Dihaloheptasilanes $ X_{2} $Si[SiMe($ SiMe_{3} $)2]2 as potential precursors for silylenes, disilenes and cyclotrisilanes

Abstract The synthesis of new dihaloheptasilanes $ X_{2} $Si[SiMe($ SiMe_{3} $)2]2 (X=Cl: 2, Br: 3, I: 4) was performed by treating dihydridoheptasilane 1 (X=H) with $ CCl_{4} $, $ HCBr_{3} $ or $ HCI_{3} $. Difluoroheptasilane 6 (X=F) was prepared from either diphenylheptasilane 5 (X=Ph), triflic a...
Ausführliche Beschreibung

Gespeichert in:

Autor*in:	Hassler, Karl [verfasserIn] Dzambaski, Ana [verfasserIn] Baumgartner, Judith [verfasserIn]

Format:	E-Artikel
Sprache:	Englisch

Erschienen:	2007

Schlagwörter:	Dihaloheptasilanes Reduction Disilylsilylene Cyclotrisilanes X-ray structure

Übergeordnetes Werk:	Enthalten in: Silicon chemistry - Dordrecht : Springer Science + Business Media B.V., 2002, 3(2007), 6 vom: 09. Nov., Seite 271-288
Übergeordnetes Werk:	volume:3 ; year:2007 ; number:6 ; day:09 ; month:11 ; pages:271-288

Links:	Volltext

DOI / URN:	10.1007/s11201-007-9029-8

Katalog-ID:	SPR017675391

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245	1	0	\|a Dihaloheptasilanes $ X_{2} $Si[SiMe($ SiMe_{3} $)2]2 as potential precursors for silylenes, disilenes and cyclotrisilanes
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520			\|a Abstract The synthesis of new dihaloheptasilanes $ X_{2} $Si[SiMe($ SiMe_{3} $)2]2 (X=Cl: 2, Br: 3, I: 4) was performed by treating dihydridoheptasilane 1 (X=H) with $ CCl_{4} $, $ HCBr_{3} $ or $ HCI_{3} $. Difluoroheptasilane 6 (X=F) was prepared from either diphenylheptasilane 5 (X=Ph), triflic acid (HOTf), and LiF with concomitant isolation of heptasilanes 7 ($ X_{2} $=Ph and OTf), 8 ($ X_{2} $=F and Ph), and 9 ($ X_{2} $=F and OTf), or by halogen exchange from 2 using $ ZnF_{2} $. Crystal structures of 2, 3, 4, and 5 are reported. The reduction of 2 with Li, Na or $ KC_{8} $ resulted in the instantaneous formation of various cyclotrisilanes, while the reduction of 3 gave exclusively the unsymmetrical cyclotrisilane (E)-1-methyl-2,3,3-tris[methylbis(trimethylsilyl)silyl]-1,2-bis(trimethylsilyl)cyclotrisilane 10, which was characterized by X-ray crystallography. A mechanism for the formation of cyclotrisilanes via a silylsilylene-to-disilene rearrangement is proposed. Attempts to prepare the tetradekasilane [($ Me_{3} $Si)2MeSi]2SiH–SiH[SiMe($ SiMe_{3} $)2]2 (by reductive dehalogenation of either HClSi[SiMe($ SiMe_{3} $)2]213 or HISi[SiMe($ SiMe_{3} $)2]218), or the tetradekasilane [($ Me_{3} $Si)2MeSi]2SiPh–SiPh[SiMe($ SiMe_{3} $)2]2 (by reductive dehalogenation of either PhClSi[SiMe($ SiMe_{3} $)2]214 or PhISi[SiMe($ SiMe_{3} $)2]219) as precursors for the disilene [($ Me_{3} $Si)2MeSi]2Si=Si[SiMe($ SiMe_{3} $)2]2 failed. 14 was characterized by X-ray crystallography. All compounds described were also characterized by multinuclear NMR spectroscopy and elemental analysis.
650		4	\|a Dihaloheptasilanes \|7 (dpeaa)DE-He213
650		4	\|a Reduction \|7 (dpeaa)DE-He213
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650		4	\|a X-ray structure \|7 (dpeaa)DE-He213
700	1		\|a Dzambaski, Ana \|e verfasserin \|4 aut
700	1		\|a Baumgartner, Judith \|e verfasserin \|4 aut
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matchkey_str	article:15728994:2007----::iaoetslns_ssmsm_2aptnilrcrososllns
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bklnumber	35.48
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allfields	10.1007/s11201-007-9029-8 doi (DE-627)SPR017675391 (SPR)s11201-007-9029-8-e DE-627 ger DE-627 rakwb eng 540 ASE 35.48 bkl Hassler, Karl verfasserin aut Dihaloheptasilanes $ X_{2} $Si[SiMe($ SiMe_{3} $)2]2 as potential precursors for silylenes, disilenes and cyclotrisilanes 2007 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract The synthesis of new dihaloheptasilanes $ X_{2} $Si[SiMe($ SiMe_{3} $)2]2 (X=Cl: 2, Br: 3, I: 4) was performed by treating dihydridoheptasilane 1 (X=H) with $ CCl_{4} $, $ HCBr_{3} $ or $ HCI_{3} $. Difluoroheptasilane 6 (X=F) was prepared from either diphenylheptasilane 5 (X=Ph), triflic acid (HOTf), and LiF with concomitant isolation of heptasilanes 7 ($ X_{2} $=Ph and OTf), 8 ($ X_{2} $=F and Ph), and 9 ($ X_{2} $=F and OTf), or by halogen exchange from 2 using $ ZnF_{2} $. Crystal structures of 2, 3, 4, and 5 are reported. The reduction of 2 with Li, Na or $ KC_{8} $ resulted in the instantaneous formation of various cyclotrisilanes, while the reduction of 3 gave exclusively the unsymmetrical cyclotrisilane (E)-1-methyl-2,3,3-tris[methylbis(trimethylsilyl)silyl]-1,2-bis(trimethylsilyl)cyclotrisilane 10, which was characterized by X-ray crystallography. A mechanism for the formation of cyclotrisilanes via a silylsilylene-to-disilene rearrangement is proposed. Attempts to prepare the tetradekasilane [($ Me_{3} $Si)2MeSi]2SiH–SiH[SiMe($ SiMe_{3} $)2]2 (by reductive dehalogenation of either HClSi[SiMe($ SiMe_{3} $)2]213 or HISi[SiMe($ SiMe_{3} $)2]218), or the tetradekasilane [($ Me_{3} $Si)2MeSi]2SiPh–SiPh[SiMe($ SiMe_{3} $)2]2 (by reductive dehalogenation of either PhClSi[SiMe($ SiMe_{3} $)2]214 or PhISi[SiMe($ SiMe_{3} $)2]219) as precursors for the disilene [($ Me_{3} $Si)2MeSi]2Si=Si[SiMe($ SiMe_{3} $)2]2 failed. 14 was characterized by X-ray crystallography. All compounds described were also characterized by multinuclear NMR spectroscopy and elemental analysis. Dihaloheptasilanes (dpeaa)DE-He213 Reduction (dpeaa)DE-He213 Disilylsilylene (dpeaa)DE-He213 Cyclotrisilanes (dpeaa)DE-He213 X-ray structure (dpeaa)DE-He213 Dzambaski, Ana verfasserin aut Baumgartner, Judith verfasserin aut Enthalten in Silicon chemistry Dordrecht : Springer Science + Business Media B.V., 2002 3(2007), 6 vom: 09. Nov., Seite 271-288 (DE-627)340872586 (DE-600)2065666-X 1572-8994 nnns volume:3 year:2007 number:6 day:09 month:11 pages:271-288 https://dx.doi.org/10.1007/s11201-007-9029-8 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_24 GBV_ILN_40 GBV_ILN_63 GBV_ILN_70 GBV_ILN_100 GBV_ILN_101 GBV_ILN_702 GBV_ILN_2048 GBV_ILN_2190 GBV_ILN_2522 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4333 GBV_ILN_4338 35.48 ASE AR 3 2007 6 09 11 271-288
spelling	10.1007/s11201-007-9029-8 doi (DE-627)SPR017675391 (SPR)s11201-007-9029-8-e DE-627 ger DE-627 rakwb eng 540 ASE 35.48 bkl Hassler, Karl verfasserin aut Dihaloheptasilanes $ X_{2} $Si[SiMe($ SiMe_{3} $)2]2 as potential precursors for silylenes, disilenes and cyclotrisilanes 2007 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract The synthesis of new dihaloheptasilanes $ X_{2} $Si[SiMe($ SiMe_{3} $)2]2 (X=Cl: 2, Br: 3, I: 4) was performed by treating dihydridoheptasilane 1 (X=H) with $ CCl_{4} $, $ HCBr_{3} $ or $ HCI_{3} $. Difluoroheptasilane 6 (X=F) was prepared from either diphenylheptasilane 5 (X=Ph), triflic acid (HOTf), and LiF with concomitant isolation of heptasilanes 7 ($ X_{2} $=Ph and OTf), 8 ($ X_{2} $=F and Ph), and 9 ($ X_{2} $=F and OTf), or by halogen exchange from 2 using $ ZnF_{2} $. Crystal structures of 2, 3, 4, and 5 are reported. The reduction of 2 with Li, Na or $ KC_{8} $ resulted in the instantaneous formation of various cyclotrisilanes, while the reduction of 3 gave exclusively the unsymmetrical cyclotrisilane (E)-1-methyl-2,3,3-tris[methylbis(trimethylsilyl)silyl]-1,2-bis(trimethylsilyl)cyclotrisilane 10, which was characterized by X-ray crystallography. A mechanism for the formation of cyclotrisilanes via a silylsilylene-to-disilene rearrangement is proposed. Attempts to prepare the tetradekasilane [($ Me_{3} $Si)2MeSi]2SiH–SiH[SiMe($ SiMe_{3} $)2]2 (by reductive dehalogenation of either HClSi[SiMe($ SiMe_{3} $)2]213 or HISi[SiMe($ SiMe_{3} $)2]218), or the tetradekasilane [($ Me_{3} $Si)2MeSi]2SiPh–SiPh[SiMe($ SiMe_{3} $)2]2 (by reductive dehalogenation of either PhClSi[SiMe($ SiMe_{3} $)2]214 or PhISi[SiMe($ SiMe_{3} $)2]219) as precursors for the disilene [($ Me_{3} $Si)2MeSi]2Si=Si[SiMe($ SiMe_{3} $)2]2 failed. 14 was characterized by X-ray crystallography. All compounds described were also characterized by multinuclear NMR spectroscopy and elemental analysis. Dihaloheptasilanes (dpeaa)DE-He213 Reduction (dpeaa)DE-He213 Disilylsilylene (dpeaa)DE-He213 Cyclotrisilanes (dpeaa)DE-He213 X-ray structure (dpeaa)DE-He213 Dzambaski, Ana verfasserin aut Baumgartner, Judith verfasserin aut Enthalten in Silicon chemistry Dordrecht : Springer Science + Business Media B.V., 2002 3(2007), 6 vom: 09. Nov., Seite 271-288 (DE-627)340872586 (DE-600)2065666-X 1572-8994 nnns volume:3 year:2007 number:6 day:09 month:11 pages:271-288 https://dx.doi.org/10.1007/s11201-007-9029-8 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_24 GBV_ILN_40 GBV_ILN_63 GBV_ILN_70 GBV_ILN_100 GBV_ILN_101 GBV_ILN_702 GBV_ILN_2048 GBV_ILN_2190 GBV_ILN_2522 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4333 GBV_ILN_4338 35.48 ASE AR 3 2007 6 09 11 271-288
allfields_unstemmed	10.1007/s11201-007-9029-8 doi (DE-627)SPR017675391 (SPR)s11201-007-9029-8-e DE-627 ger DE-627 rakwb eng 540 ASE 35.48 bkl Hassler, Karl verfasserin aut Dihaloheptasilanes $ X_{2} $Si[SiMe($ SiMe_{3} $)2]2 as potential precursors for silylenes, disilenes and cyclotrisilanes 2007 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract The synthesis of new dihaloheptasilanes $ X_{2} $Si[SiMe($ SiMe_{3} $)2]2 (X=Cl: 2, Br: 3, I: 4) was performed by treating dihydridoheptasilane 1 (X=H) with $ CCl_{4} $, $ HCBr_{3} $ or $ HCI_{3} $. Difluoroheptasilane 6 (X=F) was prepared from either diphenylheptasilane 5 (X=Ph), triflic acid (HOTf), and LiF with concomitant isolation of heptasilanes 7 ($ X_{2} $=Ph and OTf), 8 ($ X_{2} $=F and Ph), and 9 ($ X_{2} $=F and OTf), or by halogen exchange from 2 using $ ZnF_{2} $. Crystal structures of 2, 3, 4, and 5 are reported. The reduction of 2 with Li, Na or $ KC_{8} $ resulted in the instantaneous formation of various cyclotrisilanes, while the reduction of 3 gave exclusively the unsymmetrical cyclotrisilane (E)-1-methyl-2,3,3-tris[methylbis(trimethylsilyl)silyl]-1,2-bis(trimethylsilyl)cyclotrisilane 10, which was characterized by X-ray crystallography. A mechanism for the formation of cyclotrisilanes via a silylsilylene-to-disilene rearrangement is proposed. Attempts to prepare the tetradekasilane [($ Me_{3} $Si)2MeSi]2SiH–SiH[SiMe($ SiMe_{3} $)2]2 (by reductive dehalogenation of either HClSi[SiMe($ SiMe_{3} $)2]213 or HISi[SiMe($ SiMe_{3} $)2]218), or the tetradekasilane [($ Me_{3} $Si)2MeSi]2SiPh–SiPh[SiMe($ SiMe_{3} $)2]2 (by reductive dehalogenation of either PhClSi[SiMe($ SiMe_{3} $)2]214 or PhISi[SiMe($ SiMe_{3} $)2]219) as precursors for the disilene [($ Me_{3} $Si)2MeSi]2Si=Si[SiMe($ SiMe_{3} $)2]2 failed. 14 was characterized by X-ray crystallography. All compounds described were also characterized by multinuclear NMR spectroscopy and elemental analysis. Dihaloheptasilanes (dpeaa)DE-He213 Reduction (dpeaa)DE-He213 Disilylsilylene (dpeaa)DE-He213 Cyclotrisilanes (dpeaa)DE-He213 X-ray structure (dpeaa)DE-He213 Dzambaski, Ana verfasserin aut Baumgartner, Judith verfasserin aut Enthalten in Silicon chemistry Dordrecht : Springer Science + Business Media B.V., 2002 3(2007), 6 vom: 09. Nov., Seite 271-288 (DE-627)340872586 (DE-600)2065666-X 1572-8994 nnns volume:3 year:2007 number:6 day:09 month:11 pages:271-288 https://dx.doi.org/10.1007/s11201-007-9029-8 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_24 GBV_ILN_40 GBV_ILN_63 GBV_ILN_70 GBV_ILN_100 GBV_ILN_101 GBV_ILN_702 GBV_ILN_2048 GBV_ILN_2190 GBV_ILN_2522 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4333 GBV_ILN_4338 35.48 ASE AR 3 2007 6 09 11 271-288
allfieldsGer	10.1007/s11201-007-9029-8 doi (DE-627)SPR017675391 (SPR)s11201-007-9029-8-e DE-627 ger DE-627 rakwb eng 540 ASE 35.48 bkl Hassler, Karl verfasserin aut Dihaloheptasilanes $ X_{2} $Si[SiMe($ SiMe_{3} $)2]2 as potential precursors for silylenes, disilenes and cyclotrisilanes 2007 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract The synthesis of new dihaloheptasilanes $ X_{2} $Si[SiMe($ SiMe_{3} $)2]2 (X=Cl: 2, Br: 3, I: 4) was performed by treating dihydridoheptasilane 1 (X=H) with $ CCl_{4} $, $ HCBr_{3} $ or $ HCI_{3} $. Difluoroheptasilane 6 (X=F) was prepared from either diphenylheptasilane 5 (X=Ph), triflic acid (HOTf), and LiF with concomitant isolation of heptasilanes 7 ($ X_{2} $=Ph and OTf), 8 ($ X_{2} $=F and Ph), and 9 ($ X_{2} $=F and OTf), or by halogen exchange from 2 using $ ZnF_{2} $. Crystal structures of 2, 3, 4, and 5 are reported. The reduction of 2 with Li, Na or $ KC_{8} $ resulted in the instantaneous formation of various cyclotrisilanes, while the reduction of 3 gave exclusively the unsymmetrical cyclotrisilane (E)-1-methyl-2,3,3-tris[methylbis(trimethylsilyl)silyl]-1,2-bis(trimethylsilyl)cyclotrisilane 10, which was characterized by X-ray crystallography. A mechanism for the formation of cyclotrisilanes via a silylsilylene-to-disilene rearrangement is proposed. Attempts to prepare the tetradekasilane [($ Me_{3} $Si)2MeSi]2SiH–SiH[SiMe($ SiMe_{3} $)2]2 (by reductive dehalogenation of either HClSi[SiMe($ SiMe_{3} $)2]213 or HISi[SiMe($ SiMe_{3} $)2]218), or the tetradekasilane [($ Me_{3} $Si)2MeSi]2SiPh–SiPh[SiMe($ SiMe_{3} $)2]2 (by reductive dehalogenation of either PhClSi[SiMe($ SiMe_{3} $)2]214 or PhISi[SiMe($ SiMe_{3} $)2]219) as precursors for the disilene [($ Me_{3} $Si)2MeSi]2Si=Si[SiMe($ SiMe_{3} $)2]2 failed. 14 was characterized by X-ray crystallography. All compounds described were also characterized by multinuclear NMR spectroscopy and elemental analysis. Dihaloheptasilanes (dpeaa)DE-He213 Reduction (dpeaa)DE-He213 Disilylsilylene (dpeaa)DE-He213 Cyclotrisilanes (dpeaa)DE-He213 X-ray structure (dpeaa)DE-He213 Dzambaski, Ana verfasserin aut Baumgartner, Judith verfasserin aut Enthalten in Silicon chemistry Dordrecht : Springer Science + Business Media B.V., 2002 3(2007), 6 vom: 09. Nov., Seite 271-288 (DE-627)340872586 (DE-600)2065666-X 1572-8994 nnns volume:3 year:2007 number:6 day:09 month:11 pages:271-288 https://dx.doi.org/10.1007/s11201-007-9029-8 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_24 GBV_ILN_40 GBV_ILN_63 GBV_ILN_70 GBV_ILN_100 GBV_ILN_101 GBV_ILN_702 GBV_ILN_2048 GBV_ILN_2190 GBV_ILN_2522 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4333 GBV_ILN_4338 35.48 ASE AR 3 2007 6 09 11 271-288
allfieldsSound	10.1007/s11201-007-9029-8 doi (DE-627)SPR017675391 (SPR)s11201-007-9029-8-e DE-627 ger DE-627 rakwb eng 540 ASE 35.48 bkl Hassler, Karl verfasserin aut Dihaloheptasilanes $ X_{2} $Si[SiMe($ SiMe_{3} $)2]2 as potential precursors for silylenes, disilenes and cyclotrisilanes 2007 Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Abstract The synthesis of new dihaloheptasilanes $ X_{2} $Si[SiMe($ SiMe_{3} $)2]2 (X=Cl: 2, Br: 3, I: 4) was performed by treating dihydridoheptasilane 1 (X=H) with $ CCl_{4} $, $ HCBr_{3} $ or $ HCI_{3} $. Difluoroheptasilane 6 (X=F) was prepared from either diphenylheptasilane 5 (X=Ph), triflic acid (HOTf), and LiF with concomitant isolation of heptasilanes 7 ($ X_{2} $=Ph and OTf), 8 ($ X_{2} $=F and Ph), and 9 ($ X_{2} $=F and OTf), or by halogen exchange from 2 using $ ZnF_{2} $. Crystal structures of 2, 3, 4, and 5 are reported. The reduction of 2 with Li, Na or $ KC_{8} $ resulted in the instantaneous formation of various cyclotrisilanes, while the reduction of 3 gave exclusively the unsymmetrical cyclotrisilane (E)-1-methyl-2,3,3-tris[methylbis(trimethylsilyl)silyl]-1,2-bis(trimethylsilyl)cyclotrisilane 10, which was characterized by X-ray crystallography. A mechanism for the formation of cyclotrisilanes via a silylsilylene-to-disilene rearrangement is proposed. Attempts to prepare the tetradekasilane [($ Me_{3} $Si)2MeSi]2SiH–SiH[SiMe($ SiMe_{3} $)2]2 (by reductive dehalogenation of either HClSi[SiMe($ SiMe_{3} $)2]213 or HISi[SiMe($ SiMe_{3} $)2]218), or the tetradekasilane [($ Me_{3} $Si)2MeSi]2SiPh–SiPh[SiMe($ SiMe_{3} $)2]2 (by reductive dehalogenation of either PhClSi[SiMe($ SiMe_{3} $)2]214 or PhISi[SiMe($ SiMe_{3} $)2]219) as precursors for the disilene [($ Me_{3} $Si)2MeSi]2Si=Si[SiMe($ SiMe_{3} $)2]2 failed. 14 was characterized by X-ray crystallography. All compounds described were also characterized by multinuclear NMR spectroscopy and elemental analysis. Dihaloheptasilanes (dpeaa)DE-He213 Reduction (dpeaa)DE-He213 Disilylsilylene (dpeaa)DE-He213 Cyclotrisilanes (dpeaa)DE-He213 X-ray structure (dpeaa)DE-He213 Dzambaski, Ana verfasserin aut Baumgartner, Judith verfasserin aut Enthalten in Silicon chemistry Dordrecht : Springer Science + Business Media B.V., 2002 3(2007), 6 vom: 09. Nov., Seite 271-288 (DE-627)340872586 (DE-600)2065666-X 1572-8994 nnns volume:3 year:2007 number:6 day:09 month:11 pages:271-288 https://dx.doi.org/10.1007/s11201-007-9029-8 lizenzpflichtig Volltext GBV_USEFLAG_A SYSFLAG_A GBV_SPRINGER SSG-OLC-PHA GBV_ILN_24 GBV_ILN_40 GBV_ILN_63 GBV_ILN_70 GBV_ILN_100 GBV_ILN_101 GBV_ILN_702 GBV_ILN_2048 GBV_ILN_2190 GBV_ILN_2522 GBV_ILN_4012 GBV_ILN_4035 GBV_ILN_4037 GBV_ILN_4112 GBV_ILN_4125 GBV_ILN_4126 GBV_ILN_4242 GBV_ILN_4246 GBV_ILN_4249 GBV_ILN_4251 GBV_ILN_4305 GBV_ILN_4306 GBV_ILN_4307 GBV_ILN_4322 GBV_ILN_4323 GBV_ILN_4324 GBV_ILN_4325 GBV_ILN_4333 GBV_ILN_4338 35.48 ASE AR 3 2007 6 09 11 271-288
language	English
source	Enthalten in Silicon chemistry 3(2007), 6 vom: 09. Nov., Seite 271-288 volume:3 year:2007 number:6 day:09 month:11 pages:271-288
sourceStr	Enthalten in Silicon chemistry 3(2007), 6 vom: 09. Nov., Seite 271-288 volume:3 year:2007 number:6 day:09 month:11 pages:271-288
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author	Hassler, Karl
spellingShingle	Hassler, Karl ddc 540 bkl 35.48 misc Dihaloheptasilanes misc Reduction misc Disilylsilylene misc Cyclotrisilanes misc X-ray structure Dihaloheptasilanes $ X_{2} $Si[SiMe($ SiMe_{3} $)2]2 as potential precursors for silylenes, disilenes and cyclotrisilanes
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topic_title	540 ASE 35.48 bkl Dihaloheptasilanes $ X_{2} $Si[SiMe($ SiMe_{3} $)2]2 as potential precursors for silylenes, disilenes and cyclotrisilanes Dihaloheptasilanes (dpeaa)DE-He213 Reduction (dpeaa)DE-He213 Disilylsilylene (dpeaa)DE-He213 Cyclotrisilanes (dpeaa)DE-He213 X-ray structure (dpeaa)DE-He213
topic	ddc 540 bkl 35.48 misc Dihaloheptasilanes misc Reduction misc Disilylsilylene misc Cyclotrisilanes misc X-ray structure
topic_unstemmed	ddc 540 bkl 35.48 misc Dihaloheptasilanes misc Reduction misc Disilylsilylene misc Cyclotrisilanes misc X-ray structure
topic_browse	ddc 540 bkl 35.48 misc Dihaloheptasilanes misc Reduction misc Disilylsilylene misc Cyclotrisilanes misc X-ray structure
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title	Dihaloheptasilanes $ X_{2} $Si[SiMe($ SiMe_{3} $)2]2 as potential precursors for silylenes, disilenes and cyclotrisilanes
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title_full	Dihaloheptasilanes $ X_{2} $Si[SiMe($ SiMe_{3} $)2]2 as potential precursors for silylenes, disilenes and cyclotrisilanes
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author_browse	Hassler, Karl Dzambaski, Ana Baumgartner, Judith
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format_se	Elektronische Aufsätze
author-letter	Hassler, Karl
doi_str_mv	10.1007/s11201-007-9029-8
dewey-full	540
author2-role	verfasserin
title_sort	dihaloheptasilanes $ x_{2} $si[sime($ sime_{3} $)2]2 as potential precursors for silylenes, disilenes and cyclotrisilanes
title_auth	Dihaloheptasilanes $ X_{2} $Si[SiMe($ SiMe_{3} $)2]2 as potential precursors for silylenes, disilenes and cyclotrisilanes
abstract	Abstract The synthesis of new dihaloheptasilanes $ X_{2} $Si[SiMe($ SiMe_{3} $)2]2 (X=Cl: 2, Br: 3, I: 4) was performed by treating dihydridoheptasilane 1 (X=H) with $ CCl_{4} $, $ HCBr_{3} $ or $ HCI_{3} $. Difluoroheptasilane 6 (X=F) was prepared from either diphenylheptasilane 5 (X=Ph), triflic acid (HOTf), and LiF with concomitant isolation of heptasilanes 7 ($ X_{2} $=Ph and OTf), 8 ($ X_{2} $=F and Ph), and 9 ($ X_{2} $=F and OTf), or by halogen exchange from 2 using $ ZnF_{2} $. Crystal structures of 2, 3, 4, and 5 are reported. The reduction of 2 with Li, Na or $ KC_{8} $ resulted in the instantaneous formation of various cyclotrisilanes, while the reduction of 3 gave exclusively the unsymmetrical cyclotrisilane (E)-1-methyl-2,3,3-tris[methylbis(trimethylsilyl)silyl]-1,2-bis(trimethylsilyl)cyclotrisilane 10, which was characterized by X-ray crystallography. A mechanism for the formation of cyclotrisilanes via a silylsilylene-to-disilene rearrangement is proposed. Attempts to prepare the tetradekasilane [($ Me_{3} $Si)2MeSi]2SiH–SiH[SiMe($ SiMe_{3} $)2]2 (by reductive dehalogenation of either HClSi[SiMe($ SiMe_{3} $)2]213 or HISi[SiMe($ SiMe_{3} $)2]218), or the tetradekasilane [($ Me_{3} $Si)2MeSi]2SiPh–SiPh[SiMe($ SiMe_{3} $)2]2 (by reductive dehalogenation of either PhClSi[SiMe($ SiMe_{3} $)2]214 or PhISi[SiMe($ SiMe_{3} $)2]219) as precursors for the disilene [($ Me_{3} $Si)2MeSi]2Si=Si[SiMe($ SiMe_{3} $)2]2 failed. 14 was characterized by X-ray crystallography. All compounds described were also characterized by multinuclear NMR spectroscopy and elemental analysis.
abstractGer	Abstract The synthesis of new dihaloheptasilanes $ X_{2} $Si[SiMe($ SiMe_{3} $)2]2 (X=Cl: 2, Br: 3, I: 4) was performed by treating dihydridoheptasilane 1 (X=H) with $ CCl_{4} $, $ HCBr_{3} $ or $ HCI_{3} $. Difluoroheptasilane 6 (X=F) was prepared from either diphenylheptasilane 5 (X=Ph), triflic acid (HOTf), and LiF with concomitant isolation of heptasilanes 7 ($ X_{2} $=Ph and OTf), 8 ($ X_{2} $=F and Ph), and 9 ($ X_{2} $=F and OTf), or by halogen exchange from 2 using $ ZnF_{2} $. Crystal structures of 2, 3, 4, and 5 are reported. The reduction of 2 with Li, Na or $ KC_{8} $ resulted in the instantaneous formation of various cyclotrisilanes, while the reduction of 3 gave exclusively the unsymmetrical cyclotrisilane (E)-1-methyl-2,3,3-tris[methylbis(trimethylsilyl)silyl]-1,2-bis(trimethylsilyl)cyclotrisilane 10, which was characterized by X-ray crystallography. A mechanism for the formation of cyclotrisilanes via a silylsilylene-to-disilene rearrangement is proposed. Attempts to prepare the tetradekasilane [($ Me_{3} $Si)2MeSi]2SiH–SiH[SiMe($ SiMe_{3} $)2]2 (by reductive dehalogenation of either HClSi[SiMe($ SiMe_{3} $)2]213 or HISi[SiMe($ SiMe_{3} $)2]218), or the tetradekasilane [($ Me_{3} $Si)2MeSi]2SiPh–SiPh[SiMe($ SiMe_{3} $)2]2 (by reductive dehalogenation of either PhClSi[SiMe($ SiMe_{3} $)2]214 or PhISi[SiMe($ SiMe_{3} $)2]219) as precursors for the disilene [($ Me_{3} $Si)2MeSi]2Si=Si[SiMe($ SiMe_{3} $)2]2 failed. 14 was characterized by X-ray crystallography. All compounds described were also characterized by multinuclear NMR spectroscopy and elemental analysis.
abstract_unstemmed	Abstract The synthesis of new dihaloheptasilanes $ X_{2} $Si[SiMe($ SiMe_{3} $)2]2 (X=Cl: 2, Br: 3, I: 4) was performed by treating dihydridoheptasilane 1 (X=H) with $ CCl_{4} $, $ HCBr_{3} $ or $ HCI_{3} $. Difluoroheptasilane 6 (X=F) was prepared from either diphenylheptasilane 5 (X=Ph), triflic acid (HOTf), and LiF with concomitant isolation of heptasilanes 7 ($ X_{2} $=Ph and OTf), 8 ($ X_{2} $=F and Ph), and 9 ($ X_{2} $=F and OTf), or by halogen exchange from 2 using $ ZnF_{2} $. Crystal structures of 2, 3, 4, and 5 are reported. The reduction of 2 with Li, Na or $ KC_{8} $ resulted in the instantaneous formation of various cyclotrisilanes, while the reduction of 3 gave exclusively the unsymmetrical cyclotrisilane (E)-1-methyl-2,3,3-tris[methylbis(trimethylsilyl)silyl]-1,2-bis(trimethylsilyl)cyclotrisilane 10, which was characterized by X-ray crystallography. A mechanism for the formation of cyclotrisilanes via a silylsilylene-to-disilene rearrangement is proposed. Attempts to prepare the tetradekasilane [($ Me_{3} $Si)2MeSi]2SiH–SiH[SiMe($ SiMe_{3} $)2]2 (by reductive dehalogenation of either HClSi[SiMe($ SiMe_{3} $)2]213 or HISi[SiMe($ SiMe_{3} $)2]218), or the tetradekasilane [($ Me_{3} $Si)2MeSi]2SiPh–SiPh[SiMe($ SiMe_{3} $)2]2 (by reductive dehalogenation of either PhClSi[SiMe($ SiMe_{3} $)2]214 or PhISi[SiMe($ SiMe_{3} $)2]219) as precursors for the disilene [($ Me_{3} $Si)2MeSi]2Si=Si[SiMe($ SiMe_{3} $)2]2 failed. 14 was characterized by X-ray crystallography. All compounds described were also characterized by multinuclear NMR spectroscopy and elemental analysis.
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container_issue	6
title_short	Dihaloheptasilanes $ X_{2} $Si[SiMe($ SiMe_{3} $)2]2 as potential precursors for silylenes, disilenes and cyclotrisilanes
url	https://dx.doi.org/10.1007/s11201-007-9029-8
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author2	Dzambaski, Ana Baumgartner, Judith
author2Str	Dzambaski, Ana Baumgartner, Judith
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doi_str	10.1007/s11201-007-9029-8
up_date	2024-07-03T14:26:53.999Z
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