Characterization of hydrofluoric acid treated Y–Ba–Cu–O oxides

Abstract Effects of hydrofluoric acid (HF) treatment on the properties of Y–Ba–Cu–O oxides were investigated. No obvious etching of bulk Y–Ba–Cu–O and no degradation of zero resistance temperature were observed even though the oxides were placed into 49% HF solution for up to 20 h. Surface passivati...
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Gespeichert in:

Autor*in:	Jia, Q. X. [verfasserIn] Anderson, W. A.

Format:	Artikel
Sprache:	Englisch

Erschienen:	1989

Systematik:	VA 5350

Anmerkung:	© The Materials Research Society 1989

Übergeordnetes Werk:	Enthalten in: Journal of materials research - Springer International Publishing, 1986, 4(1989), 6 vom: Nov., Seite 1320-1325
Übergeordnetes Werk:	volume:4 ; year:1989 ; number:6 ; month:11 ; pages:1320-1325

Links:	Volltext

DOI / URN:	10.1557/JMR.1989.1320

Katalog-ID:	OLC2119954844

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520			\|a Abstract Effects of hydrofluoric acid (HF) treatment on the properties of Y–Ba–Cu–O oxides were investigated. No obvious etching of bulk Y–Ba–Cu–O and no degradation of zero resistance temperature were observed even though the oxides were placed into 49% HF solution for up to 20 h. Surface passivation of Y–Ba–Cu–O due to HF immersion was verified by subsequent immersion of Y–Ba–Cu–O in water. A thin layer of amorphous fluoride formed on the surface of the Y–Ba–Cu–O during HF treatment, which limited further reaction between Y–Ba–Cu–O and HF, and later reaction with water. Thin film Y–Ba–Cu–O was passivated by HF vapors and showed no degradation in Tc-zero after 30 min immersion in water. The properties of the surface layer of Y–Ba–Cu–O oxide after HF treatment are reported from Auger electron spectroscopy, x-ray diffraction, and scanning electron microscopy studies.
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allfields	10.1557/JMR.1989.1320 doi (DE-627)OLC2119954844 (DE-He213)JMR.1989.1320-p DE-627 ger DE-627 rakwb eng 670 VZ VA 5350 VZ rvk Jia, Q. X. verfasserin aut Characterization of hydrofluoric acid treated Y–Ba–Cu–O oxides 1989 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © The Materials Research Society 1989 Abstract Effects of hydrofluoric acid (HF) treatment on the properties of Y–Ba–Cu–O oxides were investigated. No obvious etching of bulk Y–Ba–Cu–O and no degradation of zero resistance temperature were observed even though the oxides were placed into 49% HF solution for up to 20 h. Surface passivation of Y–Ba–Cu–O due to HF immersion was verified by subsequent immersion of Y–Ba–Cu–O in water. A thin layer of amorphous fluoride formed on the surface of the Y–Ba–Cu–O during HF treatment, which limited further reaction between Y–Ba–Cu–O and HF, and later reaction with water. Thin film Y–Ba–Cu–O was passivated by HF vapors and showed no degradation in Tc-zero after 30 min immersion in water. The properties of the surface layer of Y–Ba–Cu–O oxide after HF treatment are reported from Auger electron spectroscopy, x-ray diffraction, and scanning electron microscopy studies. Anderson, W. A. aut Enthalten in Journal of materials research Springer International Publishing, 1986 4(1989), 6 vom: Nov., Seite 1320-1325 (DE-627)129206288 (DE-600)54876-5 (DE-576)01445744X 0884-2914 nnns volume:4 year:1989 number:6 month:11 pages:1320-1325 https://doi.org/10.1557/JMR.1989.1320 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_21 GBV_ILN_22 GBV_ILN_23 GBV_ILN_30 GBV_ILN_32 GBV_ILN_40 GBV_ILN_70 GBV_ILN_100 GBV_ILN_130 GBV_ILN_602 GBV_ILN_2005 GBV_ILN_2010 GBV_ILN_2020 GBV_ILN_2027 GBV_ILN_4126 GBV_ILN_4155 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4315 GBV_ILN_4319 GBV_ILN_4323 VA 5350 AR 4 1989 6 11 1320-1325
spelling	10.1557/JMR.1989.1320 doi (DE-627)OLC2119954844 (DE-He213)JMR.1989.1320-p DE-627 ger DE-627 rakwb eng 670 VZ VA 5350 VZ rvk Jia, Q. X. verfasserin aut Characterization of hydrofluoric acid treated Y–Ba–Cu–O oxides 1989 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © The Materials Research Society 1989 Abstract Effects of hydrofluoric acid (HF) treatment on the properties of Y–Ba–Cu–O oxides were investigated. No obvious etching of bulk Y–Ba–Cu–O and no degradation of zero resistance temperature were observed even though the oxides were placed into 49% HF solution for up to 20 h. Surface passivation of Y–Ba–Cu–O due to HF immersion was verified by subsequent immersion of Y–Ba–Cu–O in water. A thin layer of amorphous fluoride formed on the surface of the Y–Ba–Cu–O during HF treatment, which limited further reaction between Y–Ba–Cu–O and HF, and later reaction with water. Thin film Y–Ba–Cu–O was passivated by HF vapors and showed no degradation in Tc-zero after 30 min immersion in water. The properties of the surface layer of Y–Ba–Cu–O oxide after HF treatment are reported from Auger electron spectroscopy, x-ray diffraction, and scanning electron microscopy studies. Anderson, W. A. aut Enthalten in Journal of materials research Springer International Publishing, 1986 4(1989), 6 vom: Nov., Seite 1320-1325 (DE-627)129206288 (DE-600)54876-5 (DE-576)01445744X 0884-2914 nnns volume:4 year:1989 number:6 month:11 pages:1320-1325 https://doi.org/10.1557/JMR.1989.1320 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_21 GBV_ILN_22 GBV_ILN_23 GBV_ILN_30 GBV_ILN_32 GBV_ILN_40 GBV_ILN_70 GBV_ILN_100 GBV_ILN_130 GBV_ILN_602 GBV_ILN_2005 GBV_ILN_2010 GBV_ILN_2020 GBV_ILN_2027 GBV_ILN_4126 GBV_ILN_4155 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4315 GBV_ILN_4319 GBV_ILN_4323 VA 5350 AR 4 1989 6 11 1320-1325
allfields_unstemmed	10.1557/JMR.1989.1320 doi (DE-627)OLC2119954844 (DE-He213)JMR.1989.1320-p DE-627 ger DE-627 rakwb eng 670 VZ VA 5350 VZ rvk Jia, Q. X. verfasserin aut Characterization of hydrofluoric acid treated Y–Ba–Cu–O oxides 1989 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © The Materials Research Society 1989 Abstract Effects of hydrofluoric acid (HF) treatment on the properties of Y–Ba–Cu–O oxides were investigated. No obvious etching of bulk Y–Ba–Cu–O and no degradation of zero resistance temperature were observed even though the oxides were placed into 49% HF solution for up to 20 h. Surface passivation of Y–Ba–Cu–O due to HF immersion was verified by subsequent immersion of Y–Ba–Cu–O in water. A thin layer of amorphous fluoride formed on the surface of the Y–Ba–Cu–O during HF treatment, which limited further reaction between Y–Ba–Cu–O and HF, and later reaction with water. Thin film Y–Ba–Cu–O was passivated by HF vapors and showed no degradation in Tc-zero after 30 min immersion in water. The properties of the surface layer of Y–Ba–Cu–O oxide after HF treatment are reported from Auger electron spectroscopy, x-ray diffraction, and scanning electron microscopy studies. Anderson, W. A. aut Enthalten in Journal of materials research Springer International Publishing, 1986 4(1989), 6 vom: Nov., Seite 1320-1325 (DE-627)129206288 (DE-600)54876-5 (DE-576)01445744X 0884-2914 nnns volume:4 year:1989 number:6 month:11 pages:1320-1325 https://doi.org/10.1557/JMR.1989.1320 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_21 GBV_ILN_22 GBV_ILN_23 GBV_ILN_30 GBV_ILN_32 GBV_ILN_40 GBV_ILN_70 GBV_ILN_100 GBV_ILN_130 GBV_ILN_602 GBV_ILN_2005 GBV_ILN_2010 GBV_ILN_2020 GBV_ILN_2027 GBV_ILN_4126 GBV_ILN_4155 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4315 GBV_ILN_4319 GBV_ILN_4323 VA 5350 AR 4 1989 6 11 1320-1325
allfieldsGer	10.1557/JMR.1989.1320 doi (DE-627)OLC2119954844 (DE-He213)JMR.1989.1320-p DE-627 ger DE-627 rakwb eng 670 VZ VA 5350 VZ rvk Jia, Q. X. verfasserin aut Characterization of hydrofluoric acid treated Y–Ba–Cu–O oxides 1989 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © The Materials Research Society 1989 Abstract Effects of hydrofluoric acid (HF) treatment on the properties of Y–Ba–Cu–O oxides were investigated. No obvious etching of bulk Y–Ba–Cu–O and no degradation of zero resistance temperature were observed even though the oxides were placed into 49% HF solution for up to 20 h. Surface passivation of Y–Ba–Cu–O due to HF immersion was verified by subsequent immersion of Y–Ba–Cu–O in water. A thin layer of amorphous fluoride formed on the surface of the Y–Ba–Cu–O during HF treatment, which limited further reaction between Y–Ba–Cu–O and HF, and later reaction with water. Thin film Y–Ba–Cu–O was passivated by HF vapors and showed no degradation in Tc-zero after 30 min immersion in water. The properties of the surface layer of Y–Ba–Cu–O oxide after HF treatment are reported from Auger electron spectroscopy, x-ray diffraction, and scanning electron microscopy studies. Anderson, W. A. aut Enthalten in Journal of materials research Springer International Publishing, 1986 4(1989), 6 vom: Nov., Seite 1320-1325 (DE-627)129206288 (DE-600)54876-5 (DE-576)01445744X 0884-2914 nnns volume:4 year:1989 number:6 month:11 pages:1320-1325 https://doi.org/10.1557/JMR.1989.1320 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_21 GBV_ILN_22 GBV_ILN_23 GBV_ILN_30 GBV_ILN_32 GBV_ILN_40 GBV_ILN_70 GBV_ILN_100 GBV_ILN_130 GBV_ILN_602 GBV_ILN_2005 GBV_ILN_2010 GBV_ILN_2020 GBV_ILN_2027 GBV_ILN_4126 GBV_ILN_4155 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4315 GBV_ILN_4319 GBV_ILN_4323 VA 5350 AR 4 1989 6 11 1320-1325
allfieldsSound	10.1557/JMR.1989.1320 doi (DE-627)OLC2119954844 (DE-He213)JMR.1989.1320-p DE-627 ger DE-627 rakwb eng 670 VZ VA 5350 VZ rvk Jia, Q. X. verfasserin aut Characterization of hydrofluoric acid treated Y–Ba–Cu–O oxides 1989 Text txt rdacontent ohne Hilfsmittel zu benutzen n rdamedia Band nc rdacarrier © The Materials Research Society 1989 Abstract Effects of hydrofluoric acid (HF) treatment on the properties of Y–Ba–Cu–O oxides were investigated. No obvious etching of bulk Y–Ba–Cu–O and no degradation of zero resistance temperature were observed even though the oxides were placed into 49% HF solution for up to 20 h. Surface passivation of Y–Ba–Cu–O due to HF immersion was verified by subsequent immersion of Y–Ba–Cu–O in water. A thin layer of amorphous fluoride formed on the surface of the Y–Ba–Cu–O during HF treatment, which limited further reaction between Y–Ba–Cu–O and HF, and later reaction with water. Thin film Y–Ba–Cu–O was passivated by HF vapors and showed no degradation in Tc-zero after 30 min immersion in water. The properties of the surface layer of Y–Ba–Cu–O oxide after HF treatment are reported from Auger electron spectroscopy, x-ray diffraction, and scanning electron microscopy studies. Anderson, W. A. aut Enthalten in Journal of materials research Springer International Publishing, 1986 4(1989), 6 vom: Nov., Seite 1320-1325 (DE-627)129206288 (DE-600)54876-5 (DE-576)01445744X 0884-2914 nnns volume:4 year:1989 number:6 month:11 pages:1320-1325 https://doi.org/10.1557/JMR.1989.1320 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_OLC SSG-OLC-TEC GBV_ILN_21 GBV_ILN_22 GBV_ILN_23 GBV_ILN_30 GBV_ILN_32 GBV_ILN_40 GBV_ILN_70 GBV_ILN_100 GBV_ILN_130 GBV_ILN_602 GBV_ILN_2005 GBV_ILN_2010 GBV_ILN_2020 GBV_ILN_2027 GBV_ILN_4126 GBV_ILN_4155 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4315 GBV_ILN_4319 GBV_ILN_4323 VA 5350 AR 4 1989 6 11 1320-1325
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title_sort	characterization of hydrofluoric acid treated y–ba–cu–o oxides
title_auth	Characterization of hydrofluoric acid treated Y–Ba–Cu–O oxides
abstract	Abstract Effects of hydrofluoric acid (HF) treatment on the properties of Y–Ba–Cu–O oxides were investigated. No obvious etching of bulk Y–Ba–Cu–O and no degradation of zero resistance temperature were observed even though the oxides were placed into 49% HF solution for up to 20 h. Surface passivation of Y–Ba–Cu–O due to HF immersion was verified by subsequent immersion of Y–Ba–Cu–O in water. A thin layer of amorphous fluoride formed on the surface of the Y–Ba–Cu–O during HF treatment, which limited further reaction between Y–Ba–Cu–O and HF, and later reaction with water. Thin film Y–Ba–Cu–O was passivated by HF vapors and showed no degradation in Tc-zero after 30 min immersion in water. The properties of the surface layer of Y–Ba–Cu–O oxide after HF treatment are reported from Auger electron spectroscopy, x-ray diffraction, and scanning electron microscopy studies. © The Materials Research Society 1989
abstractGer	Abstract Effects of hydrofluoric acid (HF) treatment on the properties of Y–Ba–Cu–O oxides were investigated. No obvious etching of bulk Y–Ba–Cu–O and no degradation of zero resistance temperature were observed even though the oxides were placed into 49% HF solution for up to 20 h. Surface passivation of Y–Ba–Cu–O due to HF immersion was verified by subsequent immersion of Y–Ba–Cu–O in water. A thin layer of amorphous fluoride formed on the surface of the Y–Ba–Cu–O during HF treatment, which limited further reaction between Y–Ba–Cu–O and HF, and later reaction with water. Thin film Y–Ba–Cu–O was passivated by HF vapors and showed no degradation in Tc-zero after 30 min immersion in water. The properties of the surface layer of Y–Ba–Cu–O oxide after HF treatment are reported from Auger electron spectroscopy, x-ray diffraction, and scanning electron microscopy studies. © The Materials Research Society 1989
abstract_unstemmed	Abstract Effects of hydrofluoric acid (HF) treatment on the properties of Y–Ba–Cu–O oxides were investigated. No obvious etching of bulk Y–Ba–Cu–O and no degradation of zero resistance temperature were observed even though the oxides were placed into 49% HF solution for up to 20 h. Surface passivation of Y–Ba–Cu–O due to HF immersion was verified by subsequent immersion of Y–Ba–Cu–O in water. A thin layer of amorphous fluoride formed on the surface of the Y–Ba–Cu–O during HF treatment, which limited further reaction between Y–Ba–Cu–O and HF, and later reaction with water. Thin film Y–Ba–Cu–O was passivated by HF vapors and showed no degradation in Tc-zero after 30 min immersion in water. The properties of the surface layer of Y–Ba–Cu–O oxide after HF treatment are reported from Auger electron spectroscopy, x-ray diffraction, and scanning electron microscopy studies. © The Materials Research Society 1989
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container_issue	6
title_short	Characterization of hydrofluoric acid treated Y–Ba–Cu–O oxides
url	https://doi.org/10.1557/JMR.1989.1320
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author2	Anderson, W. A.
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doi_str	10.1557/JMR.1989.1320
up_date	2024-07-04T02:47:36.384Z
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