Influence of Different $ CH_{4} $/$ N_{2} $ Ratios on Structural and Mechanical Properties of a-$ CN_{x} $:H Film Synthesized Using Plasma Focus
Abstract Carbon nitride films were synthesized by operating the dense plasma focus device with different $ CH_{4} $/$ N_{2} $ admixture gas ratios and fixed 20 focus shots. The pressure and axial distance from anode tip were kept constant at 3 mbar and 8 cm respectively. Raman and X-ray photoelectro...
Ausführliche Beschreibung
Gespeichert in:
| Autor*in: |
Umar, Z. A. [verfasserIn] Ahmad, R. [verfasserIn] Rawat, R. S. [verfasserIn] Hussnain, A. [verfasserIn] Khalid, N. [verfasserIn] Chen, Z. [verfasserIn] Shen, L. [verfasserIn] Zhang, Z. [verfasserIn] Hussain, T. [verfasserIn] |
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| Format: |
E-Artikel |
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| Sprache: |
Englisch |
| Erschienen: |
2014 |
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| Schlagwörter: |
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| Übergeordnetes Werk: |
Enthalten in: Journal of fusion energy - New York, NY : Springer Science + Business Media B.V., 1981, 33(2014), 6 vom: 01. Juni, Seite 640-647 |
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| Übergeordnetes Werk: |
volume:33 ; year:2014 ; number:6 ; day:01 ; month:06 ; pages:640-647 |
| Links: |
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| DOI / URN: |
10.1007/s10894-014-9723-4 |
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| Katalog-ID: |
SPR014393530 |
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| 520 | |a Abstract Carbon nitride films were synthesized by operating the dense plasma focus device with different $ CH_{4} $/$ N_{2} $ admixture gas ratios and fixed 20 focus shots. The pressure and axial distance from anode tip were kept constant at 3 mbar and 8 cm respectively. Raman and X-ray photoelectron spectroscopy (XPS) techniques were used to observe the effect of $ CH_{4} $/$ N_{2} $ ratio on carbon nitride bonding. The XPS analysis showed that the terminating group C≡N is more dominant for the films synthesized using higher concentration of nitrogen which gives softer films. Field emission scanning electron microscopy results showed that the deposited films consist of nanoparticles and their agglomerates. The size of agglomerates increases with decreasing concentration of nitrogen in $ CH_{4} $/$ N_{2} $ admixture gas. Nanoindentation results showed the increase in hardness and elastic modulus values of films with decreasing concentration of nitrogen in $ CH_{4} $/$ N_{2} $ admixture gas. The hardness and elastic modulus values were found to be dependent on $ sp^{3} $ content in the film as well as the C≡N. The hardness and elastic modulus values of 10.7 and 229.8 GPa respectively were achieved for the films deposited with fixed 20 focus deposition shots and using $ CH_{4} $/$ N_{2} $ admixture gas ratio of 7:3. | ||
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| 700 | 1 | |a Rawat, R. S. |e verfasserin |4 aut | |
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| 700 | 1 | |a Khalid, N. |e verfasserin |4 aut | |
| 700 | 1 | |a Chen, Z. |e verfasserin |4 aut | |
| 700 | 1 | |a Shen, L. |e verfasserin |4 aut | |
| 700 | 1 | |a Zhang, Z. |e verfasserin |4 aut | |
| 700 | 1 | |a Hussain, T. |e verfasserin |4 aut | |
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10.1007/s10894-014-9723-4 doi (DE-627)SPR014393530 (SPR)s10894-014-9723-4-e DE-627 ger DE-627 rakwb eng 530 ASE 33.00 bkl Umar, Z. A. verfasserin aut Influence of Different $ CH_{4} $/$ N_{2} $ Ratios on Structural and Mechanical Properties of a-$ CN_{x} $:H Film Synthesized Using Plasma Focus 2014 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Carbon nitride films were synthesized by operating the dense plasma focus device with different $ CH_{4} $/$ N_{2} $ admixture gas ratios and fixed 20 focus shots. The pressure and axial distance from anode tip were kept constant at 3 mbar and 8 cm respectively. Raman and X-ray photoelectron spectroscopy (XPS) techniques were used to observe the effect of $ CH_{4} $/$ N_{2} $ ratio on carbon nitride bonding. The XPS analysis showed that the terminating group C≡N is more dominant for the films synthesized using higher concentration of nitrogen which gives softer films. Field emission scanning electron microscopy results showed that the deposited films consist of nanoparticles and their agglomerates. The size of agglomerates increases with decreasing concentration of nitrogen in $ CH_{4} $/$ N_{2} $ admixture gas. Nanoindentation results showed the increase in hardness and elastic modulus values of films with decreasing concentration of nitrogen in $ CH_{4} $/$ N_{2} $ admixture gas. The hardness and elastic modulus values were found to be dependent on $ sp^{3} $ content in the film as well as the C≡N. The hardness and elastic modulus values of 10.7 and 229.8 GPa respectively were achieved for the films deposited with fixed 20 focus deposition shots and using $ CH_{4} $/$ N_{2} $ admixture gas ratio of 7:3. DPF (dpeaa)DE-He213 XPS (dpeaa)DE-He213 FESEM (dpeaa)DE-He213 Hardness (dpeaa)DE-He213 Elastic modulus (dpeaa)DE-He213 Ahmad, R. verfasserin aut Rawat, R. S. verfasserin aut Hussnain, A. verfasserin aut Khalid, N. verfasserin aut Chen, Z. verfasserin aut Shen, L. verfasserin aut Zhang, Z. verfasserin aut Hussain, T. verfasserin aut Enthalten in Journal of fusion energy New York, NY : Springer Science + Business Media B.V., 1981 33(2014), 6 vom: 01. Juni, Seite 640-647 (DE-627)320574636 (DE-600)2016894-9 1572-9591 nnns volume:33 year:2014 number:6 day:01 month:06 pages:640-647 https://dx.doi.org/10.1007/s10894-014-9723-4 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 33.00 ASE AR 33 2014 6 01 06 640-647 |
| spelling |
10.1007/s10894-014-9723-4 doi (DE-627)SPR014393530 (SPR)s10894-014-9723-4-e DE-627 ger DE-627 rakwb eng 530 ASE 33.00 bkl Umar, Z. A. verfasserin aut Influence of Different $ CH_{4} $/$ N_{2} $ Ratios on Structural and Mechanical Properties of a-$ CN_{x} $:H Film Synthesized Using Plasma Focus 2014 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Carbon nitride films were synthesized by operating the dense plasma focus device with different $ CH_{4} $/$ N_{2} $ admixture gas ratios and fixed 20 focus shots. The pressure and axial distance from anode tip were kept constant at 3 mbar and 8 cm respectively. Raman and X-ray photoelectron spectroscopy (XPS) techniques were used to observe the effect of $ CH_{4} $/$ N_{2} $ ratio on carbon nitride bonding. The XPS analysis showed that the terminating group C≡N is more dominant for the films synthesized using higher concentration of nitrogen which gives softer films. Field emission scanning electron microscopy results showed that the deposited films consist of nanoparticles and their agglomerates. The size of agglomerates increases with decreasing concentration of nitrogen in $ CH_{4} $/$ N_{2} $ admixture gas. Nanoindentation results showed the increase in hardness and elastic modulus values of films with decreasing concentration of nitrogen in $ CH_{4} $/$ N_{2} $ admixture gas. The hardness and elastic modulus values were found to be dependent on $ sp^{3} $ content in the film as well as the C≡N. The hardness and elastic modulus values of 10.7 and 229.8 GPa respectively were achieved for the films deposited with fixed 20 focus deposition shots and using $ CH_{4} $/$ N_{2} $ admixture gas ratio of 7:3. DPF (dpeaa)DE-He213 XPS (dpeaa)DE-He213 FESEM (dpeaa)DE-He213 Hardness (dpeaa)DE-He213 Elastic modulus (dpeaa)DE-He213 Ahmad, R. verfasserin aut Rawat, R. S. verfasserin aut Hussnain, A. verfasserin aut Khalid, N. verfasserin aut Chen, Z. verfasserin aut Shen, L. verfasserin aut Zhang, Z. verfasserin aut Hussain, T. verfasserin aut Enthalten in Journal of fusion energy New York, NY : Springer Science + Business Media B.V., 1981 33(2014), 6 vom: 01. Juni, Seite 640-647 (DE-627)320574636 (DE-600)2016894-9 1572-9591 nnns volume:33 year:2014 number:6 day:01 month:06 pages:640-647 https://dx.doi.org/10.1007/s10894-014-9723-4 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 33.00 ASE AR 33 2014 6 01 06 640-647 |
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10.1007/s10894-014-9723-4 doi (DE-627)SPR014393530 (SPR)s10894-014-9723-4-e DE-627 ger DE-627 rakwb eng 530 ASE 33.00 bkl Umar, Z. A. verfasserin aut Influence of Different $ CH_{4} $/$ N_{2} $ Ratios on Structural and Mechanical Properties of a-$ CN_{x} $:H Film Synthesized Using Plasma Focus 2014 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Carbon nitride films were synthesized by operating the dense plasma focus device with different $ CH_{4} $/$ N_{2} $ admixture gas ratios and fixed 20 focus shots. The pressure and axial distance from anode tip were kept constant at 3 mbar and 8 cm respectively. Raman and X-ray photoelectron spectroscopy (XPS) techniques were used to observe the effect of $ CH_{4} $/$ N_{2} $ ratio on carbon nitride bonding. The XPS analysis showed that the terminating group C≡N is more dominant for the films synthesized using higher concentration of nitrogen which gives softer films. Field emission scanning electron microscopy results showed that the deposited films consist of nanoparticles and their agglomerates. The size of agglomerates increases with decreasing concentration of nitrogen in $ CH_{4} $/$ N_{2} $ admixture gas. Nanoindentation results showed the increase in hardness and elastic modulus values of films with decreasing concentration of nitrogen in $ CH_{4} $/$ N_{2} $ admixture gas. The hardness and elastic modulus values were found to be dependent on $ sp^{3} $ content in the film as well as the C≡N. The hardness and elastic modulus values of 10.7 and 229.8 GPa respectively were achieved for the films deposited with fixed 20 focus deposition shots and using $ CH_{4} $/$ N_{2} $ admixture gas ratio of 7:3. DPF (dpeaa)DE-He213 XPS (dpeaa)DE-He213 FESEM (dpeaa)DE-He213 Hardness (dpeaa)DE-He213 Elastic modulus (dpeaa)DE-He213 Ahmad, R. verfasserin aut Rawat, R. S. verfasserin aut Hussnain, A. verfasserin aut Khalid, N. verfasserin aut Chen, Z. verfasserin aut Shen, L. verfasserin aut Zhang, Z. verfasserin aut Hussain, T. verfasserin aut Enthalten in Journal of fusion energy New York, NY : Springer Science + Business Media B.V., 1981 33(2014), 6 vom: 01. Juni, Seite 640-647 (DE-627)320574636 (DE-600)2016894-9 1572-9591 nnns volume:33 year:2014 number:6 day:01 month:06 pages:640-647 https://dx.doi.org/10.1007/s10894-014-9723-4 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 33.00 ASE AR 33 2014 6 01 06 640-647 |
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10.1007/s10894-014-9723-4 doi (DE-627)SPR014393530 (SPR)s10894-014-9723-4-e DE-627 ger DE-627 rakwb eng 530 ASE 33.00 bkl Umar, Z. A. verfasserin aut Influence of Different $ CH_{4} $/$ N_{2} $ Ratios on Structural and Mechanical Properties of a-$ CN_{x} $:H Film Synthesized Using Plasma Focus 2014 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Carbon nitride films were synthesized by operating the dense plasma focus device with different $ CH_{4} $/$ N_{2} $ admixture gas ratios and fixed 20 focus shots. The pressure and axial distance from anode tip were kept constant at 3 mbar and 8 cm respectively. Raman and X-ray photoelectron spectroscopy (XPS) techniques were used to observe the effect of $ CH_{4} $/$ N_{2} $ ratio on carbon nitride bonding. The XPS analysis showed that the terminating group C≡N is more dominant for the films synthesized using higher concentration of nitrogen which gives softer films. Field emission scanning electron microscopy results showed that the deposited films consist of nanoparticles and their agglomerates. The size of agglomerates increases with decreasing concentration of nitrogen in $ CH_{4} $/$ N_{2} $ admixture gas. Nanoindentation results showed the increase in hardness and elastic modulus values of films with decreasing concentration of nitrogen in $ CH_{4} $/$ N_{2} $ admixture gas. The hardness and elastic modulus values were found to be dependent on $ sp^{3} $ content in the film as well as the C≡N. The hardness and elastic modulus values of 10.7 and 229.8 GPa respectively were achieved for the films deposited with fixed 20 focus deposition shots and using $ CH_{4} $/$ N_{2} $ admixture gas ratio of 7:3. DPF (dpeaa)DE-He213 XPS (dpeaa)DE-He213 FESEM (dpeaa)DE-He213 Hardness (dpeaa)DE-He213 Elastic modulus (dpeaa)DE-He213 Ahmad, R. verfasserin aut Rawat, R. S. verfasserin aut Hussnain, A. verfasserin aut Khalid, N. verfasserin aut Chen, Z. verfasserin aut Shen, L. verfasserin aut Zhang, Z. verfasserin aut Hussain, T. verfasserin aut Enthalten in Journal of fusion energy New York, NY : Springer Science + Business Media B.V., 1981 33(2014), 6 vom: 01. Juni, Seite 640-647 (DE-627)320574636 (DE-600)2016894-9 1572-9591 nnns volume:33 year:2014 number:6 day:01 month:06 pages:640-647 https://dx.doi.org/10.1007/s10894-014-9723-4 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 33.00 ASE AR 33 2014 6 01 06 640-647 |
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10.1007/s10894-014-9723-4 doi (DE-627)SPR014393530 (SPR)s10894-014-9723-4-e DE-627 ger DE-627 rakwb eng 530 ASE 33.00 bkl Umar, Z. A. verfasserin aut Influence of Different $ CH_{4} $/$ N_{2} $ Ratios on Structural and Mechanical Properties of a-$ CN_{x} $:H Film Synthesized Using Plasma Focus 2014 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Carbon nitride films were synthesized by operating the dense plasma focus device with different $ CH_{4} $/$ N_{2} $ admixture gas ratios and fixed 20 focus shots. The pressure and axial distance from anode tip were kept constant at 3 mbar and 8 cm respectively. Raman and X-ray photoelectron spectroscopy (XPS) techniques were used to observe the effect of $ CH_{4} $/$ N_{2} $ ratio on carbon nitride bonding. The XPS analysis showed that the terminating group C≡N is more dominant for the films synthesized using higher concentration of nitrogen which gives softer films. Field emission scanning electron microscopy results showed that the deposited films consist of nanoparticles and their agglomerates. The size of agglomerates increases with decreasing concentration of nitrogen in $ CH_{4} $/$ N_{2} $ admixture gas. Nanoindentation results showed the increase in hardness and elastic modulus values of films with decreasing concentration of nitrogen in $ CH_{4} $/$ N_{2} $ admixture gas. The hardness and elastic modulus values were found to be dependent on $ sp^{3} $ content in the film as well as the C≡N. The hardness and elastic modulus values of 10.7 and 229.8 GPa respectively were achieved for the films deposited with fixed 20 focus deposition shots and using $ CH_{4} $/$ N_{2} $ admixture gas ratio of 7:3. DPF (dpeaa)DE-He213 XPS (dpeaa)DE-He213 FESEM (dpeaa)DE-He213 Hardness (dpeaa)DE-He213 Elastic modulus (dpeaa)DE-He213 Ahmad, R. verfasserin aut Rawat, R. S. verfasserin aut Hussnain, A. verfasserin aut Khalid, N. verfasserin aut Chen, Z. verfasserin aut Shen, L. verfasserin aut Zhang, Z. verfasserin aut Hussain, T. verfasserin aut Enthalten in Journal of fusion energy New York, NY : Springer Science + Business Media B.V., 1981 33(2014), 6 vom: 01. Juni, Seite 640-647 (DE-627)320574636 (DE-600)2016894-9 1572-9591 nnns volume:33 year:2014 number:6 day:01 month:06 pages:640-647 https://dx.doi.org/10.1007/s10894-014-9723-4 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 33.00 ASE AR 33 2014 6 01 06 640-647 |
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A.</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Influence of Different $ CH_{4} $/$ N_{2} $ Ratios on Structural and Mechanical Properties of a-$ CN_{x} $:H Film Synthesized Using Plasma Focus</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">2014</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">Text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">Computermedien</subfield><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">Online-Ressource</subfield><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Abstract Carbon nitride films were synthesized by operating the dense plasma focus device with different $ CH_{4} $/$ N_{2} $ admixture gas ratios and fixed 20 focus shots. The pressure and axial distance from anode tip were kept constant at 3 mbar and 8 cm respectively. Raman and X-ray photoelectron spectroscopy (XPS) techniques were used to observe the effect of $ CH_{4} $/$ N_{2} $ ratio on carbon nitride bonding. The XPS analysis showed that the terminating group C≡N is more dominant for the films synthesized using higher concentration of nitrogen which gives softer films. Field emission scanning electron microscopy results showed that the deposited films consist of nanoparticles and their agglomerates. The size of agglomerates increases with decreasing concentration of nitrogen in $ CH_{4} $/$ N_{2} $ admixture gas. Nanoindentation results showed the increase in hardness and elastic modulus values of films with decreasing concentration of nitrogen in $ CH_{4} $/$ N_{2} $ admixture gas. The hardness and elastic modulus values were found to be dependent on $ sp^{3} $ content in the film as well as the C≡N. 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Umar, Z. A. |
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Umar, Z. A. ddc 530 bkl 33.00 misc DPF misc XPS misc FESEM misc Hardness misc Elastic modulus Influence of Different $ CH_{4} $/$ N_{2} $ Ratios on Structural and Mechanical Properties of a-$ CN_{x} $:H Film Synthesized Using Plasma Focus |
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530 ASE 33.00 bkl Influence of Different $ CH_{4} $/$ N_{2} $ Ratios on Structural and Mechanical Properties of a-$ CN_{x} $:H Film Synthesized Using Plasma Focus DPF (dpeaa)DE-He213 XPS (dpeaa)DE-He213 FESEM (dpeaa)DE-He213 Hardness (dpeaa)DE-He213 Elastic modulus (dpeaa)DE-He213 |
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ddc 530 bkl 33.00 misc DPF misc XPS misc FESEM misc Hardness misc Elastic modulus |
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ddc 530 bkl 33.00 misc DPF misc XPS misc FESEM misc Hardness misc Elastic modulus |
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Influence of Different $ CH_{4} $/$ N_{2} $ Ratios on Structural and Mechanical Properties of a-$ CN_{x} $:H Film Synthesized Using Plasma Focus |
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Influence of Different $ CH_{4} $/$ N_{2} $ Ratios on Structural and Mechanical Properties of a-$ CN_{x} $:H Film Synthesized Using Plasma Focus |
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Umar, Z. A. Ahmad, R. Rawat, R. S. Hussnain, A. Khalid, N. Chen, Z. Shen, L. Zhang, Z. Hussain, T. |
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Elektronische Aufsätze |
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Umar, Z. A. |
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10.1007/s10894-014-9723-4 |
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influence of different $ ch_{4} $/$ n_{2} $ ratios on structural and mechanical properties of a-$ cn_{x} $:h film synthesized using plasma focus |
| title_auth |
Influence of Different $ CH_{4} $/$ N_{2} $ Ratios on Structural and Mechanical Properties of a-$ CN_{x} $:H Film Synthesized Using Plasma Focus |
| abstract |
Abstract Carbon nitride films were synthesized by operating the dense plasma focus device with different $ CH_{4} $/$ N_{2} $ admixture gas ratios and fixed 20 focus shots. The pressure and axial distance from anode tip were kept constant at 3 mbar and 8 cm respectively. Raman and X-ray photoelectron spectroscopy (XPS) techniques were used to observe the effect of $ CH_{4} $/$ N_{2} $ ratio on carbon nitride bonding. The XPS analysis showed that the terminating group C≡N is more dominant for the films synthesized using higher concentration of nitrogen which gives softer films. Field emission scanning electron microscopy results showed that the deposited films consist of nanoparticles and their agglomerates. The size of agglomerates increases with decreasing concentration of nitrogen in $ CH_{4} $/$ N_{2} $ admixture gas. Nanoindentation results showed the increase in hardness and elastic modulus values of films with decreasing concentration of nitrogen in $ CH_{4} $/$ N_{2} $ admixture gas. The hardness and elastic modulus values were found to be dependent on $ sp^{3} $ content in the film as well as the C≡N. The hardness and elastic modulus values of 10.7 and 229.8 GPa respectively were achieved for the films deposited with fixed 20 focus deposition shots and using $ CH_{4} $/$ N_{2} $ admixture gas ratio of 7:3. |
| abstractGer |
Abstract Carbon nitride films were synthesized by operating the dense plasma focus device with different $ CH_{4} $/$ N_{2} $ admixture gas ratios and fixed 20 focus shots. The pressure and axial distance from anode tip were kept constant at 3 mbar and 8 cm respectively. Raman and X-ray photoelectron spectroscopy (XPS) techniques were used to observe the effect of $ CH_{4} $/$ N_{2} $ ratio on carbon nitride bonding. The XPS analysis showed that the terminating group C≡N is more dominant for the films synthesized using higher concentration of nitrogen which gives softer films. Field emission scanning electron microscopy results showed that the deposited films consist of nanoparticles and their agglomerates. The size of agglomerates increases with decreasing concentration of nitrogen in $ CH_{4} $/$ N_{2} $ admixture gas. Nanoindentation results showed the increase in hardness and elastic modulus values of films with decreasing concentration of nitrogen in $ CH_{4} $/$ N_{2} $ admixture gas. The hardness and elastic modulus values were found to be dependent on $ sp^{3} $ content in the film as well as the C≡N. The hardness and elastic modulus values of 10.7 and 229.8 GPa respectively were achieved for the films deposited with fixed 20 focus deposition shots and using $ CH_{4} $/$ N_{2} $ admixture gas ratio of 7:3. |
| abstract_unstemmed |
Abstract Carbon nitride films were synthesized by operating the dense plasma focus device with different $ CH_{4} $/$ N_{2} $ admixture gas ratios and fixed 20 focus shots. The pressure and axial distance from anode tip were kept constant at 3 mbar and 8 cm respectively. Raman and X-ray photoelectron spectroscopy (XPS) techniques were used to observe the effect of $ CH_{4} $/$ N_{2} $ ratio on carbon nitride bonding. The XPS analysis showed that the terminating group C≡N is more dominant for the films synthesized using higher concentration of nitrogen which gives softer films. Field emission scanning electron microscopy results showed that the deposited films consist of nanoparticles and their agglomerates. The size of agglomerates increases with decreasing concentration of nitrogen in $ CH_{4} $/$ N_{2} $ admixture gas. Nanoindentation results showed the increase in hardness and elastic modulus values of films with decreasing concentration of nitrogen in $ CH_{4} $/$ N_{2} $ admixture gas. The hardness and elastic modulus values were found to be dependent on $ sp^{3} $ content in the film as well as the C≡N. The hardness and elastic modulus values of 10.7 and 229.8 GPa respectively were achieved for the films deposited with fixed 20 focus deposition shots and using $ CH_{4} $/$ N_{2} $ admixture gas ratio of 7:3. |
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Influence of Different $ CH_{4} $/$ N_{2} $ Ratios on Structural and Mechanical Properties of a-$ CN_{x} $:H Film Synthesized Using Plasma Focus |
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Ahmad, R. Rawat, R. S. Hussnain, A. Khalid, N. Chen, Z. Shen, L. Zhang, Z. Hussain, T. |
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| score |
7.4012547 |