Optically Sensitive Materials for the Simulation of Wave Fields of Stresses in Anisotropic Bodies
Abstract We propose a procedure of manufacturing and present opticomechanical characteristics of materials used for the photoelastic simulation of wave fields and dynamic fracture processes in anisotropic bodies.
Gespeichert in:
| Autor*in: |
Malezhyk, M. P. [verfasserIn] |
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| Format: |
Artikel |
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| Sprache: |
Englisch |
| Erschienen: |
2004 |
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| Schlagwörter: |
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| Anmerkung: |
© Plenum Publishing Corporation 2004 |
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| Übergeordnetes Werk: |
Enthalten in: Materials science - Kluwer Academic Publishers-Plenum Publishers, 1993, 40(2004), 1 vom: Jan., Seite 118-124 |
|---|---|
| Übergeordnetes Werk: |
volume:40 ; year:2004 ; number:1 ; month:01 ; pages:118-124 |
| Links: |
|---|
| DOI / URN: |
10.1023/B:MASC.0000042794.74992.11 |
|---|
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OLC2075304645 |
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| 520 | |a Abstract We propose a procedure of manufacturing and present opticomechanical characteristics of materials used for the photoelastic simulation of wave fields and dynamic fracture processes in anisotropic bodies. | ||
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| 650 | 4 | |a Sensitive Material | |
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Abstract We propose a procedure of manufacturing and present opticomechanical characteristics of materials used for the photoelastic simulation of wave fields and dynamic fracture processes in anisotropic bodies. © Plenum Publishing Corporation 2004 |
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|
| score |
7.3994904 |