Preparation of ZnO films on sapphire (01$$\bar 1$$2) substrates by low-pressure organometallic chemical vapour deposition

Gespeichert in:

Autor*in:	Kobayasm, K. [verfasserIn] Matsubara, T. Matsushima, S. Shirakata, S. Isomura, S. Okada, G.

Format:	Artikel
Sprache:	Englisch

Erschienen:	1996

Schlagwörter:	Polymer Sapphire Chemical Vapour Deposition Vapour Deposition Chemical Vapour

Anmerkung:	© Chapman & Hall 1996

Übergeordnetes Werk:	Enthalten in: Journal of materials science / Letters - Kluwer Academic Publishers, 1982, 15(1996), 5 vom: Jan., Seite 457-459
Übergeordnetes Werk:	volume:15 ; year:1996 ; number:5 ; month:01 ; pages:457-459

Links:	Volltext

DOI / URN:	10.1007/BF00277198

Katalog-ID:	OLC2072994462

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allfields	10.1007/BF00277198 doi (DE-627)OLC2072994462 (DE-He213)BF00277198-p DE-627 ger DE-627 rakwb eng 670 VZ Kobayasm, K. verfasserin aut Preparation of ZnO films on sapphire (01$$\bar 1$$2) substrates by low-pressure organometallic chemical vapour deposition 1996 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © Chapman & Hall 1996 Polymer Sapphire Chemical Vapour Deposition Vapour Deposition Chemical Vapour Matsubara, T. aut Matsushima, S. aut Shirakata, S. aut Isomura, S. aut Okada, G. aut Enthalten in Journal of materials science / Letters Kluwer Academic Publishers, 1982 15(1996), 5 vom: Jan., Seite 457-459 (DE-627)130626473 (DE-600)797184-9 (DE-576)016132890 0261-8028 nnns volume:15 year:1996 number:5 month:01 pages:457-459 https://doi.org/10.1007/BF00277198 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_11 GBV_ILN_20 GBV_ILN_21 GBV_ILN_23 GBV_ILN_24 GBV_ILN_30 GBV_ILN_32 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_65 GBV_ILN_70 GBV_ILN_2004 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2027 GBV_ILN_4046 GBV_ILN_4082 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4314 GBV_ILN_4316 GBV_ILN_4319 GBV_ILN_4323 GBV_ILN_4700 AR 15 1996 5 01 457-459
spelling	10.1007/BF00277198 doi (DE-627)OLC2072994462 (DE-He213)BF00277198-p DE-627 ger DE-627 rakwb eng 670 VZ Kobayasm, K. verfasserin aut Preparation of ZnO films on sapphire (01$$\bar 1$$2) substrates by low-pressure organometallic chemical vapour deposition 1996 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © Chapman & Hall 1996 Polymer Sapphire Chemical Vapour Deposition Vapour Deposition Chemical Vapour Matsubara, T. aut Matsushima, S. aut Shirakata, S. aut Isomura, S. aut Okada, G. aut Enthalten in Journal of materials science / Letters Kluwer Academic Publishers, 1982 15(1996), 5 vom: Jan., Seite 457-459 (DE-627)130626473 (DE-600)797184-9 (DE-576)016132890 0261-8028 nnns volume:15 year:1996 number:5 month:01 pages:457-459 https://doi.org/10.1007/BF00277198 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_11 GBV_ILN_20 GBV_ILN_21 GBV_ILN_23 GBV_ILN_24 GBV_ILN_30 GBV_ILN_32 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_65 GBV_ILN_70 GBV_ILN_2004 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2027 GBV_ILN_4046 GBV_ILN_4082 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4314 GBV_ILN_4316 GBV_ILN_4319 GBV_ILN_4323 GBV_ILN_4700 AR 15 1996 5 01 457-459
allfields_unstemmed	10.1007/BF00277198 doi (DE-627)OLC2072994462 (DE-He213)BF00277198-p DE-627 ger DE-627 rakwb eng 670 VZ Kobayasm, K. verfasserin aut Preparation of ZnO films on sapphire (01$$\bar 1$$2) substrates by low-pressure organometallic chemical vapour deposition 1996 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © Chapman & Hall 1996 Polymer Sapphire Chemical Vapour Deposition Vapour Deposition Chemical Vapour Matsubara, T. aut Matsushima, S. aut Shirakata, S. aut Isomura, S. aut Okada, G. aut Enthalten in Journal of materials science / Letters Kluwer Academic Publishers, 1982 15(1996), 5 vom: Jan., Seite 457-459 (DE-627)130626473 (DE-600)797184-9 (DE-576)016132890 0261-8028 nnns volume:15 year:1996 number:5 month:01 pages:457-459 https://doi.org/10.1007/BF00277198 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_11 GBV_ILN_20 GBV_ILN_21 GBV_ILN_23 GBV_ILN_24 GBV_ILN_30 GBV_ILN_32 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_65 GBV_ILN_70 GBV_ILN_2004 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2027 GBV_ILN_4046 GBV_ILN_4082 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4314 GBV_ILN_4316 GBV_ILN_4319 GBV_ILN_4323 GBV_ILN_4700 AR 15 1996 5 01 457-459
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allfieldsSound	10.1007/BF00277198 doi (DE-627)OLC2072994462 (DE-He213)BF00277198-p DE-627 ger DE-627 rakwb eng 670 VZ Kobayasm, K. verfasserin aut Preparation of ZnO films on sapphire (01$$\bar 1$$2) substrates by low-pressure organometallic chemical vapour deposition 1996 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © Chapman & Hall 1996 Polymer Sapphire Chemical Vapour Deposition Vapour Deposition Chemical Vapour Matsubara, T. aut Matsushima, S. aut Shirakata, S. aut Isomura, S. aut Okada, G. aut Enthalten in Journal of materials science / Letters Kluwer Academic Publishers, 1982 15(1996), 5 vom: Jan., Seite 457-459 (DE-627)130626473 (DE-600)797184-9 (DE-576)016132890 0261-8028 nnns volume:15 year:1996 number:5 month:01 pages:457-459 https://doi.org/10.1007/BF00277198 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHA SSG-OLC-DE-84 GBV_ILN_11 GBV_ILN_20 GBV_ILN_21 GBV_ILN_23 GBV_ILN_24 GBV_ILN_30 GBV_ILN_32 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_65 GBV_ILN_70 GBV_ILN_2004 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2027 GBV_ILN_4046 GBV_ILN_4082 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4314 GBV_ILN_4316 GBV_ILN_4319 GBV_ILN_4323 GBV_ILN_4700 AR 15 1996 5 01 457-459
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spellingShingle	Kobayasm, K. ddc 670 misc Polymer misc Sapphire misc Chemical Vapour Deposition misc Vapour Deposition misc Chemical Vapour Preparation of ZnO films on sapphire (01$$\bar 1$$2) substrates by low-pressure organometallic chemical vapour deposition
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title	Preparation of ZnO films on sapphire (01$$\bar 1$$2) substrates by low-pressure organometallic chemical vapour deposition
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title_sort	preparation of zno films on sapphire (01$$\bar 1$$2) substrates by low-pressure organometallic chemical vapour deposition
title_auth	Preparation of ZnO films on sapphire (01$$\bar 1$$2) substrates by low-pressure organometallic chemical vapour deposition
abstract	© Chapman & Hall 1996
abstractGer	© Chapman & Hall 1996
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container_issue	5
title_short	Preparation of ZnO films on sapphire (01$$\bar 1$$2) substrates by low-pressure organometallic chemical vapour deposition
url	https://doi.org/10.1007/BF00277198
remote_bool	false
author2	Matsubara, T. Matsushima, S. Shirakata, S. Isomura, S. Okada, G.
author2Str	Matsubara, T. Matsushima, S. Shirakata, S. Isomura, S. Okada, G.
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doi_str	10.1007/BF00277198
up_date	2024-07-03T16:54:32.584Z
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Preparation of ZnO films on sapphire (01$$\bar 1$$2) substrates by low-pressure organometallic chemical vapour deposition

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