Pulsed microwave radiator for the band system λ=175 nm ArCl(B-X)/236 nm XeCl(D−X)/258 nm $ Cl_{2} $*/308 nm XeCl(B-X)
Abstract Parameters of a multiwave radiator pumped with transverse volume discharge in an Ar-Xe-$ Cl_{2} $ mixture at a pressure of P=5–30 kPa were optimized. It is shown that, at a partial xenon pressure in the mixture below 0.4 kPa, the discharge may serve a multiwave radiation source operating on...
Ausführliche Beschreibung
Gespeichert in:
| Autor*in: |
Shuaibov, A. K. [verfasserIn] |
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| Format: |
Artikel |
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| Sprache: |
Englisch |
| Erschienen: |
2000 |
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| Schlagwörter: |
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| Anmerkung: |
© MAIK "Nauka/Interperiodica" 2000 |
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| Übergeordnetes Werk: |
Enthalten in: Technical physics letters - Nauka/Interperiodica, 1993, 26(2000), 5 vom: Mai, Seite 357-359 |
|---|---|
| Übergeordnetes Werk: |
volume:26 ; year:2000 ; number:5 ; month:05 ; pages:357-359 |
| Links: |
|---|
| DOI / URN: |
10.1134/1.1262868 |
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OLC2072852501 |
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10.1134/1.1262868 doi (DE-627)OLC2072852501 (DE-He213)1.1262868-p DE-627 ger DE-627 rakwb eng 530 VZ Shuaibov, A. K. verfasserin aut Pulsed microwave radiator for the band system λ=175 nm ArCl(B-X)/236 nm XeCl(D−X)/258 nm $ Cl_{2} $*/308 nm XeCl(B-X) 2000 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © MAIK "Nauka/Interperiodica" 2000 Abstract Parameters of a multiwave radiator pumped with transverse volume discharge in an Ar-Xe-$ Cl_{2} $ mixture at a pressure of P=5–30 kPa were optimized. It is shown that, at a partial xenon pressure in the mixture below 0.4 kPa, the discharge may serve a multiwave radiation source operating on the electron-vibrational transitions with λ=175 nm ArCl(B-X), 236 nm XeCl(D-X), 258 nm $ Cl_{2} $(D′-A′), and 308 nm XeCl(B-X). The emission line intensities have comparable values, which may be of interest for applications in the short-wave pulsed photometry, microelectronics, and photochemistry. Radiation Microwave Xenon Microwave Radiator Emission Line Enthalten in Technical physics letters Nauka/Interperiodica, 1993 26(2000), 5 vom: Mai, Seite 357-359 (DE-627)171149521 (DE-600)1158056-2 (DE-576)038488426 1063-7850 nnns volume:26 year:2000 number:5 month:05 pages:357-359 https://doi.org/10.1134/1.1262868 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_32 GBV_ILN_40 GBV_ILN_70 GBV_ILN_2014 GBV_ILN_4700 AR 26 2000 5 05 357-359 |
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10.1134/1.1262868 doi (DE-627)OLC2072852501 (DE-He213)1.1262868-p DE-627 ger DE-627 rakwb eng 530 VZ Shuaibov, A. K. verfasserin aut Pulsed microwave radiator for the band system λ=175 nm ArCl(B-X)/236 nm XeCl(D−X)/258 nm $ Cl_{2} $*/308 nm XeCl(B-X) 2000 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © MAIK "Nauka/Interperiodica" 2000 Abstract Parameters of a multiwave radiator pumped with transverse volume discharge in an Ar-Xe-$ Cl_{2} $ mixture at a pressure of P=5–30 kPa were optimized. It is shown that, at a partial xenon pressure in the mixture below 0.4 kPa, the discharge may serve a multiwave radiation source operating on the electron-vibrational transitions with λ=175 nm ArCl(B-X), 236 nm XeCl(D-X), 258 nm $ Cl_{2} $(D′-A′), and 308 nm XeCl(B-X). The emission line intensities have comparable values, which may be of interest for applications in the short-wave pulsed photometry, microelectronics, and photochemistry. Radiation Microwave Xenon Microwave Radiator Emission Line Enthalten in Technical physics letters Nauka/Interperiodica, 1993 26(2000), 5 vom: Mai, Seite 357-359 (DE-627)171149521 (DE-600)1158056-2 (DE-576)038488426 1063-7850 nnns volume:26 year:2000 number:5 month:05 pages:357-359 https://doi.org/10.1134/1.1262868 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_32 GBV_ILN_40 GBV_ILN_70 GBV_ILN_2014 GBV_ILN_4700 AR 26 2000 5 05 357-359 |
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10.1134/1.1262868 doi (DE-627)OLC2072852501 (DE-He213)1.1262868-p DE-627 ger DE-627 rakwb eng 530 VZ Shuaibov, A. K. verfasserin aut Pulsed microwave radiator for the band system λ=175 nm ArCl(B-X)/236 nm XeCl(D−X)/258 nm $ Cl_{2} $*/308 nm XeCl(B-X) 2000 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © MAIK "Nauka/Interperiodica" 2000 Abstract Parameters of a multiwave radiator pumped with transverse volume discharge in an Ar-Xe-$ Cl_{2} $ mixture at a pressure of P=5–30 kPa were optimized. It is shown that, at a partial xenon pressure in the mixture below 0.4 kPa, the discharge may serve a multiwave radiation source operating on the electron-vibrational transitions with λ=175 nm ArCl(B-X), 236 nm XeCl(D-X), 258 nm $ Cl_{2} $(D′-A′), and 308 nm XeCl(B-X). The emission line intensities have comparable values, which may be of interest for applications in the short-wave pulsed photometry, microelectronics, and photochemistry. Radiation Microwave Xenon Microwave Radiator Emission Line Enthalten in Technical physics letters Nauka/Interperiodica, 1993 26(2000), 5 vom: Mai, Seite 357-359 (DE-627)171149521 (DE-600)1158056-2 (DE-576)038488426 1063-7850 nnns volume:26 year:2000 number:5 month:05 pages:357-359 https://doi.org/10.1134/1.1262868 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_32 GBV_ILN_40 GBV_ILN_70 GBV_ILN_2014 GBV_ILN_4700 AR 26 2000 5 05 357-359 |
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10.1134/1.1262868 doi (DE-627)OLC2072852501 (DE-He213)1.1262868-p DE-627 ger DE-627 rakwb eng 530 VZ Shuaibov, A. K. verfasserin aut Pulsed microwave radiator for the band system λ=175 nm ArCl(B-X)/236 nm XeCl(D−X)/258 nm $ Cl_{2} $*/308 nm XeCl(B-X) 2000 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © MAIK "Nauka/Interperiodica" 2000 Abstract Parameters of a multiwave radiator pumped with transverse volume discharge in an Ar-Xe-$ Cl_{2} $ mixture at a pressure of P=5–30 kPa were optimized. It is shown that, at a partial xenon pressure in the mixture below 0.4 kPa, the discharge may serve a multiwave radiation source operating on the electron-vibrational transitions with λ=175 nm ArCl(B-X), 236 nm XeCl(D-X), 258 nm $ Cl_{2} $(D′-A′), and 308 nm XeCl(B-X). The emission line intensities have comparable values, which may be of interest for applications in the short-wave pulsed photometry, microelectronics, and photochemistry. Radiation Microwave Xenon Microwave Radiator Emission Line Enthalten in Technical physics letters Nauka/Interperiodica, 1993 26(2000), 5 vom: Mai, Seite 357-359 (DE-627)171149521 (DE-600)1158056-2 (DE-576)038488426 1063-7850 nnns volume:26 year:2000 number:5 month:05 pages:357-359 https://doi.org/10.1134/1.1262868 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_32 GBV_ILN_40 GBV_ILN_70 GBV_ILN_2014 GBV_ILN_4700 AR 26 2000 5 05 357-359 |
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10.1134/1.1262868 doi (DE-627)OLC2072852501 (DE-He213)1.1262868-p DE-627 ger DE-627 rakwb eng 530 VZ Shuaibov, A. K. verfasserin aut Pulsed microwave radiator for the band system λ=175 nm ArCl(B-X)/236 nm XeCl(D−X)/258 nm $ Cl_{2} $*/308 nm XeCl(B-X) 2000 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © MAIK "Nauka/Interperiodica" 2000 Abstract Parameters of a multiwave radiator pumped with transverse volume discharge in an Ar-Xe-$ Cl_{2} $ mixture at a pressure of P=5–30 kPa were optimized. It is shown that, at a partial xenon pressure in the mixture below 0.4 kPa, the discharge may serve a multiwave radiation source operating on the electron-vibrational transitions with λ=175 nm ArCl(B-X), 236 nm XeCl(D-X), 258 nm $ Cl_{2} $(D′-A′), and 308 nm XeCl(B-X). The emission line intensities have comparable values, which may be of interest for applications in the short-wave pulsed photometry, microelectronics, and photochemistry. Radiation Microwave Xenon Microwave Radiator Emission Line Enthalten in Technical physics letters Nauka/Interperiodica, 1993 26(2000), 5 vom: Mai, Seite 357-359 (DE-627)171149521 (DE-600)1158056-2 (DE-576)038488426 1063-7850 nnns volume:26 year:2000 number:5 month:05 pages:357-359 https://doi.org/10.1134/1.1262868 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_32 GBV_ILN_40 GBV_ILN_70 GBV_ILN_2014 GBV_ILN_4700 AR 26 2000 5 05 357-359 |
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Shuaibov, A. K. |
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Pulsed microwave radiator for the band system λ=175 nm ArCl(B-X)/236 nm XeCl(D−X)/258 nm $ Cl_{2} $*/308 nm XeCl(B-X) |
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Abstract Parameters of a multiwave radiator pumped with transverse volume discharge in an Ar-Xe-$ Cl_{2} $ mixture at a pressure of P=5–30 kPa were optimized. It is shown that, at a partial xenon pressure in the mixture below 0.4 kPa, the discharge may serve a multiwave radiation source operating on the electron-vibrational transitions with λ=175 nm ArCl(B-X), 236 nm XeCl(D-X), 258 nm $ Cl_{2} $(D′-A′), and 308 nm XeCl(B-X). The emission line intensities have comparable values, which may be of interest for applications in the short-wave pulsed photometry, microelectronics, and photochemistry. © MAIK "Nauka/Interperiodica" 2000 |
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Abstract Parameters of a multiwave radiator pumped with transverse volume discharge in an Ar-Xe-$ Cl_{2} $ mixture at a pressure of P=5–30 kPa were optimized. It is shown that, at a partial xenon pressure in the mixture below 0.4 kPa, the discharge may serve a multiwave radiation source operating on the electron-vibrational transitions with λ=175 nm ArCl(B-X), 236 nm XeCl(D-X), 258 nm $ Cl_{2} $(D′-A′), and 308 nm XeCl(B-X). The emission line intensities have comparable values, which may be of interest for applications in the short-wave pulsed photometry, microelectronics, and photochemistry. © MAIK "Nauka/Interperiodica" 2000 |
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Abstract Parameters of a multiwave radiator pumped with transverse volume discharge in an Ar-Xe-$ Cl_{2} $ mixture at a pressure of P=5–30 kPa were optimized. It is shown that, at a partial xenon pressure in the mixture below 0.4 kPa, the discharge may serve a multiwave radiation source operating on the electron-vibrational transitions with λ=175 nm ArCl(B-X), 236 nm XeCl(D-X), 258 nm $ Cl_{2} $(D′-A′), and 308 nm XeCl(B-X). The emission line intensities have comparable values, which may be of interest for applications in the short-wave pulsed photometry, microelectronics, and photochemistry. © MAIK "Nauka/Interperiodica" 2000 |
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<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000caa a22002652 4500</leader><controlfield tag="001">OLC2072852501</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20230504113701.0</controlfield><controlfield tag="007">tu</controlfield><controlfield tag="008">200820s2000 xx ||||| 00| ||eng c</controlfield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1134/1.1262868</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)OLC2072852501</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-He213)1.1262868-p</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1=" " ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">530</subfield><subfield code="q">VZ</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Shuaibov, A. K.</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Pulsed microwave radiator for the band system λ=175 nm ArCl(B-X)/236 nm XeCl(D−X)/258 nm $ Cl_{2} $*/308 nm XeCl(B-X)</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">2000</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">Text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">ohne Hilfsmittel zu benutzen</subfield><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">Band</subfield><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">© MAIK "Nauka/Interperiodica" 2000</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Abstract Parameters of a multiwave radiator pumped with transverse volume discharge in an Ar-Xe-$ Cl_{2} $ mixture at a pressure of P=5–30 kPa were optimized. 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