Hard plasma chemical coatings based on silicon carbon nitride

Abstract Silicon carbon nitride (SiCN) coatings deposited on a silicon substrate are produced by plasma-enhanced chemical vapor deposition (PECVD) using methyltrichlorosilane (MTCS), nitrogen, and hydrogen as starting materials. The coatings are characterized with AFM, XRD, and FTIR. Their mechanica...
Ausführliche Beschreibung

Gespeichert in:
Autor*in:

Ivashchenko, L. A. [verfasserIn]

Ivashchenko, V. I.

Porada, O. K.

Dub, S. M.

Skrinskii, P. L.

Ushakov, M. V.

Karpets, M. V.

Stegnii, A. I.

Grishnova, L. A.

Format:

Artikel

Sprache:

Englisch

Erschienen:

2007

Schlagwörter:

nanocrystalline coating

silicon carbon nitride

plasma-enhanced chemical vapor deposition (PECVD)

methyltrichlorosilane (MTCS)

nanoindentation

adhesion

friction

microabrasive wear

Anmerkung:

© Springer Science+Business Media, Inc. 2007

Übergeordnetes Werk:

Enthalten in: Powder metallurgy and metal ceramics - Springer US, 1993, 46(2007), 11-12 vom: Nov., Seite 543-549

Übergeordnetes Werk:

volume:46 ; year:2007 ; number:11-12 ; month:11 ; pages:543-549

Links:

Volltext

DOI / URN:

10.1007/s11106-007-0084-7

Katalog-ID:

OLC2061150659

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