Surface analysis of Fe-Si-Al sputtered alloy films by conversion electron Mössbauer spectrometry
Abstract Fe-Si-Al alloy films were deposited on silicon wafers heated to various temperatures by DC Ar sputtering and the microstructure of the films was analyzed by CEMS. As-prepared films on cooled substrate contained superparamagnetic components in addition to magnetic components. The fine grains...
Ausführliche Beschreibung
Gespeichert in:
| Autor*in: |
Nomura, Kiyoshi [verfasserIn] |
|---|
| Format: |
Artikel |
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| Sprache: |
Englisch |
| Erschienen: |
1994 |
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| Schlagwörter: |
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| Anmerkung: |
© J.C. Baltzer AG, Science Publishers 1994 |
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| Übergeordnetes Werk: |
Enthalten in: Hyperfine interactions - Baltzer Science Publishers, Baarn/Kluwer Academic Publishers, 1975, 88(1994), 1 vom: Dez., Seite 73-81 |
|---|---|
| Übergeordnetes Werk: |
volume:88 ; year:1994 ; number:1 ; month:12 ; pages:73-81 |
| Links: |
|---|
| DOI / URN: |
10.1007/BF02068704 |
|---|
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OLC2076379886 |
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| 520 | |a Abstract Fe-Si-Al alloy films were deposited on silicon wafers heated to various temperatures by DC Ar sputtering and the microstructure of the films was analyzed by CEMS. As-prepared films on cooled substrate contained superparamagnetic components in addition to magnetic components. The fine grains included yielded a random orientation of magnetic spins in the films. The spin orientation became perpendicular to the surface by annealing the sputtered films at more than 773 K. The magnetic fields in sputtered films on a heated substrate were parallel to the surface. | ||
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10.1007/BF02068704 doi (DE-627)OLC2076379886 (DE-He213)BF02068704-p DE-627 ger DE-627 rakwb eng 530 VZ 33.00 bkl Nomura, Kiyoshi verfasserin aut Surface analysis of Fe-Si-Al sputtered alloy films by conversion electron Mössbauer spectrometry 1994 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © J.C. Baltzer AG, Science Publishers 1994 Abstract Fe-Si-Al alloy films were deposited on silicon wafers heated to various temperatures by DC Ar sputtering and the microstructure of the films was analyzed by CEMS. As-prepared films on cooled substrate contained superparamagnetic components in addition to magnetic components. The fine grains included yielded a random orientation of magnetic spins in the films. The spin orientation became perpendicular to the surface by annealing the sputtered films at more than 773 K. The magnetic fields in sputtered films on a heated substrate were parallel to the surface. Silicon Microstructure Magnetic Field Thin Film Silicon Wafer Ujihira, Yusuke aut Yanagitani, Akihiko aut Enthalten in Hyperfine interactions Baltzer Science Publishers, Baarn/Kluwer Academic Publishers, 1975 88(1994), 1 vom: Dez., Seite 73-81 (DE-627)129438685 (DE-600)194471-X (DE-576)014809028 0304-3843 nnns volume:88 year:1994 number:1 month:12 pages:73-81 https://doi.org/10.1007/BF02068704 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_20 GBV_ILN_22 GBV_ILN_40 GBV_ILN_70 GBV_ILN_2279 GBV_ILN_4012 GBV_ILN_4046 33.00 VZ AR 88 1994 1 12 73-81 |
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10.1007/BF02068704 doi (DE-627)OLC2076379886 (DE-He213)BF02068704-p DE-627 ger DE-627 rakwb eng 530 VZ 33.00 bkl Nomura, Kiyoshi verfasserin aut Surface analysis of Fe-Si-Al sputtered alloy films by conversion electron Mössbauer spectrometry 1994 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © J.C. Baltzer AG, Science Publishers 1994 Abstract Fe-Si-Al alloy films were deposited on silicon wafers heated to various temperatures by DC Ar sputtering and the microstructure of the films was analyzed by CEMS. As-prepared films on cooled substrate contained superparamagnetic components in addition to magnetic components. The fine grains included yielded a random orientation of magnetic spins in the films. The spin orientation became perpendicular to the surface by annealing the sputtered films at more than 773 K. The magnetic fields in sputtered films on a heated substrate were parallel to the surface. Silicon Microstructure Magnetic Field Thin Film Silicon Wafer Ujihira, Yusuke aut Yanagitani, Akihiko aut Enthalten in Hyperfine interactions Baltzer Science Publishers, Baarn/Kluwer Academic Publishers, 1975 88(1994), 1 vom: Dez., Seite 73-81 (DE-627)129438685 (DE-600)194471-X (DE-576)014809028 0304-3843 nnns volume:88 year:1994 number:1 month:12 pages:73-81 https://doi.org/10.1007/BF02068704 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_20 GBV_ILN_22 GBV_ILN_40 GBV_ILN_70 GBV_ILN_2279 GBV_ILN_4012 GBV_ILN_4046 33.00 VZ AR 88 1994 1 12 73-81 |
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10.1007/BF02068704 doi (DE-627)OLC2076379886 (DE-He213)BF02068704-p DE-627 ger DE-627 rakwb eng 530 VZ 33.00 bkl Nomura, Kiyoshi verfasserin aut Surface analysis of Fe-Si-Al sputtered alloy films by conversion electron Mössbauer spectrometry 1994 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © J.C. Baltzer AG, Science Publishers 1994 Abstract Fe-Si-Al alloy films were deposited on silicon wafers heated to various temperatures by DC Ar sputtering and the microstructure of the films was analyzed by CEMS. As-prepared films on cooled substrate contained superparamagnetic components in addition to magnetic components. The fine grains included yielded a random orientation of magnetic spins in the films. The spin orientation became perpendicular to the surface by annealing the sputtered films at more than 773 K. The magnetic fields in sputtered films on a heated substrate were parallel to the surface. Silicon Microstructure Magnetic Field Thin Film Silicon Wafer Ujihira, Yusuke aut Yanagitani, Akihiko aut Enthalten in Hyperfine interactions Baltzer Science Publishers, Baarn/Kluwer Academic Publishers, 1975 88(1994), 1 vom: Dez., Seite 73-81 (DE-627)129438685 (DE-600)194471-X (DE-576)014809028 0304-3843 nnns volume:88 year:1994 number:1 month:12 pages:73-81 https://doi.org/10.1007/BF02068704 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_20 GBV_ILN_22 GBV_ILN_40 GBV_ILN_70 GBV_ILN_2279 GBV_ILN_4012 GBV_ILN_4046 33.00 VZ AR 88 1994 1 12 73-81 |
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10.1007/BF02068704 doi (DE-627)OLC2076379886 (DE-He213)BF02068704-p DE-627 ger DE-627 rakwb eng 530 VZ 33.00 bkl Nomura, Kiyoshi verfasserin aut Surface analysis of Fe-Si-Al sputtered alloy films by conversion electron Mössbauer spectrometry 1994 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © J.C. Baltzer AG, Science Publishers 1994 Abstract Fe-Si-Al alloy films were deposited on silicon wafers heated to various temperatures by DC Ar sputtering and the microstructure of the films was analyzed by CEMS. As-prepared films on cooled substrate contained superparamagnetic components in addition to magnetic components. The fine grains included yielded a random orientation of magnetic spins in the films. The spin orientation became perpendicular to the surface by annealing the sputtered films at more than 773 K. The magnetic fields in sputtered films on a heated substrate were parallel to the surface. Silicon Microstructure Magnetic Field Thin Film Silicon Wafer Ujihira, Yusuke aut Yanagitani, Akihiko aut Enthalten in Hyperfine interactions Baltzer Science Publishers, Baarn/Kluwer Academic Publishers, 1975 88(1994), 1 vom: Dez., Seite 73-81 (DE-627)129438685 (DE-600)194471-X (DE-576)014809028 0304-3843 nnns volume:88 year:1994 number:1 month:12 pages:73-81 https://doi.org/10.1007/BF02068704 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_20 GBV_ILN_22 GBV_ILN_40 GBV_ILN_70 GBV_ILN_2279 GBV_ILN_4012 GBV_ILN_4046 33.00 VZ AR 88 1994 1 12 73-81 |
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10.1007/BF02068704 doi (DE-627)OLC2076379886 (DE-He213)BF02068704-p DE-627 ger DE-627 rakwb eng 530 VZ 33.00 bkl Nomura, Kiyoshi verfasserin aut Surface analysis of Fe-Si-Al sputtered alloy films by conversion electron Mössbauer spectrometry 1994 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © J.C. Baltzer AG, Science Publishers 1994 Abstract Fe-Si-Al alloy films were deposited on silicon wafers heated to various temperatures by DC Ar sputtering and the microstructure of the films was analyzed by CEMS. As-prepared films on cooled substrate contained superparamagnetic components in addition to magnetic components. The fine grains included yielded a random orientation of magnetic spins in the films. The spin orientation became perpendicular to the surface by annealing the sputtered films at more than 773 K. The magnetic fields in sputtered films on a heated substrate were parallel to the surface. Silicon Microstructure Magnetic Field Thin Film Silicon Wafer Ujihira, Yusuke aut Yanagitani, Akihiko aut Enthalten in Hyperfine interactions Baltzer Science Publishers, Baarn/Kluwer Academic Publishers, 1975 88(1994), 1 vom: Dez., Seite 73-81 (DE-627)129438685 (DE-600)194471-X (DE-576)014809028 0304-3843 nnns volume:88 year:1994 number:1 month:12 pages:73-81 https://doi.org/10.1007/BF02068704 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_20 GBV_ILN_22 GBV_ILN_40 GBV_ILN_70 GBV_ILN_2279 GBV_ILN_4012 GBV_ILN_4046 33.00 VZ AR 88 1994 1 12 73-81 |
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Abstract Fe-Si-Al alloy films were deposited on silicon wafers heated to various temperatures by DC Ar sputtering and the microstructure of the films was analyzed by CEMS. As-prepared films on cooled substrate contained superparamagnetic components in addition to magnetic components. The fine grains included yielded a random orientation of magnetic spins in the films. The spin orientation became perpendicular to the surface by annealing the sputtered films at more than 773 K. The magnetic fields in sputtered films on a heated substrate were parallel to the surface. © J.C. Baltzer AG, Science Publishers 1994 |
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Abstract Fe-Si-Al alloy films were deposited on silicon wafers heated to various temperatures by DC Ar sputtering and the microstructure of the films was analyzed by CEMS. As-prepared films on cooled substrate contained superparamagnetic components in addition to magnetic components. The fine grains included yielded a random orientation of magnetic spins in the films. The spin orientation became perpendicular to the surface by annealing the sputtered films at more than 773 K. The magnetic fields in sputtered films on a heated substrate were parallel to the surface. © J.C. Baltzer AG, Science Publishers 1994 |
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Abstract Fe-Si-Al alloy films were deposited on silicon wafers heated to various temperatures by DC Ar sputtering and the microstructure of the films was analyzed by CEMS. As-prepared films on cooled substrate contained superparamagnetic components in addition to magnetic components. The fine grains included yielded a random orientation of magnetic spins in the films. The spin orientation became perpendicular to the surface by annealing the sputtered films at more than 773 K. The magnetic fields in sputtered films on a heated substrate were parallel to the surface. © J.C. Baltzer AG, Science Publishers 1994 |
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Baltzer AG, Science Publishers 1994</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Abstract Fe-Si-Al alloy films were deposited on silicon wafers heated to various temperatures by DC Ar sputtering and the microstructure of the films was analyzed by CEMS. As-prepared films on cooled substrate contained superparamagnetic components in addition to magnetic components. The fine grains included yielded a random orientation of magnetic spins in the films. The spin orientation became perpendicular to the surface by annealing the sputtered films at more than 773 K. 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