Material removal process of single-crystal SiC in chemical-magnetorheological compound finishing

Abstract Aiming at the material removal of single-crystal SiC in chemical-magnetorheological compound finishing (CMRF), polishing slurries with different components were designed to conduct polishing experiments in this study. On this basis, the mechanical, chemical, and combined effects in the poli...
Ausführliche Beschreibung

Gespeichert in:
Autor*in:

Liang, Huazhuo [verfasserIn]

Lu, Jiabin

Pan, Jisheng

Yan, Qiusheng

Format:

E-Artikel

Sprache:

Englisch

Erschienen:

2017

Schlagwörter:

Single-crystal SiC

Chemical-magnetorheological compound finishing

Fenton reaction

Material removal

Anmerkung:

© Springer-Verlag London Ltd. 2017

Übergeordnetes Werk:

Enthalten in: The international journal of advanced manufacturing technology - London : Springer, 1985, 94(2017), 5-8 vom: 21. Sept., Seite 2939-2948

Übergeordnetes Werk:

volume:94 ; year:2017 ; number:5-8 ; day:21 ; month:09 ; pages:2939-2948

Links:

Volltext

DOI / URN:

10.1007/s00170-017-1098-z

Katalog-ID:

SPR001462997

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