Impact of amorphous titanium oxide film on the device stability of Al/$ TiO_{2} $/Al resistive memory
Abstract We have investigated the role of amorphous titanium oxide film in the reliable bipolar resistive switching of Al/$ TiO_{2} $/Al resistive random access memory devices. As $ TiO_{2} $ deposition temperature decreased, a more stable endurance characteristic was obtained. We proposed that the...
Ausführliche Beschreibung
Autor*in: |
Jeong, Hu Young [verfasserIn] |
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Format: |
E-Artikel |
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Sprache: |
Englisch |
Erschienen: |
2011 |
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Schlagwörter: |
Resistive Random Access Memory |
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Anmerkung: |
© Springer-Verlag 2011 |
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Übergeordnetes Werk: |
Enthalten in: Applied physics - Berlin : Springer, 1973, 102(2011), 4 vom: 21. Jan., Seite 967-972 |
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Übergeordnetes Werk: |
volume:102 ; year:2011 ; number:4 ; day:21 ; month:01 ; pages:967-972 |
Links: |
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DOI / URN: |
10.1007/s00339-011-6278-3 |
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Katalog-ID: |
SPR004117433 |
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520 | |a Abstract We have investigated the role of amorphous titanium oxide film in the reliable bipolar resistive switching of Al/$ TiO_{2} $/Al resistive random access memory devices. As $ TiO_{2} $ deposition temperature decreased, a more stable endurance characteristic was obtained. We proposed that the degradation of the bipolar resistive switching property of Al/$ TiO_{2} $/Al devices is closely related to the imperfect migration of oxygen ions between the top insulating interface layer and the oxygen-deficient titanium oxide during the set and reset operations. In addition, the dependence of the $ TiO_{2} $ film thickness on the switching property was also studied. As the thickness of the film increased, a reduction in the resistance of the high resistance state rapidly appeared. We attribute the improved endurance performance of thin and low-temperature grown $ TiO_{2} $ devices to the amorphous state with a low film density. | ||
650 | 4 | |a Resistive Switching |7 (dpeaa)DE-He213 | |
650 | 4 | |a High Resistance State |7 (dpeaa)DE-He213 | |
650 | 4 | |a Resistive Random Access Memory |7 (dpeaa)DE-He213 | |
650 | 4 | |a Resistive Random Access Memory Device |7 (dpeaa)DE-He213 | |
650 | 4 | |a Bipolar Resistive Switching |7 (dpeaa)DE-He213 | |
700 | 1 | |a Kim, Sung Kyu |4 aut | |
700 | 1 | |a Lee, Jeong Yong |4 aut | |
700 | 1 | |a Choi, Sung-Yool |4 aut | |
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10.1007/s00339-011-6278-3 doi (DE-627)SPR004117433 (SPR)s00339-011-6278-3-e DE-627 ger DE-627 rakwb eng Jeong, Hu Young verfasserin aut Impact of amorphous titanium oxide film on the device stability of Al/$ TiO_{2} $/Al resistive memory 2011 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Springer-Verlag 2011 Abstract We have investigated the role of amorphous titanium oxide film in the reliable bipolar resistive switching of Al/$ TiO_{2} $/Al resistive random access memory devices. As $ TiO_{2} $ deposition temperature decreased, a more stable endurance characteristic was obtained. We proposed that the degradation of the bipolar resistive switching property of Al/$ TiO_{2} $/Al devices is closely related to the imperfect migration of oxygen ions between the top insulating interface layer and the oxygen-deficient titanium oxide during the set and reset operations. In addition, the dependence of the $ TiO_{2} $ film thickness on the switching property was also studied. As the thickness of the film increased, a reduction in the resistance of the high resistance state rapidly appeared. We attribute the improved endurance performance of thin and low-temperature grown $ TiO_{2} $ devices to the amorphous state with a low film density. Resistive Switching (dpeaa)DE-He213 High Resistance State (dpeaa)DE-He213 Resistive Random Access Memory (dpeaa)DE-He213 Resistive Random Access Memory Device (dpeaa)DE-He213 Bipolar Resistive Switching (dpeaa)DE-He213 Kim, Sung Kyu aut Lee, Jeong Yong aut Choi, Sung-Yool aut Enthalten in Applied physics Berlin : Springer, 1973 102(2011), 4 vom: 21. Jan., Seite 967-972 (DE-627)235503231 (DE-600)1398311-8 1432-0630 nnns volume:102 year:2011 number:4 day:21 month:01 pages:967-972 https://dx.doi.org/10.1007/s00339-011-6278-3 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_267 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 102 2011 4 21 01 967-972 |
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10.1007/s00339-011-6278-3 doi (DE-627)SPR004117433 (SPR)s00339-011-6278-3-e DE-627 ger DE-627 rakwb eng Jeong, Hu Young verfasserin aut Impact of amorphous titanium oxide film on the device stability of Al/$ TiO_{2} $/Al resistive memory 2011 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Springer-Verlag 2011 Abstract We have investigated the role of amorphous titanium oxide film in the reliable bipolar resistive switching of Al/$ TiO_{2} $/Al resistive random access memory devices. As $ TiO_{2} $ deposition temperature decreased, a more stable endurance characteristic was obtained. We proposed that the degradation of the bipolar resistive switching property of Al/$ TiO_{2} $/Al devices is closely related to the imperfect migration of oxygen ions between the top insulating interface layer and the oxygen-deficient titanium oxide during the set and reset operations. In addition, the dependence of the $ TiO_{2} $ film thickness on the switching property was also studied. As the thickness of the film increased, a reduction in the resistance of the high resistance state rapidly appeared. We attribute the improved endurance performance of thin and low-temperature grown $ TiO_{2} $ devices to the amorphous state with a low film density. Resistive Switching (dpeaa)DE-He213 High Resistance State (dpeaa)DE-He213 Resistive Random Access Memory (dpeaa)DE-He213 Resistive Random Access Memory Device (dpeaa)DE-He213 Bipolar Resistive Switching (dpeaa)DE-He213 Kim, Sung Kyu aut Lee, Jeong Yong aut Choi, Sung-Yool aut Enthalten in Applied physics Berlin : Springer, 1973 102(2011), 4 vom: 21. Jan., Seite 967-972 (DE-627)235503231 (DE-600)1398311-8 1432-0630 nnns volume:102 year:2011 number:4 day:21 month:01 pages:967-972 https://dx.doi.org/10.1007/s00339-011-6278-3 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_267 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 102 2011 4 21 01 967-972 |
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10.1007/s00339-011-6278-3 doi (DE-627)SPR004117433 (SPR)s00339-011-6278-3-e DE-627 ger DE-627 rakwb eng Jeong, Hu Young verfasserin aut Impact of amorphous titanium oxide film on the device stability of Al/$ TiO_{2} $/Al resistive memory 2011 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Springer-Verlag 2011 Abstract We have investigated the role of amorphous titanium oxide film in the reliable bipolar resistive switching of Al/$ TiO_{2} $/Al resistive random access memory devices. As $ TiO_{2} $ deposition temperature decreased, a more stable endurance characteristic was obtained. We proposed that the degradation of the bipolar resistive switching property of Al/$ TiO_{2} $/Al devices is closely related to the imperfect migration of oxygen ions between the top insulating interface layer and the oxygen-deficient titanium oxide during the set and reset operations. In addition, the dependence of the $ TiO_{2} $ film thickness on the switching property was also studied. As the thickness of the film increased, a reduction in the resistance of the high resistance state rapidly appeared. We attribute the improved endurance performance of thin and low-temperature grown $ TiO_{2} $ devices to the amorphous state with a low film density. Resistive Switching (dpeaa)DE-He213 High Resistance State (dpeaa)DE-He213 Resistive Random Access Memory (dpeaa)DE-He213 Resistive Random Access Memory Device (dpeaa)DE-He213 Bipolar Resistive Switching (dpeaa)DE-He213 Kim, Sung Kyu aut Lee, Jeong Yong aut Choi, Sung-Yool aut Enthalten in Applied physics Berlin : Springer, 1973 102(2011), 4 vom: 21. Jan., Seite 967-972 (DE-627)235503231 (DE-600)1398311-8 1432-0630 nnns volume:102 year:2011 number:4 day:21 month:01 pages:967-972 https://dx.doi.org/10.1007/s00339-011-6278-3 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_267 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 102 2011 4 21 01 967-972 |
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10.1007/s00339-011-6278-3 doi (DE-627)SPR004117433 (SPR)s00339-011-6278-3-e DE-627 ger DE-627 rakwb eng Jeong, Hu Young verfasserin aut Impact of amorphous titanium oxide film on the device stability of Al/$ TiO_{2} $/Al resistive memory 2011 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Springer-Verlag 2011 Abstract We have investigated the role of amorphous titanium oxide film in the reliable bipolar resistive switching of Al/$ TiO_{2} $/Al resistive random access memory devices. As $ TiO_{2} $ deposition temperature decreased, a more stable endurance characteristic was obtained. We proposed that the degradation of the bipolar resistive switching property of Al/$ TiO_{2} $/Al devices is closely related to the imperfect migration of oxygen ions between the top insulating interface layer and the oxygen-deficient titanium oxide during the set and reset operations. In addition, the dependence of the $ TiO_{2} $ film thickness on the switching property was also studied. As the thickness of the film increased, a reduction in the resistance of the high resistance state rapidly appeared. We attribute the improved endurance performance of thin and low-temperature grown $ TiO_{2} $ devices to the amorphous state with a low film density. Resistive Switching (dpeaa)DE-He213 High Resistance State (dpeaa)DE-He213 Resistive Random Access Memory (dpeaa)DE-He213 Resistive Random Access Memory Device (dpeaa)DE-He213 Bipolar Resistive Switching (dpeaa)DE-He213 Kim, Sung Kyu aut Lee, Jeong Yong aut Choi, Sung-Yool aut Enthalten in Applied physics Berlin : Springer, 1973 102(2011), 4 vom: 21. Jan., Seite 967-972 (DE-627)235503231 (DE-600)1398311-8 1432-0630 nnns volume:102 year:2011 number:4 day:21 month:01 pages:967-972 https://dx.doi.org/10.1007/s00339-011-6278-3 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_267 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 102 2011 4 21 01 967-972 |
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10.1007/s00339-011-6278-3 doi (DE-627)SPR004117433 (SPR)s00339-011-6278-3-e DE-627 ger DE-627 rakwb eng Jeong, Hu Young verfasserin aut Impact of amorphous titanium oxide film on the device stability of Al/$ TiO_{2} $/Al resistive memory 2011 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Springer-Verlag 2011 Abstract We have investigated the role of amorphous titanium oxide film in the reliable bipolar resistive switching of Al/$ TiO_{2} $/Al resistive random access memory devices. As $ TiO_{2} $ deposition temperature decreased, a more stable endurance characteristic was obtained. We proposed that the degradation of the bipolar resistive switching property of Al/$ TiO_{2} $/Al devices is closely related to the imperfect migration of oxygen ions between the top insulating interface layer and the oxygen-deficient titanium oxide during the set and reset operations. In addition, the dependence of the $ TiO_{2} $ film thickness on the switching property was also studied. As the thickness of the film increased, a reduction in the resistance of the high resistance state rapidly appeared. We attribute the improved endurance performance of thin and low-temperature grown $ TiO_{2} $ devices to the amorphous state with a low film density. Resistive Switching (dpeaa)DE-He213 High Resistance State (dpeaa)DE-He213 Resistive Random Access Memory (dpeaa)DE-He213 Resistive Random Access Memory Device (dpeaa)DE-He213 Bipolar Resistive Switching (dpeaa)DE-He213 Kim, Sung Kyu aut Lee, Jeong Yong aut Choi, Sung-Yool aut Enthalten in Applied physics Berlin : Springer, 1973 102(2011), 4 vom: 21. Jan., Seite 967-972 (DE-627)235503231 (DE-600)1398311-8 1432-0630 nnns volume:102 year:2011 number:4 day:21 month:01 pages:967-972 https://dx.doi.org/10.1007/s00339-011-6278-3 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_267 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 102 2011 4 21 01 967-972 |
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Enthalten in Applied physics 102(2011), 4 vom: 21. Jan., Seite 967-972 volume:102 year:2011 number:4 day:21 month:01 pages:967-972 |
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Enthalten in Applied physics 102(2011), 4 vom: 21. Jan., Seite 967-972 volume:102 year:2011 number:4 day:21 month:01 pages:967-972 |
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Resistive Switching High Resistance State Resistive Random Access Memory Resistive Random Access Memory Device Bipolar Resistive Switching |
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Jeong, Hu Young @@aut@@ Kim, Sung Kyu @@aut@@ Lee, Jeong Yong @@aut@@ Choi, Sung-Yool @@aut@@ |
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|
author |
Jeong, Hu Young |
spellingShingle |
Jeong, Hu Young misc Resistive Switching misc High Resistance State misc Resistive Random Access Memory misc Resistive Random Access Memory Device misc Bipolar Resistive Switching Impact of amorphous titanium oxide film on the device stability of Al/$ TiO_{2} $/Al resistive memory |
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Impact of amorphous titanium oxide film on the device stability of Al/$ TiO_{2} $/Al resistive memory Resistive Switching (dpeaa)DE-He213 High Resistance State (dpeaa)DE-He213 Resistive Random Access Memory (dpeaa)DE-He213 Resistive Random Access Memory Device (dpeaa)DE-He213 Bipolar Resistive Switching (dpeaa)DE-He213 |
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misc Resistive Switching misc High Resistance State misc Resistive Random Access Memory misc Resistive Random Access Memory Device misc Bipolar Resistive Switching |
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misc Resistive Switching misc High Resistance State misc Resistive Random Access Memory misc Resistive Random Access Memory Device misc Bipolar Resistive Switching |
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misc Resistive Switching misc High Resistance State misc Resistive Random Access Memory misc Resistive Random Access Memory Device misc Bipolar Resistive Switching |
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Impact of amorphous titanium oxide film on the device stability of Al/$ TiO_{2} $/Al resistive memory |
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Impact of amorphous titanium oxide film on the device stability of Al/$ TiO_{2} $/Al resistive memory |
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Jeong, Hu Young |
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Jeong, Hu Young Kim, Sung Kyu Lee, Jeong Yong Choi, Sung-Yool |
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Elektronische Aufsätze |
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Jeong, Hu Young |
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10.1007/s00339-011-6278-3 |
title_sort |
impact of amorphous titanium oxide film on the device stability of al/$ tio_{2} $/al resistive memory |
title_auth |
Impact of amorphous titanium oxide film on the device stability of Al/$ TiO_{2} $/Al resistive memory |
abstract |
Abstract We have investigated the role of amorphous titanium oxide film in the reliable bipolar resistive switching of Al/$ TiO_{2} $/Al resistive random access memory devices. As $ TiO_{2} $ deposition temperature decreased, a more stable endurance characteristic was obtained. We proposed that the degradation of the bipolar resistive switching property of Al/$ TiO_{2} $/Al devices is closely related to the imperfect migration of oxygen ions between the top insulating interface layer and the oxygen-deficient titanium oxide during the set and reset operations. In addition, the dependence of the $ TiO_{2} $ film thickness on the switching property was also studied. As the thickness of the film increased, a reduction in the resistance of the high resistance state rapidly appeared. We attribute the improved endurance performance of thin and low-temperature grown $ TiO_{2} $ devices to the amorphous state with a low film density. © Springer-Verlag 2011 |
abstractGer |
Abstract We have investigated the role of amorphous titanium oxide film in the reliable bipolar resistive switching of Al/$ TiO_{2} $/Al resistive random access memory devices. As $ TiO_{2} $ deposition temperature decreased, a more stable endurance characteristic was obtained. We proposed that the degradation of the bipolar resistive switching property of Al/$ TiO_{2} $/Al devices is closely related to the imperfect migration of oxygen ions between the top insulating interface layer and the oxygen-deficient titanium oxide during the set and reset operations. In addition, the dependence of the $ TiO_{2} $ film thickness on the switching property was also studied. As the thickness of the film increased, a reduction in the resistance of the high resistance state rapidly appeared. We attribute the improved endurance performance of thin and low-temperature grown $ TiO_{2} $ devices to the amorphous state with a low film density. © Springer-Verlag 2011 |
abstract_unstemmed |
Abstract We have investigated the role of amorphous titanium oxide film in the reliable bipolar resistive switching of Al/$ TiO_{2} $/Al resistive random access memory devices. As $ TiO_{2} $ deposition temperature decreased, a more stable endurance characteristic was obtained. We proposed that the degradation of the bipolar resistive switching property of Al/$ TiO_{2} $/Al devices is closely related to the imperfect migration of oxygen ions between the top insulating interface layer and the oxygen-deficient titanium oxide during the set and reset operations. In addition, the dependence of the $ TiO_{2} $ film thickness on the switching property was also studied. As the thickness of the film increased, a reduction in the resistance of the high resistance state rapidly appeared. We attribute the improved endurance performance of thin and low-temperature grown $ TiO_{2} $ devices to the amorphous state with a low film density. © Springer-Verlag 2011 |
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title_short |
Impact of amorphous titanium oxide film on the device stability of Al/$ TiO_{2} $/Al resistive memory |
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https://dx.doi.org/10.1007/s00339-011-6278-3 |
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Kim, Sung Kyu Lee, Jeong Yong Choi, Sung-Yool |
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10.1007/s00339-011-6278-3 |
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score |
7.3987417 |