Thermal Plasma Sources: How Well are They Adopted to Process Needs?
Abstract Thermal plasma devices have evolved over the years from an aerospace R&D tool for the simulation of re-entry of space vehicles into powerful sources for a wide range of applications including materials processing, nano-powder synthesis and deposition of functional coatings, waste treatm...
Ausführliche Beschreibung
Autor*in: |
Mostaghimi, Javad [verfasserIn] Boulos, Maher I. [verfasserIn] |
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Format: |
E-Artikel |
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Sprache: |
Englisch |
Erschienen: |
2015 |
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Schlagwörter: |
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Übergeordnetes Werk: |
Enthalten in: Plasma chemistry and plasma processing - Dordrecht : Springer Science + Business Media B.V., 1981, 35(2015), 3 vom: 26. Feb., Seite 421-436 |
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Übergeordnetes Werk: |
volume:35 ; year:2015 ; number:3 ; day:26 ; month:02 ; pages:421-436 |
Links: |
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DOI / URN: |
10.1007/s11090-015-9616-y |
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Katalog-ID: |
SPR016780558 |
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10.1007/s11090-015-9616-y doi (DE-627)SPR016780558 (SPR)s11090-015-9616-y-e DE-627 ger DE-627 rakwb eng 540 ASE 33.00 bkl 35.00 bkl Mostaghimi, Javad verfasserin aut Thermal Plasma Sources: How Well are They Adopted to Process Needs? 2015 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Thermal plasma devices have evolved over the years from an aerospace R&D tool for the simulation of re-entry of space vehicles into powerful sources for a wide range of applications including materials processing, nano-powder synthesis and deposition of functional coatings, waste treatment and biomass gasification. With the development of full scale industrial applications, it is increasingly apparent that the plasma source is an integral part of the process, and that the success of a technology depends to a large extent on the way the plasma source satisfies the process needs. In this paper, a short review is presented of a selected number of commercially available plasma sources that are using DC and/or RF inductively coupled plasma torch technologies. Thermal plasma processing (dpeaa)DE-He213 DC plasma torches (non-transferred) (dpeaa)DE-He213 Radio frequency inductively coupled plasma torches (dpeaa)DE-He213 Boulos, Maher I. verfasserin aut Enthalten in Plasma chemistry and plasma processing Dordrecht : Springer Science + Business Media B.V., 1981 35(2015), 3 vom: 26. Feb., Seite 421-436 (DE-627)318633000 (DE-600)2018594-7 1572-8986 nnns volume:35 year:2015 number:3 day:26 month:02 pages:421-436 https://dx.doi.org/10.1007/s11090-015-9616-y lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 33.00 ASE 35.00 ASE AR 35 2015 3 26 02 421-436 |
spelling |
10.1007/s11090-015-9616-y doi (DE-627)SPR016780558 (SPR)s11090-015-9616-y-e DE-627 ger DE-627 rakwb eng 540 ASE 33.00 bkl 35.00 bkl Mostaghimi, Javad verfasserin aut Thermal Plasma Sources: How Well are They Adopted to Process Needs? 2015 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Thermal plasma devices have evolved over the years from an aerospace R&D tool for the simulation of re-entry of space vehicles into powerful sources for a wide range of applications including materials processing, nano-powder synthesis and deposition of functional coatings, waste treatment and biomass gasification. With the development of full scale industrial applications, it is increasingly apparent that the plasma source is an integral part of the process, and that the success of a technology depends to a large extent on the way the plasma source satisfies the process needs. In this paper, a short review is presented of a selected number of commercially available plasma sources that are using DC and/or RF inductively coupled plasma torch technologies. Thermal plasma processing (dpeaa)DE-He213 DC plasma torches (non-transferred) (dpeaa)DE-He213 Radio frequency inductively coupled plasma torches (dpeaa)DE-He213 Boulos, Maher I. verfasserin aut Enthalten in Plasma chemistry and plasma processing Dordrecht : Springer Science + Business Media B.V., 1981 35(2015), 3 vom: 26. Feb., Seite 421-436 (DE-627)318633000 (DE-600)2018594-7 1572-8986 nnns volume:35 year:2015 number:3 day:26 month:02 pages:421-436 https://dx.doi.org/10.1007/s11090-015-9616-y lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 33.00 ASE 35.00 ASE AR 35 2015 3 26 02 421-436 |
allfields_unstemmed |
10.1007/s11090-015-9616-y doi (DE-627)SPR016780558 (SPR)s11090-015-9616-y-e DE-627 ger DE-627 rakwb eng 540 ASE 33.00 bkl 35.00 bkl Mostaghimi, Javad verfasserin aut Thermal Plasma Sources: How Well are They Adopted to Process Needs? 2015 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Thermal plasma devices have evolved over the years from an aerospace R&D tool for the simulation of re-entry of space vehicles into powerful sources for a wide range of applications including materials processing, nano-powder synthesis and deposition of functional coatings, waste treatment and biomass gasification. With the development of full scale industrial applications, it is increasingly apparent that the plasma source is an integral part of the process, and that the success of a technology depends to a large extent on the way the plasma source satisfies the process needs. In this paper, a short review is presented of a selected number of commercially available plasma sources that are using DC and/or RF inductively coupled plasma torch technologies. Thermal plasma processing (dpeaa)DE-He213 DC plasma torches (non-transferred) (dpeaa)DE-He213 Radio frequency inductively coupled plasma torches (dpeaa)DE-He213 Boulos, Maher I. verfasserin aut Enthalten in Plasma chemistry and plasma processing Dordrecht : Springer Science + Business Media B.V., 1981 35(2015), 3 vom: 26. Feb., Seite 421-436 (DE-627)318633000 (DE-600)2018594-7 1572-8986 nnns volume:35 year:2015 number:3 day:26 month:02 pages:421-436 https://dx.doi.org/10.1007/s11090-015-9616-y lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 33.00 ASE 35.00 ASE AR 35 2015 3 26 02 421-436 |
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10.1007/s11090-015-9616-y doi (DE-627)SPR016780558 (SPR)s11090-015-9616-y-e DE-627 ger DE-627 rakwb eng 540 ASE 33.00 bkl 35.00 bkl Mostaghimi, Javad verfasserin aut Thermal Plasma Sources: How Well are They Adopted to Process Needs? 2015 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Thermal plasma devices have evolved over the years from an aerospace R&D tool for the simulation of re-entry of space vehicles into powerful sources for a wide range of applications including materials processing, nano-powder synthesis and deposition of functional coatings, waste treatment and biomass gasification. With the development of full scale industrial applications, it is increasingly apparent that the plasma source is an integral part of the process, and that the success of a technology depends to a large extent on the way the plasma source satisfies the process needs. In this paper, a short review is presented of a selected number of commercially available plasma sources that are using DC and/or RF inductively coupled plasma torch technologies. Thermal plasma processing (dpeaa)DE-He213 DC plasma torches (non-transferred) (dpeaa)DE-He213 Radio frequency inductively coupled plasma torches (dpeaa)DE-He213 Boulos, Maher I. verfasserin aut Enthalten in Plasma chemistry and plasma processing Dordrecht : Springer Science + Business Media B.V., 1981 35(2015), 3 vom: 26. Feb., Seite 421-436 (DE-627)318633000 (DE-600)2018594-7 1572-8986 nnns volume:35 year:2015 number:3 day:26 month:02 pages:421-436 https://dx.doi.org/10.1007/s11090-015-9616-y lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 33.00 ASE 35.00 ASE AR 35 2015 3 26 02 421-436 |
allfieldsSound |
10.1007/s11090-015-9616-y doi (DE-627)SPR016780558 (SPR)s11090-015-9616-y-e DE-627 ger DE-627 rakwb eng 540 ASE 33.00 bkl 35.00 bkl Mostaghimi, Javad verfasserin aut Thermal Plasma Sources: How Well are They Adopted to Process Needs? 2015 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract Thermal plasma devices have evolved over the years from an aerospace R&D tool for the simulation of re-entry of space vehicles into powerful sources for a wide range of applications including materials processing, nano-powder synthesis and deposition of functional coatings, waste treatment and biomass gasification. With the development of full scale industrial applications, it is increasingly apparent that the plasma source is an integral part of the process, and that the success of a technology depends to a large extent on the way the plasma source satisfies the process needs. In this paper, a short review is presented of a selected number of commercially available plasma sources that are using DC and/or RF inductively coupled plasma torch technologies. Thermal plasma processing (dpeaa)DE-He213 DC plasma torches (non-transferred) (dpeaa)DE-He213 Radio frequency inductively coupled plasma torches (dpeaa)DE-He213 Boulos, Maher I. verfasserin aut Enthalten in Plasma chemistry and plasma processing Dordrecht : Springer Science + Business Media B.V., 1981 35(2015), 3 vom: 26. Feb., Seite 421-436 (DE-627)318633000 (DE-600)2018594-7 1572-8986 nnns volume:35 year:2015 number:3 day:26 month:02 pages:421-436 https://dx.doi.org/10.1007/s11090-015-9616-y lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_11 GBV_ILN_20 GBV_ILN_22 GBV_ILN_23 GBV_ILN_24 GBV_ILN_31 GBV_ILN_32 GBV_ILN_39 GBV_ILN_40 GBV_ILN_60 GBV_ILN_62 GBV_ILN_63 GBV_ILN_69 GBV_ILN_70 GBV_ILN_73 GBV_ILN_74 GBV_ILN_90 GBV_ILN_95 GBV_ILN_100 GBV_ILN_101 GBV_ILN_105 GBV_ILN_110 GBV_ILN_120 GBV_ILN_138 GBV_ILN_150 GBV_ILN_151 GBV_ILN_152 GBV_ILN_161 GBV_ILN_170 GBV_ILN_171 GBV_ILN_187 GBV_ILN_213 GBV_ILN_224 GBV_ILN_230 GBV_ILN_250 GBV_ILN_281 GBV_ILN_285 GBV_ILN_293 GBV_ILN_370 GBV_ILN_602 GBV_ILN_636 GBV_ILN_702 GBV_ILN_2001 GBV_ILN_2003 GBV_ILN_2004 GBV_ILN_2005 GBV_ILN_2006 GBV_ILN_2007 GBV_ILN_2008 GBV_ILN_2009 GBV_ILN_2010 GBV_ILN_2011 GBV_ILN_2014 GBV_ILN_2015 GBV_ILN_2020 GBV_ILN_2021 GBV_ILN_2025 GBV_ILN_2026 GBV_ILN_2027 GBV_ILN_2031 GBV_ILN_2034 GBV_ILN_2037 GBV_ILN_2038 GBV_ILN_2039 GBV_ILN_2044 GBV_ILN_2048 GBV_ILN_2049 GBV_ILN_2050 GBV_ILN_2055 GBV_ILN_2057 GBV_ILN_2059 GBV_ILN_2061 GBV_ILN_2064 GBV_ILN_2065 GBV_ILN_2068 GBV_ILN_2070 GBV_ILN_2086 GBV_ILN_2088 GBV_ILN_2093 GBV_ILN_2106 GBV_ILN_2107 GBV_ILN_2108 GBV_ILN_2110 GBV_ILN_2111 GBV_ILN_2112 GBV_ILN_2113 GBV_ILN_2116 GBV_ILN_2118 GBV_ILN_2119 GBV_ILN_2122 GBV_ILN_2129 GBV_ILN_2143 GBV_ILN_2144 GBV_ILN_2147 GBV_ILN_2148 GBV_ILN_2152 GBV_ILN_2153 GBV_ILN_2188 GBV_ILN_2190 GBV_ILN_2232 GBV_ILN_2336 GBV_ILN_2446 GBV_ILN_2470 GBV_ILN_2472 GBV_ILN_2507 GBV_ILN_2522 GBV_ILN_2548 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4046 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4313 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4326 GBV_ILN_4333 GBV_ILN_4334 GBV_ILN_4335 GBV_ILN_4336 GBV_ILN_4338 GBV_ILN_4393 GBV_ILN_4700 33.00 ASE 35.00 ASE AR 35 2015 3 26 02 421-436 |
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Enthalten in Plasma chemistry and plasma processing 35(2015), 3 vom: 26. Feb., Seite 421-436 volume:35 year:2015 number:3 day:26 month:02 pages:421-436 |
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Mostaghimi, Javad @@aut@@ Boulos, Maher I. @@aut@@ |
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Mostaghimi, Javad |
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Mostaghimi, Javad ddc 540 bkl 33.00 bkl 35.00 misc Thermal plasma processing misc DC plasma torches (non-transferred) misc Radio frequency inductively coupled plasma torches Thermal Plasma Sources: How Well are They Adopted to Process Needs? |
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540 ASE 33.00 bkl 35.00 bkl Thermal Plasma Sources: How Well are They Adopted to Process Needs? Thermal plasma processing (dpeaa)DE-He213 DC plasma torches (non-transferred) (dpeaa)DE-He213 Radio frequency inductively coupled plasma torches (dpeaa)DE-He213 |
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ddc 540 bkl 33.00 bkl 35.00 misc Thermal plasma processing misc DC plasma torches (non-transferred) misc Radio frequency inductively coupled plasma torches |
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thermal plasma sources: how well are they adopted to process needs? |
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Thermal Plasma Sources: How Well are They Adopted to Process Needs? |
abstract |
Abstract Thermal plasma devices have evolved over the years from an aerospace R&D tool for the simulation of re-entry of space vehicles into powerful sources for a wide range of applications including materials processing, nano-powder synthesis and deposition of functional coatings, waste treatment and biomass gasification. With the development of full scale industrial applications, it is increasingly apparent that the plasma source is an integral part of the process, and that the success of a technology depends to a large extent on the way the plasma source satisfies the process needs. In this paper, a short review is presented of a selected number of commercially available plasma sources that are using DC and/or RF inductively coupled plasma torch technologies. |
abstractGer |
Abstract Thermal plasma devices have evolved over the years from an aerospace R&D tool for the simulation of re-entry of space vehicles into powerful sources for a wide range of applications including materials processing, nano-powder synthesis and deposition of functional coatings, waste treatment and biomass gasification. With the development of full scale industrial applications, it is increasingly apparent that the plasma source is an integral part of the process, and that the success of a technology depends to a large extent on the way the plasma source satisfies the process needs. In this paper, a short review is presented of a selected number of commercially available plasma sources that are using DC and/or RF inductively coupled plasma torch technologies. |
abstract_unstemmed |
Abstract Thermal plasma devices have evolved over the years from an aerospace R&D tool for the simulation of re-entry of space vehicles into powerful sources for a wide range of applications including materials processing, nano-powder synthesis and deposition of functional coatings, waste treatment and biomass gasification. With the development of full scale industrial applications, it is increasingly apparent that the plasma source is an integral part of the process, and that the success of a technology depends to a large extent on the way the plasma source satisfies the process needs. In this paper, a short review is presented of a selected number of commercially available plasma sources that are using DC and/or RF inductively coupled plasma torch technologies. |
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Thermal Plasma Sources: How Well are They Adopted to Process Needs? |
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<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01000caa a22002652 4500</leader><controlfield tag="001">SPR016780558</controlfield><controlfield tag="003">DE-627</controlfield><controlfield tag="005">20230519113352.0</controlfield><controlfield tag="007">cr uuu---uuuuu</controlfield><controlfield tag="008">201006s2015 xx |||||o 00| ||eng c</controlfield><datafield tag="024" ind1="7" ind2=" "><subfield code="a">10.1007/s11090-015-9616-y</subfield><subfield code="2">doi</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-627)SPR016780558</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(SPR)s11090-015-9616-y-e</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-627</subfield><subfield code="b">ger</subfield><subfield code="c">DE-627</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1=" " ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">540</subfield><subfield code="q">ASE</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">33.00</subfield><subfield code="2">bkl</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">35.00</subfield><subfield code="2">bkl</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Mostaghimi, Javad</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Thermal Plasma Sources: How Well are They Adopted to Process Needs?</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">2015</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">Text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">Computermedien</subfield><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">Online-Ressource</subfield><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Abstract Thermal plasma devices have evolved over the years from an aerospace R&D tool for the simulation of re-entry of space vehicles into powerful sources for a wide range of applications including materials processing, nano-powder synthesis and deposition of functional coatings, waste treatment and biomass gasification. With the development of full scale industrial applications, it is increasingly apparent that the plasma source is an integral part of the process, and that the success of a technology depends to a large extent on the way the plasma source satisfies the process needs. In this paper, a short review is presented of a selected number of commercially available plasma sources that are using DC and/or RF inductively coupled plasma torch technologies.</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Thermal plasma processing</subfield><subfield code="7">(dpeaa)DE-He213</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">DC plasma torches (non-transferred)</subfield><subfield code="7">(dpeaa)DE-He213</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Radio frequency inductively coupled plasma torches</subfield><subfield code="7">(dpeaa)DE-He213</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Boulos, Maher I.</subfield><subfield code="e">verfasserin</subfield><subfield code="4">aut</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="i">Enthalten in</subfield><subfield code="t">Plasma chemistry and plasma processing</subfield><subfield code="d">Dordrecht : Springer Science + Business Media B.V., 1981</subfield><subfield code="g">35(2015), 3 vom: 26. Feb., Seite 421-436</subfield><subfield code="w">(DE-627)318633000</subfield><subfield code="w">(DE-600)2018594-7</subfield><subfield code="x">1572-8986</subfield><subfield code="7">nnns</subfield></datafield><datafield tag="773" ind1="1" ind2="8"><subfield code="g">volume:35</subfield><subfield code="g">year:2015</subfield><subfield code="g">number:3</subfield><subfield code="g">day:26</subfield><subfield code="g">month:02</subfield><subfield code="g">pages:421-436</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://dx.doi.org/10.1007/s11090-015-9616-y</subfield><subfield code="z">lizenzpflichtig</subfield><subfield code="3">Volltext</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_USEFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">SYSFLAG_A</subfield></datafield><datafield tag="912" ind1=" " ind2=" "><subfield code="a">GBV_SPRINGER</subfield></datafield><datafield tag="912" 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