Variety of ZnO nanostructured materials prepared by PECVD
Abstract Zinc oxide nanostructures of different composition and morphology have been prepared by the plasma-enhanced chemical vapor deposition technique (PECVD). Highly pure elemental zinc was used as the precursor. RF (40 MHz) inductively-coupled plasma discharge was implemented for initiation of t...
Ausführliche Beschreibung
Autor*in: |
Mochalov, Leonid [verfasserIn] |
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Englisch |
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2022 |
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Anmerkung: |
© The Author(s), under exclusive licence to Springer Science+Business Media, LLC, part of Springer Nature 2022. Springer Nature or its licensor holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law. |
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Übergeordnetes Werk: |
Enthalten in: Optical and quantum electronics - Springer US, 1975, 54(2022), 10 vom: 24. Aug. |
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Übergeordnetes Werk: |
volume:54 ; year:2022 ; number:10 ; day:24 ; month:08 |
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DOI / URN: |
10.1007/s11082-022-03979-z |
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Katalog-ID: |
OLC2079413074 |
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520 | |a Abstract Zinc oxide nanostructures of different composition and morphology have been prepared by the plasma-enhanced chemical vapor deposition technique (PECVD). Highly pure elemental zinc was used as the precursor. RF (40 MHz) inductively-coupled plasma discharge was implemented for initiation of the plasma-chemical reactions in the gas phase. Hydrogen–oxygen ($ H_{2} $–$ O_{2} $) gas composition of various ratios (1:2, 1:1, and 2:1) was employed as the plasma feed gas mixture. Hydrogen also served as the carrier gas. Optical emission spectroscopy was utilized to identify the intermediate reactive species and assume the possible mechanism of the plasma process. The effect of the power produced by the plasma discharge, as well as the heating of the zinc precursor, on the stoichiometry and structure of thin films was investigated. The obtained material properties were described by different analytical techniques. | ||
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10.1007/s11082-022-03979-z doi (DE-627)OLC2079413074 (DE-He213)s11082-022-03979-z-p DE-627 ger DE-627 rakwb eng 500 620 VZ Mochalov, Leonid verfasserin aut Variety of ZnO nanostructured materials prepared by PECVD 2022 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © The Author(s), under exclusive licence to Springer Science+Business Media, LLC, part of Springer Nature 2022. Springer Nature or its licensor holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law. Abstract Zinc oxide nanostructures of different composition and morphology have been prepared by the plasma-enhanced chemical vapor deposition technique (PECVD). Highly pure elemental zinc was used as the precursor. RF (40 MHz) inductively-coupled plasma discharge was implemented for initiation of the plasma-chemical reactions in the gas phase. Hydrogen–oxygen ($ H_{2} $–$ O_{2} $) gas composition of various ratios (1:2, 1:1, and 2:1) was employed as the plasma feed gas mixture. Hydrogen also served as the carrier gas. Optical emission spectroscopy was utilized to identify the intermediate reactive species and assume the possible mechanism of the plasma process. The effect of the power produced by the plasma discharge, as well as the heating of the zinc precursor, on the stoichiometry and structure of thin films was investigated. The obtained material properties were described by different analytical techniques. Zinc oxide Nanostructures PECVD Logunov, Alexander aut Prokhorov, Igor aut Vshivtsev, Maksim aut Kudryashov, Mikhail aut Kudryashova, Yulia aut Malyshev, Vladimir aut Spivak, Yulia (orcid)0000-0002-5852-999X aut Greshnyakov, Evgeny aut Knyazev, Alexander aut Fukina, Diana aut Yunin, Pavel aut Moshnikov, Vyacheslav aut Enthalten in Optical and quantum electronics Springer US, 1975 54(2022), 10 vom: 24. Aug. (DE-627)129419540 (DE-600)189950-8 (DE-576)014796139 0306-8919 nnns volume:54 year:2022 number:10 day:24 month:08 https://doi.org/10.1007/s11082-022-03979-z lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY AR 54 2022 10 24 08 |
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10.1007/s11082-022-03979-z doi (DE-627)OLC2079413074 (DE-He213)s11082-022-03979-z-p DE-627 ger DE-627 rakwb eng 500 620 VZ Mochalov, Leonid verfasserin aut Variety of ZnO nanostructured materials prepared by PECVD 2022 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © The Author(s), under exclusive licence to Springer Science+Business Media, LLC, part of Springer Nature 2022. Springer Nature or its licensor holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law. Abstract Zinc oxide nanostructures of different composition and morphology have been prepared by the plasma-enhanced chemical vapor deposition technique (PECVD). Highly pure elemental zinc was used as the precursor. RF (40 MHz) inductively-coupled plasma discharge was implemented for initiation of the plasma-chemical reactions in the gas phase. Hydrogen–oxygen ($ H_{2} $–$ O_{2} $) gas composition of various ratios (1:2, 1:1, and 2:1) was employed as the plasma feed gas mixture. Hydrogen also served as the carrier gas. Optical emission spectroscopy was utilized to identify the intermediate reactive species and assume the possible mechanism of the plasma process. The effect of the power produced by the plasma discharge, as well as the heating of the zinc precursor, on the stoichiometry and structure of thin films was investigated. The obtained material properties were described by different analytical techniques. Zinc oxide Nanostructures PECVD Logunov, Alexander aut Prokhorov, Igor aut Vshivtsev, Maksim aut Kudryashov, Mikhail aut Kudryashova, Yulia aut Malyshev, Vladimir aut Spivak, Yulia (orcid)0000-0002-5852-999X aut Greshnyakov, Evgeny aut Knyazev, Alexander aut Fukina, Diana aut Yunin, Pavel aut Moshnikov, Vyacheslav aut Enthalten in Optical and quantum electronics Springer US, 1975 54(2022), 10 vom: 24. Aug. (DE-627)129419540 (DE-600)189950-8 (DE-576)014796139 0306-8919 nnns volume:54 year:2022 number:10 day:24 month:08 https://doi.org/10.1007/s11082-022-03979-z lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY AR 54 2022 10 24 08 |
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10.1007/s11082-022-03979-z doi (DE-627)OLC2079413074 (DE-He213)s11082-022-03979-z-p DE-627 ger DE-627 rakwb eng 500 620 VZ Mochalov, Leonid verfasserin aut Variety of ZnO nanostructured materials prepared by PECVD 2022 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © The Author(s), under exclusive licence to Springer Science+Business Media, LLC, part of Springer Nature 2022. Springer Nature or its licensor holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law. Abstract Zinc oxide nanostructures of different composition and morphology have been prepared by the plasma-enhanced chemical vapor deposition technique (PECVD). Highly pure elemental zinc was used as the precursor. RF (40 MHz) inductively-coupled plasma discharge was implemented for initiation of the plasma-chemical reactions in the gas phase. Hydrogen–oxygen ($ H_{2} $–$ O_{2} $) gas composition of various ratios (1:2, 1:1, and 2:1) was employed as the plasma feed gas mixture. Hydrogen also served as the carrier gas. Optical emission spectroscopy was utilized to identify the intermediate reactive species and assume the possible mechanism of the plasma process. The effect of the power produced by the plasma discharge, as well as the heating of the zinc precursor, on the stoichiometry and structure of thin films was investigated. The obtained material properties were described by different analytical techniques. Zinc oxide Nanostructures PECVD Logunov, Alexander aut Prokhorov, Igor aut Vshivtsev, Maksim aut Kudryashov, Mikhail aut Kudryashova, Yulia aut Malyshev, Vladimir aut Spivak, Yulia (orcid)0000-0002-5852-999X aut Greshnyakov, Evgeny aut Knyazev, Alexander aut Fukina, Diana aut Yunin, Pavel aut Moshnikov, Vyacheslav aut Enthalten in Optical and quantum electronics Springer US, 1975 54(2022), 10 vom: 24. Aug. (DE-627)129419540 (DE-600)189950-8 (DE-576)014796139 0306-8919 nnns volume:54 year:2022 number:10 day:24 month:08 https://doi.org/10.1007/s11082-022-03979-z lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY AR 54 2022 10 24 08 |
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10.1007/s11082-022-03979-z doi (DE-627)OLC2079413074 (DE-He213)s11082-022-03979-z-p DE-627 ger DE-627 rakwb eng 500 620 VZ Mochalov, Leonid verfasserin aut Variety of ZnO nanostructured materials prepared by PECVD 2022 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © The Author(s), under exclusive licence to Springer Science+Business Media, LLC, part of Springer Nature 2022. Springer Nature or its licensor holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law. Abstract Zinc oxide nanostructures of different composition and morphology have been prepared by the plasma-enhanced chemical vapor deposition technique (PECVD). Highly pure elemental zinc was used as the precursor. RF (40 MHz) inductively-coupled plasma discharge was implemented for initiation of the plasma-chemical reactions in the gas phase. Hydrogen–oxygen ($ H_{2} $–$ O_{2} $) gas composition of various ratios (1:2, 1:1, and 2:1) was employed as the plasma feed gas mixture. Hydrogen also served as the carrier gas. Optical emission spectroscopy was utilized to identify the intermediate reactive species and assume the possible mechanism of the plasma process. The effect of the power produced by the plasma discharge, as well as the heating of the zinc precursor, on the stoichiometry and structure of thin films was investigated. The obtained material properties were described by different analytical techniques. Zinc oxide Nanostructures PECVD Logunov, Alexander aut Prokhorov, Igor aut Vshivtsev, Maksim aut Kudryashov, Mikhail aut Kudryashova, Yulia aut Malyshev, Vladimir aut Spivak, Yulia (orcid)0000-0002-5852-999X aut Greshnyakov, Evgeny aut Knyazev, Alexander aut Fukina, Diana aut Yunin, Pavel aut Moshnikov, Vyacheslav aut Enthalten in Optical and quantum electronics Springer US, 1975 54(2022), 10 vom: 24. Aug. (DE-627)129419540 (DE-600)189950-8 (DE-576)014796139 0306-8919 nnns volume:54 year:2022 number:10 day:24 month:08 https://doi.org/10.1007/s11082-022-03979-z lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY AR 54 2022 10 24 08 |
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10.1007/s11082-022-03979-z doi (DE-627)OLC2079413074 (DE-He213)s11082-022-03979-z-p DE-627 ger DE-627 rakwb eng 500 620 VZ Mochalov, Leonid verfasserin aut Variety of ZnO nanostructured materials prepared by PECVD 2022 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © The Author(s), under exclusive licence to Springer Science+Business Media, LLC, part of Springer Nature 2022. Springer Nature or its licensor holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law. Abstract Zinc oxide nanostructures of different composition and morphology have been prepared by the plasma-enhanced chemical vapor deposition technique (PECVD). Highly pure elemental zinc was used as the precursor. RF (40 MHz) inductively-coupled plasma discharge was implemented for initiation of the plasma-chemical reactions in the gas phase. Hydrogen–oxygen ($ H_{2} $–$ O_{2} $) gas composition of various ratios (1:2, 1:1, and 2:1) was employed as the plasma feed gas mixture. Hydrogen also served as the carrier gas. Optical emission spectroscopy was utilized to identify the intermediate reactive species and assume the possible mechanism of the plasma process. The effect of the power produced by the plasma discharge, as well as the heating of the zinc precursor, on the stoichiometry and structure of thin films was investigated. The obtained material properties were described by different analytical techniques. Zinc oxide Nanostructures PECVD Logunov, Alexander aut Prokhorov, Igor aut Vshivtsev, Maksim aut Kudryashov, Mikhail aut Kudryashova, Yulia aut Malyshev, Vladimir aut Spivak, Yulia (orcid)0000-0002-5852-999X aut Greshnyakov, Evgeny aut Knyazev, Alexander aut Fukina, Diana aut Yunin, Pavel aut Moshnikov, Vyacheslav aut Enthalten in Optical and quantum electronics Springer US, 1975 54(2022), 10 vom: 24. Aug. (DE-627)129419540 (DE-600)189950-8 (DE-576)014796139 0306-8919 nnns volume:54 year:2022 number:10 day:24 month:08 https://doi.org/10.1007/s11082-022-03979-z lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC SSG-OLC-PHY AR 54 2022 10 24 08 |
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Variety of ZnO nanostructured materials prepared by PECVD |
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Variety of ZnO nanostructured materials prepared by PECVD |
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Mochalov, Leonid |
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Mochalov, Leonid Logunov, Alexander Prokhorov, Igor Vshivtsev, Maksim Kudryashov, Mikhail Kudryashova, Yulia Malyshev, Vladimir Spivak, Yulia Greshnyakov, Evgeny Knyazev, Alexander Fukina, Diana Yunin, Pavel Moshnikov, Vyacheslav |
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variety of zno nanostructured materials prepared by pecvd |
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Variety of ZnO nanostructured materials prepared by PECVD |
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Abstract Zinc oxide nanostructures of different composition and morphology have been prepared by the plasma-enhanced chemical vapor deposition technique (PECVD). Highly pure elemental zinc was used as the precursor. RF (40 MHz) inductively-coupled plasma discharge was implemented for initiation of the plasma-chemical reactions in the gas phase. Hydrogen–oxygen ($ H_{2} $–$ O_{2} $) gas composition of various ratios (1:2, 1:1, and 2:1) was employed as the plasma feed gas mixture. Hydrogen also served as the carrier gas. Optical emission spectroscopy was utilized to identify the intermediate reactive species and assume the possible mechanism of the plasma process. The effect of the power produced by the plasma discharge, as well as the heating of the zinc precursor, on the stoichiometry and structure of thin films was investigated. The obtained material properties were described by different analytical techniques. © The Author(s), under exclusive licence to Springer Science+Business Media, LLC, part of Springer Nature 2022. Springer Nature or its licensor holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law. |
abstractGer |
Abstract Zinc oxide nanostructures of different composition and morphology have been prepared by the plasma-enhanced chemical vapor deposition technique (PECVD). Highly pure elemental zinc was used as the precursor. RF (40 MHz) inductively-coupled plasma discharge was implemented for initiation of the plasma-chemical reactions in the gas phase. Hydrogen–oxygen ($ H_{2} $–$ O_{2} $) gas composition of various ratios (1:2, 1:1, and 2:1) was employed as the plasma feed gas mixture. Hydrogen also served as the carrier gas. Optical emission spectroscopy was utilized to identify the intermediate reactive species and assume the possible mechanism of the plasma process. The effect of the power produced by the plasma discharge, as well as the heating of the zinc precursor, on the stoichiometry and structure of thin films was investigated. The obtained material properties were described by different analytical techniques. © The Author(s), under exclusive licence to Springer Science+Business Media, LLC, part of Springer Nature 2022. Springer Nature or its licensor holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law. |
abstract_unstemmed |
Abstract Zinc oxide nanostructures of different composition and morphology have been prepared by the plasma-enhanced chemical vapor deposition technique (PECVD). Highly pure elemental zinc was used as the precursor. RF (40 MHz) inductively-coupled plasma discharge was implemented for initiation of the plasma-chemical reactions in the gas phase. Hydrogen–oxygen ($ H_{2} $–$ O_{2} $) gas composition of various ratios (1:2, 1:1, and 2:1) was employed as the plasma feed gas mixture. Hydrogen also served as the carrier gas. Optical emission spectroscopy was utilized to identify the intermediate reactive species and assume the possible mechanism of the plasma process. The effect of the power produced by the plasma discharge, as well as the heating of the zinc precursor, on the stoichiometry and structure of thin films was investigated. The obtained material properties were described by different analytical techniques. © The Author(s), under exclusive licence to Springer Science+Business Media, LLC, part of Springer Nature 2022. Springer Nature or its licensor holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law. |
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Variety of ZnO nanostructured materials prepared by PECVD |
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Logunov, Alexander Prokhorov, Igor Vshivtsev, Maksim Kudryashov, Mikhail Kudryashova, Yulia Malyshev, Vladimir Spivak, Yulia Greshnyakov, Evgeny Knyazev, Alexander Fukina, Diana Yunin, Pavel Moshnikov, Vyacheslav |
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Logunov, Alexander Prokhorov, Igor Vshivtsev, Maksim Kudryashov, Mikhail Kudryashova, Yulia Malyshev, Vladimir Spivak, Yulia Greshnyakov, Evgeny Knyazev, Alexander Fukina, Diana Yunin, Pavel Moshnikov, Vyacheslav |
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