Ablation of polymers by focused EUV radiation from a table-top laser-produced plasma source

Abstract We have investigated ablation of polymers with radiation of 13.5 nm wavelength, using a table-top laser produced plasma source based on solid gold as target material. A Schwarzschild objective with Mo/Si multilayer coatings was adapted to the source, generating an EUV spot of 5 μm diameter...
Ausführliche Beschreibung

Gespeichert in:
Autor*in:

Barkusky, Frank [verfasserIn]

Bayer, Armin

Mann, Klaus

Format:

E-Artikel

Sprache:

Englisch

Erschienen:

2011

Schlagwörter:

PMMA

PTFE

Material Removal

Ablation Rate

White Light Interferometry

Anmerkung:

© The Author(s) 2011

Übergeordnetes Werk:

Enthalten in: Applied physics - Berlin : Springer, 1973, 105(2011), 1 vom: 06. Aug.

Übergeordnetes Werk:

volume:105 ; year:2011 ; number:1 ; day:06 ; month:08

Links:

Volltext

DOI / URN:

10.1007/s00339-011-6540-8

Katalog-ID:

SPR004122119

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