Muon diffusion and level crossing in copper
Abstract We have studied the quantum diffusion of positive muons in pure copper over the temperature range 12 mK≤T≤150 K using weak longitudinal field μSR. Below 150 K, this technique has proved to be the most sensitive to the muon hop rate. Our final results for the behaviour of the muon hop rate a...
Ausführliche Beschreibung
Gespeichert in:
| Autor*in: |
Luke, G. M. [verfasserIn] |
|---|
| Format: |
Artikel |
|---|---|
| Sprache: |
Englisch |
| Erschienen: |
1991 |
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| Schlagwörter: |
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| Anmerkung: |
© J.C. Baltzer A.G. Scientific Publishing Company 1990 |
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| Übergeordnetes Werk: |
Enthalten in: Hyperfine interactions - Kluwer Academic Publishers, 1975, 64(1991), 1-4 vom: Feb., Seite 721-727 |
|---|---|
| Übergeordnetes Werk: |
volume:64 ; year:1991 ; number:1-4 ; month:02 ; pages:721-727 |
| Links: |
|---|
| DOI / URN: |
10.1007/BF02396209 |
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OLC2076365877 |
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| 520 | |a Abstract We have studied the quantum diffusion of positive muons in pure copper over the temperature range 12 mK≤T≤150 K using weak longitudinal field μSR. Below 150 K, this technique has proved to be the most sensitive to the muon hop rate. Our final results for the behaviour of the muon hop rate are well explained within the framework of theories for the quantum diffusion of light interstitials in metals of Kondo, Yamada and others. In addition, the use of level-crossing resonance has allowed us to measure the electric quadrupole interaction strength (and sign) of the copper nuclei, $ ω_{Q} $= −3.314(7) $ μS^{−1} $. These results have enabled us to show that the muon occupies the same octahedral site at all the temperatures studied, ruling out the possibility of metastable muon sites contributing to any significant portion of the muon polarization. | ||
| 650 | 4 | |a Copper | |
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| 700 | 1 | |a Brewer, J. H. |4 aut | |
| 700 | 1 | |a Kreitzman, S. R. |4 aut | |
| 700 | 1 | |a Noakes, D. R. |4 aut | |
| 700 | 1 | |a Celio, M. |4 aut | |
| 700 | 1 | |a Kadono, R. |4 aut | |
| 700 | 1 | |a Ansaldo, E. J. |4 aut | |
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10.1007/BF02396209 doi (DE-627)OLC2076365877 (DE-He213)BF02396209-p DE-627 ger DE-627 rakwb eng 530 VZ 33.00 bkl Luke, G. M. verfasserin aut Muon diffusion and level crossing in copper 1991 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © J.C. Baltzer A.G. Scientific Publishing Company 1990 Abstract We have studied the quantum diffusion of positive muons in pure copper over the temperature range 12 mK≤T≤150 K using weak longitudinal field μSR. Below 150 K, this technique has proved to be the most sensitive to the muon hop rate. Our final results for the behaviour of the muon hop rate are well explained within the framework of theories for the quantum diffusion of light interstitials in metals of Kondo, Yamada and others. In addition, the use of level-crossing resonance has allowed us to measure the electric quadrupole interaction strength (and sign) of the copper nuclei, $ ω_{Q} $= −3.314(7) $ μS^{−1} $. These results have enabled us to show that the muon occupies the same octahedral site at all the temperatures studied, ruling out the possibility of metastable muon sites contributing to any significant portion of the muon polarization. Copper Thin Film Octahedral Site Interaction Strength Pure Copper Brewer, J. H. aut Kreitzman, S. R. aut Noakes, D. R. aut Celio, M. aut Kadono, R. aut Ansaldo, E. J. aut Enthalten in Hyperfine interactions Kluwer Academic Publishers, 1975 64(1991), 1-4 vom: Feb., Seite 721-727 (DE-627)129438685 (DE-600)194471-X (DE-576)014809028 0304-3843 nnns volume:64 year:1991 number:1-4 month:02 pages:721-727 https://doi.org/10.1007/BF02396209 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_20 GBV_ILN_22 GBV_ILN_40 GBV_ILN_70 GBV_ILN_2279 GBV_ILN_4012 GBV_ILN_4046 GBV_ILN_4323 33.00 VZ AR 64 1991 1-4 02 721-727 |
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10.1007/BF02396209 doi (DE-627)OLC2076365877 (DE-He213)BF02396209-p DE-627 ger DE-627 rakwb eng 530 VZ 33.00 bkl Luke, G. M. verfasserin aut Muon diffusion and level crossing in copper 1991 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © J.C. Baltzer A.G. Scientific Publishing Company 1990 Abstract We have studied the quantum diffusion of positive muons in pure copper over the temperature range 12 mK≤T≤150 K using weak longitudinal field μSR. Below 150 K, this technique has proved to be the most sensitive to the muon hop rate. Our final results for the behaviour of the muon hop rate are well explained within the framework of theories for the quantum diffusion of light interstitials in metals of Kondo, Yamada and others. In addition, the use of level-crossing resonance has allowed us to measure the electric quadrupole interaction strength (and sign) of the copper nuclei, $ ω_{Q} $= −3.314(7) $ μS^{−1} $. These results have enabled us to show that the muon occupies the same octahedral site at all the temperatures studied, ruling out the possibility of metastable muon sites contributing to any significant portion of the muon polarization. Copper Thin Film Octahedral Site Interaction Strength Pure Copper Brewer, J. H. aut Kreitzman, S. R. aut Noakes, D. R. aut Celio, M. aut Kadono, R. aut Ansaldo, E. J. aut Enthalten in Hyperfine interactions Kluwer Academic Publishers, 1975 64(1991), 1-4 vom: Feb., Seite 721-727 (DE-627)129438685 (DE-600)194471-X (DE-576)014809028 0304-3843 nnns volume:64 year:1991 number:1-4 month:02 pages:721-727 https://doi.org/10.1007/BF02396209 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_20 GBV_ILN_22 GBV_ILN_40 GBV_ILN_70 GBV_ILN_2279 GBV_ILN_4012 GBV_ILN_4046 GBV_ILN_4323 33.00 VZ AR 64 1991 1-4 02 721-727 |
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10.1007/BF02396209 doi (DE-627)OLC2076365877 (DE-He213)BF02396209-p DE-627 ger DE-627 rakwb eng 530 VZ 33.00 bkl Luke, G. M. verfasserin aut Muon diffusion and level crossing in copper 1991 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © J.C. Baltzer A.G. Scientific Publishing Company 1990 Abstract We have studied the quantum diffusion of positive muons in pure copper over the temperature range 12 mK≤T≤150 K using weak longitudinal field μSR. Below 150 K, this technique has proved to be the most sensitive to the muon hop rate. Our final results for the behaviour of the muon hop rate are well explained within the framework of theories for the quantum diffusion of light interstitials in metals of Kondo, Yamada and others. In addition, the use of level-crossing resonance has allowed us to measure the electric quadrupole interaction strength (and sign) of the copper nuclei, $ ω_{Q} $= −3.314(7) $ μS^{−1} $. These results have enabled us to show that the muon occupies the same octahedral site at all the temperatures studied, ruling out the possibility of metastable muon sites contributing to any significant portion of the muon polarization. Copper Thin Film Octahedral Site Interaction Strength Pure Copper Brewer, J. H. aut Kreitzman, S. R. aut Noakes, D. R. aut Celio, M. aut Kadono, R. aut Ansaldo, E. J. aut Enthalten in Hyperfine interactions Kluwer Academic Publishers, 1975 64(1991), 1-4 vom: Feb., Seite 721-727 (DE-627)129438685 (DE-600)194471-X (DE-576)014809028 0304-3843 nnns volume:64 year:1991 number:1-4 month:02 pages:721-727 https://doi.org/10.1007/BF02396209 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_20 GBV_ILN_22 GBV_ILN_40 GBV_ILN_70 GBV_ILN_2279 GBV_ILN_4012 GBV_ILN_4046 GBV_ILN_4323 33.00 VZ AR 64 1991 1-4 02 721-727 |
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10.1007/BF02396209 doi (DE-627)OLC2076365877 (DE-He213)BF02396209-p DE-627 ger DE-627 rakwb eng 530 VZ 33.00 bkl Luke, G. M. verfasserin aut Muon diffusion and level crossing in copper 1991 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © J.C. Baltzer A.G. Scientific Publishing Company 1990 Abstract We have studied the quantum diffusion of positive muons in pure copper over the temperature range 12 mK≤T≤150 K using weak longitudinal field μSR. Below 150 K, this technique has proved to be the most sensitive to the muon hop rate. Our final results for the behaviour of the muon hop rate are well explained within the framework of theories for the quantum diffusion of light interstitials in metals of Kondo, Yamada and others. In addition, the use of level-crossing resonance has allowed us to measure the electric quadrupole interaction strength (and sign) of the copper nuclei, $ ω_{Q} $= −3.314(7) $ μS^{−1} $. These results have enabled us to show that the muon occupies the same octahedral site at all the temperatures studied, ruling out the possibility of metastable muon sites contributing to any significant portion of the muon polarization. Copper Thin Film Octahedral Site Interaction Strength Pure Copper Brewer, J. H. aut Kreitzman, S. R. aut Noakes, D. R. aut Celio, M. aut Kadono, R. aut Ansaldo, E. J. aut Enthalten in Hyperfine interactions Kluwer Academic Publishers, 1975 64(1991), 1-4 vom: Feb., Seite 721-727 (DE-627)129438685 (DE-600)194471-X (DE-576)014809028 0304-3843 nnns volume:64 year:1991 number:1-4 month:02 pages:721-727 https://doi.org/10.1007/BF02396209 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_20 GBV_ILN_22 GBV_ILN_40 GBV_ILN_70 GBV_ILN_2279 GBV_ILN_4012 GBV_ILN_4046 GBV_ILN_4323 33.00 VZ AR 64 1991 1-4 02 721-727 |
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10.1007/BF02396209 doi (DE-627)OLC2076365877 (DE-He213)BF02396209-p DE-627 ger DE-627 rakwb eng 530 VZ 33.00 bkl Luke, G. M. verfasserin aut Muon diffusion and level crossing in copper 1991 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © J.C. Baltzer A.G. Scientific Publishing Company 1990 Abstract We have studied the quantum diffusion of positive muons in pure copper over the temperature range 12 mK≤T≤150 K using weak longitudinal field μSR. Below 150 K, this technique has proved to be the most sensitive to the muon hop rate. Our final results for the behaviour of the muon hop rate are well explained within the framework of theories for the quantum diffusion of light interstitials in metals of Kondo, Yamada and others. In addition, the use of level-crossing resonance has allowed us to measure the electric quadrupole interaction strength (and sign) of the copper nuclei, $ ω_{Q} $= −3.314(7) $ μS^{−1} $. These results have enabled us to show that the muon occupies the same octahedral site at all the temperatures studied, ruling out the possibility of metastable muon sites contributing to any significant portion of the muon polarization. Copper Thin Film Octahedral Site Interaction Strength Pure Copper Brewer, J. H. aut Kreitzman, S. R. aut Noakes, D. R. aut Celio, M. aut Kadono, R. aut Ansaldo, E. J. aut Enthalten in Hyperfine interactions Kluwer Academic Publishers, 1975 64(1991), 1-4 vom: Feb., Seite 721-727 (DE-627)129438685 (DE-600)194471-X (DE-576)014809028 0304-3843 nnns volume:64 year:1991 number:1-4 month:02 pages:721-727 https://doi.org/10.1007/BF02396209 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_20 GBV_ILN_22 GBV_ILN_40 GBV_ILN_70 GBV_ILN_2279 GBV_ILN_4012 GBV_ILN_4046 GBV_ILN_4323 33.00 VZ AR 64 1991 1-4 02 721-727 |
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Luke, G. M. |
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10.1007/BF02396209 |
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muon diffusion and level crossing in copper |
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Muon diffusion and level crossing in copper |
| abstract |
Abstract We have studied the quantum diffusion of positive muons in pure copper over the temperature range 12 mK≤T≤150 K using weak longitudinal field μSR. Below 150 K, this technique has proved to be the most sensitive to the muon hop rate. Our final results for the behaviour of the muon hop rate are well explained within the framework of theories for the quantum diffusion of light interstitials in metals of Kondo, Yamada and others. In addition, the use of level-crossing resonance has allowed us to measure the electric quadrupole interaction strength (and sign) of the copper nuclei, $ ω_{Q} $= −3.314(7) $ μS^{−1} $. These results have enabled us to show that the muon occupies the same octahedral site at all the temperatures studied, ruling out the possibility of metastable muon sites contributing to any significant portion of the muon polarization. © J.C. Baltzer A.G. Scientific Publishing Company 1990 |
| abstractGer |
Abstract We have studied the quantum diffusion of positive muons in pure copper over the temperature range 12 mK≤T≤150 K using weak longitudinal field μSR. Below 150 K, this technique has proved to be the most sensitive to the muon hop rate. Our final results for the behaviour of the muon hop rate are well explained within the framework of theories for the quantum diffusion of light interstitials in metals of Kondo, Yamada and others. In addition, the use of level-crossing resonance has allowed us to measure the electric quadrupole interaction strength (and sign) of the copper nuclei, $ ω_{Q} $= −3.314(7) $ μS^{−1} $. These results have enabled us to show that the muon occupies the same octahedral site at all the temperatures studied, ruling out the possibility of metastable muon sites contributing to any significant portion of the muon polarization. © J.C. Baltzer A.G. Scientific Publishing Company 1990 |
| abstract_unstemmed |
Abstract We have studied the quantum diffusion of positive muons in pure copper over the temperature range 12 mK≤T≤150 K using weak longitudinal field μSR. Below 150 K, this technique has proved to be the most sensitive to the muon hop rate. Our final results for the behaviour of the muon hop rate are well explained within the framework of theories for the quantum diffusion of light interstitials in metals of Kondo, Yamada and others. In addition, the use of level-crossing resonance has allowed us to measure the electric quadrupole interaction strength (and sign) of the copper nuclei, $ ω_{Q} $= −3.314(7) $ μS^{−1} $. These results have enabled us to show that the muon occupies the same octahedral site at all the temperatures studied, ruling out the possibility of metastable muon sites contributing to any significant portion of the muon polarization. © J.C. Baltzer A.G. Scientific Publishing Company 1990 |
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| title_short |
Muon diffusion and level crossing in copper |
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Brewer, J. H. Kreitzman, S. R. Noakes, D. R. Celio, M. Kadono, R. Ansaldo, E. J. |
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Brewer, J. H. Kreitzman, S. R. Noakes, D. R. Celio, M. Kadono, R. Ansaldo, E. J. |
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