On the nature of doping effect of methane in ZnO thin films deposited by RF-magnetron sputtering

Abstract A comparative study of the effects of methane and hydrogen as reactive agents on the structural, optical, and electrical properties of ZnO thin films deposited by magnetron sputtering has been performed. The research was aimed at the identification of the nature of the previously reported s...
Ausführliche Beschreibung

Gespeichert in:
Autor*in:

Vasin, A. V. [verfasserIn]

Rusavsky, A. V.

Mamykin, S. V.

Nikolenko, A. S.

Strelchuk, V. V.

Yatskiv, R.

Grym, J.

Gudimenko, A. I.

Kladko, V. P.

Tyagulskyy, I. P.

Lorinčik, J.

Elantyev, I.

Nazarov, A. N.

Format:

Artikel

Sprache:

Englisch

Erschienen:

2022

Anmerkung:

© The Author(s), under exclusive licence to Springer Science+Business Media, LLC, part of Springer Nature 2022

Übergeordnetes Werk:

Enthalten in: Journal of materials science / Materials in electronics - Springer US, 1990, 33(2022), 9 vom: 08. Feb., Seite 6421-6431

Übergeordnetes Werk:

volume:33 ; year:2022 ; number:9 ; day:08 ; month:02 ; pages:6421-6431

Links:

Volltext

DOI / URN:

10.1007/s10854-022-07814-9

Katalog-ID:

OLC2078183032

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