Synthesis of photosensitive poly(methyl methacrylate-co-glycidyl methacrylate) for optical waveguide devices

Abstract Photosensitive poly(MMA-co-GMA) for optical waveguide was synthesized, and the refractive index of the polymer film was tuned in the range of 1.481–1.588 at 1550 nm by mixing with bis-phenol-A epoxy resin. The film, which was made by spinning coated the poly(MMA-co-GMA) with photo initiator...
Ausführliche Beschreibung

Gespeichert in:

Autor*in:	Fei, Xu [verfasserIn] Shi, Yuan Cao, Yang

Format:	E-Artikel
Sprache:	Englisch

Erschienen:	2010

Schlagwörter:	Optical Waveguide Butyl Acetate Channel Waveguide Straight Waveguide Optical Waveguide Device

Anmerkung:	© Springer-Verlag 2010

Übergeordnetes Werk:	Enthalten in: Applied physics - Berlin : Springer, 1973, 100(2010), 2 vom: 09. Juli, Seite 409-414
Übergeordnetes Werk:	volume:100 ; year:2010 ; number:2 ; day:09 ; month:07 ; pages:409-414

Links:	Volltext

DOI / URN:	10.1007/s00339-010-5851-5

Katalog-ID:	SPR004110439

Internformat


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520			\|a Abstract Photosensitive poly(MMA-co-GMA) for optical waveguide was synthesized, and the refractive index of the polymer film was tuned in the range of 1.481–1.588 at 1550 nm by mixing with bis-phenol-A epoxy resin. The film, which was made by spinning coated the poly(MMA-co-GMA) with photo initiator, had good UV light lithograph sensitivity, high glass transition temperature (Tg: 153°C, after crosslinking) and good thermal stabilities (Td: up to 324°C, after crosslinking). The optical waveguides with very smooth top surface were fabricated from the resulting polymer by direct UV exposure and chemical development. For waveguides with cladding, the propagation losses of the channel waveguides were measured to be below 3 dB/cm at 1550 nm.
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912			\|a GBV_ILN_100
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912			\|a GBV_ILN_105
912			\|a GBV_ILN_110
912			\|a GBV_ILN_120
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912			\|a GBV_ILN_151
912			\|a GBV_ILN_152
912			\|a GBV_ILN_161
912			\|a GBV_ILN_170
912			\|a GBV_ILN_171
912			\|a GBV_ILN_187
912			\|a GBV_ILN_206
912			\|a GBV_ILN_213
912			\|a GBV_ILN_224
912			\|a GBV_ILN_230
912			\|a GBV_ILN_250
912			\|a GBV_ILN_267
912			\|a GBV_ILN_281
912			\|a GBV_ILN_285
912			\|a GBV_ILN_293
912			\|a GBV_ILN_370
912			\|a GBV_ILN_602
912			\|a GBV_ILN_636
912			\|a GBV_ILN_702
912			\|a GBV_ILN_2001
912			\|a GBV_ILN_2003
912			\|a GBV_ILN_2004
912			\|a GBV_ILN_2005
912			\|a GBV_ILN_2006
912			\|a GBV_ILN_2007
912			\|a GBV_ILN_2008
912			\|a GBV_ILN_2009
912			\|a GBV_ILN_2010
912			\|a GBV_ILN_2011
912			\|a GBV_ILN_2014
912			\|a GBV_ILN_2015
912			\|a GBV_ILN_2020
912			\|a GBV_ILN_2021
912			\|a GBV_ILN_2025
912			\|a GBV_ILN_2026
912			\|a GBV_ILN_2027
912			\|a GBV_ILN_2031
912			\|a GBV_ILN_2034
912			\|a GBV_ILN_2037
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912			\|a GBV_ILN_2044
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912			\|a GBV_ILN_2049
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912			\|a GBV_ILN_2055
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912			\|a GBV_ILN_2107
912			\|a GBV_ILN_2108
912			\|a GBV_ILN_2110
912			\|a GBV_ILN_2111
912			\|a GBV_ILN_2112
912			\|a GBV_ILN_2113
912			\|a GBV_ILN_2116
912			\|a GBV_ILN_2118
912			\|a GBV_ILN_2119
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allfields	10.1007/s00339-010-5851-5 doi (DE-627)SPR004110439 (SPR)s00339-010-5851-5-e DE-627 ger DE-627 rakwb eng Fei, Xu verfasserin aut Synthesis of photosensitive poly(methyl methacrylate-co-glycidyl methacrylate) for optical waveguide devices 2010 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Springer-Verlag 2010 Abstract Photosensitive poly(MMA-co-GMA) for optical waveguide was synthesized, and the refractive index of the polymer film was tuned in the range of 1.481–1.588 at 1550 nm by mixing with bis-phenol-A epoxy resin. The film, which was made by spinning coated the poly(MMA-co-GMA) with photo initiator, had good UV light lithograph sensitivity, high glass transition temperature (Tg: 153°C, after crosslinking) and good thermal stabilities (Td: up to 324°C, after crosslinking). The optical waveguides with very smooth top surface were fabricated from the resulting polymer by direct UV exposure and chemical development. For waveguides with cladding, the propagation losses of the channel waveguides were measured to be below 3 dB/cm at 1550 nm. Optical Waveguide (dpeaa)DE-He213 Butyl Acetate (dpeaa)DE-He213 Channel Waveguide (dpeaa)DE-He213 Straight Waveguide (dpeaa)DE-He213 Optical Waveguide Device (dpeaa)DE-He213 Shi, Yuan aut Cao, Yang aut Enthalten in Applied physics Berlin : Springer, 1973 100(2010), 2 vom: 09. Juli, Seite 409-414 (DE-627)235503231 (DE-600)1398311-8 1432-0630 nnns volume:100 year:2010 number:2 day:09 month:07 pages:409-414 https://dx.doi.org/10.1007/s00339-010-5851-5 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_267 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 100 2010 2 09 07 409-414
spelling	10.1007/s00339-010-5851-5 doi (DE-627)SPR004110439 (SPR)s00339-010-5851-5-e DE-627 ger DE-627 rakwb eng Fei, Xu verfasserin aut Synthesis of photosensitive poly(methyl methacrylate-co-glycidyl methacrylate) for optical waveguide devices 2010 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Springer-Verlag 2010 Abstract Photosensitive poly(MMA-co-GMA) for optical waveguide was synthesized, and the refractive index of the polymer film was tuned in the range of 1.481–1.588 at 1550 nm by mixing with bis-phenol-A epoxy resin. The film, which was made by spinning coated the poly(MMA-co-GMA) with photo initiator, had good UV light lithograph sensitivity, high glass transition temperature (Tg: 153°C, after crosslinking) and good thermal stabilities (Td: up to 324°C, after crosslinking). The optical waveguides with very smooth top surface were fabricated from the resulting polymer by direct UV exposure and chemical development. For waveguides with cladding, the propagation losses of the channel waveguides were measured to be below 3 dB/cm at 1550 nm. Optical Waveguide (dpeaa)DE-He213 Butyl Acetate (dpeaa)DE-He213 Channel Waveguide (dpeaa)DE-He213 Straight Waveguide (dpeaa)DE-He213 Optical Waveguide Device (dpeaa)DE-He213 Shi, Yuan aut Cao, Yang aut Enthalten in Applied physics Berlin : Springer, 1973 100(2010), 2 vom: 09. Juli, Seite 409-414 (DE-627)235503231 (DE-600)1398311-8 1432-0630 nnns volume:100 year:2010 number:2 day:09 month:07 pages:409-414 https://dx.doi.org/10.1007/s00339-010-5851-5 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_267 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 100 2010 2 09 07 409-414
allfields_unstemmed	10.1007/s00339-010-5851-5 doi (DE-627)SPR004110439 (SPR)s00339-010-5851-5-e DE-627 ger DE-627 rakwb eng Fei, Xu verfasserin aut Synthesis of photosensitive poly(methyl methacrylate-co-glycidyl methacrylate) for optical waveguide devices 2010 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Springer-Verlag 2010 Abstract Photosensitive poly(MMA-co-GMA) for optical waveguide was synthesized, and the refractive index of the polymer film was tuned in the range of 1.481–1.588 at 1550 nm by mixing with bis-phenol-A epoxy resin. The film, which was made by spinning coated the poly(MMA-co-GMA) with photo initiator, had good UV light lithograph sensitivity, high glass transition temperature (Tg: 153°C, after crosslinking) and good thermal stabilities (Td: up to 324°C, after crosslinking). The optical waveguides with very smooth top surface were fabricated from the resulting polymer by direct UV exposure and chemical development. For waveguides with cladding, the propagation losses of the channel waveguides were measured to be below 3 dB/cm at 1550 nm. Optical Waveguide (dpeaa)DE-He213 Butyl Acetate (dpeaa)DE-He213 Channel Waveguide (dpeaa)DE-He213 Straight Waveguide (dpeaa)DE-He213 Optical Waveguide Device (dpeaa)DE-He213 Shi, Yuan aut Cao, Yang aut Enthalten in Applied physics Berlin : Springer, 1973 100(2010), 2 vom: 09. Juli, Seite 409-414 (DE-627)235503231 (DE-600)1398311-8 1432-0630 nnns volume:100 year:2010 number:2 day:09 month:07 pages:409-414 https://dx.doi.org/10.1007/s00339-010-5851-5 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_267 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 100 2010 2 09 07 409-414
allfieldsGer	10.1007/s00339-010-5851-5 doi (DE-627)SPR004110439 (SPR)s00339-010-5851-5-e DE-627 ger DE-627 rakwb eng Fei, Xu verfasserin aut Synthesis of photosensitive poly(methyl methacrylate-co-glycidyl methacrylate) for optical waveguide devices 2010 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Springer-Verlag 2010 Abstract Photosensitive poly(MMA-co-GMA) for optical waveguide was synthesized, and the refractive index of the polymer film was tuned in the range of 1.481–1.588 at 1550 nm by mixing with bis-phenol-A epoxy resin. The film, which was made by spinning coated the poly(MMA-co-GMA) with photo initiator, had good UV light lithograph sensitivity, high glass transition temperature (Tg: 153°C, after crosslinking) and good thermal stabilities (Td: up to 324°C, after crosslinking). The optical waveguides with very smooth top surface were fabricated from the resulting polymer by direct UV exposure and chemical development. For waveguides with cladding, the propagation losses of the channel waveguides were measured to be below 3 dB/cm at 1550 nm. Optical Waveguide (dpeaa)DE-He213 Butyl Acetate (dpeaa)DE-He213 Channel Waveguide (dpeaa)DE-He213 Straight Waveguide (dpeaa)DE-He213 Optical Waveguide Device (dpeaa)DE-He213 Shi, Yuan aut Cao, Yang aut Enthalten in Applied physics Berlin : Springer, 1973 100(2010), 2 vom: 09. Juli, Seite 409-414 (DE-627)235503231 (DE-600)1398311-8 1432-0630 nnns volume:100 year:2010 number:2 day:09 month:07 pages:409-414 https://dx.doi.org/10.1007/s00339-010-5851-5 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_267 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 100 2010 2 09 07 409-414
allfieldsSound	10.1007/s00339-010-5851-5 doi (DE-627)SPR004110439 (SPR)s00339-010-5851-5-e DE-627 ger DE-627 rakwb eng Fei, Xu verfasserin aut Synthesis of photosensitive poly(methyl methacrylate-co-glycidyl methacrylate) for optical waveguide devices 2010 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Springer-Verlag 2010 Abstract Photosensitive poly(MMA-co-GMA) for optical waveguide was synthesized, and the refractive index of the polymer film was tuned in the range of 1.481–1.588 at 1550 nm by mixing with bis-phenol-A epoxy resin. The film, which was made by spinning coated the poly(MMA-co-GMA) with photo initiator, had good UV light lithograph sensitivity, high glass transition temperature (Tg: 153°C, after crosslinking) and good thermal stabilities (Td: up to 324°C, after crosslinking). The optical waveguides with very smooth top surface were fabricated from the resulting polymer by direct UV exposure and chemical development. For waveguides with cladding, the propagation losses of the channel waveguides were measured to be below 3 dB/cm at 1550 nm. Optical Waveguide (dpeaa)DE-He213 Butyl Acetate (dpeaa)DE-He213 Channel Waveguide (dpeaa)DE-He213 Straight Waveguide (dpeaa)DE-He213 Optical Waveguide Device (dpeaa)DE-He213 Shi, Yuan aut Cao, Yang aut Enthalten in Applied physics Berlin : Springer, 1973 100(2010), 2 vom: 09. Juli, Seite 409-414 (DE-627)235503231 (DE-600)1398311-8 1432-0630 nnns volume:100 year:2010 number:2 day:09 month:07 pages:409-414 https://dx.doi.org/10.1007/s00339-010-5851-5 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_267 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 100 2010 2 09 07 409-414
language	English
source	Enthalten in Applied physics 100(2010), 2 vom: 09. Juli, Seite 409-414 volume:100 year:2010 number:2 day:09 month:07 pages:409-414
sourceStr	Enthalten in Applied physics 100(2010), 2 vom: 09. Juli, Seite 409-414 volume:100 year:2010 number:2 day:09 month:07 pages:409-414
format_phy_str_mv	Article
institution	findex.gbv.de
topic_facet	Optical Waveguide Butyl Acetate Channel Waveguide Straight Waveguide Optical Waveguide Device
isfreeaccess_bool	false
container_title	Applied physics
authorswithroles_txt_mv	Fei, Xu @@aut@@ Shi, Yuan @@aut@@ Cao, Yang @@aut@@
publishDateDaySort_date	2010-07-09T00:00:00Z
hierarchy_top_id	235503231
id	SPR004110439
language_de	englisch
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author	Fei, Xu
spellingShingle	Fei, Xu misc Optical Waveguide misc Butyl Acetate misc Channel Waveguide misc Straight Waveguide misc Optical Waveguide Device Synthesis of photosensitive poly(methyl methacrylate-co-glycidyl methacrylate) for optical waveguide devices
authorStr	Fei, Xu
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topic_title	Synthesis of photosensitive poly(methyl methacrylate-co-glycidyl methacrylate) for optical waveguide devices Optical Waveguide (dpeaa)DE-He213 Butyl Acetate (dpeaa)DE-He213 Channel Waveguide (dpeaa)DE-He213 Straight Waveguide (dpeaa)DE-He213 Optical Waveguide Device (dpeaa)DE-He213
topic	misc Optical Waveguide misc Butyl Acetate misc Channel Waveguide misc Straight Waveguide misc Optical Waveguide Device
topic_unstemmed	misc Optical Waveguide misc Butyl Acetate misc Channel Waveguide misc Straight Waveguide misc Optical Waveguide Device
topic_browse	misc Optical Waveguide misc Butyl Acetate misc Channel Waveguide misc Straight Waveguide misc Optical Waveguide Device
format_facet	Elektronische Aufsätze Aufsätze Elektronische Ressource
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title	Synthesis of photosensitive poly(methyl methacrylate-co-glycidyl methacrylate) for optical waveguide devices
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title_full	Synthesis of photosensitive poly(methyl methacrylate-co-glycidyl methacrylate) for optical waveguide devices
author_sort	Fei, Xu
journal	Applied physics
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author_browse	Fei, Xu Shi, Yuan Cao, Yang
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doi_str_mv	10.1007/s00339-010-5851-5
title_sort	synthesis of photosensitive poly(methyl methacrylate-co-glycidyl methacrylate) for optical waveguide devices
title_auth	Synthesis of photosensitive poly(methyl methacrylate-co-glycidyl methacrylate) for optical waveguide devices
abstract	Abstract Photosensitive poly(MMA-co-GMA) for optical waveguide was synthesized, and the refractive index of the polymer film was tuned in the range of 1.481–1.588 at 1550 nm by mixing with bis-phenol-A epoxy resin. The film, which was made by spinning coated the poly(MMA-co-GMA) with photo initiator, had good UV light lithograph sensitivity, high glass transition temperature (Tg: 153°C, after crosslinking) and good thermal stabilities (Td: up to 324°C, after crosslinking). The optical waveguides with very smooth top surface were fabricated from the resulting polymer by direct UV exposure and chemical development. For waveguides with cladding, the propagation losses of the channel waveguides were measured to be below 3 dB/cm at 1550 nm. © Springer-Verlag 2010
abstractGer	Abstract Photosensitive poly(MMA-co-GMA) for optical waveguide was synthesized, and the refractive index of the polymer film was tuned in the range of 1.481–1.588 at 1550 nm by mixing with bis-phenol-A epoxy resin. The film, which was made by spinning coated the poly(MMA-co-GMA) with photo initiator, had good UV light lithograph sensitivity, high glass transition temperature (Tg: 153°C, after crosslinking) and good thermal stabilities (Td: up to 324°C, after crosslinking). The optical waveguides with very smooth top surface were fabricated from the resulting polymer by direct UV exposure and chemical development. For waveguides with cladding, the propagation losses of the channel waveguides were measured to be below 3 dB/cm at 1550 nm. © Springer-Verlag 2010
abstract_unstemmed	Abstract Photosensitive poly(MMA-co-GMA) for optical waveguide was synthesized, and the refractive index of the polymer film was tuned in the range of 1.481–1.588 at 1550 nm by mixing with bis-phenol-A epoxy resin. The film, which was made by spinning coated the poly(MMA-co-GMA) with photo initiator, had good UV light lithograph sensitivity, high glass transition temperature (Tg: 153°C, after crosslinking) and good thermal stabilities (Td: up to 324°C, after crosslinking). The optical waveguides with very smooth top surface were fabricated from the resulting polymer by direct UV exposure and chemical development. For waveguides with cladding, the propagation losses of the channel waveguides were measured to be below 3 dB/cm at 1550 nm. © Springer-Verlag 2010
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container_issue	2
title_short	Synthesis of photosensitive poly(methyl methacrylate-co-glycidyl methacrylate) for optical waveguide devices
url	https://dx.doi.org/10.1007/s00339-010-5851-5
remote_bool	true
author2	Shi, Yuan Cao, Yang
author2Str	Shi, Yuan Cao, Yang
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doi_str	10.1007/s00339-010-5851-5
up_date	2024-07-03T23:39:47.671Z
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Synthesis of photosensitive poly(methyl methacrylate-co-glycidyl methacrylate) for optical waveguide devices

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