Concentration profiles through thin oxide scales by ion-probe microanalysis
Abstract The ion microanalyzer has been used to measure concentration profiles through oxide scales formed on oxide dispersion-containing Ni-20 wt pct Cr alloys after high-temperature oxidation. These protective scales are sufficiently thin, generally less than 1.0 μm, to render examination by more...
Ausführliche Beschreibung
Gespeichert in:
| Autor*in: |
Wright, I. G. [verfasserIn] |
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| Format: |
Artikel |
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| Sprache: |
Englisch |
| Erschienen: |
1973 |
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| Schlagwörter: |
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| Anmerkung: |
© American Society for Metals, The Melallurgical Society of AIME 1973 |
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| Übergeordnetes Werk: |
Enthalten in: Metallurgical transactions. A, Physical metallurgy and materials science - Springer-Verlag, 1975, 4(1973), 2 vom: Feb., Seite 411-417 |
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| Übergeordnetes Werk: |
volume:4 ; year:1973 ; number:2 ; month:02 ; pages:411-417 |
| Links: |
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| DOI / URN: |
10.1007/BF02648692 |
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OLC205972578X |
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| 520 | |a Abstract The ion microanalyzer has been used to measure concentration profiles through oxide scales formed on oxide dispersion-containing Ni-20 wt pct Cr alloys after high-temperature oxidation. These protective scales are sufficiently thin, generally less than 1.0 μm, to render examination by more established techniques such as electron-probe microanalysis difficult and often fruitless. The operation of the technique is described and the results obtained are discussed. Although the analyses are not yet quantitative, the profiles obtained indicate that the dispersoid is incorporated throughout the whole thickness of the scales, and allow further insight into the mechanism of oxidation of these alloys. | ||
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10.1007/BF02648692 doi (DE-627)OLC205972578X (DE-He213)BF02648692-p DE-627 ger DE-627 rakwb eng 670 530 VZ Wright, I. G. verfasserin aut Concentration profiles through thin oxide scales by ion-probe microanalysis 1973 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © American Society for Metals, The Melallurgical Society of AIME 1973 Abstract The ion microanalyzer has been used to measure concentration profiles through oxide scales formed on oxide dispersion-containing Ni-20 wt pct Cr alloys after high-temperature oxidation. These protective scales are sufficiently thin, generally less than 1.0 μm, to render examination by more established techniques such as electron-probe microanalysis difficult and often fruitless. The operation of the technique is described and the results obtained are discussed. Although the analyses are not yet quantitative, the profiles obtained indicate that the dispersoid is incorporated throughout the whole thickness of the scales, and allow further insight into the mechanism of oxidation of these alloys. Metallurgical Transaction Oxide Scale Dark Field ThO2 Measure Concentration Profile Seltzer, M. S. aut Enthalten in Metallurgical transactions. A, Physical metallurgy and materials science Springer-Verlag, 1975 4(1973), 2 vom: Feb., Seite 411-417 (DE-627)129429058 (DE-600)192156-3 (DE-576)01480204X 0026-086X nnns volume:4 year:1973 number:2 month:02 pages:411-417 https://doi.org/10.1007/BF02648692 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY SSG-OLC-DE-84 AR 4 1973 2 02 411-417 |
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10.1007/BF02648692 doi (DE-627)OLC205972578X (DE-He213)BF02648692-p DE-627 ger DE-627 rakwb eng 670 530 VZ Wright, I. G. verfasserin aut Concentration profiles through thin oxide scales by ion-probe microanalysis 1973 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © American Society for Metals, The Melallurgical Society of AIME 1973 Abstract The ion microanalyzer has been used to measure concentration profiles through oxide scales formed on oxide dispersion-containing Ni-20 wt pct Cr alloys after high-temperature oxidation. These protective scales are sufficiently thin, generally less than 1.0 μm, to render examination by more established techniques such as electron-probe microanalysis difficult and often fruitless. The operation of the technique is described and the results obtained are discussed. Although the analyses are not yet quantitative, the profiles obtained indicate that the dispersoid is incorporated throughout the whole thickness of the scales, and allow further insight into the mechanism of oxidation of these alloys. Metallurgical Transaction Oxide Scale Dark Field ThO2 Measure Concentration Profile Seltzer, M. S. aut Enthalten in Metallurgical transactions. A, Physical metallurgy and materials science Springer-Verlag, 1975 4(1973), 2 vom: Feb., Seite 411-417 (DE-627)129429058 (DE-600)192156-3 (DE-576)01480204X 0026-086X nnns volume:4 year:1973 number:2 month:02 pages:411-417 https://doi.org/10.1007/BF02648692 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY SSG-OLC-DE-84 AR 4 1973 2 02 411-417 |
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10.1007/BF02648692 doi (DE-627)OLC205972578X (DE-He213)BF02648692-p DE-627 ger DE-627 rakwb eng 670 530 VZ Wright, I. G. verfasserin aut Concentration profiles through thin oxide scales by ion-probe microanalysis 1973 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © American Society for Metals, The Melallurgical Society of AIME 1973 Abstract The ion microanalyzer has been used to measure concentration profiles through oxide scales formed on oxide dispersion-containing Ni-20 wt pct Cr alloys after high-temperature oxidation. These protective scales are sufficiently thin, generally less than 1.0 μm, to render examination by more established techniques such as electron-probe microanalysis difficult and often fruitless. The operation of the technique is described and the results obtained are discussed. Although the analyses are not yet quantitative, the profiles obtained indicate that the dispersoid is incorporated throughout the whole thickness of the scales, and allow further insight into the mechanism of oxidation of these alloys. Metallurgical Transaction Oxide Scale Dark Field ThO2 Measure Concentration Profile Seltzer, M. S. aut Enthalten in Metallurgical transactions. A, Physical metallurgy and materials science Springer-Verlag, 1975 4(1973), 2 vom: Feb., Seite 411-417 (DE-627)129429058 (DE-600)192156-3 (DE-576)01480204X 0026-086X nnns volume:4 year:1973 number:2 month:02 pages:411-417 https://doi.org/10.1007/BF02648692 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY SSG-OLC-DE-84 AR 4 1973 2 02 411-417 |
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10.1007/BF02648692 doi (DE-627)OLC205972578X (DE-He213)BF02648692-p DE-627 ger DE-627 rakwb eng 670 530 VZ Wright, I. G. verfasserin aut Concentration profiles through thin oxide scales by ion-probe microanalysis 1973 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © American Society for Metals, The Melallurgical Society of AIME 1973 Abstract The ion microanalyzer has been used to measure concentration profiles through oxide scales formed on oxide dispersion-containing Ni-20 wt pct Cr alloys after high-temperature oxidation. These protective scales are sufficiently thin, generally less than 1.0 μm, to render examination by more established techniques such as electron-probe microanalysis difficult and often fruitless. The operation of the technique is described and the results obtained are discussed. Although the analyses are not yet quantitative, the profiles obtained indicate that the dispersoid is incorporated throughout the whole thickness of the scales, and allow further insight into the mechanism of oxidation of these alloys. Metallurgical Transaction Oxide Scale Dark Field ThO2 Measure Concentration Profile Seltzer, M. S. aut Enthalten in Metallurgical transactions. A, Physical metallurgy and materials science Springer-Verlag, 1975 4(1973), 2 vom: Feb., Seite 411-417 (DE-627)129429058 (DE-600)192156-3 (DE-576)01480204X 0026-086X nnns volume:4 year:1973 number:2 month:02 pages:411-417 https://doi.org/10.1007/BF02648692 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY SSG-OLC-DE-84 AR 4 1973 2 02 411-417 |
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Abstract The ion microanalyzer has been used to measure concentration profiles through oxide scales formed on oxide dispersion-containing Ni-20 wt pct Cr alloys after high-temperature oxidation. These protective scales are sufficiently thin, generally less than 1.0 μm, to render examination by more established techniques such as electron-probe microanalysis difficult and often fruitless. The operation of the technique is described and the results obtained are discussed. Although the analyses are not yet quantitative, the profiles obtained indicate that the dispersoid is incorporated throughout the whole thickness of the scales, and allow further insight into the mechanism of oxidation of these alloys. © American Society for Metals, The Melallurgical Society of AIME 1973 |
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Abstract The ion microanalyzer has been used to measure concentration profiles through oxide scales formed on oxide dispersion-containing Ni-20 wt pct Cr alloys after high-temperature oxidation. These protective scales are sufficiently thin, generally less than 1.0 μm, to render examination by more established techniques such as electron-probe microanalysis difficult and often fruitless. The operation of the technique is described and the results obtained are discussed. Although the analyses are not yet quantitative, the profiles obtained indicate that the dispersoid is incorporated throughout the whole thickness of the scales, and allow further insight into the mechanism of oxidation of these alloys. © American Society for Metals, The Melallurgical Society of AIME 1973 |
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Abstract The ion microanalyzer has been used to measure concentration profiles through oxide scales formed on oxide dispersion-containing Ni-20 wt pct Cr alloys after high-temperature oxidation. These protective scales are sufficiently thin, generally less than 1.0 μm, to render examination by more established techniques such as electron-probe microanalysis difficult and often fruitless. The operation of the technique is described and the results obtained are discussed. Although the analyses are not yet quantitative, the profiles obtained indicate that the dispersoid is incorporated throughout the whole thickness of the scales, and allow further insight into the mechanism of oxidation of these alloys. © American Society for Metals, The Melallurgical Society of AIME 1973 |
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G.</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Concentration profiles through thin oxide scales by ion-probe microanalysis</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">1973</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">Text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">ohne Hilfsmittel zu benutzen</subfield><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">Band</subfield><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">© American Society for Metals, The Melallurgical Society of AIME 1973</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Abstract The ion microanalyzer has been used to measure concentration profiles through oxide scales formed on oxide dispersion-containing Ni-20 wt pct Cr alloys after high-temperature oxidation. These protective scales are sufficiently thin, generally less than 1.0 μm, to render examination by more established techniques such as electron-probe microanalysis difficult and often fruitless. The operation of the technique is described and the results obtained are discussed. Although the analyses are not yet quantitative, the profiles obtained indicate that the dispersoid is incorporated throughout the whole thickness of the scales, and allow further insight into the mechanism of oxidation of these alloys.</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Metallurgical Transaction</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Oxide Scale</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Dark Field</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">ThO2</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Measure Concentration Profile</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Seltzer, M. S.</subfield><subfield code="4">aut</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">Enthalten in</subfield><subfield code="t">Metallurgical transactions. A, Physical metallurgy and materials science</subfield><subfield code="d">Springer-Verlag, 1975</subfield><subfield code="g">4(1973), 2 vom: Feb., Seite 411-417</subfield><subfield code="w">(DE-627)129429058</subfield><subfield code="w">(DE-600)192156-3</subfield><subfield code="w">(DE-576)01480204X</subfield><subfield code="x">0026-086X</subfield><subfield code="7">nnns</subfield></datafield><datafield tag="773" ind1="1" ind2="8"><subfield code="g">volume:4</subfield><subfield code="g">year:1973</subfield><subfield code="g">number:2</subfield><subfield code="g">month:02</subfield><subfield code="g">pages:411-417</subfield></datafield><datafield tag="856" ind1="4" ind2="1"><subfield code="u">https://doi.org/10.1007/BF02648692</subfield><subfield code="z">lizenzpflichtig</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_USEFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SYSFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_OLC</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-TEC</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-PHY</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-DE-84</subfield></datafield><datafield tag="951" ind1=" " ind2=" "><subfield code="a">AR</subfield></datafield><datafield tag="952" ind1=" " ind2=" "><subfield code="d">4</subfield><subfield code="j">1973</subfield><subfield code="e">2</subfield><subfield code="c">02</subfield><subfield code="h">411-417</subfield></datafield></record></collection>
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