On the applicability of the sharp interface model in modelling the kinetics of the direct nitridation of silicon

Gespeichert in:

Autor*in:	Jovanovic, Z. R. [verfasserIn]

Format:	Artikel
Sprache:	Englisch

Erschienen:	1995

Schlagwörter:	Polymer Silicon Interface Model Sharp Interface Sharp Interface Model

Anmerkung:	© Chapman & Hall 1995

Übergeordnetes Werk:	Enthalten in: Journal of materials science / Letters - Kluwer Academic Publishers, 1982, 14(1995), 18 vom: Sept., Seite 1263-1267
Übergeordnetes Werk:	volume:14 ; year:1995 ; number:18 ; month:09 ; pages:1263-1267

Links:	Volltext

DOI / URN:	10.1007/BF01262262

Katalog-ID:	OLC2072991579

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On the applicability of the sharp interface model in modelling the kinetics of the direct nitridation of silicon

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