The room-temperature ferromagnetism of defect-rich ZnMgO semiconductor thin films
Abstract The magnetic properties of Mg-doped ZnO thin films grown under different oxygen pressures PO and annealing temperatures Ta on Si (001) substrates by pulsed-laser deposited (PLD) were investigated. The hysteresis curve at room temperature (RT), measured with a high-resolution magnetometer (∼...
Ausführliche Beschreibung
Gespeichert in:
| Autor*in: |
Fang, Q. Q. [verfasserIn] |
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| Format: |
E-Artikel |
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| Sprache: |
Englisch |
| Erschienen: |
2012 |
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| Schlagwörter: |
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| Anmerkung: |
© Springer-Verlag 2012 |
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| Übergeordnetes Werk: |
Enthalten in: Applied physics - Berlin : Springer, 1973, 108(2012), 4 vom: 29. Mai, Seite 871-876 |
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| Übergeordnetes Werk: |
volume:108 ; year:2012 ; number:4 ; day:29 ; month:05 ; pages:871-876 |
| Links: |
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| DOI / URN: |
10.1007/s00339-012-6986-3 |
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| Katalog-ID: |
SPR004127552 |
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| 245 | 1 | 4 | |a The room-temperature ferromagnetism of defect-rich ZnMgO semiconductor thin films |
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| 520 | |a Abstract The magnetic properties of Mg-doped ZnO thin films grown under different oxygen pressures PO and annealing temperatures Ta on Si (001) substrates by pulsed-laser deposited (PLD) were investigated. The hysteresis curve at room temperature (RT), measured with a high-resolution magnetometer (∼$ 10^{−6} $ emu), revealed the presence of a ferromagnetic state for all Mg-doped ZnO thin films that were investigated. Interestingly, a significant magnetic signal was observed for an amorphous $ Zn_{0.35} %$ Mg_{0.65} $O thin film; RT ferromagnetism in amorphous ZnMgO films has rarely been reported. Photoluminescence (PL) spectroscopy measurements, as well as microstructure analysis, suggest that RT ferromagnetism in ZnMgO thin film, when exposed to an oxygen atmosphere or annealed in air, is related to oxygen interstitials, $ O_{i} $, and zinc vacancies, $ V_{Zn} $. Strong polarization from electrons trapped on these defects and vacancies induces the magnetic properties. We reveal a possible approach for explaining the origin of magnetism by a defect-induced mechanism rather than the conventional carrier-induced mechanism. In our proposed mechanism, a defect-rich polarizing effect may play a crucial role in the magnetic behavior of ZnO-based semiconductors. | ||
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| 650 | 4 | |a Room Temperature Ferromagnetism |7 (dpeaa)DE-He213 | |
| 650 | 4 | |a Oxygen Defect |7 (dpeaa)DE-He213 | |
| 650 | 4 | |a Defect Emission |7 (dpeaa)DE-He213 | |
| 650 | 4 | |a Room Temperature Magnetism |7 (dpeaa)DE-He213 | |
| 700 | 1 | |a Wang, W. N. |4 aut | |
| 700 | 1 | |a Li, J. G. |4 aut | |
| 700 | 1 | |a Ding, Q. Q. |4 aut | |
| 700 | 1 | |a Wang, C. |4 aut | |
| 700 | 1 | |a Huang, W. J. |4 aut | |
| 700 | 1 | |a Zhang, H. M. |4 aut | |
| 700 | 1 | |a Zhang, Q. P. |4 aut | |
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10.1007/s00339-012-6986-3 doi (DE-627)SPR004127552 (SPR)s00339-012-6986-3-e DE-627 ger DE-627 rakwb eng Fang, Q. Q. verfasserin aut The room-temperature ferromagnetism of defect-rich ZnMgO semiconductor thin films 2012 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Springer-Verlag 2012 Abstract The magnetic properties of Mg-doped ZnO thin films grown under different oxygen pressures PO and annealing temperatures Ta on Si (001) substrates by pulsed-laser deposited (PLD) were investigated. The hysteresis curve at room temperature (RT), measured with a high-resolution magnetometer (∼$ 10^{−6} $ emu), revealed the presence of a ferromagnetic state for all Mg-doped ZnO thin films that were investigated. Interestingly, a significant magnetic signal was observed for an amorphous $ Zn_{0.35} %$ Mg_{0.65} $O thin film; RT ferromagnetism in amorphous ZnMgO films has rarely been reported. Photoluminescence (PL) spectroscopy measurements, as well as microstructure analysis, suggest that RT ferromagnetism in ZnMgO thin film, when exposed to an oxygen atmosphere or annealed in air, is related to oxygen interstitials, $ O_{i} $, and zinc vacancies, $ V_{Zn} $. Strong polarization from electrons trapped on these defects and vacancies induces the magnetic properties. We reveal a possible approach for explaining the origin of magnetism by a defect-induced mechanism rather than the conventional carrier-induced mechanism. In our proposed mechanism, a defect-rich polarizing effect may play a crucial role in the magnetic behavior of ZnO-based semiconductors. Oxygen Pressure (dpeaa)DE-He213 Room Temperature Ferromagnetism (dpeaa)DE-He213 Oxygen Defect (dpeaa)DE-He213 Defect Emission (dpeaa)DE-He213 Room Temperature Magnetism (dpeaa)DE-He213 Wang, W. N. aut Li, J. G. aut Ding, Q. Q. aut Wang, C. aut Huang, W. J. aut Zhang, H. M. aut Zhang, Q. P. aut Enthalten in Applied physics Berlin : Springer, 1973 108(2012), 4 vom: 29. Mai, Seite 871-876 (DE-627)235503231 (DE-600)1398311-8 1432-0630 nnns volume:108 year:2012 number:4 day:29 month:05 pages:871-876 https://dx.doi.org/10.1007/s00339-012-6986-3 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_267 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 108 2012 4 29 05 871-876 |
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10.1007/s00339-012-6986-3 doi (DE-627)SPR004127552 (SPR)s00339-012-6986-3-e DE-627 ger DE-627 rakwb eng Fang, Q. Q. verfasserin aut The room-temperature ferromagnetism of defect-rich ZnMgO semiconductor thin films 2012 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Springer-Verlag 2012 Abstract The magnetic properties of Mg-doped ZnO thin films grown under different oxygen pressures PO and annealing temperatures Ta on Si (001) substrates by pulsed-laser deposited (PLD) were investigated. The hysteresis curve at room temperature (RT), measured with a high-resolution magnetometer (∼$ 10^{−6} $ emu), revealed the presence of a ferromagnetic state for all Mg-doped ZnO thin films that were investigated. Interestingly, a significant magnetic signal was observed for an amorphous $ Zn_{0.35} %$ Mg_{0.65} $O thin film; RT ferromagnetism in amorphous ZnMgO films has rarely been reported. Photoluminescence (PL) spectroscopy measurements, as well as microstructure analysis, suggest that RT ferromagnetism in ZnMgO thin film, when exposed to an oxygen atmosphere or annealed in air, is related to oxygen interstitials, $ O_{i} $, and zinc vacancies, $ V_{Zn} $. Strong polarization from electrons trapped on these defects and vacancies induces the magnetic properties. We reveal a possible approach for explaining the origin of magnetism by a defect-induced mechanism rather than the conventional carrier-induced mechanism. In our proposed mechanism, a defect-rich polarizing effect may play a crucial role in the magnetic behavior of ZnO-based semiconductors. Oxygen Pressure (dpeaa)DE-He213 Room Temperature Ferromagnetism (dpeaa)DE-He213 Oxygen Defect (dpeaa)DE-He213 Defect Emission (dpeaa)DE-He213 Room Temperature Magnetism (dpeaa)DE-He213 Wang, W. N. aut Li, J. G. aut Ding, Q. Q. aut Wang, C. aut Huang, W. J. aut Zhang, H. M. aut Zhang, Q. P. aut Enthalten in Applied physics Berlin : Springer, 1973 108(2012), 4 vom: 29. Mai, Seite 871-876 (DE-627)235503231 (DE-600)1398311-8 1432-0630 nnns volume:108 year:2012 number:4 day:29 month:05 pages:871-876 https://dx.doi.org/10.1007/s00339-012-6986-3 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_267 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 108 2012 4 29 05 871-876 |
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10.1007/s00339-012-6986-3 doi (DE-627)SPR004127552 (SPR)s00339-012-6986-3-e DE-627 ger DE-627 rakwb eng Fang, Q. Q. verfasserin aut The room-temperature ferromagnetism of defect-rich ZnMgO semiconductor thin films 2012 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Springer-Verlag 2012 Abstract The magnetic properties of Mg-doped ZnO thin films grown under different oxygen pressures PO and annealing temperatures Ta on Si (001) substrates by pulsed-laser deposited (PLD) were investigated. The hysteresis curve at room temperature (RT), measured with a high-resolution magnetometer (∼$ 10^{−6} $ emu), revealed the presence of a ferromagnetic state for all Mg-doped ZnO thin films that were investigated. Interestingly, a significant magnetic signal was observed for an amorphous $ Zn_{0.35} %$ Mg_{0.65} $O thin film; RT ferromagnetism in amorphous ZnMgO films has rarely been reported. Photoluminescence (PL) spectroscopy measurements, as well as microstructure analysis, suggest that RT ferromagnetism in ZnMgO thin film, when exposed to an oxygen atmosphere or annealed in air, is related to oxygen interstitials, $ O_{i} $, and zinc vacancies, $ V_{Zn} $. Strong polarization from electrons trapped on these defects and vacancies induces the magnetic properties. We reveal a possible approach for explaining the origin of magnetism by a defect-induced mechanism rather than the conventional carrier-induced mechanism. In our proposed mechanism, a defect-rich polarizing effect may play a crucial role in the magnetic behavior of ZnO-based semiconductors. Oxygen Pressure (dpeaa)DE-He213 Room Temperature Ferromagnetism (dpeaa)DE-He213 Oxygen Defect (dpeaa)DE-He213 Defect Emission (dpeaa)DE-He213 Room Temperature Magnetism (dpeaa)DE-He213 Wang, W. N. aut Li, J. G. aut Ding, Q. Q. aut Wang, C. aut Huang, W. J. aut Zhang, H. M. aut Zhang, Q. P. aut Enthalten in Applied physics Berlin : Springer, 1973 108(2012), 4 vom: 29. Mai, Seite 871-876 (DE-627)235503231 (DE-600)1398311-8 1432-0630 nnns volume:108 year:2012 number:4 day:29 month:05 pages:871-876 https://dx.doi.org/10.1007/s00339-012-6986-3 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_267 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 108 2012 4 29 05 871-876 |
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10.1007/s00339-012-6986-3 doi (DE-627)SPR004127552 (SPR)s00339-012-6986-3-e DE-627 ger DE-627 rakwb eng Fang, Q. Q. verfasserin aut The room-temperature ferromagnetism of defect-rich ZnMgO semiconductor thin films 2012 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Springer-Verlag 2012 Abstract The magnetic properties of Mg-doped ZnO thin films grown under different oxygen pressures PO and annealing temperatures Ta on Si (001) substrates by pulsed-laser deposited (PLD) were investigated. The hysteresis curve at room temperature (RT), measured with a high-resolution magnetometer (∼$ 10^{−6} $ emu), revealed the presence of a ferromagnetic state for all Mg-doped ZnO thin films that were investigated. Interestingly, a significant magnetic signal was observed for an amorphous $ Zn_{0.35} %$ Mg_{0.65} $O thin film; RT ferromagnetism in amorphous ZnMgO films has rarely been reported. Photoluminescence (PL) spectroscopy measurements, as well as microstructure analysis, suggest that RT ferromagnetism in ZnMgO thin film, when exposed to an oxygen atmosphere or annealed in air, is related to oxygen interstitials, $ O_{i} $, and zinc vacancies, $ V_{Zn} $. Strong polarization from electrons trapped on these defects and vacancies induces the magnetic properties. We reveal a possible approach for explaining the origin of magnetism by a defect-induced mechanism rather than the conventional carrier-induced mechanism. In our proposed mechanism, a defect-rich polarizing effect may play a crucial role in the magnetic behavior of ZnO-based semiconductors. Oxygen Pressure (dpeaa)DE-He213 Room Temperature Ferromagnetism (dpeaa)DE-He213 Oxygen Defect (dpeaa)DE-He213 Defect Emission (dpeaa)DE-He213 Room Temperature Magnetism (dpeaa)DE-He213 Wang, W. N. aut Li, J. G. aut Ding, Q. Q. aut Wang, C. aut Huang, W. J. aut Zhang, H. M. aut Zhang, Q. P. aut Enthalten in Applied physics Berlin : Springer, 1973 108(2012), 4 vom: 29. Mai, Seite 871-876 (DE-627)235503231 (DE-600)1398311-8 1432-0630 nnns volume:108 year:2012 number:4 day:29 month:05 pages:871-876 https://dx.doi.org/10.1007/s00339-012-6986-3 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_267 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 108 2012 4 29 05 871-876 |
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10.1007/s00339-012-6986-3 doi (DE-627)SPR004127552 (SPR)s00339-012-6986-3-e DE-627 ger DE-627 rakwb eng Fang, Q. Q. verfasserin aut The room-temperature ferromagnetism of defect-rich ZnMgO semiconductor thin films 2012 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Springer-Verlag 2012 Abstract The magnetic properties of Mg-doped ZnO thin films grown under different oxygen pressures PO and annealing temperatures Ta on Si (001) substrates by pulsed-laser deposited (PLD) were investigated. The hysteresis curve at room temperature (RT), measured with a high-resolution magnetometer (∼$ 10^{−6} $ emu), revealed the presence of a ferromagnetic state for all Mg-doped ZnO thin films that were investigated. Interestingly, a significant magnetic signal was observed for an amorphous $ Zn_{0.35} %$ Mg_{0.65} $O thin film; RT ferromagnetism in amorphous ZnMgO films has rarely been reported. Photoluminescence (PL) spectroscopy measurements, as well as microstructure analysis, suggest that RT ferromagnetism in ZnMgO thin film, when exposed to an oxygen atmosphere or annealed in air, is related to oxygen interstitials, $ O_{i} $, and zinc vacancies, $ V_{Zn} $. Strong polarization from electrons trapped on these defects and vacancies induces the magnetic properties. We reveal a possible approach for explaining the origin of magnetism by a defect-induced mechanism rather than the conventional carrier-induced mechanism. In our proposed mechanism, a defect-rich polarizing effect may play a crucial role in the magnetic behavior of ZnO-based semiconductors. Oxygen Pressure (dpeaa)DE-He213 Room Temperature Ferromagnetism (dpeaa)DE-He213 Oxygen Defect (dpeaa)DE-He213 Defect Emission (dpeaa)DE-He213 Room Temperature Magnetism (dpeaa)DE-He213 Wang, W. N. aut Li, J. G. aut Ding, Q. Q. aut Wang, C. aut Huang, W. J. aut Zhang, H. M. aut Zhang, Q. P. aut Enthalten in Applied physics Berlin : Springer, 1973 108(2012), 4 vom: 29. Mai, Seite 871-876 (DE-627)235503231 (DE-600)1398311-8 1432-0630 nnns volume:108 year:2012 number:4 day:29 month:05 pages:871-876 https://dx.doi.org/10.1007/s00339-012-6986-3 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_267 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 108 2012 4 29 05 871-876 |
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Enthalten in Applied physics 108(2012), 4 vom: 29. Mai, Seite 871-876 volume:108 year:2012 number:4 day:29 month:05 pages:871-876 |
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Enthalten in Applied physics 108(2012), 4 vom: 29. Mai, Seite 871-876 volume:108 year:2012 number:4 day:29 month:05 pages:871-876 |
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Oxygen Pressure Room Temperature Ferromagnetism Oxygen Defect Defect Emission Room Temperature Magnetism |
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Fang, Q. Q. @@aut@@ Wang, W. N. @@aut@@ Li, J. G. @@aut@@ Ding, Q. Q. @@aut@@ Wang, C. @@aut@@ Huang, W. J. @@aut@@ Zhang, H. M. @@aut@@ Zhang, Q. P. @@aut@@ |
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Q.</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="4"><subfield code="a">The room-temperature ferromagnetism of defect-rich ZnMgO semiconductor thin films</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">2012</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">Text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">Computermedien</subfield><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">Online-Ressource</subfield><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">© Springer-Verlag 2012</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Abstract The magnetic properties of Mg-doped ZnO thin films grown under different oxygen pressures PO and annealing temperatures Ta on Si (001) substrates by pulsed-laser deposited (PLD) were investigated. The hysteresis curve at room temperature (RT), measured with a high-resolution magnetometer (∼$ 10^{−6} $ emu), revealed the presence of a ferromagnetic state for all Mg-doped ZnO thin films that were investigated. Interestingly, a significant magnetic signal was observed for an amorphous $ Zn_{0.35} %$ Mg_{0.65} $O thin film; RT ferromagnetism in amorphous ZnMgO films has rarely been reported. Photoluminescence (PL) spectroscopy measurements, as well as microstructure analysis, suggest that RT ferromagnetism in ZnMgO thin film, when exposed to an oxygen atmosphere or annealed in air, is related to oxygen interstitials, $ O_{i} $, and zinc vacancies, $ V_{Zn} $. Strong polarization from electrons trapped on these defects and vacancies induces the magnetic properties. We reveal a possible approach for explaining the origin of magnetism by a defect-induced mechanism rather than the conventional carrier-induced mechanism. In our proposed mechanism, a defect-rich polarizing effect may play a crucial role in the magnetic behavior of ZnO-based semiconductors.</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Oxygen Pressure</subfield><subfield code="7">(dpeaa)DE-He213</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Room Temperature Ferromagnetism</subfield><subfield code="7">(dpeaa)DE-He213</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Oxygen Defect</subfield><subfield code="7">(dpeaa)DE-He213</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Defect Emission</subfield><subfield code="7">(dpeaa)DE-He213</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Room Temperature Magnetism</subfield><subfield code="7">(dpeaa)DE-He213</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Wang, W. 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Fang, Q. Q. |
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Fang, Q. Q. misc Oxygen Pressure misc Room Temperature Ferromagnetism misc Oxygen Defect misc Defect Emission misc Room Temperature Magnetism The room-temperature ferromagnetism of defect-rich ZnMgO semiconductor thin films |
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The room-temperature ferromagnetism of defect-rich ZnMgO semiconductor thin films Oxygen Pressure (dpeaa)DE-He213 Room Temperature Ferromagnetism (dpeaa)DE-He213 Oxygen Defect (dpeaa)DE-He213 Defect Emission (dpeaa)DE-He213 Room Temperature Magnetism (dpeaa)DE-He213 |
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misc Oxygen Pressure misc Room Temperature Ferromagnetism misc Oxygen Defect misc Defect Emission misc Room Temperature Magnetism |
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The room-temperature ferromagnetism of defect-rich ZnMgO semiconductor thin films |
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Fang, Q. Q. Wang, W. N. Li, J. G. Ding, Q. Q. Wang, C. Huang, W. J. Zhang, H. M. Zhang, Q. P. |
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10.1007/s00339-012-6986-3 |
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room-temperature ferromagnetism of defect-rich znmgo semiconductor thin films |
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The room-temperature ferromagnetism of defect-rich ZnMgO semiconductor thin films |
| abstract |
Abstract The magnetic properties of Mg-doped ZnO thin films grown under different oxygen pressures PO and annealing temperatures Ta on Si (001) substrates by pulsed-laser deposited (PLD) were investigated. The hysteresis curve at room temperature (RT), measured with a high-resolution magnetometer (∼$ 10^{−6} $ emu), revealed the presence of a ferromagnetic state for all Mg-doped ZnO thin films that were investigated. Interestingly, a significant magnetic signal was observed for an amorphous $ Zn_{0.35} %$ Mg_{0.65} $O thin film; RT ferromagnetism in amorphous ZnMgO films has rarely been reported. Photoluminescence (PL) spectroscopy measurements, as well as microstructure analysis, suggest that RT ferromagnetism in ZnMgO thin film, when exposed to an oxygen atmosphere or annealed in air, is related to oxygen interstitials, $ O_{i} $, and zinc vacancies, $ V_{Zn} $. Strong polarization from electrons trapped on these defects and vacancies induces the magnetic properties. We reveal a possible approach for explaining the origin of magnetism by a defect-induced mechanism rather than the conventional carrier-induced mechanism. In our proposed mechanism, a defect-rich polarizing effect may play a crucial role in the magnetic behavior of ZnO-based semiconductors. © Springer-Verlag 2012 |
| abstractGer |
Abstract The magnetic properties of Mg-doped ZnO thin films grown under different oxygen pressures PO and annealing temperatures Ta on Si (001) substrates by pulsed-laser deposited (PLD) were investigated. The hysteresis curve at room temperature (RT), measured with a high-resolution magnetometer (∼$ 10^{−6} $ emu), revealed the presence of a ferromagnetic state for all Mg-doped ZnO thin films that were investigated. Interestingly, a significant magnetic signal was observed for an amorphous $ Zn_{0.35} %$ Mg_{0.65} $O thin film; RT ferromagnetism in amorphous ZnMgO films has rarely been reported. Photoluminescence (PL) spectroscopy measurements, as well as microstructure analysis, suggest that RT ferromagnetism in ZnMgO thin film, when exposed to an oxygen atmosphere or annealed in air, is related to oxygen interstitials, $ O_{i} $, and zinc vacancies, $ V_{Zn} $. Strong polarization from electrons trapped on these defects and vacancies induces the magnetic properties. We reveal a possible approach for explaining the origin of magnetism by a defect-induced mechanism rather than the conventional carrier-induced mechanism. In our proposed mechanism, a defect-rich polarizing effect may play a crucial role in the magnetic behavior of ZnO-based semiconductors. © Springer-Verlag 2012 |
| abstract_unstemmed |
Abstract The magnetic properties of Mg-doped ZnO thin films grown under different oxygen pressures PO and annealing temperatures Ta on Si (001) substrates by pulsed-laser deposited (PLD) were investigated. The hysteresis curve at room temperature (RT), measured with a high-resolution magnetometer (∼$ 10^{−6} $ emu), revealed the presence of a ferromagnetic state for all Mg-doped ZnO thin films that were investigated. Interestingly, a significant magnetic signal was observed for an amorphous $ Zn_{0.35} %$ Mg_{0.65} $O thin film; RT ferromagnetism in amorphous ZnMgO films has rarely been reported. Photoluminescence (PL) spectroscopy measurements, as well as microstructure analysis, suggest that RT ferromagnetism in ZnMgO thin film, when exposed to an oxygen atmosphere or annealed in air, is related to oxygen interstitials, $ O_{i} $, and zinc vacancies, $ V_{Zn} $. Strong polarization from electrons trapped on these defects and vacancies induces the magnetic properties. We reveal a possible approach for explaining the origin of magnetism by a defect-induced mechanism rather than the conventional carrier-induced mechanism. In our proposed mechanism, a defect-rich polarizing effect may play a crucial role in the magnetic behavior of ZnO-based semiconductors. © Springer-Verlag 2012 |
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The room-temperature ferromagnetism of defect-rich ZnMgO semiconductor thin films |
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https://dx.doi.org/10.1007/s00339-012-6986-3 |
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Wang, W. N. Li, J. G. Ding, Q. Q. Wang, C. Huang, W. J. Zhang, H. M. Zhang, Q. P. |
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Wang, W. N. Li, J. G. Ding, Q. Q. Wang, C. Huang, W. J. Zhang, H. M. Zhang, Q. P. |
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| score |
7.3973303 |