Controlled growth of high-quality graphene using hot-filament chemical vapor deposition

Abstract High-quality graphene was grown on polycrystalline copper (Cu) foils (1 cm × 1 cm) using hot-filament chemical vapor deposition method. The role of process parameters such as gas flow rates (methane and hydrogen), growth temperatures (filament and substrate) and durations on the growth of g...
Ausführliche Beschreibung

Gespeichert in:
Autor*in:

Selvakumar, N. [verfasserIn]

Vadivel, B.

Rao, D. V. Sridhara

Krupanidhi, S. B.

Barshilia, Harish C.

Format:

E-Artikel

Sprache:

Englisch

Erschienen:

2016

Schlagwörter:

Selective Area Electron Diffraction Pattern

Monolayer Graphene

Bilayer Graphene

Multilayer Graphene

Hydrogen Flow Rate

Anmerkung:

© Springer-Verlag Berlin Heidelberg 2016

Übergeordnetes Werk:

Enthalten in: Applied physics - Berlin : Springer, 1973, 122(2016), 11 vom: 11. Okt.

Übergeordnetes Werk:

volume:122 ; year:2016 ; number:11 ; day:11 ; month:10

Links:

Volltext

DOI / URN:

10.1007/s00339-016-0483-z

Katalog-ID:

SPR004156714

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