Fabrication of high-aspect-ratio sub-diffraction-limit microstructures by two-photon-absorption photopolymerization

Abstract Micro-cell structures with side-walls as thin as 0.70 μm and aspect ratios as high as 6.7 are fabricated by single-layer writing through two-photon-absorption (TPA) photopolymerization. The use of a moderate-numerical-aperture (N.A.) objective lens to obtain a much more elongated voxel and...
Ausführliche Beschreibung

Gespeichert in:

Autor*in:	Pan, E.-Y. [verfasserIn] Pu, N.-W. Tong, Y.-P. Yau, H.-F.

Format:	E-Artikel
Sprache:	Englisch

Erschienen:	2003

Schlagwörter:	Microstructure Aspect Ratio High Aspect Ratio Objective Lens Photopolymerization

Anmerkung:	© Springer-Verlag 2003

Übergeordnetes Werk:	Enthalten in: Applied physics - Berlin : Springer, 1981, 77(2003), 5 vom: 23. Sept., Seite 485-488
Übergeordnetes Werk:	volume:77 ; year:2003 ; number:5 ; day:23 ; month:09 ; pages:485-488

Links:	Volltext

DOI / URN:	10.1007/s00340-003-1283-7

Katalog-ID:	SPR004203917

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520			\|a Abstract Micro-cell structures with side-walls as thin as 0.70 μm and aspect ratios as high as 6.7 are fabricated by single-layer writing through two-photon-absorption (TPA) photopolymerization. The use of a moderate-numerical-aperture (N.A.) objective lens to obtain a much more elongated voxel and an in situ ultraviolet (UV) pre-exposure step to improve the sensitivity of TPA photopolymerization are the main factors responsible for the high aspect ratio and sub-diffraction-limit resolution that are achieved.
650		4	\|a Microstructure \|7 (dpeaa)DE-He213
650		4	\|a Aspect Ratio \|7 (dpeaa)DE-He213
650		4	\|a High Aspect Ratio \|7 (dpeaa)DE-He213
650		4	\|a Objective Lens \|7 (dpeaa)DE-He213
650		4	\|a Photopolymerization \|7 (dpeaa)DE-He213
700	1		\|a Pu, N.-W. \|4 aut
700	1		\|a Tong, Y.-P. \|4 aut
700	1		\|a Yau, H.-F. \|4 aut
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912			\|a GBV_ILN_62
912			\|a GBV_ILN_63
912			\|a GBV_ILN_69
912			\|a GBV_ILN_70
912			\|a GBV_ILN_73
912			\|a GBV_ILN_74
912			\|a GBV_ILN_90
912			\|a GBV_ILN_95
912			\|a GBV_ILN_100
912			\|a GBV_ILN_101
912			\|a GBV_ILN_105
912			\|a GBV_ILN_110
912			\|a GBV_ILN_120
912			\|a GBV_ILN_138
912			\|a GBV_ILN_150
912			\|a GBV_ILN_151
912			\|a GBV_ILN_152
912			\|a GBV_ILN_161
912			\|a GBV_ILN_170
912			\|a GBV_ILN_171
912			\|a GBV_ILN_187
912			\|a GBV_ILN_206
912			\|a GBV_ILN_213
912			\|a GBV_ILN_224
912			\|a GBV_ILN_230
912			\|a GBV_ILN_250
912			\|a GBV_ILN_267
912			\|a GBV_ILN_281
912			\|a GBV_ILN_285
912			\|a GBV_ILN_293
912			\|a GBV_ILN_370
912			\|a GBV_ILN_602
912			\|a GBV_ILN_636
912			\|a GBV_ILN_702
912			\|a GBV_ILN_2001
912			\|a GBV_ILN_2003
912			\|a GBV_ILN_2004
912			\|a GBV_ILN_2005
912			\|a GBV_ILN_2006
912			\|a GBV_ILN_2007
912			\|a GBV_ILN_2008
912			\|a GBV_ILN_2009
912			\|a GBV_ILN_2010
912			\|a GBV_ILN_2011
912			\|a GBV_ILN_2014
912			\|a GBV_ILN_2015
912			\|a GBV_ILN_2020
912			\|a GBV_ILN_2021
912			\|a GBV_ILN_2025
912			\|a GBV_ILN_2026
912			\|a GBV_ILN_2027
912			\|a GBV_ILN_2031
912			\|a GBV_ILN_2034
912			\|a GBV_ILN_2037
912			\|a GBV_ILN_2038
912			\|a GBV_ILN_2039
912			\|a GBV_ILN_2044
912			\|a GBV_ILN_2048
912			\|a GBV_ILN_2049
912			\|a GBV_ILN_2050
912			\|a GBV_ILN_2055
912			\|a GBV_ILN_2056
912			\|a GBV_ILN_2057
912			\|a GBV_ILN_2059
912			\|a GBV_ILN_2061
912			\|a GBV_ILN_2064
912			\|a GBV_ILN_2065
912			\|a GBV_ILN_2068
912			\|a GBV_ILN_2070
912			\|a GBV_ILN_2086
912			\|a GBV_ILN_2088
912			\|a GBV_ILN_2093
912			\|a GBV_ILN_2106
912			\|a GBV_ILN_2107
912			\|a GBV_ILN_2108
912			\|a GBV_ILN_2110
912			\|a GBV_ILN_2111
912			\|a GBV_ILN_2112
912			\|a GBV_ILN_2113
912			\|a GBV_ILN_2116
912			\|a GBV_ILN_2118
912			\|a GBV_ILN_2119
912			\|a GBV_ILN_2122
912			\|a GBV_ILN_2129
912			\|a GBV_ILN_2143
912			\|a GBV_ILN_2144
912			\|a GBV_ILN_2147
912			\|a GBV_ILN_2148
912			\|a GBV_ILN_2152
912			\|a GBV_ILN_2153
912			\|a GBV_ILN_2188
912			\|a GBV_ILN_2190
912			\|a GBV_ILN_2232
912			\|a GBV_ILN_2336
912			\|a GBV_ILN_2446
912			\|a GBV_ILN_2470
912			\|a GBV_ILN_2472
912			\|a GBV_ILN_2507
912			\|a GBV_ILN_2522
912			\|a GBV_ILN_2548
912			\|a GBV_ILN_4012
912			\|a GBV_ILN_4035
912			\|a GBV_ILN_4037
912			\|a GBV_ILN_4046
912			\|a GBV_ILN_4112
912			\|a GBV_ILN_4125
912			\|a GBV_ILN_4126
912			\|a GBV_ILN_4242
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912			\|a GBV_ILN_4249
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912			\|a GBV_ILN_4306
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912			\|a GBV_ILN_4322
912			\|a GBV_ILN_4323
912			\|a GBV_ILN_4324
912			\|a GBV_ILN_4325
912			\|a GBV_ILN_4326
912			\|a GBV_ILN_4328
912			\|a GBV_ILN_4333
912			\|a GBV_ILN_4334
912			\|a GBV_ILN_4335
912			\|a GBV_ILN_4336
912			\|a GBV_ILN_4338
912			\|a GBV_ILN_4393
912			\|a GBV_ILN_4700
951			\|a AR
952			\|d 77 \|j 2003 \|e 5 \|b 23 \|c 09 \|h 485-488

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publishDate	2003
allfields	10.1007/s00340-003-1283-7 doi (DE-627)SPR004203917 (SPR)s00340-003-1283-7-e DE-627 ger DE-627 rakwb eng Pan, E.-Y. verfasserin aut Fabrication of high-aspect-ratio sub-diffraction-limit microstructures by two-photon-absorption photopolymerization 2003 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Springer-Verlag 2003 Abstract Micro-cell structures with side-walls as thin as 0.70 μm and aspect ratios as high as 6.7 are fabricated by single-layer writing through two-photon-absorption (TPA) photopolymerization. The use of a moderate-numerical-aperture (N.A.) objective lens to obtain a much more elongated voxel and an in situ ultraviolet (UV) pre-exposure step to improve the sensitivity of TPA photopolymerization are the main factors responsible for the high aspect ratio and sub-diffraction-limit resolution that are achieved. Microstructure (dpeaa)DE-He213 Aspect Ratio (dpeaa)DE-He213 High Aspect Ratio (dpeaa)DE-He213 Objective Lens (dpeaa)DE-He213 Photopolymerization (dpeaa)DE-He213 Pu, N.-W. aut Tong, Y.-P. aut Yau, H.-F. aut Enthalten in Applied physics Berlin : Springer, 1981 77(2003), 5 vom: 23. Sept., Seite 485-488 (DE-627)253389933 (DE-600)1458437-2 1432-0649 nnns volume:77 year:2003 number:5 day:23 month:09 pages:485-488 https://dx.doi.org/10.1007/s00340-003-1283-7 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_267 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 77 2003 5 23 09 485-488
spelling	10.1007/s00340-003-1283-7 doi (DE-627)SPR004203917 (SPR)s00340-003-1283-7-e DE-627 ger DE-627 rakwb eng Pan, E.-Y. verfasserin aut Fabrication of high-aspect-ratio sub-diffraction-limit microstructures by two-photon-absorption photopolymerization 2003 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Springer-Verlag 2003 Abstract Micro-cell structures with side-walls as thin as 0.70 μm and aspect ratios as high as 6.7 are fabricated by single-layer writing through two-photon-absorption (TPA) photopolymerization. The use of a moderate-numerical-aperture (N.A.) objective lens to obtain a much more elongated voxel and an in situ ultraviolet (UV) pre-exposure step to improve the sensitivity of TPA photopolymerization are the main factors responsible for the high aspect ratio and sub-diffraction-limit resolution that are achieved. Microstructure (dpeaa)DE-He213 Aspect Ratio (dpeaa)DE-He213 High Aspect Ratio (dpeaa)DE-He213 Objective Lens (dpeaa)DE-He213 Photopolymerization (dpeaa)DE-He213 Pu, N.-W. aut Tong, Y.-P. aut Yau, H.-F. aut Enthalten in Applied physics Berlin : Springer, 1981 77(2003), 5 vom: 23. Sept., Seite 485-488 (DE-627)253389933 (DE-600)1458437-2 1432-0649 nnns volume:77 year:2003 number:5 day:23 month:09 pages:485-488 https://dx.doi.org/10.1007/s00340-003-1283-7 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_267 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 77 2003 5 23 09 485-488
allfields_unstemmed	10.1007/s00340-003-1283-7 doi (DE-627)SPR004203917 (SPR)s00340-003-1283-7-e DE-627 ger DE-627 rakwb eng Pan, E.-Y. verfasserin aut Fabrication of high-aspect-ratio sub-diffraction-limit microstructures by two-photon-absorption photopolymerization 2003 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Springer-Verlag 2003 Abstract Micro-cell structures with side-walls as thin as 0.70 μm and aspect ratios as high as 6.7 are fabricated by single-layer writing through two-photon-absorption (TPA) photopolymerization. The use of a moderate-numerical-aperture (N.A.) objective lens to obtain a much more elongated voxel and an in situ ultraviolet (UV) pre-exposure step to improve the sensitivity of TPA photopolymerization are the main factors responsible for the high aspect ratio and sub-diffraction-limit resolution that are achieved. Microstructure (dpeaa)DE-He213 Aspect Ratio (dpeaa)DE-He213 High Aspect Ratio (dpeaa)DE-He213 Objective Lens (dpeaa)DE-He213 Photopolymerization (dpeaa)DE-He213 Pu, N.-W. aut Tong, Y.-P. aut Yau, H.-F. aut Enthalten in Applied physics Berlin : Springer, 1981 77(2003), 5 vom: 23. Sept., Seite 485-488 (DE-627)253389933 (DE-600)1458437-2 1432-0649 nnns volume:77 year:2003 number:5 day:23 month:09 pages:485-488 https://dx.doi.org/10.1007/s00340-003-1283-7 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_267 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 77 2003 5 23 09 485-488
allfieldsGer	10.1007/s00340-003-1283-7 doi (DE-627)SPR004203917 (SPR)s00340-003-1283-7-e DE-627 ger DE-627 rakwb eng Pan, E.-Y. verfasserin aut Fabrication of high-aspect-ratio sub-diffraction-limit microstructures by two-photon-absorption photopolymerization 2003 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Springer-Verlag 2003 Abstract Micro-cell structures with side-walls as thin as 0.70 μm and aspect ratios as high as 6.7 are fabricated by single-layer writing through two-photon-absorption (TPA) photopolymerization. The use of a moderate-numerical-aperture (N.A.) objective lens to obtain a much more elongated voxel and an in situ ultraviolet (UV) pre-exposure step to improve the sensitivity of TPA photopolymerization are the main factors responsible for the high aspect ratio and sub-diffraction-limit resolution that are achieved. Microstructure (dpeaa)DE-He213 Aspect Ratio (dpeaa)DE-He213 High Aspect Ratio (dpeaa)DE-He213 Objective Lens (dpeaa)DE-He213 Photopolymerization (dpeaa)DE-He213 Pu, N.-W. aut Tong, Y.-P. aut Yau, H.-F. aut Enthalten in Applied physics Berlin : Springer, 1981 77(2003), 5 vom: 23. Sept., Seite 485-488 (DE-627)253389933 (DE-600)1458437-2 1432-0649 nnns volume:77 year:2003 number:5 day:23 month:09 pages:485-488 https://dx.doi.org/10.1007/s00340-003-1283-7 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_267 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 77 2003 5 23 09 485-488
allfieldsSound	10.1007/s00340-003-1283-7 doi (DE-627)SPR004203917 (SPR)s00340-003-1283-7-e DE-627 ger DE-627 rakwb eng Pan, E.-Y. verfasserin aut Fabrication of high-aspect-ratio sub-diffraction-limit microstructures by two-photon-absorption photopolymerization 2003 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier © Springer-Verlag 2003 Abstract Micro-cell structures with side-walls as thin as 0.70 μm and aspect ratios as high as 6.7 are fabricated by single-layer writing through two-photon-absorption (TPA) photopolymerization. The use of a moderate-numerical-aperture (N.A.) objective lens to obtain a much more elongated voxel and an in situ ultraviolet (UV) pre-exposure step to improve the sensitivity of TPA photopolymerization are the main factors responsible for the high aspect ratio and sub-diffraction-limit resolution that are achieved. Microstructure (dpeaa)DE-He213 Aspect Ratio (dpeaa)DE-He213 High Aspect Ratio (dpeaa)DE-He213 Objective Lens (dpeaa)DE-He213 Photopolymerization (dpeaa)DE-He213 Pu, N.-W. aut Tong, Y.-P. aut Yau, H.-F. aut Enthalten in Applied physics Berlin : Springer, 1981 77(2003), 5 vom: 23. Sept., Seite 485-488 (DE-627)253389933 (DE-600)1458437-2 1432-0649 nnns volume:77 year:2003 number:5 day:23 month:09 pages:485-488 https://dx.doi.org/10.1007/s00340-003-1283-7 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_206 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_267 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2056 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4328 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 AR 77 2003 5 23 09 485-488
language	English
source	Enthalten in Applied physics 77(2003), 5 vom: 23. Sept., Seite 485-488 volume:77 year:2003 number:5 day:23 month:09 pages:485-488
sourceStr	Enthalten in Applied physics 77(2003), 5 vom: 23. Sept., Seite 485-488 volume:77 year:2003 number:5 day:23 month:09 pages:485-488
format_phy_str_mv	Article
institution	findex.gbv.de
topic_facet	Microstructure Aspect Ratio High Aspect Ratio Objective Lens Photopolymerization
isfreeaccess_bool	false
container_title	Applied physics
authorswithroles_txt_mv	Pan, E.-Y. @@aut@@ Pu, N.-W. @@aut@@ Tong, Y.-P. @@aut@@ Yau, H.-F. @@aut@@
publishDateDaySort_date	2003-09-23T00:00:00Z
hierarchy_top_id	253389933
id	SPR004203917
language_de	englisch
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author	Pan, E.-Y.
spellingShingle	Pan, E.-Y. misc Microstructure misc Aspect Ratio misc High Aspect Ratio misc Objective Lens misc Photopolymerization Fabrication of high-aspect-ratio sub-diffraction-limit microstructures by two-photon-absorption photopolymerization
authorStr	Pan, E.-Y.
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topic_title	Fabrication of high-aspect-ratio sub-diffraction-limit microstructures by two-photon-absorption photopolymerization Microstructure (dpeaa)DE-He213 Aspect Ratio (dpeaa)DE-He213 High Aspect Ratio (dpeaa)DE-He213 Objective Lens (dpeaa)DE-He213 Photopolymerization (dpeaa)DE-He213
topic	misc Microstructure misc Aspect Ratio misc High Aspect Ratio misc Objective Lens misc Photopolymerization
topic_unstemmed	misc Microstructure misc Aspect Ratio misc High Aspect Ratio misc Objective Lens misc Photopolymerization
topic_browse	misc Microstructure misc Aspect Ratio misc High Aspect Ratio misc Objective Lens misc Photopolymerization
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title	Fabrication of high-aspect-ratio sub-diffraction-limit microstructures by two-photon-absorption photopolymerization
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title_full	Fabrication of high-aspect-ratio sub-diffraction-limit microstructures by two-photon-absorption photopolymerization
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author_browse	Pan, E.-Y. Pu, N.-W. Tong, Y.-P. Yau, H.-F.
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doi_str_mv	10.1007/s00340-003-1283-7
title_sort	fabrication of high-aspect-ratio sub-diffraction-limit microstructures by two-photon-absorption photopolymerization
title_auth	Fabrication of high-aspect-ratio sub-diffraction-limit microstructures by two-photon-absorption photopolymerization
abstract	Abstract Micro-cell structures with side-walls as thin as 0.70 μm and aspect ratios as high as 6.7 are fabricated by single-layer writing through two-photon-absorption (TPA) photopolymerization. The use of a moderate-numerical-aperture (N.A.) objective lens to obtain a much more elongated voxel and an in situ ultraviolet (UV) pre-exposure step to improve the sensitivity of TPA photopolymerization are the main factors responsible for the high aspect ratio and sub-diffraction-limit resolution that are achieved. © Springer-Verlag 2003
abstractGer	Abstract Micro-cell structures with side-walls as thin as 0.70 μm and aspect ratios as high as 6.7 are fabricated by single-layer writing through two-photon-absorption (TPA) photopolymerization. The use of a moderate-numerical-aperture (N.A.) objective lens to obtain a much more elongated voxel and an in situ ultraviolet (UV) pre-exposure step to improve the sensitivity of TPA photopolymerization are the main factors responsible for the high aspect ratio and sub-diffraction-limit resolution that are achieved. © Springer-Verlag 2003
abstract_unstemmed	Abstract Micro-cell structures with side-walls as thin as 0.70 μm and aspect ratios as high as 6.7 are fabricated by single-layer writing through two-photon-absorption (TPA) photopolymerization. The use of a moderate-numerical-aperture (N.A.) objective lens to obtain a much more elongated voxel and an in situ ultraviolet (UV) pre-exposure step to improve the sensitivity of TPA photopolymerization are the main factors responsible for the high aspect ratio and sub-diffraction-limit resolution that are achieved. © Springer-Verlag 2003
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container_issue	5
title_short	Fabrication of high-aspect-ratio sub-diffraction-limit microstructures by two-photon-absorption photopolymerization
url	https://dx.doi.org/10.1007/s00340-003-1283-7
remote_bool	true
author2	Pu, N.-W. Tong, Y.-P. Yau, H.-F.
author2Str	Pu, N.-W. Tong, Y.-P. Yau, H.-F.
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doi_str	10.1007/s00340-003-1283-7
up_date	2024-07-04T00:07:02.277Z
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Fabrication of high-aspect-ratio sub-diffraction-limit microstructures by two-photon-absorption photopolymerization

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