Additive oxygen effects in Cl2 plasma etching of chrome films
Autor*in: |
Kwon, Kwang-Ho [verfasserIn] |
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Format: |
Artikel |
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Sprache: |
Englisch |
Erschienen: |
1999 |
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Schlagwörter: |
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Anmerkung: |
© Kluwer Academic Publishers 1999 |
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Übergeordnetes Werk: |
Enthalten in: Journal of materials science / Letters - Kluwer Academic Publishers, 1982, 18(1999), 15 vom: Aug., Seite 1197-1200 |
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Übergeordnetes Werk: |
volume:18 ; year:1999 ; number:15 ; month:08 ; pages:1197-1200 |
Links: |
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DOI / URN: |
10.1023/A:1006642016630 |
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Katalog-ID: |
OLC2073015778 |
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LEADER | 01000caa a22002652 4500 | ||
---|---|---|---|
001 | OLC2073015778 | ||
003 | DE-627 | ||
005 | 20230503132218.0 | ||
007 | tu | ||
008 | 200819s1999 xx ||||| 00| ||eng c | ||
024 | 7 | |a 10.1023/A:1006642016630 |2 doi | |
035 | |a (DE-627)OLC2073015778 | ||
035 | |a (DE-He213)A:1006642016630-p | ||
040 | |a DE-627 |b ger |c DE-627 |e rakwb | ||
041 | |a eng | ||
082 | 0 | 4 | |a 670 |q VZ |
100 | 1 | |a Kwon, Kwang-Ho |e verfasserin |4 aut | |
245 | 1 | 0 | |a Additive oxygen effects in Cl2 plasma etching of chrome films |
264 | 1 | |c 1999 | |
336 | |a Text |b txt |2 rdacontent | ||
337 | |a ohne Hilfsmittel zu benutzen |b n |2 rdamedia | ||
338 | |a Band |b nc |2 rdacarrier | ||
500 | |a © Kluwer Academic Publishers 1999 | ||
650 | 4 | |a Oxygen | |
650 | 4 | |a Polymer | |
650 | 4 | |a Chrome | |
650 | 4 | |a Plasma Etching | |
650 | 4 | |a Additive Oxygen | |
700 | 1 | |a Kang, Seung-Youl |4 aut | |
700 | 1 | |a Park, Sang-Ho |4 aut | |
700 | 1 | |a Sung, Hee-Kyung |4 aut | |
700 | 1 | |a Kim, Dong-Keun |4 aut | |
700 | 1 | |a Moon, Jong-Ha |4 aut | |
773 | 0 | 8 | |i Enthalten in |t Journal of materials science / Letters |d Kluwer Academic Publishers, 1982 |g 18(1999), 15 vom: Aug., Seite 1197-1200 |w (DE-627)130626473 |w (DE-600)797184-9 |w (DE-576)016132890 |x 0261-8028 |7 nnns |
773 | 1 | 8 | |g volume:18 |g year:1999 |g number:15 |g month:08 |g pages:1197-1200 |
856 | 4 | 1 | |u https://doi.org/10.1023/A:1006642016630 |z lizenzpflichtig |3 Volltext |
912 | |a GBV_USEFLAG_A | ||
912 | |a SYSFLAG_A | ||
912 | |a GBV_OLC | ||
912 | |a SSG-OLC-TEC | ||
912 | |a GBV_ILN_11 | ||
912 | |a GBV_ILN_20 | ||
912 | |a GBV_ILN_21 | ||
912 | |a GBV_ILN_23 | ||
912 | |a GBV_ILN_30 | ||
912 | |a GBV_ILN_32 | ||
912 | |a GBV_ILN_40 | ||
912 | |a GBV_ILN_62 | ||
912 | |a GBV_ILN_65 | ||
912 | |a GBV_ILN_70 | ||
912 | |a GBV_ILN_2004 | ||
912 | |a GBV_ILN_2015 | ||
912 | |a GBV_ILN_2020 | ||
912 | |a GBV_ILN_2021 | ||
912 | |a GBV_ILN_2027 | ||
912 | |a GBV_ILN_4046 | ||
912 | |a GBV_ILN_4305 | ||
912 | |a GBV_ILN_4306 | ||
912 | |a GBV_ILN_4314 | ||
912 | |a GBV_ILN_4316 | ||
912 | |a GBV_ILN_4319 | ||
912 | |a GBV_ILN_4323 | ||
912 | |a GBV_ILN_4700 | ||
951 | |a AR | ||
952 | |d 18 |j 1999 |e 15 |c 08 |h 1197-1200 |
author_variant |
k h k khk s y k syk s h p shp h k s hks d k k dkk j h m jhm |
---|---|
matchkey_str |
article:02618028:1999----::diiexgnfetic2lsathn |
hierarchy_sort_str |
1999 |
publishDate |
1999 |
allfields |
10.1023/A:1006642016630 doi (DE-627)OLC2073015778 (DE-He213)A:1006642016630-p DE-627 ger DE-627 rakwb eng 670 VZ Kwon, Kwang-Ho verfasserin aut Additive oxygen effects in Cl2 plasma etching of chrome films 1999 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © Kluwer Academic Publishers 1999 Oxygen Polymer Chrome Plasma Etching Additive Oxygen Kang, Seung-Youl aut Park, Sang-Ho aut Sung, Hee-Kyung aut Kim, Dong-Keun aut Moon, Jong-Ha aut Enthalten in Journal of materials science / Letters Kluwer Academic Publishers, 1982 18(1999), 15 vom: Aug., Seite 1197-1200 (DE-627)130626473 (DE-600)797184-9 (DE-576)016132890 0261-8028 nnns volume:18 year:1999 number:15 month:08 pages:1197-1200 https://doi.org/10.1023/A:1006642016630 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_11 GBV_ILN_20 GBV_ILN_21 GBV_ILN_23 GBV_ILN_30 GBV_ILN_32 GBV_ILN_40 GBV_ILN_62 GBV_ILN_65 GBV_ILN_70 GBV_ILN_2004 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2027 GBV_ILN_4046 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4314 GBV_ILN_4316 GBV_ILN_4319 GBV_ILN_4323 GBV_ILN_4700 AR 18 1999 15 08 1197-1200 |
spelling |
10.1023/A:1006642016630 doi (DE-627)OLC2073015778 (DE-He213)A:1006642016630-p DE-627 ger DE-627 rakwb eng 670 VZ Kwon, Kwang-Ho verfasserin aut Additive oxygen effects in Cl2 plasma etching of chrome films 1999 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © Kluwer Academic Publishers 1999 Oxygen Polymer Chrome Plasma Etching Additive Oxygen Kang, Seung-Youl aut Park, Sang-Ho aut Sung, Hee-Kyung aut Kim, Dong-Keun aut Moon, Jong-Ha aut Enthalten in Journal of materials science / Letters Kluwer Academic Publishers, 1982 18(1999), 15 vom: Aug., Seite 1197-1200 (DE-627)130626473 (DE-600)797184-9 (DE-576)016132890 0261-8028 nnns volume:18 year:1999 number:15 month:08 pages:1197-1200 https://doi.org/10.1023/A:1006642016630 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_11 GBV_ILN_20 GBV_ILN_21 GBV_ILN_23 GBV_ILN_30 GBV_ILN_32 GBV_ILN_40 GBV_ILN_62 GBV_ILN_65 GBV_ILN_70 GBV_ILN_2004 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2027 GBV_ILN_4046 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4314 GBV_ILN_4316 GBV_ILN_4319 GBV_ILN_4323 GBV_ILN_4700 AR 18 1999 15 08 1197-1200 |
allfields_unstemmed |
10.1023/A:1006642016630 doi (DE-627)OLC2073015778 (DE-He213)A:1006642016630-p DE-627 ger DE-627 rakwb eng 670 VZ Kwon, Kwang-Ho verfasserin aut Additive oxygen effects in Cl2 plasma etching of chrome films 1999 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © Kluwer Academic Publishers 1999 Oxygen Polymer Chrome Plasma Etching Additive Oxygen Kang, Seung-Youl aut Park, Sang-Ho aut Sung, Hee-Kyung aut Kim, Dong-Keun aut Moon, Jong-Ha aut Enthalten in Journal of materials science / Letters Kluwer Academic Publishers, 1982 18(1999), 15 vom: Aug., Seite 1197-1200 (DE-627)130626473 (DE-600)797184-9 (DE-576)016132890 0261-8028 nnns volume:18 year:1999 number:15 month:08 pages:1197-1200 https://doi.org/10.1023/A:1006642016630 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_11 GBV_ILN_20 GBV_ILN_21 GBV_ILN_23 GBV_ILN_30 GBV_ILN_32 GBV_ILN_40 GBV_ILN_62 GBV_ILN_65 GBV_ILN_70 GBV_ILN_2004 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2027 GBV_ILN_4046 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4314 GBV_ILN_4316 GBV_ILN_4319 GBV_ILN_4323 GBV_ILN_4700 AR 18 1999 15 08 1197-1200 |
allfieldsGer |
10.1023/A:1006642016630 doi (DE-627)OLC2073015778 (DE-He213)A:1006642016630-p DE-627 ger DE-627 rakwb eng 670 VZ Kwon, Kwang-Ho verfasserin aut Additive oxygen effects in Cl2 plasma etching of chrome films 1999 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © Kluwer Academic Publishers 1999 Oxygen Polymer Chrome Plasma Etching Additive Oxygen Kang, Seung-Youl aut Park, Sang-Ho aut Sung, Hee-Kyung aut Kim, Dong-Keun aut Moon, Jong-Ha aut Enthalten in Journal of materials science / Letters Kluwer Academic Publishers, 1982 18(1999), 15 vom: Aug., Seite 1197-1200 (DE-627)130626473 (DE-600)797184-9 (DE-576)016132890 0261-8028 nnns volume:18 year:1999 number:15 month:08 pages:1197-1200 https://doi.org/10.1023/A:1006642016630 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_11 GBV_ILN_20 GBV_ILN_21 GBV_ILN_23 GBV_ILN_30 GBV_ILN_32 GBV_ILN_40 GBV_ILN_62 GBV_ILN_65 GBV_ILN_70 GBV_ILN_2004 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2027 GBV_ILN_4046 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4314 GBV_ILN_4316 GBV_ILN_4319 GBV_ILN_4323 GBV_ILN_4700 AR 18 1999 15 08 1197-1200 |
allfieldsSound |
10.1023/A:1006642016630 doi (DE-627)OLC2073015778 (DE-He213)A:1006642016630-p DE-627 ger DE-627 rakwb eng 670 VZ Kwon, Kwang-Ho verfasserin aut Additive oxygen effects in Cl2 plasma etching of chrome films 1999 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © Kluwer Academic Publishers 1999 Oxygen Polymer Chrome Plasma Etching Additive Oxygen Kang, Seung-Youl aut Park, Sang-Ho aut Sung, Hee-Kyung aut Kim, Dong-Keun aut Moon, Jong-Ha aut Enthalten in Journal of materials science / Letters Kluwer Academic Publishers, 1982 18(1999), 15 vom: Aug., Seite 1197-1200 (DE-627)130626473 (DE-600)797184-9 (DE-576)016132890 0261-8028 nnns volume:18 year:1999 number:15 month:08 pages:1197-1200 https://doi.org/10.1023/A:1006642016630 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_11 GBV_ILN_20 GBV_ILN_21 GBV_ILN_23 GBV_ILN_30 GBV_ILN_32 GBV_ILN_40 GBV_ILN_62 GBV_ILN_65 GBV_ILN_70 GBV_ILN_2004 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2027 GBV_ILN_4046 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4314 GBV_ILN_4316 GBV_ILN_4319 GBV_ILN_4323 GBV_ILN_4700 AR 18 1999 15 08 1197-1200 |
language |
English |
source |
Enthalten in Journal of materials science / Letters 18(1999), 15 vom: Aug., Seite 1197-1200 volume:18 year:1999 number:15 month:08 pages:1197-1200 |
sourceStr |
Enthalten in Journal of materials science / Letters 18(1999), 15 vom: Aug., Seite 1197-1200 volume:18 year:1999 number:15 month:08 pages:1197-1200 |
format_phy_str_mv |
Article |
institution |
findex.gbv.de |
topic_facet |
Oxygen Polymer Chrome Plasma Etching Additive Oxygen |
dewey-raw |
670 |
isfreeaccess_bool |
false |
container_title |
Journal of materials science / Letters |
authorswithroles_txt_mv |
Kwon, Kwang-Ho @@aut@@ Kang, Seung-Youl @@aut@@ Park, Sang-Ho @@aut@@ Sung, Hee-Kyung @@aut@@ Kim, Dong-Keun @@aut@@ Moon, Jong-Ha @@aut@@ |
publishDateDaySort_date |
1999-08-01T00:00:00Z |
hierarchy_top_id |
130626473 |
dewey-sort |
3670 |
id |
OLC2073015778 |
language_de |
englisch |
fullrecord |
<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000caa a22002652 4500</leader><controlfield tag="001">OLC2073015778</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20230503132218.0</controlfield><controlfield tag="007">tu</controlfield><controlfield tag="008">200819s1999 xx ||||| 00| ||eng c</controlfield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1023/A:1006642016630</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)OLC2073015778</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-He213)A:1006642016630-p</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1=" " ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">670</subfield><subfield code="q">VZ</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Kwon, Kwang-Ho</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Additive oxygen effects in Cl2 plasma etching of chrome films</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">1999</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">Text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">ohne Hilfsmittel zu benutzen</subfield><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">Band</subfield><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">© Kluwer Academic Publishers 1999</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Oxygen</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Polymer</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Chrome</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Plasma Etching</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Additive Oxygen</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Kang, Seung-Youl</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Park, Sang-Ho</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Sung, Hee-Kyung</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Kim, Dong-Keun</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Moon, Jong-Ha</subfield><subfield code="4">aut</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">Enthalten in</subfield><subfield code="t">Journal of materials science / Letters</subfield><subfield code="d">Kluwer Academic Publishers, 1982</subfield><subfield code="g">18(1999), 15 vom: Aug., Seite 1197-1200</subfield><subfield code="w">(DE-627)130626473</subfield><subfield code="w">(DE-600)797184-9</subfield><subfield code="w">(DE-576)016132890</subfield><subfield code="x">0261-8028</subfield><subfield code="7">nnns</subfield></datafield><datafield tag="773" ind1="1" ind2="8"><subfield code="g">volume:18</subfield><subfield code="g">year:1999</subfield><subfield code="g">number:15</subfield><subfield code="g">month:08</subfield><subfield code="g">pages:1197-1200</subfield></datafield><datafield tag="856" ind1="4" ind2="1"><subfield code="u">https://doi.org/10.1023/A:1006642016630</subfield><subfield code="z">lizenzpflichtig</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_USEFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SYSFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_OLC</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-TEC</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_11</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_20</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_21</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_23</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_30</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_32</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_40</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_62</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_65</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_70</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2004</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2015</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2020</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2021</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2027</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4046</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4305</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4306</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4314</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4316</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4319</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4323</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4700</subfield></datafield><datafield tag="951" ind1=" " ind2=" "><subfield code="a">AR</subfield></datafield><datafield tag="952" ind1=" " ind2=" "><subfield code="d">18</subfield><subfield code="j">1999</subfield><subfield code="e">15</subfield><subfield code="c">08</subfield><subfield code="h">1197-1200</subfield></datafield></record></collection>
|
author |
Kwon, Kwang-Ho |
spellingShingle |
Kwon, Kwang-Ho ddc 670 misc Oxygen misc Polymer misc Chrome misc Plasma Etching misc Additive Oxygen Additive oxygen effects in Cl2 plasma etching of chrome films |
authorStr |
Kwon, Kwang-Ho |
ppnlink_with_tag_str_mv |
@@773@@(DE-627)130626473 |
format |
Article |
dewey-ones |
670 - Manufacturing |
delete_txt_mv |
keep |
author_role |
aut aut aut aut aut aut |
collection |
OLC |
remote_str |
false |
illustrated |
Not Illustrated |
issn |
0261-8028 |
topic_title |
670 VZ Additive oxygen effects in Cl2 plasma etching of chrome films Oxygen Polymer Chrome Plasma Etching Additive Oxygen |
topic |
ddc 670 misc Oxygen misc Polymer misc Chrome misc Plasma Etching misc Additive Oxygen |
topic_unstemmed |
ddc 670 misc Oxygen misc Polymer misc Chrome misc Plasma Etching misc Additive Oxygen |
topic_browse |
ddc 670 misc Oxygen misc Polymer misc Chrome misc Plasma Etching misc Additive Oxygen |
format_facet |
Aufsätze Gedruckte Aufsätze |
format_main_str_mv |
Text Zeitschrift/Artikel |
carriertype_str_mv |
nc |
hierarchy_parent_title |
Journal of materials science / Letters |
hierarchy_parent_id |
130626473 |
dewey-tens |
670 - Manufacturing |
hierarchy_top_title |
Journal of materials science / Letters |
isfreeaccess_txt |
false |
familylinks_str_mv |
(DE-627)130626473 (DE-600)797184-9 (DE-576)016132890 |
title |
Additive oxygen effects in Cl2 plasma etching of chrome films |
ctrlnum |
(DE-627)OLC2073015778 (DE-He213)A:1006642016630-p |
title_full |
Additive oxygen effects in Cl2 plasma etching of chrome films |
author_sort |
Kwon, Kwang-Ho |
journal |
Journal of materials science / Letters |
journalStr |
Journal of materials science / Letters |
lang_code |
eng |
isOA_bool |
false |
dewey-hundreds |
600 - Technology |
recordtype |
marc |
publishDateSort |
1999 |
contenttype_str_mv |
txt |
container_start_page |
1197 |
author_browse |
Kwon, Kwang-Ho Kang, Seung-Youl Park, Sang-Ho Sung, Hee-Kyung Kim, Dong-Keun Moon, Jong-Ha |
container_volume |
18 |
class |
670 VZ |
format_se |
Aufsätze |
author-letter |
Kwon, Kwang-Ho |
doi_str_mv |
10.1023/A:1006642016630 |
dewey-full |
670 |
title_sort |
additive oxygen effects in cl2 plasma etching of chrome films |
title_auth |
Additive oxygen effects in Cl2 plasma etching of chrome films |
abstract |
© Kluwer Academic Publishers 1999 |
abstractGer |
© Kluwer Academic Publishers 1999 |
abstract_unstemmed |
© Kluwer Academic Publishers 1999 |
collection_details |
GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_11 GBV_ILN_20 GBV_ILN_21 GBV_ILN_23 GBV_ILN_30 GBV_ILN_32 GBV_ILN_40 GBV_ILN_62 GBV_ILN_65 GBV_ILN_70 GBV_ILN_2004 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2027 GBV_ILN_4046 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4314 GBV_ILN_4316 GBV_ILN_4319 GBV_ILN_4323 GBV_ILN_4700 |
container_issue |
15 |
title_short |
Additive oxygen effects in Cl2 plasma etching of chrome films |
url |
https://doi.org/10.1023/A:1006642016630 |
remote_bool |
false |
author2 |
Kang, Seung-Youl Park, Sang-Ho Sung, Hee-Kyung Kim, Dong-Keun Moon, Jong-Ha |
author2Str |
Kang, Seung-Youl Park, Sang-Ho Sung, Hee-Kyung Kim, Dong-Keun Moon, Jong-Ha |
ppnlink |
130626473 |
mediatype_str_mv |
n |
isOA_txt |
false |
hochschulschrift_bool |
false |
doi_str |
10.1023/A:1006642016630 |
up_date |
2024-07-03T16:58:29.782Z |
_version_ |
1803577888377667585 |
fullrecord_marcxml |
<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000caa a22002652 4500</leader><controlfield tag="001">OLC2073015778</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20230503132218.0</controlfield><controlfield tag="007">tu</controlfield><controlfield tag="008">200819s1999 xx ||||| 00| ||eng c</controlfield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1023/A:1006642016630</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)OLC2073015778</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-He213)A:1006642016630-p</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1=" " ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">670</subfield><subfield code="q">VZ</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Kwon, Kwang-Ho</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Additive oxygen effects in Cl2 plasma etching of chrome films</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">1999</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">Text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">ohne Hilfsmittel zu benutzen</subfield><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">Band</subfield><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">© Kluwer Academic Publishers 1999</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Oxygen</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Polymer</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Chrome</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Plasma Etching</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Additive Oxygen</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Kang, Seung-Youl</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Park, Sang-Ho</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Sung, Hee-Kyung</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Kim, Dong-Keun</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Moon, Jong-Ha</subfield><subfield code="4">aut</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">Enthalten in</subfield><subfield code="t">Journal of materials science / Letters</subfield><subfield code="d">Kluwer Academic Publishers, 1982</subfield><subfield code="g">18(1999), 15 vom: Aug., Seite 1197-1200</subfield><subfield code="w">(DE-627)130626473</subfield><subfield code="w">(DE-600)797184-9</subfield><subfield code="w">(DE-576)016132890</subfield><subfield code="x">0261-8028</subfield><subfield code="7">nnns</subfield></datafield><datafield tag="773" ind1="1" ind2="8"><subfield code="g">volume:18</subfield><subfield code="g">year:1999</subfield><subfield code="g">number:15</subfield><subfield code="g">month:08</subfield><subfield code="g">pages:1197-1200</subfield></datafield><datafield tag="856" ind1="4" ind2="1"><subfield code="u">https://doi.org/10.1023/A:1006642016630</subfield><subfield code="z">lizenzpflichtig</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_USEFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SYSFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_OLC</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SSG-OLC-TEC</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_11</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_20</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_21</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_23</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_30</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_32</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_40</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_62</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_65</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_70</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2004</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2015</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2020</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2021</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_2027</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4046</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4305</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4306</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4314</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4316</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4319</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4323</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_ILN_4700</subfield></datafield><datafield tag="951" ind1=" " ind2=" "><subfield code="a">AR</subfield></datafield><datafield tag="952" ind1=" " ind2=" "><subfield code="d">18</subfield><subfield code="j">1999</subfield><subfield code="e">15</subfield><subfield code="c">08</subfield><subfield code="h">1197-1200</subfield></datafield></record></collection>
|
score |
7.4018774 |