Measurements of Deflection and Residual Stress in Thin Films Utilizing Coherent Light Reflection/Projection Moiré Interferometry
Abstract Thin film technology is an area of great importance in current applications of opto-electronics, electronics, MEMS and computer technology. A critical issue in thin film technology is residual stresses that arise when the coating is deposited onto a substrate. Residual stresses can be very...
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| Autor*in: |
Sciammarella, C. A. [verfasserIn] |
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| Format: |
Artikel |
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| Sprache: |
Englisch |
| Erschienen: |
2013 |
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| Schlagwörter: |
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| Anmerkung: |
© Society for Experimental Mechanics 2013 |
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| Übergeordnetes Werk: |
Enthalten in: Experimental mechanics - Springer US, 1961, 53(2013), 6 vom: 11. Jan., Seite 977-987 |
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| Übergeordnetes Werk: |
volume:53 ; year:2013 ; number:6 ; day:11 ; month:01 ; pages:977-987 |
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| DOI / URN: |
10.1007/s11340-012-9699-9 |
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| 520 | |a Abstract Thin film technology is an area of great importance in current applications of opto-electronics, electronics, MEMS and computer technology. A critical issue in thin film technology is residual stresses that arise when the coating is deposited onto a substrate. Residual stresses can be very large in magnitude and have detrimental effects on the role that the thin film must play. To save development time on coating deposition processes it is important to perform accurate residual stresses measurements in situ in real time where the deposition is made. A novel optical set up is developed in this study to measure deflections and residual stresses generated in coated specimens that can be applied directly in the reactor utilized in the deposition process. Experimental results are in good agreement with other measurements carried out independently and other data reported in literature for thin films like those tested in the experiments. | ||
| 650 | 4 | |a Residual stresses | |
| 650 | 4 | |a Thin films | |
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| 700 | 1 | |a Lamberti, L. |4 aut | |
| 700 | 1 | |a Pappalettere, C. |4 aut | |
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| 700 | 1 | |a Signore, M. A. |4 aut | |
| 700 | 1 | |a Valerini, D. |4 aut | |
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10.1007/s11340-012-9699-9 doi (DE-627)OLC2058180259 (DE-He213)s11340-012-9699-9-p DE-627 ger DE-627 rakwb eng 690 VZ Sciammarella, C. A. verfasserin aut Measurements of Deflection and Residual Stress in Thin Films Utilizing Coherent Light Reflection/Projection Moiré Interferometry 2013 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © Society for Experimental Mechanics 2013 Abstract Thin film technology is an area of great importance in current applications of opto-electronics, electronics, MEMS and computer technology. A critical issue in thin film technology is residual stresses that arise when the coating is deposited onto a substrate. Residual stresses can be very large in magnitude and have detrimental effects on the role that the thin film must play. To save development time on coating deposition processes it is important to perform accurate residual stresses measurements in situ in real time where the deposition is made. A novel optical set up is developed in this study to measure deflections and residual stresses generated in coated specimens that can be applied directly in the reactor utilized in the deposition process. Experimental results are in good agreement with other measurements carried out independently and other data reported in literature for thin films like those tested in the experiments. Residual stresses Thin films Reflection moiré Projection moiré Boccaccio, A. aut Lamberti, L. aut Pappalettere, C. aut Rizzo, A. aut Signore, M. A. aut Valerini, D. aut Enthalten in Experimental mechanics Springer US, 1961 53(2013), 6 vom: 11. Jan., Seite 977-987 (DE-627)129593990 (DE-600)240480-1 (DE-576)015086852 0014-4851 nnns volume:53 year:2013 number:6 day:11 month:01 pages:977-987 https://doi.org/10.1007/s11340-012-9699-9 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-UMW SSG-OLC-ARC SSG-OLC-TEC SSG-OLC-PHY GBV_ILN_70 GBV_ILN_2057 GBV_ILN_4700 AR 53 2013 6 11 01 977-987 |
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10.1007/s11340-012-9699-9 doi (DE-627)OLC2058180259 (DE-He213)s11340-012-9699-9-p DE-627 ger DE-627 rakwb eng 690 VZ Sciammarella, C. A. verfasserin aut Measurements of Deflection and Residual Stress in Thin Films Utilizing Coherent Light Reflection/Projection Moiré Interferometry 2013 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © Society for Experimental Mechanics 2013 Abstract Thin film technology is an area of great importance in current applications of opto-electronics, electronics, MEMS and computer technology. A critical issue in thin film technology is residual stresses that arise when the coating is deposited onto a substrate. Residual stresses can be very large in magnitude and have detrimental effects on the role that the thin film must play. To save development time on coating deposition processes it is important to perform accurate residual stresses measurements in situ in real time where the deposition is made. A novel optical set up is developed in this study to measure deflections and residual stresses generated in coated specimens that can be applied directly in the reactor utilized in the deposition process. Experimental results are in good agreement with other measurements carried out independently and other data reported in literature for thin films like those tested in the experiments. Residual stresses Thin films Reflection moiré Projection moiré Boccaccio, A. aut Lamberti, L. aut Pappalettere, C. aut Rizzo, A. aut Signore, M. A. aut Valerini, D. aut Enthalten in Experimental mechanics Springer US, 1961 53(2013), 6 vom: 11. Jan., Seite 977-987 (DE-627)129593990 (DE-600)240480-1 (DE-576)015086852 0014-4851 nnns volume:53 year:2013 number:6 day:11 month:01 pages:977-987 https://doi.org/10.1007/s11340-012-9699-9 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-UMW SSG-OLC-ARC SSG-OLC-TEC SSG-OLC-PHY GBV_ILN_70 GBV_ILN_2057 GBV_ILN_4700 AR 53 2013 6 11 01 977-987 |
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measurements of deflection and residual stress in thin films utilizing coherent light reflection/projection moiré interferometry |
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Measurements of Deflection and Residual Stress in Thin Films Utilizing Coherent Light Reflection/Projection Moiré Interferometry |
| abstract |
Abstract Thin film technology is an area of great importance in current applications of opto-electronics, electronics, MEMS and computer technology. A critical issue in thin film technology is residual stresses that arise when the coating is deposited onto a substrate. Residual stresses can be very large in magnitude and have detrimental effects on the role that the thin film must play. To save development time on coating deposition processes it is important to perform accurate residual stresses measurements in situ in real time where the deposition is made. A novel optical set up is developed in this study to measure deflections and residual stresses generated in coated specimens that can be applied directly in the reactor utilized in the deposition process. Experimental results are in good agreement with other measurements carried out independently and other data reported in literature for thin films like those tested in the experiments. © Society for Experimental Mechanics 2013 |
| abstractGer |
Abstract Thin film technology is an area of great importance in current applications of opto-electronics, electronics, MEMS and computer technology. A critical issue in thin film technology is residual stresses that arise when the coating is deposited onto a substrate. Residual stresses can be very large in magnitude and have detrimental effects on the role that the thin film must play. To save development time on coating deposition processes it is important to perform accurate residual stresses measurements in situ in real time where the deposition is made. A novel optical set up is developed in this study to measure deflections and residual stresses generated in coated specimens that can be applied directly in the reactor utilized in the deposition process. Experimental results are in good agreement with other measurements carried out independently and other data reported in literature for thin films like those tested in the experiments. © Society for Experimental Mechanics 2013 |
| abstract_unstemmed |
Abstract Thin film technology is an area of great importance in current applications of opto-electronics, electronics, MEMS and computer technology. A critical issue in thin film technology is residual stresses that arise when the coating is deposited onto a substrate. Residual stresses can be very large in magnitude and have detrimental effects on the role that the thin film must play. To save development time on coating deposition processes it is important to perform accurate residual stresses measurements in situ in real time where the deposition is made. A novel optical set up is developed in this study to measure deflections and residual stresses generated in coated specimens that can be applied directly in the reactor utilized in the deposition process. Experimental results are in good agreement with other measurements carried out independently and other data reported in literature for thin films like those tested in the experiments. © Society for Experimental Mechanics 2013 |
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| container_issue |
6 |
| title_short |
Measurements of Deflection and Residual Stress in Thin Films Utilizing Coherent Light Reflection/Projection Moiré Interferometry |
| url |
https://doi.org/10.1007/s11340-012-9699-9 |
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| author2 |
Boccaccio, A. Lamberti, L. Pappalettere, C. Rizzo, A. Signore, M. A. Valerini, D. |
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Boccaccio, A. Lamberti, L. Pappalettere, C. Rizzo, A. Signore, M. A. Valerini, D. |
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129593990 |
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| doi_str |
10.1007/s11340-012-9699-9 |
| up_date |
2024-07-03T18:00:14.147Z |
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