Adatom diffusion along and down island steps
Abstract During thin film deposition, an adatom diffuses on a flat island, down the island, or along edges of the island. Away from the flat region, the adatom generally experiences an extra migration energy – the Schwoebel-Ehrlich (ES) barrier as it has been referred as. Recently, we have proposed...
Ausführliche Beschreibung
Autor*in: |
Huang, Hanchen [verfasserIn] |
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Format: |
Artikel |
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Sprache: |
Englisch |
Erschienen: |
2002 |
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Schlagwörter: |
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Anmerkung: |
© Kluwer Academic Publishers 2002 |
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Übergeordnetes Werk: |
Enthalten in: Journal of computer-aided materials design - Kluwer Academic Publishers, 1993, 9(2002), 1 vom: Jan., Seite 75-80 |
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Übergeordnetes Werk: |
volume:9 ; year:2002 ; number:1 ; month:01 ; pages:75-80 |
Links: |
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DOI / URN: |
10.1023/A:1023243920865 |
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Katalog-ID: |
OLC2034720180 |
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10.1023/A:1023243920865 doi (DE-627)OLC2034720180 (DE-He213)A:1023243920865-p DE-627 ger DE-627 rakwb eng 004 VZ Huang, Hanchen verfasserin aut Adatom diffusion along and down island steps 2002 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © Kluwer Academic Publishers 2002 Abstract During thin film deposition, an adatom diffuses on a flat island, down the island, or along edges of the island. Away from the flat region, the adatom generally experiences an extra migration energy – the Schwoebel-Ehrlich (ES) barrier as it has been referred as. Recently, we have proposed the concept of three-dimensional (3D) ES barrier – the facet-facet diffusion barrier. In this Letter, we propose another new concept – the step-facet barrier, with an emphasis on diffusion along the step edge. Based on these two new developments, we generalize the model of diffusion barriers near edges of islands, by classifying them as horizontal or vertical, and one to three dimensions. Migration Thin Film Diffusion Barrier Film Deposition Step Edge Enthalten in Journal of computer-aided materials design Kluwer Academic Publishers, 1993 9(2002), 1 vom: Jan., Seite 75-80 (DE-627)192061305 (DE-600)1306273-6 (DE-576)078706963 0928-1045 nnns volume:9 year:2002 number:1 month:01 pages:75-80 https://doi.org/10.1023/A:1023243920865 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY SSG-OLC-CHE SSG-OLC-MAT SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_70 AR 9 2002 1 01 75-80 |
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10.1023/A:1023243920865 doi (DE-627)OLC2034720180 (DE-He213)A:1023243920865-p DE-627 ger DE-627 rakwb eng 004 VZ Huang, Hanchen verfasserin aut Adatom diffusion along and down island steps 2002 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © Kluwer Academic Publishers 2002 Abstract During thin film deposition, an adatom diffuses on a flat island, down the island, or along edges of the island. Away from the flat region, the adatom generally experiences an extra migration energy – the Schwoebel-Ehrlich (ES) barrier as it has been referred as. Recently, we have proposed the concept of three-dimensional (3D) ES barrier – the facet-facet diffusion barrier. In this Letter, we propose another new concept – the step-facet barrier, with an emphasis on diffusion along the step edge. Based on these two new developments, we generalize the model of diffusion barriers near edges of islands, by classifying them as horizontal or vertical, and one to three dimensions. Migration Thin Film Diffusion Barrier Film Deposition Step Edge Enthalten in Journal of computer-aided materials design Kluwer Academic Publishers, 1993 9(2002), 1 vom: Jan., Seite 75-80 (DE-627)192061305 (DE-600)1306273-6 (DE-576)078706963 0928-1045 nnns volume:9 year:2002 number:1 month:01 pages:75-80 https://doi.org/10.1023/A:1023243920865 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY SSG-OLC-CHE SSG-OLC-MAT SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_70 AR 9 2002 1 01 75-80 |
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10.1023/A:1023243920865 doi (DE-627)OLC2034720180 (DE-He213)A:1023243920865-p DE-627 ger DE-627 rakwb eng 004 VZ Huang, Hanchen verfasserin aut Adatom diffusion along and down island steps 2002 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © Kluwer Academic Publishers 2002 Abstract During thin film deposition, an adatom diffuses on a flat island, down the island, or along edges of the island. Away from the flat region, the adatom generally experiences an extra migration energy – the Schwoebel-Ehrlich (ES) barrier as it has been referred as. Recently, we have proposed the concept of three-dimensional (3D) ES barrier – the facet-facet diffusion barrier. In this Letter, we propose another new concept – the step-facet barrier, with an emphasis on diffusion along the step edge. Based on these two new developments, we generalize the model of diffusion barriers near edges of islands, by classifying them as horizontal or vertical, and one to three dimensions. Migration Thin Film Diffusion Barrier Film Deposition Step Edge Enthalten in Journal of computer-aided materials design Kluwer Academic Publishers, 1993 9(2002), 1 vom: Jan., Seite 75-80 (DE-627)192061305 (DE-600)1306273-6 (DE-576)078706963 0928-1045 nnns volume:9 year:2002 number:1 month:01 pages:75-80 https://doi.org/10.1023/A:1023243920865 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY SSG-OLC-CHE SSG-OLC-MAT SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_70 AR 9 2002 1 01 75-80 |
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10.1023/A:1023243920865 doi (DE-627)OLC2034720180 (DE-He213)A:1023243920865-p DE-627 ger DE-627 rakwb eng 004 VZ Huang, Hanchen verfasserin aut Adatom diffusion along and down island steps 2002 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © Kluwer Academic Publishers 2002 Abstract During thin film deposition, an adatom diffuses on a flat island, down the island, or along edges of the island. Away from the flat region, the adatom generally experiences an extra migration energy – the Schwoebel-Ehrlich (ES) barrier as it has been referred as. Recently, we have proposed the concept of three-dimensional (3D) ES barrier – the facet-facet diffusion barrier. In this Letter, we propose another new concept – the step-facet barrier, with an emphasis on diffusion along the step edge. Based on these two new developments, we generalize the model of diffusion barriers near edges of islands, by classifying them as horizontal or vertical, and one to three dimensions. Migration Thin Film Diffusion Barrier Film Deposition Step Edge Enthalten in Journal of computer-aided materials design Kluwer Academic Publishers, 1993 9(2002), 1 vom: Jan., Seite 75-80 (DE-627)192061305 (DE-600)1306273-6 (DE-576)078706963 0928-1045 nnns volume:9 year:2002 number:1 month:01 pages:75-80 https://doi.org/10.1023/A:1023243920865 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY SSG-OLC-CHE SSG-OLC-MAT SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_70 AR 9 2002 1 01 75-80 |
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Abstract During thin film deposition, an adatom diffuses on a flat island, down the island, or along edges of the island. Away from the flat region, the adatom generally experiences an extra migration energy – the Schwoebel-Ehrlich (ES) barrier as it has been referred as. Recently, we have proposed the concept of three-dimensional (3D) ES barrier – the facet-facet diffusion barrier. In this Letter, we propose another new concept – the step-facet barrier, with an emphasis on diffusion along the step edge. Based on these two new developments, we generalize the model of diffusion barriers near edges of islands, by classifying them as horizontal or vertical, and one to three dimensions. © Kluwer Academic Publishers 2002 |
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Abstract During thin film deposition, an adatom diffuses on a flat island, down the island, or along edges of the island. Away from the flat region, the adatom generally experiences an extra migration energy – the Schwoebel-Ehrlich (ES) barrier as it has been referred as. Recently, we have proposed the concept of three-dimensional (3D) ES barrier – the facet-facet diffusion barrier. In this Letter, we propose another new concept – the step-facet barrier, with an emphasis on diffusion along the step edge. Based on these two new developments, we generalize the model of diffusion barriers near edges of islands, by classifying them as horizontal or vertical, and one to three dimensions. © Kluwer Academic Publishers 2002 |
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Abstract During thin film deposition, an adatom diffuses on a flat island, down the island, or along edges of the island. Away from the flat region, the adatom generally experiences an extra migration energy – the Schwoebel-Ehrlich (ES) barrier as it has been referred as. Recently, we have proposed the concept of three-dimensional (3D) ES barrier – the facet-facet diffusion barrier. In this Letter, we propose another new concept – the step-facet barrier, with an emphasis on diffusion along the step edge. Based on these two new developments, we generalize the model of diffusion barriers near edges of islands, by classifying them as horizontal or vertical, and one to three dimensions. © Kluwer Academic Publishers 2002 |
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Away from the flat region, the adatom generally experiences an extra migration energy – the Schwoebel-Ehrlich (ES) barrier as it has been referred as. Recently, we have proposed the concept of three-dimensional (3D) ES barrier – the facet-facet diffusion barrier. In this Letter, we propose another new concept – the step-facet barrier, with an emphasis on diffusion along the step edge. Based on these two new developments, we generalize the model of diffusion barriers near edges of islands, by classifying them as horizontal or vertical, and one to three dimensions.</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Migration</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Thin Film</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Diffusion Barrier</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Film Deposition</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Step Edge</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">Enthalten in</subfield><subfield code="t">Journal of computer-aided materials design</subfield><subfield code="d">Kluwer Academic Publishers, 1993</subfield><subfield code="g">9(2002), 1 vom: Jan., Seite 75-80</subfield><subfield code="w">(DE-627)192061305</subfield><subfield code="w">(DE-600)1306273-6</subfield><subfield code="w">(DE-576)078706963</subfield><subfield code="x">0928-1045</subfield><subfield code="7">nnns</subfield></datafield><datafield tag="773" ind1="1" ind2="8"><subfield code="g">volume:9</subfield><subfield code="g">year:2002</subfield><subfield code="g">number:1</subfield><subfield code="g">month:01</subfield><subfield code="g">pages:75-80</subfield></datafield><datafield tag="856" ind1="4" ind2="1"><subfield code="u">https://doi.org/10.1023/A:1023243920865</subfield><subfield code="z">lizenzpflichtig</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_USEFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SYSFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_OLC</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-PHY</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-CHE</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-MAT</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-PHA</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-DE-84</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_70</subfield></datafield><datafield tag="951" ind1=" " ind2=" "><subfield code="a">AR</subfield></datafield><datafield tag="952" ind1=" " ind2=" "><subfield code="d">9</subfield><subfield code="j">2002</subfield><subfield code="e">1</subfield><subfield code="c">01</subfield><subfield code="h">75-80</subfield></datafield></record></collection>
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