink_with_tag_str_mv |
@@773@@(DE-627)130863289 |
format |
Article |
dewey-ones |
600 - Technology 670 - Manufacturing 620 - Engineering & allied operations |
delete_txt_mv |
keep |
author_role |
aut aut aut aut |
collection |
OLC |
remote_str |
false |
illustrated |
Not Illustrated |
issn |
0957-4522 |
topic_title |
600 670 620 VZ Room-temperature deposition of flexible transparent conductive Ga-doped ZnO thin films by magnetron sputtering on polymer substrates Residual Stress Transparent Conductive Film Chemical Spray Pyrolysis Transparent Conductive Oxide Material Transparent Conductive Oxide Thin Film |
topic |
ddc 600 misc Residual Stress misc Transparent Conductive Film misc Chemical Spray Pyrolysis misc Transparent Conductive Oxide Material misc Transparent Conductive Oxide Thin Film |
topic_unstemmed |
ddc 600 misc Residual Stress misc Transparent Conductive Film misc Chemical Spray Pyrolysis misc Transparent Conductive Oxide Material misc Transparent Conductive Oxide Thin Film |
topic_browse |
ddc 600 misc Residual Stress misc Transparent Conductive Film misc Chemical Spray Pyrolysis misc Transparent Conductive Oxide Material misc Transparent Conductive Oxide Thin Film |
format_facet |
Aufsätze Gedruckte Aufsätze |
format_main_str_mv |
Text Zeitschrift/Artikel |
carriertype_str_mv |
nc |
hierarchy_parent_title |
Journal of materials science / Materials in electronics |
hierarchy_parent_id |
130863289 |
dewey-tens |
600 - Technology 670 - Manufacturing 620 - Engineering |
hierarchy_top_title |
Journal of materials science / Materials in electronics |
isfreeaccess_txt |
false |
familylinks_str_mv |
(DE-627)130863289 (DE-600)1030929-9 (DE-576)023106719 |
title |
Room-temperature deposition of flexible transparent conductive Ga-doped ZnO thin films by magnetron sputtering on polymer substrates |
ctrlnum |
(DE-627)OLC2026320705 (DE-He213)s10854-016-6286-3-p |
title_full |
Room-temperature deposition of flexible transparent conductive Ga-doped ZnO thin films by magnetron sputtering on polymer substrates |
author_sort |
Gong, Li |
journal |
Journal of materials science / Materials in electronics |
journalStr |
Journal of materials science / Materials in electronics |
lang_code |
eng |
isOA_bool |
false |
dewey-hundreds |
600 - Technology |
recordtype |
marc |
publishDateSort |
2017 |
contenttype_str_mv |
txt |
container_start_page |
6093 |
author_browse |
Gong, Li Liu, Yun-Zhen Liu, Fang-Yang Jiang, Liang-Xing |
container_volume |
28 |
class |
600 670 620 VZ |
format_se |
Aufsätze |
author-letter |
Gong, Li |
doi_str_mv |
10.1007/s10854-016-6286-3 |
dewey-full |
600 670 620 |
title_sort |
room-temperature deposition of flexible transparent conductive ga-doped zno thin films by magnetron sputtering on polymer substrates |
title_auth |
Room-temperature deposition of flexible transparent conductive Ga-doped ZnO thin films by magnetron sputtering on polymer substrates |
abstract |
Abstract Flexible Ga doped ZnO transparent conductive films were prepared on polymer substrates at room temperature by RF magnetron sputtering. The effect of the Ar flow rate is more important than that of r.f. power and sputtering pressure. The dependence of the structural, electrical, optical and adhesive properties of flexible Ga doped ZnO transparent conductive thin films on the Ar flow rate was investigated for the first time. When the Ar flow rate is 40 sccm, the residual stress is changed from compressive stress to tensile stress, indicating the crystallinity of the film is best. And the lowest square resistance of 7.9 Ω/sq. is obtained at the Ar flow rate of 40 sccm. Regardless of the Ar flow rate, the optical transmittance in the visible light of all the films is about 90%. The best adhesive behavior is obtained at the Ar flow rate of 40 sccm. © Springer Science+Business Media New York 2017 |
abstractGer |
Abstract Flexible Ga doped ZnO transparent conductive films were prepared on polymer substrates at room temperature by RF magnetron sputtering. The effect of the Ar flow rate is more important than that of r.f. power and sputtering pressure. The dependence of the structural, electrical, optical and adhesive properties of flexible Ga doped ZnO transparent conductive thin films on the Ar flow rate was investigated for the first time. When the Ar flow rate is 40 sccm, the residual stress is changed from compressive stress to tensile stress, indicating the crystallinity of the film is best. And the lowest square resistance of 7.9 Ω/sq. is obtained at the Ar flow rate of 40 sccm. Regardless of the Ar flow rate, the optical transmittance in the visible light of all the films is about 90%. The best adhesive behavior is obtained at the Ar flow rate of 40 sccm. © Springer Science+Business Media New York 2017 |
abstract_unstemmed |
Abstract Flexible Ga doped ZnO transparent conductive films were prepared on polymer substrates at room temperature by RF magnetron sputtering. The effect of the Ar flow rate is more important than that of r.f. power and sputtering pressure. The dependence of the structural, electrical, optical and adhesive properties of flexible Ga doped ZnO transparent conductive thin films on the Ar flow rate was investigated for the first time. When the Ar flow rate is 40 sccm, the residual stress is changed from compressive stress to tensile stress, indicating the crystallinity of the film is best. And the lowest square resistance of 7.9 Ω/sq. is obtained at the Ar flow rate of 40 sccm. Regardless of the Ar flow rate, the optical transmittance in the visible light of all the films is about 90%. The best adhesive behavior is obtained at the Ar flow rate of 40 sccm. © Springer Science+Business Media New York 2017 |
collection_details |
GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_30 GBV_ILN_70 GBV_ILN_2004 GBV_ILN_2015 GBV_ILN_4046 GBV_ILN_4323 |
container_issue |
8 |
title_short |
Room-temperature deposition of flexible transparent conductive Ga-doped ZnO thin films by magnetron sputtering on polymer substrates |
url |
https://doi.org/10.1007/s10854-016-6286-3 |
remote_bool |
false |
author2 |
Liu, Yun-Zhen Liu, Fang-Yang Jiang, Liang-Xing |
author2Str |
Liu, Yun-Zhen Liu, Fang-Yang Jiang, Liang-Xing |
ppnlink |
130863289 |
mediatype_str_mv |
n |
isOA_txt |
false |
hochschulschrift_bool |
false |
doi_str |
10.1007/s10854-016-6286-3 |
up_date |
2024-07-04T03:40:41.354Z |
_version_ |
1803618291659309056 |
fullrecord_marcxml |
<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000caa a22002652 4500</leader><controlfield tag="001">OLC2026320705</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20230518115741.0</controlfield><controlfield tag="007">tu</controlfield><controlfield tag="008">200820s2017 xx ||||| 00| ||eng c</controlfield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1007/s10854-016-6286-3</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)OLC2026320705</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-He213)s10854-016-6286-3-p</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1=" " ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">600</subfield><subfield code="a">670</subfield><subfield code="a">620</subfield><subfield code="q">VZ</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Gong, Li</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Room-temperature deposition of flexible transparent conductive Ga-doped ZnO thin films by magnetron sputtering on polymer substrates</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">2017</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">Text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">ohne Hilfsmittel zu benutzen</subfield><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">Band</subfield><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">© Springer Science+Business Media New York 2017</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Abstract Flexible Ga doped ZnO transparent conductive films were prepared on polymer substrates at room temperature by RF magnetron sputtering. The effect of the Ar flow rate is more important than that of r.f. power and sputtering pressure. The dependence of the structural, electrical, optical and adhesive properties of flexible Ga doped ZnO transparent conductive thin films on the Ar flow rate was investigated for the first time. When the Ar flow rate is 40 sccm, the residual stress is changed from compressive stress to tensile stress, indicating the crystallinity of the film is best. And the lowest square resistance of 7.9 Ω/sq. is obtained at the Ar flow rate of 40 sccm. Regardless of the Ar flow rate, the optical transmittance in the visible light of all the films is about 90%. The best adhesive behavior is obtained at the Ar flow rate of 40 sccm.</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Residual Stress</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Transparent Conductive Film</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Chemical Spray Pyrolysis</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Transparent Conductive Oxide Material</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Transparent Conductive Oxide Thin Film</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Liu, Yun-Zhen</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Liu, Fang-Yang</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Jiang, Liang-Xing</subfield><subfield code="4">aut</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">Enthalten in</subfield><subfield code="t">Journal of materials science / Materials in electronics</subfield><subfield code="d">Springer US, 1990</subfield><subfield code="g">28(2017), 8 vom: 06. Jan., Seite 6093-6098</subfield><subfield code="w">(DE-627)130863289</subfield><subfield code="w">(DE-600)1030929-9</subfield><subfield code="w">(DE-576)023106719</subfield><subfield code="x">0957-4522</subfield><subfield code="7">nnns</subfield></datafield><datafield tag="773" ind1="1" ind2="8"><subfield code="g">volume:28</subfield><subfield code="g">year:2017</subfield><subfield code="g">number:8</subfield><subfield code="g">day:06</subfield><subfield code="g">month:01</subfield><subfield code="g">pages:6093-6098</subfield></datafield><datafield tag="856" ind1="4" ind2="1"><subfield code="u">https://doi.org/10.1007/s10854-016-6286-3</subfield><subfield code="z">lizenzpflichtig</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_USEFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SYSFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_OLC</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-TEC</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-PHY</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-PHA</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-DE-84</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_30</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_70</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2004</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2015</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4046</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4323</subfield></datafield><datafield tag="951" ind1=" " ind2=" "><subfield code="a">AR</subfield></datafield><datafield tag="952" ind1=" " ind2=" "><subfield code="d">28</subfield><subfield code="j">2017</subfield><subfield code="e">8</subfield><subfield code="b">06</subfield><subfield code="c">01</subfield><subfield code="h">6093-6098</subfield></datafield></record></collection>
|
score |
7.4018927 |