Optically Sensitive Materials for the Simulation of Wave Fields of Stresses in Anisotropic Bodies
Abstract We propose a procedure of manufacturing and present opticomechanical characteristics of materials used for the photoelastic simulation of wave fields and dynamic fracture processes in anisotropic bodies.
Autor*in: |
Malezhyk, M. P. [verfasserIn] |
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Format: |
Artikel |
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Sprache: |
Englisch |
Erschienen: |
2004 |
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Schlagwörter: |
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Anmerkung: |
© Plenum Publishing Corporation 2004 |
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Übergeordnetes Werk: |
Enthalten in: Materials science - Kluwer Academic Publishers-Plenum Publishers, 1993, 40(2004), 1 vom: Jan., Seite 118-124 |
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Übergeordnetes Werk: |
volume:40 ; year:2004 ; number:1 ; month:01 ; pages:118-124 |
Links: |
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DOI / URN: |
10.1023/B:MASC.0000042794.74992.11 |
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Katalog-ID: |
OLC2075304645 |
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10.1023/B:MASC.0000042794.74992.11 doi (DE-627)OLC2075304645 (DE-He213)B:MASC.0000042794.74992.11-p DE-627 ger DE-627 rakwb eng 540 600 670 VZ Malezhyk, M. P. verfasserin aut Optically Sensitive Materials for the Simulation of Wave Fields of Stresses in Anisotropic Bodies 2004 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © Plenum Publishing Corporation 2004 Abstract We propose a procedure of manufacturing and present opticomechanical characteristics of materials used for the photoelastic simulation of wave fields and dynamic fracture processes in anisotropic bodies. Material Processing Fracture Process Wave Field Dynamic Fracture Sensitive Material Enthalten in Materials science Kluwer Academic Publishers-Plenum Publishers, 1993 40(2004), 1 vom: Jan., Seite 118-124 (DE-627)171289099 (DE-600)1174050-4 (DE-576)038733633 1068-820X nnns volume:40 year:2004 number:1 month:01 pages:118-124 https://doi.org/10.1023/B:MASC.0000042794.74992.11 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-CHE GBV_ILN_70 GBV_ILN_2015 AR 40 2004 1 01 118-124 |
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10.1023/B:MASC.0000042794.74992.11 doi (DE-627)OLC2075304645 (DE-He213)B:MASC.0000042794.74992.11-p DE-627 ger DE-627 rakwb eng 540 600 670 VZ Malezhyk, M. P. verfasserin aut Optically Sensitive Materials for the Simulation of Wave Fields of Stresses in Anisotropic Bodies 2004 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © Plenum Publishing Corporation 2004 Abstract We propose a procedure of manufacturing and present opticomechanical characteristics of materials used for the photoelastic simulation of wave fields and dynamic fracture processes in anisotropic bodies. Material Processing Fracture Process Wave Field Dynamic Fracture Sensitive Material Enthalten in Materials science Kluwer Academic Publishers-Plenum Publishers, 1993 40(2004), 1 vom: Jan., Seite 118-124 (DE-627)171289099 (DE-600)1174050-4 (DE-576)038733633 1068-820X nnns volume:40 year:2004 number:1 month:01 pages:118-124 https://doi.org/10.1023/B:MASC.0000042794.74992.11 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-CHE GBV_ILN_70 GBV_ILN_2015 AR 40 2004 1 01 118-124 |
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Optically Sensitive Materials for the Simulation of Wave Fields of Stresses in Anisotropic Bodies |
abstract |
Abstract We propose a procedure of manufacturing and present opticomechanical characteristics of materials used for the photoelastic simulation of wave fields and dynamic fracture processes in anisotropic bodies. © Plenum Publishing Corporation 2004 |
abstractGer |
Abstract We propose a procedure of manufacturing and present opticomechanical characteristics of materials used for the photoelastic simulation of wave fields and dynamic fracture processes in anisotropic bodies. © Plenum Publishing Corporation 2004 |
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Abstract We propose a procedure of manufacturing and present opticomechanical characteristics of materials used for the photoelastic simulation of wave fields and dynamic fracture processes in anisotropic bodies. © Plenum Publishing Corporation 2004 |
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