Fabrication of cross-scale structures by Moiré effect in laser interference lithography
Abstract This paper presents a method for the fabrication of cross-scale structures using the controllable Moiré effect to break through the scale barriers caused by the spatial distribution in a laser interference lithography (LIL) system. The formation principle of macroscopic Moiré gratings in th...
Ausführliche Beschreibung
Gespeichert in:
| Autor*in: |
Liu, Mengnan [verfasserIn] |
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| Format: |
Artikel |
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| Sprache: |
Englisch |
| Erschienen: |
2022 |
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| Anmerkung: |
© The Author(s), under exclusive licence to Springer-Verlag GmbH Germany, part of Springer Nature 2022. Springer Nature or its licensor holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law. |
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| Übergeordnetes Werk: |
Enthalten in: Applied physics. B, Lasers and optics - Springer Berlin Heidelberg, 1981, 128(2022), 11 vom: 15. Okt. |
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| Übergeordnetes Werk: |
volume:128 ; year:2022 ; number:11 ; day:15 ; month:10 |
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| DOI / URN: |
10.1007/s00340-022-07916-6 |
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| 520 | |a Abstract This paper presents a method for the fabrication of cross-scale structures using the controllable Moiré effect to break through the scale barriers caused by the spatial distribution in a laser interference lithography (LIL) system. The formation principle of macroscopic Moiré gratings in the LIL system was analyzed as partial wavefront interference introduced by optical components. In this work, an additional lens was used in the improved two-beam LIL system to precisely control the size of Moiré gratings, combined with the intrinsic period in the LIL system to form a cross-scale distribution of light intensity. This method provides a way for the fabrication of cross-scale surface structures by single exposure. Through the double-exposure technology, the fabrication of isotropic and anisotropic structures can be achieved flexibly for different applications, such as photonic crystals, self-cleaning surfaces, structural color elements and anti-counterfeiting labels. | ||
| 700 | 1 | |a Wang, Zuobin |4 aut | |
| 700 | 1 | |a Dong, Litong |4 aut | |
| 700 | 1 | |a Sun, Baishun |4 aut | |
| 700 | 1 | |a Wang, Ying |4 aut | |
| 700 | 1 | |a Wang, Lu |4 aut | |
| 700 | 1 | |a Weng, Zhankun |4 aut | |
| 700 | 1 | |a Tian, Yanling |4 aut | |
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10.1007/s00340-022-07916-6 doi (DE-627)OLC2079740032 (DE-He213)s00340-022-07916-6-p DE-627 ger DE-627 rakwb eng 530 620 VZ 530 VZ UA 9001 VZ rvk Liu, Mengnan verfasserin aut Fabrication of cross-scale structures by Moiré effect in laser interference lithography 2022 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © The Author(s), under exclusive licence to Springer-Verlag GmbH Germany, part of Springer Nature 2022. Springer Nature or its licensor holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law. Abstract This paper presents a method for the fabrication of cross-scale structures using the controllable Moiré effect to break through the scale barriers caused by the spatial distribution in a laser interference lithography (LIL) system. The formation principle of macroscopic Moiré gratings in the LIL system was analyzed as partial wavefront interference introduced by optical components. In this work, an additional lens was used in the improved two-beam LIL system to precisely control the size of Moiré gratings, combined with the intrinsic period in the LIL system to form a cross-scale distribution of light intensity. This method provides a way for the fabrication of cross-scale surface structures by single exposure. Through the double-exposure technology, the fabrication of isotropic and anisotropic structures can be achieved flexibly for different applications, such as photonic crystals, self-cleaning surfaces, structural color elements and anti-counterfeiting labels. Wang, Zuobin aut Dong, Litong aut Sun, Baishun aut Wang, Ying aut Wang, Lu aut Weng, Zhankun aut Tian, Yanling aut Enthalten in Applied physics. B, Lasers and optics Springer Berlin Heidelberg, 1981 128(2022), 11 vom: 15. Okt. (DE-627)130297682 (DE-600)579693-3 (DE-576)015877272 0946-2171 nnns volume:128 year:2022 number:11 day:15 month:10 https://doi.org/10.1007/s00340-022-07916-6 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_2018 GBV_ILN_4277 UA 9001 AR 128 2022 11 15 10 |
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10.1007/s00340-022-07916-6 doi (DE-627)OLC2079740032 (DE-He213)s00340-022-07916-6-p DE-627 ger DE-627 rakwb eng 530 620 VZ 530 VZ UA 9001 VZ rvk Liu, Mengnan verfasserin aut Fabrication of cross-scale structures by Moiré effect in laser interference lithography 2022 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © The Author(s), under exclusive licence to Springer-Verlag GmbH Germany, part of Springer Nature 2022. Springer Nature or its licensor holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law. Abstract This paper presents a method for the fabrication of cross-scale structures using the controllable Moiré effect to break through the scale barriers caused by the spatial distribution in a laser interference lithography (LIL) system. The formation principle of macroscopic Moiré gratings in the LIL system was analyzed as partial wavefront interference introduced by optical components. In this work, an additional lens was used in the improved two-beam LIL system to precisely control the size of Moiré gratings, combined with the intrinsic period in the LIL system to form a cross-scale distribution of light intensity. This method provides a way for the fabrication of cross-scale surface structures by single exposure. Through the double-exposure technology, the fabrication of isotropic and anisotropic structures can be achieved flexibly for different applications, such as photonic crystals, self-cleaning surfaces, structural color elements and anti-counterfeiting labels. Wang, Zuobin aut Dong, Litong aut Sun, Baishun aut Wang, Ying aut Wang, Lu aut Weng, Zhankun aut Tian, Yanling aut Enthalten in Applied physics. B, Lasers and optics Springer Berlin Heidelberg, 1981 128(2022), 11 vom: 15. Okt. (DE-627)130297682 (DE-600)579693-3 (DE-576)015877272 0946-2171 nnns volume:128 year:2022 number:11 day:15 month:10 https://doi.org/10.1007/s00340-022-07916-6 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_2018 GBV_ILN_4277 UA 9001 AR 128 2022 11 15 10 |
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10.1007/s00340-022-07916-6 doi (DE-627)OLC2079740032 (DE-He213)s00340-022-07916-6-p DE-627 ger DE-627 rakwb eng 530 620 VZ 530 VZ UA 9001 VZ rvk Liu, Mengnan verfasserin aut Fabrication of cross-scale structures by Moiré effect in laser interference lithography 2022 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © The Author(s), under exclusive licence to Springer-Verlag GmbH Germany, part of Springer Nature 2022. Springer Nature or its licensor holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law. Abstract This paper presents a method for the fabrication of cross-scale structures using the controllable Moiré effect to break through the scale barriers caused by the spatial distribution in a laser interference lithography (LIL) system. The formation principle of macroscopic Moiré gratings in the LIL system was analyzed as partial wavefront interference introduced by optical components. In this work, an additional lens was used in the improved two-beam LIL system to precisely control the size of Moiré gratings, combined with the intrinsic period in the LIL system to form a cross-scale distribution of light intensity. This method provides a way for the fabrication of cross-scale surface structures by single exposure. Through the double-exposure technology, the fabrication of isotropic and anisotropic structures can be achieved flexibly for different applications, such as photonic crystals, self-cleaning surfaces, structural color elements and anti-counterfeiting labels. Wang, Zuobin aut Dong, Litong aut Sun, Baishun aut Wang, Ying aut Wang, Lu aut Weng, Zhankun aut Tian, Yanling aut Enthalten in Applied physics. B, Lasers and optics Springer Berlin Heidelberg, 1981 128(2022), 11 vom: 15. Okt. (DE-627)130297682 (DE-600)579693-3 (DE-576)015877272 0946-2171 nnns volume:128 year:2022 number:11 day:15 month:10 https://doi.org/10.1007/s00340-022-07916-6 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_2018 GBV_ILN_4277 UA 9001 AR 128 2022 11 15 10 |
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10.1007/s00340-022-07916-6 doi (DE-627)OLC2079740032 (DE-He213)s00340-022-07916-6-p DE-627 ger DE-627 rakwb eng 530 620 VZ 530 VZ UA 9001 VZ rvk Liu, Mengnan verfasserin aut Fabrication of cross-scale structures by Moiré effect in laser interference lithography 2022 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © The Author(s), under exclusive licence to Springer-Verlag GmbH Germany, part of Springer Nature 2022. Springer Nature or its licensor holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law. Abstract This paper presents a method for the fabrication of cross-scale structures using the controllable Moiré effect to break through the scale barriers caused by the spatial distribution in a laser interference lithography (LIL) system. The formation principle of macroscopic Moiré gratings in the LIL system was analyzed as partial wavefront interference introduced by optical components. In this work, an additional lens was used in the improved two-beam LIL system to precisely control the size of Moiré gratings, combined with the intrinsic period in the LIL system to form a cross-scale distribution of light intensity. This method provides a way for the fabrication of cross-scale surface structures by single exposure. Through the double-exposure technology, the fabrication of isotropic and anisotropic structures can be achieved flexibly for different applications, such as photonic crystals, self-cleaning surfaces, structural color elements and anti-counterfeiting labels. Wang, Zuobin aut Dong, Litong aut Sun, Baishun aut Wang, Ying aut Wang, Lu aut Weng, Zhankun aut Tian, Yanling aut Enthalten in Applied physics. B, Lasers and optics Springer Berlin Heidelberg, 1981 128(2022), 11 vom: 15. Okt. (DE-627)130297682 (DE-600)579693-3 (DE-576)015877272 0946-2171 nnns volume:128 year:2022 number:11 day:15 month:10 https://doi.org/10.1007/s00340-022-07916-6 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_2018 GBV_ILN_4277 UA 9001 AR 128 2022 11 15 10 |
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10.1007/s00340-022-07916-6 doi (DE-627)OLC2079740032 (DE-He213)s00340-022-07916-6-p DE-627 ger DE-627 rakwb eng 530 620 VZ 530 VZ UA 9001 VZ rvk Liu, Mengnan verfasserin aut Fabrication of cross-scale structures by Moiré effect in laser interference lithography 2022 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © The Author(s), under exclusive licence to Springer-Verlag GmbH Germany, part of Springer Nature 2022. Springer Nature or its licensor holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law. Abstract This paper presents a method for the fabrication of cross-scale structures using the controllable Moiré effect to break through the scale barriers caused by the spatial distribution in a laser interference lithography (LIL) system. The formation principle of macroscopic Moiré gratings in the LIL system was analyzed as partial wavefront interference introduced by optical components. In this work, an additional lens was used in the improved two-beam LIL system to precisely control the size of Moiré gratings, combined with the intrinsic period in the LIL system to form a cross-scale distribution of light intensity. This method provides a way for the fabrication of cross-scale surface structures by single exposure. Through the double-exposure technology, the fabrication of isotropic and anisotropic structures can be achieved flexibly for different applications, such as photonic crystals, self-cleaning surfaces, structural color elements and anti-counterfeiting labels. Wang, Zuobin aut Dong, Litong aut Sun, Baishun aut Wang, Ying aut Wang, Lu aut Weng, Zhankun aut Tian, Yanling aut Enthalten in Applied physics. B, Lasers and optics Springer Berlin Heidelberg, 1981 128(2022), 11 vom: 15. Okt. (DE-627)130297682 (DE-600)579693-3 (DE-576)015877272 0946-2171 nnns volume:128 year:2022 number:11 day:15 month:10 https://doi.org/10.1007/s00340-022-07916-6 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-PHY GBV_ILN_2018 GBV_ILN_4277 UA 9001 AR 128 2022 11 15 10 |
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Fabrication of cross-scale structures by Moiré effect in laser interference lithography |
| abstract |
Abstract This paper presents a method for the fabrication of cross-scale structures using the controllable Moiré effect to break through the scale barriers caused by the spatial distribution in a laser interference lithography (LIL) system. The formation principle of macroscopic Moiré gratings in the LIL system was analyzed as partial wavefront interference introduced by optical components. In this work, an additional lens was used in the improved two-beam LIL system to precisely control the size of Moiré gratings, combined with the intrinsic period in the LIL system to form a cross-scale distribution of light intensity. This method provides a way for the fabrication of cross-scale surface structures by single exposure. Through the double-exposure technology, the fabrication of isotropic and anisotropic structures can be achieved flexibly for different applications, such as photonic crystals, self-cleaning surfaces, structural color elements and anti-counterfeiting labels. © The Author(s), under exclusive licence to Springer-Verlag GmbH Germany, part of Springer Nature 2022. Springer Nature or its licensor holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law. |
| abstractGer |
Abstract This paper presents a method for the fabrication of cross-scale structures using the controllable Moiré effect to break through the scale barriers caused by the spatial distribution in a laser interference lithography (LIL) system. The formation principle of macroscopic Moiré gratings in the LIL system was analyzed as partial wavefront interference introduced by optical components. In this work, an additional lens was used in the improved two-beam LIL system to precisely control the size of Moiré gratings, combined with the intrinsic period in the LIL system to form a cross-scale distribution of light intensity. This method provides a way for the fabrication of cross-scale surface structures by single exposure. Through the double-exposure technology, the fabrication of isotropic and anisotropic structures can be achieved flexibly for different applications, such as photonic crystals, self-cleaning surfaces, structural color elements and anti-counterfeiting labels. © The Author(s), under exclusive licence to Springer-Verlag GmbH Germany, part of Springer Nature 2022. Springer Nature or its licensor holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law. |
| abstract_unstemmed |
Abstract This paper presents a method for the fabrication of cross-scale structures using the controllable Moiré effect to break through the scale barriers caused by the spatial distribution in a laser interference lithography (LIL) system. The formation principle of macroscopic Moiré gratings in the LIL system was analyzed as partial wavefront interference introduced by optical components. In this work, an additional lens was used in the improved two-beam LIL system to precisely control the size of Moiré gratings, combined with the intrinsic period in the LIL system to form a cross-scale distribution of light intensity. This method provides a way for the fabrication of cross-scale surface structures by single exposure. Through the double-exposure technology, the fabrication of isotropic and anisotropic structures can be achieved flexibly for different applications, such as photonic crystals, self-cleaning surfaces, structural color elements and anti-counterfeiting labels. © The Author(s), under exclusive licence to Springer-Verlag GmbH Germany, part of Springer Nature 2022. Springer Nature or its licensor holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law. |
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11 |
| title_short |
Fabrication of cross-scale structures by Moiré effect in laser interference lithography |
| url |
https://doi.org/10.1007/s00340-022-07916-6 |
| remote_bool |
false |
| author2 |
Wang, Zuobin Dong, Litong Sun, Baishun Wang, Ying Wang, Lu Weng, Zhankun Tian, Yanling |
| author2Str |
Wang, Zuobin Dong, Litong Sun, Baishun Wang, Ying Wang, Lu Weng, Zhankun Tian, Yanling |
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| doi_str |
10.1007/s00340-022-07916-6 |
| up_date |
2024-07-04T01:57:13.993Z |
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1803611782780026880 |
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