Characteristics of Ceramic Coatings Made by Thin Film Low Pressure Plasma Spraying (LPPS-TF)
Abstract The thin film low pressure plasma spray process (LPPS-TF) has been developed with the aim of efficient depositing uniform and thin coatings with large area coverage by plasma spraying. At high power input (~150 kW) and very low pressure (~100 Pa) the plasma jet properties change considerabl...
Ausführliche Beschreibung
Gespeichert in:
| Autor*in: |
Hospach, Andreas [verfasserIn] |
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| Format: |
Artikel |
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| Sprache: |
Englisch |
| Erschienen: |
2012 |
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| Schlagwörter: |
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| Anmerkung: |
© ASM International 2012 |
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| Übergeordnetes Werk: |
Enthalten in: Journal of thermal spray technology - Springer US, 1992, 21(2012), 3-4 vom: 16. Feb., Seite 435-440 |
|---|---|
| Übergeordnetes Werk: |
volume:21 ; year:2012 ; number:3-4 ; day:16 ; month:02 ; pages:435-440 |
| Links: |
|---|
| DOI / URN: |
10.1007/s11666-012-9748-z |
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OLC2060560950 |
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| 520 | |a Abstract The thin film low pressure plasma spray process (LPPS-TF) has been developed with the aim of efficient depositing uniform and thin coatings with large area coverage by plasma spraying. At high power input (~150 kW) and very low pressure (~100 Pa) the plasma jet properties change considerably and it is even possible to evaporate the powder feedstock material providing advanced microstructures of the deposits. This relatively new technique bridges the gap between conventional plasma spraying and physical vapor deposition. In addition, the resulting microstructures are unique and can hardly be obtained by other processes. In this paper, microstructures made by LPPS-TF are shown and the columnar layer growth by vapor deposition is demonstrated. In addition to the ceramic materials $ TiO_{2} $, $ Al_{2} $$ O_{3} $ or $ MgAl_{2} $$ O_{4} $, the focus of the research was placed on partially yttria-stabilized zirconia. Variations of the microstructures are shown and discussed concerning potential coating applications. | ||
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10.1007/s11666-012-9748-z doi (DE-627)OLC2060560950 (DE-He213)s11666-012-9748-z-p DE-627 ger DE-627 rakwb eng 670 VZ Hospach, Andreas verfasserin aut Characteristics of Ceramic Coatings Made by Thin Film Low Pressure Plasma Spraying (LPPS-TF) 2012 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © ASM International 2012 Abstract The thin film low pressure plasma spray process (LPPS-TF) has been developed with the aim of efficient depositing uniform and thin coatings with large area coverage by plasma spraying. At high power input (~150 kW) and very low pressure (~100 Pa) the plasma jet properties change considerably and it is even possible to evaporate the powder feedstock material providing advanced microstructures of the deposits. This relatively new technique bridges the gap between conventional plasma spraying and physical vapor deposition. In addition, the resulting microstructures are unique and can hardly be obtained by other processes. In this paper, microstructures made by LPPS-TF are shown and the columnar layer growth by vapor deposition is demonstrated. In addition to the ceramic materials $ TiO_{2} $, $ Al_{2} $$ O_{3} $ or $ MgAl_{2} $$ O_{4} $, the focus of the research was placed on partially yttria-stabilized zirconia. Variations of the microstructures are shown and discussed concerning potential coating applications. cluster deposition columnar EB-PVD physical vapor deposition PS-PVD thermal barrier coating yttria stabilized zirconia, YSZ Mauer, Georg aut Vaßen, Robert aut Stöver, Detlev aut Enthalten in Journal of thermal spray technology Springer US, 1992 21(2012), 3-4 vom: 16. Feb., Seite 435-440 (DE-627)131101544 (DE-600)1118266-0 (DE-576)038867699 1059-9630 nnns volume:21 year:2012 number:3-4 day:16 month:02 pages:435-440 https://doi.org/10.1007/s11666-012-9748-z lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_70 AR 21 2012 3-4 16 02 435-440 |
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10.1007/s11666-012-9748-z doi (DE-627)OLC2060560950 (DE-He213)s11666-012-9748-z-p DE-627 ger DE-627 rakwb eng 670 VZ Hospach, Andreas verfasserin aut Characteristics of Ceramic Coatings Made by Thin Film Low Pressure Plasma Spraying (LPPS-TF) 2012 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © ASM International 2012 Abstract The thin film low pressure plasma spray process (LPPS-TF) has been developed with the aim of efficient depositing uniform and thin coatings with large area coverage by plasma spraying. At high power input (~150 kW) and very low pressure (~100 Pa) the plasma jet properties change considerably and it is even possible to evaporate the powder feedstock material providing advanced microstructures of the deposits. This relatively new technique bridges the gap between conventional plasma spraying and physical vapor deposition. In addition, the resulting microstructures are unique and can hardly be obtained by other processes. In this paper, microstructures made by LPPS-TF are shown and the columnar layer growth by vapor deposition is demonstrated. In addition to the ceramic materials $ TiO_{2} $, $ Al_{2} $$ O_{3} $ or $ MgAl_{2} $$ O_{4} $, the focus of the research was placed on partially yttria-stabilized zirconia. Variations of the microstructures are shown and discussed concerning potential coating applications. cluster deposition columnar EB-PVD physical vapor deposition PS-PVD thermal barrier coating yttria stabilized zirconia, YSZ Mauer, Georg aut Vaßen, Robert aut Stöver, Detlev aut Enthalten in Journal of thermal spray technology Springer US, 1992 21(2012), 3-4 vom: 16. Feb., Seite 435-440 (DE-627)131101544 (DE-600)1118266-0 (DE-576)038867699 1059-9630 nnns volume:21 year:2012 number:3-4 day:16 month:02 pages:435-440 https://doi.org/10.1007/s11666-012-9748-z lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_70 AR 21 2012 3-4 16 02 435-440 |
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10.1007/s11666-012-9748-z doi (DE-627)OLC2060560950 (DE-He213)s11666-012-9748-z-p DE-627 ger DE-627 rakwb eng 670 VZ Hospach, Andreas verfasserin aut Characteristics of Ceramic Coatings Made by Thin Film Low Pressure Plasma Spraying (LPPS-TF) 2012 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © ASM International 2012 Abstract The thin film low pressure plasma spray process (LPPS-TF) has been developed with the aim of efficient depositing uniform and thin coatings with large area coverage by plasma spraying. At high power input (~150 kW) and very low pressure (~100 Pa) the plasma jet properties change considerably and it is even possible to evaporate the powder feedstock material providing advanced microstructures of the deposits. This relatively new technique bridges the gap between conventional plasma spraying and physical vapor deposition. In addition, the resulting microstructures are unique and can hardly be obtained by other processes. In this paper, microstructures made by LPPS-TF are shown and the columnar layer growth by vapor deposition is demonstrated. In addition to the ceramic materials $ TiO_{2} $, $ Al_{2} $$ O_{3} $ or $ MgAl_{2} $$ O_{4} $, the focus of the research was placed on partially yttria-stabilized zirconia. Variations of the microstructures are shown and discussed concerning potential coating applications. cluster deposition columnar EB-PVD physical vapor deposition PS-PVD thermal barrier coating yttria stabilized zirconia, YSZ Mauer, Georg aut Vaßen, Robert aut Stöver, Detlev aut Enthalten in Journal of thermal spray technology Springer US, 1992 21(2012), 3-4 vom: 16. Feb., Seite 435-440 (DE-627)131101544 (DE-600)1118266-0 (DE-576)038867699 1059-9630 nnns volume:21 year:2012 number:3-4 day:16 month:02 pages:435-440 https://doi.org/10.1007/s11666-012-9748-z lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_70 AR 21 2012 3-4 16 02 435-440 |
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10.1007/s11666-012-9748-z doi (DE-627)OLC2060560950 (DE-He213)s11666-012-9748-z-p DE-627 ger DE-627 rakwb eng 670 VZ Hospach, Andreas verfasserin aut Characteristics of Ceramic Coatings Made by Thin Film Low Pressure Plasma Spraying (LPPS-TF) 2012 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © ASM International 2012 Abstract The thin film low pressure plasma spray process (LPPS-TF) has been developed with the aim of efficient depositing uniform and thin coatings with large area coverage by plasma spraying. At high power input (~150 kW) and very low pressure (~100 Pa) the plasma jet properties change considerably and it is even possible to evaporate the powder feedstock material providing advanced microstructures of the deposits. This relatively new technique bridges the gap between conventional plasma spraying and physical vapor deposition. In addition, the resulting microstructures are unique and can hardly be obtained by other processes. In this paper, microstructures made by LPPS-TF are shown and the columnar layer growth by vapor deposition is demonstrated. In addition to the ceramic materials $ TiO_{2} $, $ Al_{2} $$ O_{3} $ or $ MgAl_{2} $$ O_{4} $, the focus of the research was placed on partially yttria-stabilized zirconia. Variations of the microstructures are shown and discussed concerning potential coating applications. cluster deposition columnar EB-PVD physical vapor deposition PS-PVD thermal barrier coating yttria stabilized zirconia, YSZ Mauer, Georg aut Vaßen, Robert aut Stöver, Detlev aut Enthalten in Journal of thermal spray technology Springer US, 1992 21(2012), 3-4 vom: 16. Feb., Seite 435-440 (DE-627)131101544 (DE-600)1118266-0 (DE-576)038867699 1059-9630 nnns volume:21 year:2012 number:3-4 day:16 month:02 pages:435-440 https://doi.org/10.1007/s11666-012-9748-z lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_70 AR 21 2012 3-4 16 02 435-440 |
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10.1007/s11666-012-9748-z doi (DE-627)OLC2060560950 (DE-He213)s11666-012-9748-z-p DE-627 ger DE-627 rakwb eng 670 VZ Hospach, Andreas verfasserin aut Characteristics of Ceramic Coatings Made by Thin Film Low Pressure Plasma Spraying (LPPS-TF) 2012 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © ASM International 2012 Abstract The thin film low pressure plasma spray process (LPPS-TF) has been developed with the aim of efficient depositing uniform and thin coatings with large area coverage by plasma spraying. At high power input (~150 kW) and very low pressure (~100 Pa) the plasma jet properties change considerably and it is even possible to evaporate the powder feedstock material providing advanced microstructures of the deposits. This relatively new technique bridges the gap between conventional plasma spraying and physical vapor deposition. In addition, the resulting microstructures are unique and can hardly be obtained by other processes. In this paper, microstructures made by LPPS-TF are shown and the columnar layer growth by vapor deposition is demonstrated. In addition to the ceramic materials $ TiO_{2} $, $ Al_{2} $$ O_{3} $ or $ MgAl_{2} $$ O_{4} $, the focus of the research was placed on partially yttria-stabilized zirconia. Variations of the microstructures are shown and discussed concerning potential coating applications. cluster deposition columnar EB-PVD physical vapor deposition PS-PVD thermal barrier coating yttria stabilized zirconia, YSZ Mauer, Georg aut Vaßen, Robert aut Stöver, Detlev aut Enthalten in Journal of thermal spray technology Springer US, 1992 21(2012), 3-4 vom: 16. Feb., Seite 435-440 (DE-627)131101544 (DE-600)1118266-0 (DE-576)038867699 1059-9630 nnns volume:21 year:2012 number:3-4 day:16 month:02 pages:435-440 https://doi.org/10.1007/s11666-012-9748-z lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_70 AR 21 2012 3-4 16 02 435-440 |
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Characteristics of Ceramic Coatings Made by Thin Film Low Pressure Plasma Spraying (LPPS-TF) |
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Abstract The thin film low pressure plasma spray process (LPPS-TF) has been developed with the aim of efficient depositing uniform and thin coatings with large area coverage by plasma spraying. At high power input (~150 kW) and very low pressure (~100 Pa) the plasma jet properties change considerably and it is even possible to evaporate the powder feedstock material providing advanced microstructures of the deposits. This relatively new technique bridges the gap between conventional plasma spraying and physical vapor deposition. In addition, the resulting microstructures are unique and can hardly be obtained by other processes. In this paper, microstructures made by LPPS-TF are shown and the columnar layer growth by vapor deposition is demonstrated. In addition to the ceramic materials $ TiO_{2} $, $ Al_{2} $$ O_{3} $ or $ MgAl_{2} $$ O_{4} $, the focus of the research was placed on partially yttria-stabilized zirconia. Variations of the microstructures are shown and discussed concerning potential coating applications. © ASM International 2012 |
| abstractGer |
Abstract The thin film low pressure plasma spray process (LPPS-TF) has been developed with the aim of efficient depositing uniform and thin coatings with large area coverage by plasma spraying. At high power input (~150 kW) and very low pressure (~100 Pa) the plasma jet properties change considerably and it is even possible to evaporate the powder feedstock material providing advanced microstructures of the deposits. This relatively new technique bridges the gap between conventional plasma spraying and physical vapor deposition. In addition, the resulting microstructures are unique and can hardly be obtained by other processes. In this paper, microstructures made by LPPS-TF are shown and the columnar layer growth by vapor deposition is demonstrated. In addition to the ceramic materials $ TiO_{2} $, $ Al_{2} $$ O_{3} $ or $ MgAl_{2} $$ O_{4} $, the focus of the research was placed on partially yttria-stabilized zirconia. Variations of the microstructures are shown and discussed concerning potential coating applications. © ASM International 2012 |
| abstract_unstemmed |
Abstract The thin film low pressure plasma spray process (LPPS-TF) has been developed with the aim of efficient depositing uniform and thin coatings with large area coverage by plasma spraying. At high power input (~150 kW) and very low pressure (~100 Pa) the plasma jet properties change considerably and it is even possible to evaporate the powder feedstock material providing advanced microstructures of the deposits. This relatively new technique bridges the gap between conventional plasma spraying and physical vapor deposition. In addition, the resulting microstructures are unique and can hardly be obtained by other processes. In this paper, microstructures made by LPPS-TF are shown and the columnar layer growth by vapor deposition is demonstrated. In addition to the ceramic materials $ TiO_{2} $, $ Al_{2} $$ O_{3} $ or $ MgAl_{2} $$ O_{4} $, the focus of the research was placed on partially yttria-stabilized zirconia. Variations of the microstructures are shown and discussed concerning potential coating applications. © ASM International 2012 |
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GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_70 |
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| title_short |
Characteristics of Ceramic Coatings Made by Thin Film Low Pressure Plasma Spraying (LPPS-TF) |
| url |
https://doi.org/10.1007/s11666-012-9748-z |
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| author2 |
Mauer, Georg Vaßen, Robert Stöver, Detlev |
| author2Str |
Mauer, Georg Vaßen, Robert Stöver, Detlev |
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131101544 |
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| doi_str |
10.1007/s11666-012-9748-z |
| up_date |
2024-07-04T01:38:54.468Z |
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