Material removal process of single-crystal SiC in chemical-magnetorheological compound finishing
Abstract Aiming at the material removal of single-crystal SiC in chemical-magnetorheological compound finishing (CMRF), polishing slurries with different components were designed to conduct polishing experiments in this study. On this basis, the mechanical, chemical, and combined effects in the poli...
Ausführliche Beschreibung
Autor*in: |
Liang, Huazhuo [verfasserIn] |
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Format: |
E-Artikel |
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Sprache: |
Englisch |
Erschienen: |
2017 |
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Schlagwörter: |
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Anmerkung: |
© Springer-Verlag London Ltd. 2017 |
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Übergeordnetes Werk: |
Enthalten in: The international journal of advanced manufacturing technology - London : Springer, 1985, 94(2017), 5-8 vom: 21. Sept., Seite 2939-2948 |
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Übergeordnetes Werk: |
volume:94 ; year:2017 ; number:5-8 ; day:21 ; month:09 ; pages:2939-2948 |
Links: |
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DOI / URN: |
10.1007/s00170-017-1098-z |
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Katalog-ID: |
SPR001462997 |
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520 | |a Abstract Aiming at the material removal of single-crystal SiC in chemical-magnetorheological compound finishing (CMRF), polishing slurries with different components were designed to conduct polishing experiments in this study. On this basis, the mechanical, chemical, and combined effects in the polishing process were studied and the material removal model of SiC in CMRF was established. The results showed that materials are mainly removed via mechanical removal through micro-cutting of abrasive particles. Among those factors influencing material removal, mechanical removal plays a dominant role, which removes much more material than the chemical effect. Moreover, the abrasive components in the CMRF slurry determine the mechanical removal capacity of materials. The carbonyl iron powder (CIP) content influences various parameters, such as the stiffness of the CMRF pads, the constraining force on the abrasive particles, the contact state, and chemical reactivity between catalysts and workpiece surfaces. Greater contents of the abrasive and the carbonyl iron powder yield stronger material removal capacity of the CMRF, leading to more contribution to material removal from the mechanical effect than from the chemical effect. The contribution of the mechanical effect of abrasives to the material removal rate reached 63.41 to 91.42%, while those of the polishing pad and the chemical effect to material removal are 4.81 to 10.37%, and 3.74 to 26.22%, respectively. | ||
650 | 4 | |a Single-crystal SiC |7 (dpeaa)DE-He213 | |
650 | 4 | |a Chemical-magnetorheological compound finishing |7 (dpeaa)DE-He213 | |
650 | 4 | |a Fenton reaction |7 (dpeaa)DE-He213 | |
650 | 4 | |a Material removal |7 (dpeaa)DE-He213 | |
700 | 1 | |a Lu, Jiabin |4 aut | |
700 | 1 | |a Pan, Jisheng |4 aut | |
700 | 1 | |a Yan, Qiusheng |4 aut | |
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10.1007/s00170-017-1098-z doi (DE-627)SPR001462997 (SPR)s00170-017-1098-z-e DE-627 ger DE-627 rakwb eng Liang, Huazhuo verfasserin aut Material removal process of single-crystal SiC in chemical-magnetorheological compound finishing 2017 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Springer-Verlag London Ltd. 2017 Abstract Aiming at the material removal of single-crystal SiC in chemical-magnetorheological compound finishing (CMRF), polishing slurries with different components were designed to conduct polishing experiments in this study. On this basis, the mechanical, chemical, and combined effects in the polishing process were studied and the material removal model of SiC in CMRF was established. The results showed that materials are mainly removed via mechanical removal through micro-cutting of abrasive particles. Among those factors influencing material removal, mechanical removal plays a dominant role, which removes much more material than the chemical effect. Moreover, the abrasive components in the CMRF slurry determine the mechanical removal capacity of materials. The carbonyl iron powder (CIP) content influences various parameters, such as the stiffness of the CMRF pads, the constraining force on the abrasive particles, the contact state, and chemical reactivity between catalysts and workpiece surfaces. Greater contents of the abrasive and the carbonyl iron powder yield stronger material removal capacity of the CMRF, leading to more contribution to material removal from the mechanical effect than from the chemical effect. The contribution of the mechanical effect of abrasives to the material removal rate reached 63.41 to 91.42%, while those of the polishing pad and the chemical effect to material removal are 4.81 to 10.37%, and 3.74 to 26.22%, respectively. Single-crystal SiC (dpeaa)DE-He213 Chemical-magnetorheological compound finishing (dpeaa)DE-He213 Fenton reaction (dpeaa)DE-He213 Material removal (dpeaa)DE-He213 Lu, Jiabin aut Pan, Jisheng aut Yan, Qiusheng aut Enthalten in The international journal of advanced manufacturing technology London : Springer, 1985 94(2017), 5-8 vom: 21. Sept., Seite 2939-2948 (DE-627)270127712 (DE-600)1476510-X 1433-3015 nnns volume:94 year:2017 number:5-8 day:21 month:09 pages:2939-2948 https://dx.doi.org/10.1007/s00170-017-1098-z lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 94 2017 5-8 21 09 2939-2948 |
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10.1007/s00170-017-1098-z doi (DE-627)SPR001462997 (SPR)s00170-017-1098-z-e DE-627 ger DE-627 rakwb eng Liang, Huazhuo verfasserin aut Material removal process of single-crystal SiC in chemical-magnetorheological compound finishing 2017 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Springer-Verlag London Ltd. 2017 Abstract Aiming at the material removal of single-crystal SiC in chemical-magnetorheological compound finishing (CMRF), polishing slurries with different components were designed to conduct polishing experiments in this study. On this basis, the mechanical, chemical, and combined effects in the polishing process were studied and the material removal model of SiC in CMRF was established. The results showed that materials are mainly removed via mechanical removal through micro-cutting of abrasive particles. Among those factors influencing material removal, mechanical removal plays a dominant role, which removes much more material than the chemical effect. Moreover, the abrasive components in the CMRF slurry determine the mechanical removal capacity of materials. The carbonyl iron powder (CIP) content influences various parameters, such as the stiffness of the CMRF pads, the constraining force on the abrasive particles, the contact state, and chemical reactivity between catalysts and workpiece surfaces. Greater contents of the abrasive and the carbonyl iron powder yield stronger material removal capacity of the CMRF, leading to more contribution to material removal from the mechanical effect than from the chemical effect. The contribution of the mechanical effect of abrasives to the material removal rate reached 63.41 to 91.42%, while those of the polishing pad and the chemical effect to material removal are 4.81 to 10.37%, and 3.74 to 26.22%, respectively. Single-crystal SiC (dpeaa)DE-He213 Chemical-magnetorheological compound finishing (dpeaa)DE-He213 Fenton reaction (dpeaa)DE-He213 Material removal (dpeaa)DE-He213 Lu, Jiabin aut Pan, Jisheng aut Yan, Qiusheng aut Enthalten in The international journal of advanced manufacturing technology London : Springer, 1985 94(2017), 5-8 vom: 21. Sept., Seite 2939-2948 (DE-627)270127712 (DE-600)1476510-X 1433-3015 nnns volume:94 year:2017 number:5-8 day:21 month:09 pages:2939-2948 https://dx.doi.org/10.1007/s00170-017-1098-z lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 94 2017 5-8 21 09 2939-2948 |
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10.1007/s00170-017-1098-z doi (DE-627)SPR001462997 (SPR)s00170-017-1098-z-e DE-627 ger DE-627 rakwb eng Liang, Huazhuo verfasserin aut Material removal process of single-crystal SiC in chemical-magnetorheological compound finishing 2017 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Springer-Verlag London Ltd. 2017 Abstract Aiming at the material removal of single-crystal SiC in chemical-magnetorheological compound finishing (CMRF), polishing slurries with different components were designed to conduct polishing experiments in this study. On this basis, the mechanical, chemical, and combined effects in the polishing process were studied and the material removal model of SiC in CMRF was established. The results showed that materials are mainly removed via mechanical removal through micro-cutting of abrasive particles. Among those factors influencing material removal, mechanical removal plays a dominant role, which removes much more material than the chemical effect. Moreover, the abrasive components in the CMRF slurry determine the mechanical removal capacity of materials. The carbonyl iron powder (CIP) content influences various parameters, such as the stiffness of the CMRF pads, the constraining force on the abrasive particles, the contact state, and chemical reactivity between catalysts and workpiece surfaces. Greater contents of the abrasive and the carbonyl iron powder yield stronger material removal capacity of the CMRF, leading to more contribution to material removal from the mechanical effect than from the chemical effect. The contribution of the mechanical effect of abrasives to the material removal rate reached 63.41 to 91.42%, while those of the polishing pad and the chemical effect to material removal are 4.81 to 10.37%, and 3.74 to 26.22%, respectively. Single-crystal SiC (dpeaa)DE-He213 Chemical-magnetorheological compound finishing (dpeaa)DE-He213 Fenton reaction (dpeaa)DE-He213 Material removal (dpeaa)DE-He213 Lu, Jiabin aut Pan, Jisheng aut Yan, Qiusheng aut Enthalten in The international journal of advanced manufacturing technology London : Springer, 1985 94(2017), 5-8 vom: 21. Sept., Seite 2939-2948 (DE-627)270127712 (DE-600)1476510-X 1433-3015 nnns volume:94 year:2017 number:5-8 day:21 month:09 pages:2939-2948 https://dx.doi.org/10.1007/s00170-017-1098-z lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 94 2017 5-8 21 09 2939-2948 |
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10.1007/s00170-017-1098-z doi (DE-627)SPR001462997 (SPR)s00170-017-1098-z-e DE-627 ger DE-627 rakwb eng Liang, Huazhuo verfasserin aut Material removal process of single-crystal SiC in chemical-magnetorheological compound finishing 2017 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Springer-Verlag London Ltd. 2017 Abstract Aiming at the material removal of single-crystal SiC in chemical-magnetorheological compound finishing (CMRF), polishing slurries with different components were designed to conduct polishing experiments in this study. On this basis, the mechanical, chemical, and combined effects in the polishing process were studied and the material removal model of SiC in CMRF was established. The results showed that materials are mainly removed via mechanical removal through micro-cutting of abrasive particles. Among those factors influencing material removal, mechanical removal plays a dominant role, which removes much more material than the chemical effect. Moreover, the abrasive components in the CMRF slurry determine the mechanical removal capacity of materials. The carbonyl iron powder (CIP) content influences various parameters, such as the stiffness of the CMRF pads, the constraining force on the abrasive particles, the contact state, and chemical reactivity between catalysts and workpiece surfaces. Greater contents of the abrasive and the carbonyl iron powder yield stronger material removal capacity of the CMRF, leading to more contribution to material removal from the mechanical effect than from the chemical effect. The contribution of the mechanical effect of abrasives to the material removal rate reached 63.41 to 91.42%, while those of the polishing pad and the chemical effect to material removal are 4.81 to 10.37%, and 3.74 to 26.22%, respectively. Single-crystal SiC (dpeaa)DE-He213 Chemical-magnetorheological compound finishing (dpeaa)DE-He213 Fenton reaction (dpeaa)DE-He213 Material removal (dpeaa)DE-He213 Lu, Jiabin aut Pan, Jisheng aut Yan, Qiusheng aut Enthalten in The international journal of advanced manufacturing technology London : Springer, 1985 94(2017), 5-8 vom: 21. Sept., Seite 2939-2948 (DE-627)270127712 (DE-600)1476510-X 1433-3015 nnns volume:94 year:2017 number:5-8 day:21 month:09 pages:2939-2948 https://dx.doi.org/10.1007/s00170-017-1098-z lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 94 2017 5-8 21 09 2939-2948 |
allfieldsSound |
10.1007/s00170-017-1098-z doi (DE-627)SPR001462997 (SPR)s00170-017-1098-z-e DE-627 ger DE-627 rakwb eng Liang, Huazhuo verfasserin aut Material removal process of single-crystal SiC in chemical-magnetorheological compound finishing 2017 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Springer-Verlag London Ltd. 2017 Abstract Aiming at the material removal of single-crystal SiC in chemical-magnetorheological compound finishing (CMRF), polishing slurries with different components were designed to conduct polishing experiments in this study. On this basis, the mechanical, chemical, and combined effects in the polishing process were studied and the material removal model of SiC in CMRF was established. The results showed that materials are mainly removed via mechanical removal through micro-cutting of abrasive particles. Among those factors influencing material removal, mechanical removal plays a dominant role, which removes much more material than the chemical effect. Moreover, the abrasive components in the CMRF slurry determine the mechanical removal capacity of materials. The carbonyl iron powder (CIP) content influences various parameters, such as the stiffness of the CMRF pads, the constraining force on the abrasive particles, the contact state, and chemical reactivity between catalysts and workpiece surfaces. Greater contents of the abrasive and the carbonyl iron powder yield stronger material removal capacity of the CMRF, leading to more contribution to material removal from the mechanical effect than from the chemical effect. The contribution of the mechanical effect of abrasives to the material removal rate reached 63.41 to 91.42%, while those of the polishing pad and the chemical effect to material removal are 4.81 to 10.37%, and 3.74 to 26.22%, respectively. Single-crystal SiC (dpeaa)DE-He213 Chemical-magnetorheological compound finishing (dpeaa)DE-He213 Fenton reaction (dpeaa)DE-He213 Material removal (dpeaa)DE-He213 Lu, Jiabin aut Pan, Jisheng aut Yan, Qiusheng aut Enthalten in The international journal of advanced manufacturing technology London : Springer, 1985 94(2017), 5-8 vom: 21. Sept., Seite 2939-2948 (DE-627)270127712 (DE-600)1476510-X 1433-3015 nnns volume:94 year:2017 number:5-8 day:21 month:09 pages:2939-2948 https://dx.doi.org/10.1007/s00170-017-1098-z lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 94 2017 5-8 21 09 2939-2948 |
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Enthalten in The international journal of advanced manufacturing technology 94(2017), 5-8 vom: 21. Sept., Seite 2939-2948 volume:94 year:2017 number:5-8 day:21 month:09 pages:2939-2948 |
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Enthalten in The international journal of advanced manufacturing technology 94(2017), 5-8 vom: 21. Sept., Seite 2939-2948 volume:94 year:2017 number:5-8 day:21 month:09 pages:2939-2948 |
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Liang, Huazhuo @@aut@@ Lu, Jiabin @@aut@@ Pan, Jisheng @@aut@@ Yan, Qiusheng @@aut@@ |
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On this basis, the mechanical, chemical, and combined effects in the polishing process were studied and the material removal model of SiC in CMRF was established. The results showed that materials are mainly removed via mechanical removal through micro-cutting of abrasive particles. Among those factors influencing material removal, mechanical removal plays a dominant role, which removes much more material than the chemical effect. Moreover, the abrasive components in the CMRF slurry determine the mechanical removal capacity of materials. The carbonyl iron powder (CIP) content influences various parameters, such as the stiffness of the CMRF pads, the constraining force on the abrasive particles, the contact state, and chemical reactivity between catalysts and workpiece surfaces. Greater contents of the abrasive and the carbonyl iron powder yield stronger material removal capacity of the CMRF, leading to more contribution to material removal from the mechanical effect than from the chemical effect. 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Liang, Huazhuo |
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Liang, Huazhuo misc Single-crystal SiC misc Chemical-magnetorheological compound finishing misc Fenton reaction misc Material removal Material removal process of single-crystal SiC in chemical-magnetorheological compound finishing |
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Material removal process of single-crystal SiC in chemical-magnetorheological compound finishing Single-crystal SiC (dpeaa)DE-He213 Chemical-magnetorheological compound finishing (dpeaa)DE-He213 Fenton reaction (dpeaa)DE-He213 Material removal (dpeaa)DE-He213 |
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material removal process of single-crystal sic in chemical-magnetorheological compound finishing |
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Material removal process of single-crystal SiC in chemical-magnetorheological compound finishing |
abstract |
Abstract Aiming at the material removal of single-crystal SiC in chemical-magnetorheological compound finishing (CMRF), polishing slurries with different components were designed to conduct polishing experiments in this study. On this basis, the mechanical, chemical, and combined effects in the polishing process were studied and the material removal model of SiC in CMRF was established. The results showed that materials are mainly removed via mechanical removal through micro-cutting of abrasive particles. Among those factors influencing material removal, mechanical removal plays a dominant role, which removes much more material than the chemical effect. Moreover, the abrasive components in the CMRF slurry determine the mechanical removal capacity of materials. The carbonyl iron powder (CIP) content influences various parameters, such as the stiffness of the CMRF pads, the constraining force on the abrasive particles, the contact state, and chemical reactivity between catalysts and workpiece surfaces. Greater contents of the abrasive and the carbonyl iron powder yield stronger material removal capacity of the CMRF, leading to more contribution to material removal from the mechanical effect than from the chemical effect. The contribution of the mechanical effect of abrasives to the material removal rate reached 63.41 to 91.42%, while those of the polishing pad and the chemical effect to material removal are 4.81 to 10.37%, and 3.74 to 26.22%, respectively. © Springer-Verlag London Ltd. 2017 |
abstractGer |
Abstract Aiming at the material removal of single-crystal SiC in chemical-magnetorheological compound finishing (CMRF), polishing slurries with different components were designed to conduct polishing experiments in this study. On this basis, the mechanical, chemical, and combined effects in the polishing process were studied and the material removal model of SiC in CMRF was established. The results showed that materials are mainly removed via mechanical removal through micro-cutting of abrasive particles. Among those factors influencing material removal, mechanical removal plays a dominant role, which removes much more material than the chemical effect. Moreover, the abrasive components in the CMRF slurry determine the mechanical removal capacity of materials. The carbonyl iron powder (CIP) content influences various parameters, such as the stiffness of the CMRF pads, the constraining force on the abrasive particles, the contact state, and chemical reactivity between catalysts and workpiece surfaces. Greater contents of the abrasive and the carbonyl iron powder yield stronger material removal capacity of the CMRF, leading to more contribution to material removal from the mechanical effect than from the chemical effect. The contribution of the mechanical effect of abrasives to the material removal rate reached 63.41 to 91.42%, while those of the polishing pad and the chemical effect to material removal are 4.81 to 10.37%, and 3.74 to 26.22%, respectively. © Springer-Verlag London Ltd. 2017 |
abstract_unstemmed |
Abstract Aiming at the material removal of single-crystal SiC in chemical-magnetorheological compound finishing (CMRF), polishing slurries with different components were designed to conduct polishing experiments in this study. On this basis, the mechanical, chemical, and combined effects in the polishing process were studied and the material removal model of SiC in CMRF was established. The results showed that materials are mainly removed via mechanical removal through micro-cutting of abrasive particles. Among those factors influencing material removal, mechanical removal plays a dominant role, which removes much more material than the chemical effect. Moreover, the abrasive components in the CMRF slurry determine the mechanical removal capacity of materials. The carbonyl iron powder (CIP) content influences various parameters, such as the stiffness of the CMRF pads, the constraining force on the abrasive particles, the contact state, and chemical reactivity between catalysts and workpiece surfaces. Greater contents of the abrasive and the carbonyl iron powder yield stronger material removal capacity of the CMRF, leading to more contribution to material removal from the mechanical effect than from the chemical effect. The contribution of the mechanical effect of abrasives to the material removal rate reached 63.41 to 91.42%, while those of the polishing pad and the chemical effect to material removal are 4.81 to 10.37%, and 3.74 to 26.22%, respectively. © Springer-Verlag London Ltd. 2017 |
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title_short |
Material removal process of single-crystal SiC in chemical-magnetorheological compound finishing |
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https://dx.doi.org/10.1007/s00170-017-1098-z |
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Lu, Jiabin Pan, Jisheng Yan, Qiusheng |
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Lu, Jiabin Pan, Jisheng Yan, Qiusheng |
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doi_str |
10.1007/s00170-017-1098-z |
up_date |
2024-07-03T22:45:07.609Z |
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|
score |
7.401473 |