Anomalous 4He Adsorption to in situ Baked $ C_{60} $
Abstract We present data for4He adsorption to thermally evaporated C60films for 1.30 K < T < 2.17 K. This work minimizes possible effects due to the presence of adsorbed species other than4He. We observe an anomalous mass adsorption to the C60films close to4He saturation which amounts to 3 tim...
Ausführliche Beschreibung
Gespeichert in:
| Autor*in: |
Teizer, W. [verfasserIn] |
|---|
| Format: |
Artikel |
|---|---|
| Sprache: |
Englisch |
| Erschienen: |
1998 |
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| Schlagwörter: |
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| Anmerkung: |
© Plenum Publishing Corporation 1998 |
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| Übergeordnetes Werk: |
Enthalten in: Journal of low temperature physics - Kluwer Academic Publishers-Plenum Publishers, 1969, 113(1998), 3-4 vom: Nov., Seite 453-458 |
|---|---|
| Übergeordnetes Werk: |
volume:113 ; year:1998 ; number:3-4 ; month:11 ; pages:453-458 |
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| DOI / URN: |
10.1023/A:1022552112223 |
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OLC2036782795 |
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| 520 | |a Abstract We present data for4He adsorption to thermally evaporated C60films for 1.30 K < T < 2.17 K. This work minimizes possible effects due to the presence of adsorbed species other than4He. We observe an anomalous mass adsorption to the C60films close to4He saturation which amounts to 3 times the expected mass loading due to the saturated4He film on the C60surface at T = 1.30K. | ||
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10.1023/A:1022552112223 doi (DE-627)OLC2036782795 (DE-He213)A:1022552112223-p DE-627 ger DE-627 rakwb eng 530 VZ Teizer, W. verfasserin aut Anomalous 4He Adsorption to in situ Baked $ C_{60} $ 1998 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © Plenum Publishing Corporation 1998 Abstract We present data for4He adsorption to thermally evaporated C60films for 1.30 K < T < 2.17 K. This work minimizes possible effects due to the presence of adsorbed species other than4He. We observe an anomalous mass adsorption to the C60films close to4He saturation which amounts to 3 times the expected mass loading due to the saturated4He film on the C60surface at T = 1.30K. Magnetic Material Adsorbed Species Mass Loading Mass Adsorption Anomalous Mass Hallock, R. B. aut Hudspeth, Q. M. aut Hebard, A. F. aut Enthalten in Journal of low temperature physics Kluwer Academic Publishers-Plenum Publishers, 1969 113(1998), 3-4 vom: Nov., Seite 453-458 (DE-627)129546267 (DE-600)218311-0 (DE-576)014996642 0022-2291 nnns volume:113 year:1998 number:3-4 month:11 pages:453-458 https://doi.org/10.1023/A:1022552112223 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_32 GBV_ILN_40 GBV_ILN_70 GBV_ILN_170 GBV_ILN_2185 GBV_ILN_4082 GBV_ILN_4126 GBV_ILN_4306 GBV_ILN_4323 GBV_ILN_4700 AR 113 1998 3-4 11 453-458 |
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10.1023/A:1022552112223 doi (DE-627)OLC2036782795 (DE-He213)A:1022552112223-p DE-627 ger DE-627 rakwb eng 530 VZ Teizer, W. verfasserin aut Anomalous 4He Adsorption to in situ Baked $ C_{60} $ 1998 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © Plenum Publishing Corporation 1998 Abstract We present data for4He adsorption to thermally evaporated C60films for 1.30 K < T < 2.17 K. This work minimizes possible effects due to the presence of adsorbed species other than4He. We observe an anomalous mass adsorption to the C60films close to4He saturation which amounts to 3 times the expected mass loading due to the saturated4He film on the C60surface at T = 1.30K. Magnetic Material Adsorbed Species Mass Loading Mass Adsorption Anomalous Mass Hallock, R. B. aut Hudspeth, Q. M. aut Hebard, A. F. aut Enthalten in Journal of low temperature physics Kluwer Academic Publishers-Plenum Publishers, 1969 113(1998), 3-4 vom: Nov., Seite 453-458 (DE-627)129546267 (DE-600)218311-0 (DE-576)014996642 0022-2291 nnns volume:113 year:1998 number:3-4 month:11 pages:453-458 https://doi.org/10.1023/A:1022552112223 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_32 GBV_ILN_40 GBV_ILN_70 GBV_ILN_170 GBV_ILN_2185 GBV_ILN_4082 GBV_ILN_4126 GBV_ILN_4306 GBV_ILN_4323 GBV_ILN_4700 AR 113 1998 3-4 11 453-458 |
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10.1023/A:1022552112223 doi (DE-627)OLC2036782795 (DE-He213)A:1022552112223-p DE-627 ger DE-627 rakwb eng 530 VZ Teizer, W. verfasserin aut Anomalous 4He Adsorption to in situ Baked $ C_{60} $ 1998 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © Plenum Publishing Corporation 1998 Abstract We present data for4He adsorption to thermally evaporated C60films for 1.30 K < T < 2.17 K. This work minimizes possible effects due to the presence of adsorbed species other than4He. We observe an anomalous mass adsorption to the C60films close to4He saturation which amounts to 3 times the expected mass loading due to the saturated4He film on the C60surface at T = 1.30K. Magnetic Material Adsorbed Species Mass Loading Mass Adsorption Anomalous Mass Hallock, R. B. aut Hudspeth, Q. M. aut Hebard, A. F. aut Enthalten in Journal of low temperature physics Kluwer Academic Publishers-Plenum Publishers, 1969 113(1998), 3-4 vom: Nov., Seite 453-458 (DE-627)129546267 (DE-600)218311-0 (DE-576)014996642 0022-2291 nnns volume:113 year:1998 number:3-4 month:11 pages:453-458 https://doi.org/10.1023/A:1022552112223 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_32 GBV_ILN_40 GBV_ILN_70 GBV_ILN_170 GBV_ILN_2185 GBV_ILN_4082 GBV_ILN_4126 GBV_ILN_4306 GBV_ILN_4323 GBV_ILN_4700 AR 113 1998 3-4 11 453-458 |
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10.1023/A:1022552112223 doi (DE-627)OLC2036782795 (DE-He213)A:1022552112223-p DE-627 ger DE-627 rakwb eng 530 VZ Teizer, W. verfasserin aut Anomalous 4He Adsorption to in situ Baked $ C_{60} $ 1998 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © Plenum Publishing Corporation 1998 Abstract We present data for4He adsorption to thermally evaporated C60films for 1.30 K < T < 2.17 K. This work minimizes possible effects due to the presence of adsorbed species other than4He. We observe an anomalous mass adsorption to the C60films close to4He saturation which amounts to 3 times the expected mass loading due to the saturated4He film on the C60surface at T = 1.30K. Magnetic Material Adsorbed Species Mass Loading Mass Adsorption Anomalous Mass Hallock, R. B. aut Hudspeth, Q. M. aut Hebard, A. F. aut Enthalten in Journal of low temperature physics Kluwer Academic Publishers-Plenum Publishers, 1969 113(1998), 3-4 vom: Nov., Seite 453-458 (DE-627)129546267 (DE-600)218311-0 (DE-576)014996642 0022-2291 nnns volume:113 year:1998 number:3-4 month:11 pages:453-458 https://doi.org/10.1023/A:1022552112223 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_32 GBV_ILN_40 GBV_ILN_70 GBV_ILN_170 GBV_ILN_2185 GBV_ILN_4082 GBV_ILN_4126 GBV_ILN_4306 GBV_ILN_4323 GBV_ILN_4700 AR 113 1998 3-4 11 453-458 |
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10.1023/A:1022552112223 doi (DE-627)OLC2036782795 (DE-He213)A:1022552112223-p DE-627 ger DE-627 rakwb eng 530 VZ Teizer, W. verfasserin aut Anomalous 4He Adsorption to in situ Baked $ C_{60} $ 1998 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © Plenum Publishing Corporation 1998 Abstract We present data for4He adsorption to thermally evaporated C60films for 1.30 K < T < 2.17 K. This work minimizes possible effects due to the presence of adsorbed species other than4He. We observe an anomalous mass adsorption to the C60films close to4He saturation which amounts to 3 times the expected mass loading due to the saturated4He film on the C60surface at T = 1.30K. Magnetic Material Adsorbed Species Mass Loading Mass Adsorption Anomalous Mass Hallock, R. B. aut Hudspeth, Q. M. aut Hebard, A. F. aut Enthalten in Journal of low temperature physics Kluwer Academic Publishers-Plenum Publishers, 1969 113(1998), 3-4 vom: Nov., Seite 453-458 (DE-627)129546267 (DE-600)218311-0 (DE-576)014996642 0022-2291 nnns volume:113 year:1998 number:3-4 month:11 pages:453-458 https://doi.org/10.1023/A:1022552112223 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_32 GBV_ILN_40 GBV_ILN_70 GBV_ILN_170 GBV_ILN_2185 GBV_ILN_4082 GBV_ILN_4126 GBV_ILN_4306 GBV_ILN_4323 GBV_ILN_4700 AR 113 1998 3-4 11 453-458 |
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Abstract We present data for4He adsorption to thermally evaporated C60films for 1.30 K < T < 2.17 K. This work minimizes possible effects due to the presence of adsorbed species other than4He. We observe an anomalous mass adsorption to the C60films close to4He saturation which amounts to 3 times the expected mass loading due to the saturated4He film on the C60surface at T = 1.30K. © Plenum Publishing Corporation 1998 |
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Abstract We present data for4He adsorption to thermally evaporated C60films for 1.30 K < T < 2.17 K. This work minimizes possible effects due to the presence of adsorbed species other than4He. We observe an anomalous mass adsorption to the C60films close to4He saturation which amounts to 3 times the expected mass loading due to the saturated4He film on the C60surface at T = 1.30K. © Plenum Publishing Corporation 1998 |
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Abstract We present data for4He adsorption to thermally evaporated C60films for 1.30 K < T < 2.17 K. This work minimizes possible effects due to the presence of adsorbed species other than4He. We observe an anomalous mass adsorption to the C60films close to4He saturation which amounts to 3 times the expected mass loading due to the saturated4He film on the C60surface at T = 1.30K. © Plenum Publishing Corporation 1998 |
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Hallock, R. B. Hudspeth, Q. M. Hebard, A. F. |
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10.1023/A:1022552112223 |
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2024-07-04T04:10:39.944Z |
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